KR970008550A - 정전 파괴 보호 회로를 구비한 반도체 디바이스 - Google Patents
정전 파괴 보호 회로를 구비한 반도체 디바이스 Download PDFInfo
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- KR970008550A KR970008550A KR1019960028677A KR19960028677A KR970008550A KR 970008550 A KR970008550 A KR 970008550A KR 1019960028677 A KR1019960028677 A KR 1019960028677A KR 19960028677 A KR19960028677 A KR 19960028677A KR 970008550 A KR970008550 A KR 970008550A
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- semiconductor device
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- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/60—Protection against electrostatic charges or discharges, e.g. Faraday shields
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/061—Disposition
- H01L2224/0612—Layout
- H01L2224/0613—Square or rectangular array
- H01L2224/06134—Square or rectangular array covering only portions of the surface to be connected
- H01L2224/06136—Covering only the central area of the surface to be connected, i.e. central arrangements
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- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
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- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
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Abstract
반도체 디바이스는 다수의 분리 영역으로 분할된 반도체 칩(10)을 갖고 있다. 이들 각각의 영역에서는 서로 독립한 다수의 공통 방전 라인(12a, 12b, 12c), 각각의 공통 방전 라인에 직접 접속되는 다수의 제1본딩 패드(14a, 14b, 14c), 공통방전 라인에 직접 접속되지 않는 다수의 제2본딩 패드(13a, 13d, 13e, 13h, 13b, 13f, 13c, 13g), 제2본딩 패드와 공통방전 라인 사이에 접속되는 다수의 보호 소자(15a-15h), 및 제1본딩 패드에 직접 접속되고 반도체 칩의 표면에 접착 고정되는 방전용 내부 리드(22)가 구비되어 있다. 본 발명의 모든 실시예에서, 1개 이상의 공통 방전 라인이 있다. 이 배열은 칩의 면적을 축소시키고 설계 자유도를 향상시키며 정전 파괴내성을 향상시킨다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제6도는 본 발명에 따른 디바이스의 제1실시예의 평면도.
Claims (4)
- 입력 신호에 응답하여 처리된 후 소정의 신호를 출력하기 위한 내부 회로를 구비한 반도체 칩을 갖는 반도체 디바이스에 있어서, 상기 반도체 칩을 분할하여 형성된 다수의 분리 영역, 상기 분리 영역 각각에 제공되는 서로 독립한 공통 방전 라인(12a, 12b, 12c), 상기 공통 방전 라인 각각에 직접 접속되는 제1본딩 패드(14a, 14b, 14c), 상기 공통 방전 라인에 직접 접속되는 것 이외의 제2본딩 패드(13a, 13d, 13e, 13h, 13b, 13f, 13c, 13g), 상기 제2본딩 패드와 공통 방전 라인 사이에 접속되는 보호 소자(15a-15h), 및 상기 제1본딩 패드에 직접 접속되고 상기 반도체 칩의 표면에 접착 고정되는 방전용 내부 리드(22)를 포함하고 있는 것을 특징으로 하는 반도체 디바이스.
- 제1항에 있어서, 상기 분리 영역은 상기 반도체 칩의 전체 주변 영역 및 상기 전체 주변 영역 내부의 소정영역으로 이루어지는 것을 특징으로 하는 반도체 디바이스.
- 제1항에 있어서, 상기 분리 영역은 상기 반도체 칩의 소정 주변 영역으로 이루어지는 것을 특징으로 하는반도체 디바이스.
- 제1항에 있어서, 상기 공통 방전 라인은 상기 제1본딩 패드와 상기 보호 소자 사이에 배치된 소정 부분을갖고, 상기 소정 부분은 상기 제1본딩 패드와 상기 보호 소자를 직접 상호 접속하는 것을 특징으로 하는 반도체 디바이스.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7181348A JP2830783B2 (ja) | 1995-07-18 | 1995-07-18 | 半導体装置 |
JP95-181348 | 1995-07-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970008550A true KR970008550A (ko) | 1997-02-24 |
KR100194312B1 KR100194312B1 (ko) | 1999-06-15 |
Family
ID=16099145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960028677A KR100194312B1 (ko) | 1995-07-18 | 1996-07-16 | 정전 파괴 보호 회로를 구비한 반도체 디바이스 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5751051A (ko) |
JP (1) | JP2830783B2 (ko) |
KR (1) | KR100194312B1 (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2826498B2 (ja) * | 1996-01-17 | 1998-11-18 | 日本電気アイシーマイコンシステム株式会社 | 半導体装置 |
JP2940506B2 (ja) * | 1997-01-31 | 1999-08-25 | 日本電気株式会社 | 半導体装置 |
US6118640A (en) * | 1999-02-17 | 2000-09-12 | Pericom Semiconductor Corp. | Actively-driven thin-oxide MOS transistor shunt for ESD protection of multiple independent supply busses in a mixed-signal chip |
GB2357633A (en) * | 1999-12-21 | 2001-06-27 | Nokia Mobile Phones Ltd | Electrostatic discharge protection for integrated circuits |
JP4629826B2 (ja) | 2000-02-22 | 2011-02-09 | パナソニック株式会社 | 半導体集積回路装置 |
US6385021B1 (en) | 2000-04-10 | 2002-05-07 | Motorola, Inc. | Electrostatic discharge (ESD) protection circuit |
JP2002076282A (ja) | 2000-08-30 | 2002-03-15 | Nec Corp | 半導体集積回路装置及びその設計方法 |
US6724603B2 (en) * | 2002-08-09 | 2004-04-20 | Motorola, Inc. | Electrostatic discharge protection circuitry and method of operation |
US6756834B1 (en) * | 2003-04-29 | 2004-06-29 | Pericom Semiconductor Corp. | Direct power-to-ground ESD protection with an electrostatic common-discharge line |
US8035188B2 (en) * | 2004-07-28 | 2011-10-11 | Panasonic Corporation | Semiconductor device |
US7446990B2 (en) * | 2005-02-11 | 2008-11-04 | Freescale Semiconductor, Inc. | I/O cell ESD system |
US20070267748A1 (en) * | 2006-05-16 | 2007-11-22 | Tran Tu-Anh N | Integrated circuit having pads and input/output (i/o) cells |
US7808117B2 (en) * | 2006-05-16 | 2010-10-05 | Freescale Semiconductor, Inc. | Integrated circuit having pads and input/output (I/O) cells |
US7777998B2 (en) | 2007-09-10 | 2010-08-17 | Freescale Semiconductor, Inc. | Electrostatic discharge circuit and method therefor |
US8830107B1 (en) * | 2013-04-16 | 2014-09-09 | Udo Karthaus | Frequency translating analog-to-digital converter |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5182621A (en) * | 1988-06-14 | 1993-01-26 | Nec Corporation | Input protection circuit for analog/digital converting semiconductor |
US5272586A (en) * | 1991-01-29 | 1993-12-21 | National Semiconductor Corporation | Technique for improving ESD immunity |
JP3375659B2 (ja) * | 1991-03-28 | 2003-02-10 | テキサス インスツルメンツ インコーポレイテツド | 静電放電保護回路の形成方法 |
US5220443A (en) * | 1991-04-29 | 1993-06-15 | Nec Corporation | Matrix wiring substrate and active matrix display having non-linear resistance elements for electrostatic discharge protection |
JPH05114685A (ja) * | 1991-10-23 | 1993-05-07 | Mitsubishi Electric Corp | 半導体装置 |
JPH05299598A (ja) * | 1992-04-20 | 1993-11-12 | Hitachi Ltd | 半導体装置 |
JP2677737B2 (ja) * | 1992-06-24 | 1997-11-17 | 株式会社東芝 | 半導体装置 |
JP2830637B2 (ja) * | 1992-08-18 | 1998-12-02 | 日本電気株式会社 | Loc型半導体装置 |
JP2958202B2 (ja) * | 1992-12-01 | 1999-10-06 | シャープ株式会社 | 半導体装置 |
JP2972494B2 (ja) * | 1993-06-30 | 1999-11-08 | 日本電気株式会社 | 半導体装置 |
US5521783A (en) * | 1993-09-17 | 1996-05-28 | Analog Devices, Inc. | Electrostatic discharge protection circuit |
US5561577A (en) * | 1994-02-02 | 1996-10-01 | Hewlett-Packard Company | ESD protection for IC's |
-
1995
- 1995-07-18 JP JP7181348A patent/JP2830783B2/ja not_active Expired - Lifetime
-
1996
- 1996-07-16 KR KR1019960028677A patent/KR100194312B1/ko not_active IP Right Cessation
-
1997
- 1997-10-16 US US08/951,412 patent/US5751051A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR100194312B1 (ko) | 1999-06-15 |
JPH0936311A (ja) | 1997-02-07 |
JP2830783B2 (ja) | 1998-12-02 |
US5751051A (en) | 1998-05-12 |
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