JPS575869A - Vapor depositing apparatus - Google Patents
Vapor depositing apparatusInfo
- Publication number
- JPS575869A JPS575869A JP7961680A JP7961680A JPS575869A JP S575869 A JPS575869 A JP S575869A JP 7961680 A JP7961680 A JP 7961680A JP 7961680 A JP7961680 A JP 7961680A JP S575869 A JPS575869 A JP S575869A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- substance
- vapor
- electric discharge
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To form a vapor deposition film consisting a substance of an evaporation source and the third component easily and efficiently at a high film forming speed, in vapor depositing the substance of the evaporation source on a substrate in a vacuum tank, by subjecting a charged particle from a gas discharge tube and a vapor of the substance from the evaporation source to electric discharge treatment at well as controlling an electric discharge zone.
CONSTITUTION: Under a condition maintaining an interior of a vacuum tank 1 under vacuum, an evaporation source 3 is heated to evaporate a substance such as In or the like from the evaporation source as well as cation, anion or electron which are a gas decomposition products due to electric discharge is accelerated and introduced into the vacuum tank 1 from the gas discharge tube 4. Subsequently, these electric discharge products, the undecomposed gas and the vapor of the substance from the evaporation source in a mixed condition are subjected to glow discharge in the space 5 above the evaporation source 3 by the action of an accelerating electrode 6 and/or a discharge electrode 8. Then, the ionized undecomposed gas and the vapor are accelerated by the action of the electrode 6 to which negative D.C. voltage is applied to be collided against the substrate 12 and, thereby, a vapor deposition film comprising only the substance of the evaporation source or a desired vapor deposition film containing the third component due to the aforementioned electric discharge produts is formed on the substrate 12.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7961680A JPS575869A (en) | 1980-06-14 | 1980-06-14 | Vapor depositing apparatus |
| EP80304246A EP0029747A1 (en) | 1979-11-27 | 1980-11-26 | An apparatus for vacuum deposition and a method for forming a thin film by the use thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7961680A JPS575869A (en) | 1980-06-14 | 1980-06-14 | Vapor depositing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS575869A true JPS575869A (en) | 1982-01-12 |
Family
ID=13694982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7961680A Pending JPS575869A (en) | 1979-11-27 | 1980-06-14 | Vapor depositing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS575869A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5967046U (en) * | 1982-10-25 | 1984-05-07 | 株式会社日立製作所 | wireless transmitter |
-
1980
- 1980-06-14 JP JP7961680A patent/JPS575869A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5967046U (en) * | 1982-10-25 | 1984-05-07 | 株式会社日立製作所 | wireless transmitter |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4959242A (en) | Method for forming a thin film | |
| US3654108A (en) | Method for glow cleaning | |
| KR900007069A (en) | Ashing processing method and apparatus | |
| KR940010866A (en) | Microwave Plasma Treatment System and Processing Method | |
| US5818040A (en) | Neutral particle beam irradiation apparatus | |
| DE1521327A1 (en) | Method and device for the production of tough coatings on a surface | |
| JPS5620163A (en) | Beryllium oxide film and its formation | |
| JPS575869A (en) | Vapor depositing apparatus | |
| JPS5489983A (en) | Device and method for vacuum deposition compound | |
| JPS575868A (en) | Vapor depositing apparatus | |
| JPS575867A (en) | Vapor depositing apparatus | |
| GB916387A (en) | Improved process and apparatus for rendering non-adherent plastic surfaces adherent | |
| JPS57200569A (en) | Apparatus for treating surface with gas decomposed by light | |
| JPS575866A (en) | Vapor depositing apparatus | |
| JPS5689835A (en) | Vapor phase growth apparatus | |
| JPS6452469A (en) | Method for sterilizing, asceptic and antifungal treatment of material or processed product composed of synthetic resin, rubber, synthetic fiber, metal or ceramics | |
| JPS5710629A (en) | Plasma treatment of hollow body | |
| JPS575865A (en) | Apparatus for forming transparent electroconductive film | |
| KR900008155B1 (en) | Method and apparatus for forming a thin fim | |
| DE19853121C1 (en) | Treatment of substrates made of insulating materials in high-frequency plasmas involves production of a thin electrically conductive surface layer and using this layer as a high-frequency discharge electrode | |
| JPS63262457A (en) | Preparation of boron nitride film | |
| JPS6350289Y2 (en) | ||
| JPS5741375A (en) | Ion treating device | |
| JPS6016418A (en) | Plasma cvd processing method | |
| JPS5493634A (en) | Bombard cleaning method by plasma electron beam irraciation of hollow hot cathode |