KR970008550A - 정전 파괴 보호 회로를 구비한 반도체 디바이스 - Google Patents

정전 파괴 보호 회로를 구비한 반도체 디바이스 Download PDF

Info

Publication number
KR970008550A
KR970008550A KR1019960028677A KR19960028677A KR970008550A KR 970008550 A KR970008550 A KR 970008550A KR 1019960028677 A KR1019960028677 A KR 1019960028677A KR 19960028677 A KR19960028677 A KR 19960028677A KR 970008550 A KR970008550 A KR 970008550A
Authority
KR
South Korea
Prior art keywords
semiconductor device
semiconductor chip
common discharge
bonding pad
bonding
Prior art date
Application number
KR1019960028677A
Other languages
English (en)
Other versions
KR100194312B1 (ko
Inventor
기미노리 하야노
Original Assignee
가네꼬 히사시
닛본덴기 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가네꼬 히사시, 닛본덴기 가부시끼가이샤 filed Critical 가네꼬 히사시
Publication of KR970008550A publication Critical patent/KR970008550A/ko
Application granted granted Critical
Publication of KR100194312B1 publication Critical patent/KR100194312B1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/60Protection against electrostatic charges or discharges, e.g. Faraday shields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05599Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/061Disposition
    • H01L2224/0612Layout
    • H01L2224/0613Square or rectangular array
    • H01L2224/06134Square or rectangular array covering only portions of the surface to be connected
    • H01L2224/06136Covering only the central area of the surface to be connected, i.e. central arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

반도체 디바이스는 다수의 분리 영역으로 분할된 반도체 칩(10)을 갖고 있다. 이들 각각의 영역에서는 서로 독립한 다수의 공통 방전 라인(12a, 12b, 12c), 각각의 공통 방전 라인에 직접 접속되는 다수의 제1본딩 패드(14a, 14b, 14c), 공통방전 라인에 직접 접속되지 않는 다수의 제2본딩 패드(13a, 13d, 13e, 13h, 13b, 13f, 13c, 13g), 제2본딩 패드와 공통방전 라인 사이에 접속되는 다수의 보호 소자(15a-15h), 및 제1본딩 패드에 직접 접속되고 반도체 칩의 표면에 접착 고정되는 방전용 내부 리드(22)가 구비되어 있다. 본 발명의 모든 실시예에서, 1개 이상의 공통 방전 라인이 있다. 이 배열은 칩의 면적을 축소시키고 설계 자유도를 향상시키며 정전 파괴내성을 향상시킨다.

Description

정전 파괴 보호 회로를 구비한 반도체 디바이스
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제6도는 본 발명에 따른 디바이스의 제1실시예의 평면도.

Claims (4)

  1. 입력 신호에 응답하여 처리된 후 소정의 신호를 출력하기 위한 내부 회로를 구비한 반도체 칩을 갖는 반도체 디바이스에 있어서, 상기 반도체 칩을 분할하여 형성된 다수의 분리 영역, 상기 분리 영역 각각에 제공되는 서로 독립한 공통 방전 라인(12a, 12b, 12c), 상기 공통 방전 라인 각각에 직접 접속되는 제1본딩 패드(14a, 14b, 14c), 상기 공통 방전 라인에 직접 접속되는 것 이외의 제2본딩 패드(13a, 13d, 13e, 13h, 13b, 13f, 13c, 13g), 상기 제2본딩 패드와 공통 방전 라인 사이에 접속되는 보호 소자(15a-15h), 및 상기 제1본딩 패드에 직접 접속되고 상기 반도체 칩의 표면에 접착 고정되는 방전용 내부 리드(22)를 포함하고 있는 것을 특징으로 하는 반도체 디바이스.
  2. 제1항에 있어서, 상기 분리 영역은 상기 반도체 칩의 전체 주변 영역 및 상기 전체 주변 영역 내부의 소정영역으로 이루어지는 것을 특징으로 하는 반도체 디바이스.
  3. 제1항에 있어서, 상기 분리 영역은 상기 반도체 칩의 소정 주변 영역으로 이루어지는 것을 특징으로 하는반도체 디바이스.
  4. 제1항에 있어서, 상기 공통 방전 라인은 상기 제1본딩 패드와 상기 보호 소자 사이에 배치된 소정 부분을갖고, 상기 소정 부분은 상기 제1본딩 패드와 상기 보호 소자를 직접 상호 접속하는 것을 특징으로 하는 반도체 디바이스.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960028677A 1995-07-18 1996-07-16 정전 파괴 보호 회로를 구비한 반도체 디바이스 KR100194312B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7181348A JP2830783B2 (ja) 1995-07-18 1995-07-18 半導体装置
JP95-181348 1995-07-18

Publications (2)

Publication Number Publication Date
KR970008550A true KR970008550A (ko) 1997-02-24
KR100194312B1 KR100194312B1 (ko) 1999-06-15

Family

ID=16099145

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960028677A KR100194312B1 (ko) 1995-07-18 1996-07-16 정전 파괴 보호 회로를 구비한 반도체 디바이스

Country Status (3)

Country Link
US (1) US5751051A (ko)
JP (1) JP2830783B2 (ko)
KR (1) KR100194312B1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2826498B2 (ja) * 1996-01-17 1998-11-18 日本電気アイシーマイコンシステム株式会社 半導体装置
JP2940506B2 (ja) * 1997-01-31 1999-08-25 日本電気株式会社 半導体装置
US6118640A (en) * 1999-02-17 2000-09-12 Pericom Semiconductor Corp. Actively-driven thin-oxide MOS transistor shunt for ESD protection of multiple independent supply busses in a mixed-signal chip
GB2357633A (en) * 1999-12-21 2001-06-27 Nokia Mobile Phones Ltd Electrostatic discharge protection for integrated circuits
JP4629826B2 (ja) 2000-02-22 2011-02-09 パナソニック株式会社 半導体集積回路装置
US6385021B1 (en) 2000-04-10 2002-05-07 Motorola, Inc. Electrostatic discharge (ESD) protection circuit
JP2002076282A (ja) 2000-08-30 2002-03-15 Nec Corp 半導体集積回路装置及びその設計方法
US6724603B2 (en) * 2002-08-09 2004-04-20 Motorola, Inc. Electrostatic discharge protection circuitry and method of operation
US6756834B1 (en) * 2003-04-29 2004-06-29 Pericom Semiconductor Corp. Direct power-to-ground ESD protection with an electrostatic common-discharge line
US8035188B2 (en) * 2004-07-28 2011-10-11 Panasonic Corporation Semiconductor device
US7446990B2 (en) * 2005-02-11 2008-11-04 Freescale Semiconductor, Inc. I/O cell ESD system
US20070267748A1 (en) * 2006-05-16 2007-11-22 Tran Tu-Anh N Integrated circuit having pads and input/output (i/o) cells
US7808117B2 (en) * 2006-05-16 2010-10-05 Freescale Semiconductor, Inc. Integrated circuit having pads and input/output (I/O) cells
US7777998B2 (en) 2007-09-10 2010-08-17 Freescale Semiconductor, Inc. Electrostatic discharge circuit and method therefor
US8830107B1 (en) * 2013-04-16 2014-09-09 Udo Karthaus Frequency translating analog-to-digital converter

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182621A (en) * 1988-06-14 1993-01-26 Nec Corporation Input protection circuit for analog/digital converting semiconductor
US5272586A (en) * 1991-01-29 1993-12-21 National Semiconductor Corporation Technique for improving ESD immunity
JP3375659B2 (ja) * 1991-03-28 2003-02-10 テキサス インスツルメンツ インコーポレイテツド 静電放電保護回路の形成方法
US5220443A (en) * 1991-04-29 1993-06-15 Nec Corporation Matrix wiring substrate and active matrix display having non-linear resistance elements for electrostatic discharge protection
JPH05114685A (ja) * 1991-10-23 1993-05-07 Mitsubishi Electric Corp 半導体装置
JPH05299598A (ja) * 1992-04-20 1993-11-12 Hitachi Ltd 半導体装置
JP2677737B2 (ja) * 1992-06-24 1997-11-17 株式会社東芝 半導体装置
JP2830637B2 (ja) * 1992-08-18 1998-12-02 日本電気株式会社 Loc型半導体装置
JP2958202B2 (ja) * 1992-12-01 1999-10-06 シャープ株式会社 半導体装置
JP2972494B2 (ja) * 1993-06-30 1999-11-08 日本電気株式会社 半導体装置
US5521783A (en) * 1993-09-17 1996-05-28 Analog Devices, Inc. Electrostatic discharge protection circuit
US5561577A (en) * 1994-02-02 1996-10-01 Hewlett-Packard Company ESD protection for IC's

Also Published As

Publication number Publication date
KR100194312B1 (ko) 1999-06-15
JPH0936311A (ja) 1997-02-07
JP2830783B2 (ja) 1998-12-02
US5751051A (en) 1998-05-12

Similar Documents

Publication Publication Date Title
KR970008550A (ko) 정전 파괴 보호 회로를 구비한 반도체 디바이스
KR930018707A (ko) 반도체 장치
KR980006220A (ko) 정전기 보호회로를 구비한 반도체장치
KR900013622A (ko) 반도체 집적회로장치
EP0041844B1 (en) Semiconductor integrated circuit devices
KR960030397A (ko) 반도체집적회로의 보호회로
KR900017164A (ko) 반도체장치
KR910015039A (ko) 반도체웨이퍼
KR960032714A (ko) 2중 패드를 갖는 반도체 소자
KR960043151A (ko) Ac 결합 회로를 가지는 반도체 디바이스
WO2000048252A3 (en) Electrostatic discharge protection of integrated circuits
KR970077390A (ko) 패드를 이용한 반도체 장치
KR970060479A (ko) 반도체장치
KR900001020A (ko) 반도체 집적회로 장치
KR950010054A (ko) 여러가지 전기적 과도 현상으로부터 집적회로를 보호하기 위한 방법 및 시스템
KR970053834A (ko) 정전방전 보호소자를 구비한 반도체 소자
TW267252B (en) Omnidirectional ESD protecting circuit without latchup effect on CMOS chip
JPH0455333B2 (ko)
KR940012596A (ko) 다수개의 전원을 사용하는 반도체장치의 입력보호장치
KR960043126A (ko) 반도체 소자의 입력부
KR930007920Y1 (ko) 양면 박막회로판을 갖는 이중 패키지 구조
KR920007156A (ko) 수지밀봉반도체장치
KR930017159A (ko) 반도체 리드프레임
KR970052396A (ko) 반도체 칩의 접지 패드 금속라인 구조
JPH01128457A (ja) 半導体装置

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20100204

Year of fee payment: 12

LAPS Lapse due to unpaid annual fee