KR960005910A - 반도체 집적 회로 칩상의 범프용 실링구조 - Google Patents
반도체 집적 회로 칩상의 범프용 실링구조 Download PDFInfo
- Publication number
- KR960005910A KR960005910A KR1019950021795A KR19950021795A KR960005910A KR 960005910 A KR960005910 A KR 960005910A KR 1019950021795 A KR1019950021795 A KR 1019950021795A KR 19950021795 A KR19950021795 A KR 19950021795A KR 960005910 A KR960005910 A KR 960005910A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor integrated
- integrated circuit
- chip
- circuit chip
- bumps
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/05124—Aluminium [Al] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05163—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/05171—Chromium [Cr] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05638—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05647—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/1301—Shape
- H01L2224/13016—Shape in side view
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
- H01L2224/29111—Tin [Sn] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/2929—Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29355—Nickel [Ni] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/731—Location prior to the connecting process
- H01L2224/73101—Location prior to the connecting process on the same surface
- H01L2224/73103—Bump and layer connectors
- H01L2224/73104—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/819—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector with the bump connector not providing any mechanical bonding
- H01L2224/81901—Pressing the bump connector against the bonding areas by means of another connector
- H01L2224/81903—Pressing the bump connector against the bonding areas by means of another connector by means of a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83191—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83851—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00013—Fully indexed content
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01024—Chromium [Cr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0105—Tin [Sn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/0665—Epoxy resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/0781—Adhesive characteristics other than chemical being an ohmic electrical conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/1579—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Wire Bonding (AREA)
Abstract
범프를 통해 회로판상에 접합되고 반도체 집적 회로 칩위에 복수개의 패드가 형성된 반도체 집적 회로 칩상의 범프용 실링구조가 제공된다. 각 패드위에는 범프가 형성된다. 상기 복수개의 범프의 표면 이상을 덮도록 코팅 물질이 제공된다. 이 물질이, 회로판상에 칩이 접합될 때, 변형되도록 충분히 작은 경도를 가지는 절연 물질로 제조됨으로써 각 범프의 상부 이상이 회로판에 제공된 패드와 접촉하게 된다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 범프를 통하여 회로판상에 접합되는 반도체 집적 회로 칩상의 범프용 실링구조를 나타내는 단면도.
제3a도 및 제3b도는 본 발명에 따라서, 제1실시예부터 제4실시예에서 반도체 집적회로칩상에 범프를 형성하는 일련의 공정을 나타내는 단면도.
제4도는 본 발명에 따라서, 제1실시예에서 범프를 통하여 회로판상에 접합되는 반도체 집적 회로 칩상의 범프용 신규의 실링구조를 나타내는 단면도.
제5도는 본 발명에 따라서, 제1실시예에서 범프를 통하여 회로판상에 칩을 접합할 경우, 범프용의 개선된 실링구조를 갖는 반도체 집적 회로칩을 나타내는 단면도.
Claims (30)
- 범프를 통해 회로판상에 접합되는반도체 집적 회로 칩에 있어서, 상기 반도체 집적 회로 칩상에 형성되며 각각의 패드위에 범프가 형성되는 복수개의 패드와, 상기 복수개의 표면 이상을 덮도록 제공되고, 상기 회로판상에 상기 칩을 접합시킬 때, 변형됨으로써 상기 각 범프의 상부이상이 상기 회로판에 제공된 패드와 접촉되도록 충분히 작은 경도를 가지는 절연막으로 제조된 코팅물질을 구비하는 반도체 집적 회로 칩.
- 제1항에 있어서, 상기 코팅물질이 1000cP~2000cP 의 점성률을 가지는 젤라틴 물질을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제2항에 있어서, 상기 젤라틴 물질이, 상기 칩의 전체 표면 위에 형성되고 그 안에 복수개의 범프가 묻히는 막을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제3항에 있어서, 상기 젤라틴 물질이 실리콘을 포함하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제1항에 있어서, 상기 코팅물질이 마이크로 캡슐 물질을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제5항에 있어서, 상기 마이크로 캡슐 물질이, 상기 칩의 전체 표면위에 형성되고 그 안에 복수개의 범프가 묻히는 막을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제1항에 있어서, 상기 코팅물질이 1000cP~2000cP의 점성률을 가지는 크림 물질을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제7항에 있어서, 상기 크림 물질이 상기 칩의 전체 표면위에 형성되고 그 안에 복수개의 범프가 묻히는 막을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제8항에 있어서, 상기 크림 물질이 알콜계의 솔벤트에 용해된 에폭시 수지를 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제1항에 있어서, 상기 열가소성 수지가 경화될 때 외에는 상기 코팅물질이 1000cP~2000cP의 점성률을 나타내는 열가소성 수지를 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제10항에 있어서, 상기 열가소성 수지가, 상기 칩의 전체 표면위에 형성되고 그안에 복수개의 범프가 묻히는 막의 형태로 존재하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제10항에 있어서, 상기 열가소성 수지가 페놀계 수지인 것을 특징으로 하는 반도체 집적 회로 칩.
- 범프를 통해 회로판상에 접합되는 반도체 집적 회로 칩에 있어서, 상기 반도체 집적 회로 칩상에 형성되는 복수개의 패드와, 상기 범프가 비등방성 전도막을 통해 상기 회로판의 패드와 접촉하도록 상기 복수개의 범프상에 제공되고, 비등방성 전도막의 표면을 따라 흐르는 전류를 방지하고 비등방성 전도막의 표면에 대하여수직방향으로 전류를 흐르게 함으로써, 상기 각 범프가 이방성 전도막을 통하여 상기 회로판 상의 대응 패드에 전기적으로 전도되며, 상기 패드들 사이 및 상기 회로판 상의 패드 사이에 도전성이 없도록 하는 비등방성 전도막을 구비하는 반도체 집적 회로 칩.
- 제13항에 있어서, 상기 비등방성 전도막이 그 안에 2차원 배열의 도전입자를 포함하는 절연시트를 구비하고, 상기 절연시트가 상기 회로판상의 칩에 접합될 때 상기 절연시트가 변형되도록 충분히 작은 경도를 가짐으로써 상기 도전성 입자가 상기 칩상과 상기 회로판상에 형성된 상기 양 패드와 접촉되는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제13항에 있어서, 상기 비등방성 전도막이, 상기 회로판 상에 상기 칩이 접합될때, 2창원배열의 컬럼형전도물질이 상기 칩상과 상기 회로판상에 형성된 상기 양 패드와 접촉되도록 절연시트의 대향 표면에 노출된2차원 배열의 칼럼형 전도물질을 포함하는 절연시트를 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 범프를 통해 회로판상에 접합되는 반도체 집적 회로 칩에 있어서, 상기 반도체 집적 회로 칩상에 형성된 복수개의 패드와, 유기절연물질로 제조되어 상기 칩의 전체 표면상에 형성되고, 각 개구를 통하여 상기 각 패드의 일부분 이상이 노출되도록 상기 각 패드 위에 위치한 복수개의 개구를 가지는 유기절연막과, 상기 각 패드 표면의 노출부분상, 상기 각 개구의 측벽상 및 상기 각 개구근방의 상기 유기절연막의 상부 표면상에 각각 선택적으로 형성된 복수개의 금속막과, 상기 금속막위에 상기 금속막을 통해 상기 패드와 전기적으로 접속되도록 형성된 복수개의 범프와, 상기 복수개의 표면 이상을 덮도록 제공되고, 상기 회로판상에 상기 칩을 접합시킬 때, 변형됨으로써, 상기 각 범프의 상부이상이 상기 회로판에 제공된 패드와 접촉되도록 충분히 작은 경도를 가지는 절연막으로 제조된 코팅물질을 구비하는 반도체 집적 회로 칩.
- 제16항에 있어서, 상기 코팅물질이 1000cP~2000cP 의 점성률을 가지는 젤라틴 물질을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제17항에 있어서, 상기 젤라틴 물질이 상기 칩의 전체 표면위에 형성되고 그 안에 복수개의 범프가 묻히는 막을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제18항에 있어서, 상기 젤라틴 물질이 실리콘을 포함하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제16항에 있어서, 상기 코팅물질이 마이크로 캡슐 물질을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제20항에 있어서, 상기 마이크로 캡슐 물질이 상기 칩의 전체 표면위에 형성되고 그 안에 복수개의 범프가 묻히는 막을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제16항에 있어서, 상기 코팅물질이 1000cP~2000cP 의 점성률을 가지는 크림 물질을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제22항에 있어서, 상기 크림 물질이 상기 칩의 전체 표면위에 형성되고 그 안에 복수개의 범프가 묻히는 막을 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제22항에 있어서, 상기 크림 물질이 알콜계의 솔벤트에 용해된 에폭시 수지를 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제16항에 있어서, 상기 열가소성 수지가 경화될 때 외에는 상기 코팅물질이 1000cP~2000cP 의 점성률을 나타내는 열가소성 수지를 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제25항에 있어서, 상기 열가소성 수지가 상기 칩의 전체 표면위에 형성되고 그안에 복수개의 범프가 묻히는 막의 형태로 존재하는 것을 특징으로 하는 반도체 집적 회로 칩.
- 제25항에 있어서, 상기 열가소성 수지가 페놀계 수지인 것을 특징으로 하는 반도체 집적 회로 칩.
- 범프를 통해 회로판상에 접합되는 반도체 집적 회로 칩에 있어서, 상기 반도체 집적 회로 칩상에 형성된 복수개의 패드와, 유기절연물질로 제조되어 상기 칩의 전체 표면 상에 형성되고,각 개구를 통하여 상기 각 패드의 일부분 이상이 노출되도록 상기 각 패드위에 위치한 복수개의 개구를 가지는 유기절연막과, 상기 각 패드의 노출부분상, 상기 각 개구의 측벽상 및 상기 각 개구근방의 상기 유기절연막의 상부 표면상에 각각 선택적으로 형성된 복수개의 금속막과, 상기 금속막 위에, 각각이 편평한 상부를 가지고 상기 금속막을 통해 상기 패드와 전기적으로 접속되도록 형성된 복수개의 범프와, 상기 범프의 상기 편평한 상부상을 제외하고 상기 유기절연막상에 형성되며, 절연막의 상부가 상기 범프의 편평한 상부와 동일한 높이를 가지도록 두께가 조절된 절연막과, 상기 범프가 비등방성 전도막을 통해 상기 회로판의 패드와 접촉하도록 상기 복수개의 범프상에 제공되고, 비등방성 전도막의 표면을 따라 흐르는 전류를 방지하고 비등방성 전도막의 표면에 대하여수직방향으로 전류를 흐르게 함으로써 상기 각 범프가 이방성 전도막을 통하여 상기 회로판상의 대응 패드에 전기적으로 전도되며, 상기 패드들 사이 및 상기 회로판 상의 패드사이에 도전성이 없도록 하는 비등방성 전도막을 구비하는 반도체 집적 회로 칩.
- 제28항에 있어서, 상기 비등방성 전도막은 그 내부에 2차원 배열의 도전성 입자를 포함하며, 상기 전도성 입자가 상기 칩과 상기 회로 기판상에 형성된 상기 양 패드에 접촉되어 상기 회로 기판상에 상기 칩이 접합될때 변형가능하도록 충분희 작은 경도를 갖는 절연시트르르 구비하는 반도체 집적 회로 칩.
- 제28항에 있어서, 상기 비등방성 전도막이, 상기 회로판 상에 칩이 접합될때, 2차원 배열의 칼럼형 전도물질이 상기 칩상과 상기 회로판상에 형성된 상기 향패드와 접촉되도록 절연시트의 대향 표면에 노출된 2차원 배열의 컬럼형 전도물질을 포함하는 절연시트를 구비하는 것을 특징으로 하는 반도체 집적 회로 칩.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6170612A JPH0837190A (ja) | 1994-07-22 | 1994-07-22 | 半導体装置 |
JP94-170612 | 1994-07-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960005910A true KR960005910A (ko) | 1996-02-23 |
KR0163782B1 KR0163782B1 (ko) | 1999-02-01 |
Family
ID=15908094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950021795A KR0163782B1 (ko) | 1994-07-22 | 1995-07-22 | 반도체 집적 회로 칩상의 범프용 실링구조 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5600180A (ko) |
JP (1) | JPH0837190A (ko) |
KR (1) | KR0163782B1 (ko) |
Families Citing this family (69)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19512725C1 (de) * | 1995-04-05 | 1996-09-12 | Orga Kartensysteme Gmbh | Ausweiskarte o.dgl. in Form einer Chipkarte |
KR100273499B1 (ko) * | 1995-05-22 | 2001-01-15 | 우찌가사끼 이사오 | 배선기판에전기접속된반도체칩을갖는반도체장치 |
JPH0997791A (ja) * | 1995-09-27 | 1997-04-08 | Internatl Business Mach Corp <Ibm> | バンプ構造、バンプの形成方法、実装接続体 |
JP3310499B2 (ja) * | 1995-08-01 | 2002-08-05 | 富士通株式会社 | 半導体装置 |
US5736790A (en) * | 1995-09-21 | 1998-04-07 | Kabushiki Kaisha Toshiba | Semiconductor chip, package and semiconductor device |
KR100438256B1 (ko) * | 1995-12-18 | 2004-08-25 | 마츠시타 덴끼 산교 가부시키가이샤 | 반도체장치 및 그 제조방법 |
US5869869A (en) * | 1996-01-31 | 1999-02-09 | Lsi Logic Corporation | Microelectronic device with thin film electrostatic discharge protection structure |
JP3376203B2 (ja) * | 1996-02-28 | 2003-02-10 | 株式会社東芝 | 半導体装置とその製造方法及びこの半導体装置を用いた実装構造体とその製造方法 |
JP3080579B2 (ja) * | 1996-03-06 | 2000-08-28 | 富士機工電子株式会社 | エアリア・グリッド・アレイ・パッケージの製造方法 |
US5891795A (en) * | 1996-03-18 | 1999-04-06 | Motorola, Inc. | High density interconnect substrate |
US5912510A (en) * | 1996-05-29 | 1999-06-15 | Motorola, Inc. | Bonding structure for an electronic device |
KR100186333B1 (ko) * | 1996-06-20 | 1999-03-20 | 문정환 | 칩 사이즈 반도체 패키지 및 그 제조방법 |
JP2825083B2 (ja) * | 1996-08-20 | 1998-11-18 | 日本電気株式会社 | 半導体素子の実装構造 |
KR100239695B1 (ko) | 1996-09-11 | 2000-01-15 | 김영환 | 칩 사이즈 반도체 패키지 및 그 제조 방법 |
US5956605A (en) * | 1996-09-20 | 1999-09-21 | Micron Technology, Inc. | Use of nitrides for flip-chip encapsulation |
JP3960560B2 (ja) * | 1996-09-27 | 2007-08-15 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 回路素子と伝送線路とを有する装置 |
KR100278561B1 (ko) * | 1996-10-15 | 2001-02-01 | 포만 제프리 엘 | 테이퍼를구비하며에칭성이감소된다층의금속샌드위치구조및그형성방법 |
TW448524B (en) | 1997-01-17 | 2001-08-01 | Seiko Epson Corp | Electronic component, semiconductor device, manufacturing method therefor, circuit board and electronic equipment |
US6002172A (en) * | 1997-03-12 | 1999-12-14 | International Business Machines Corporation | Substrate structure and method for improving attachment reliability of semiconductor chips and modules |
JPH10303252A (ja) * | 1997-04-28 | 1998-11-13 | Nec Kansai Ltd | 半導体装置 |
JPH10335567A (ja) * | 1997-05-30 | 1998-12-18 | Mitsubishi Electric Corp | 半導体集積回路装置 |
US6245594B1 (en) * | 1997-08-05 | 2001-06-12 | Micron Technology, Inc. | Methods for forming conductive micro-bumps and recessed contacts for flip-chip technology and method of flip-chip assembly |
JP3846094B2 (ja) * | 1998-03-17 | 2006-11-15 | 株式会社デンソー | 半導体装置の製造方法 |
US6642136B1 (en) * | 2001-09-17 | 2003-11-04 | Megic Corporation | Method of making a low fabrication cost, high performance, high reliability chip scale package |
US8021976B2 (en) * | 2002-10-15 | 2011-09-20 | Megica Corporation | Method of wire bonding over active area of a semiconductor circuit |
US6168972B1 (en) | 1998-12-22 | 2001-01-02 | Fujitsu Limited | Flip chip pre-assembly underfill process |
JP2000311921A (ja) * | 1999-04-27 | 2000-11-07 | Sony Corp | 半導体装置およびその製造方法 |
US6861345B2 (en) * | 1999-08-27 | 2005-03-01 | Micron Technology, Inc. | Method of disposing conductive bumps onto a semiconductor device |
US6429531B1 (en) * | 2000-04-18 | 2002-08-06 | Motorola, Inc. | Method and apparatus for manufacturing an interconnect structure |
JP3700563B2 (ja) * | 2000-09-04 | 2005-09-28 | セイコーエプソン株式会社 | バンプの形成方法及び半導体装置の製造方法 |
JP2002118199A (ja) * | 2000-10-10 | 2002-04-19 | Mitsubishi Electric Corp | 半導体装置 |
DE10059765A1 (de) * | 2000-11-30 | 2002-06-06 | Koninkl Philips Electronics Nv | Baugruppe mit Verbindungsstruktur |
US6543674B2 (en) | 2001-02-06 | 2003-04-08 | Fujitsu Limited | Multilayer interconnection and method |
US6815324B2 (en) * | 2001-02-15 | 2004-11-09 | Megic Corporation | Reliable metal bumps on top of I/O pads after removal of test probe marks |
TWI313507B (en) * | 2002-10-25 | 2009-08-11 | Megica Corporatio | Method for assembling chips |
US6818545B2 (en) * | 2001-03-05 | 2004-11-16 | Megic Corporation | Low fabrication cost, fine pitch and high reliability solder bump |
US8158508B2 (en) * | 2001-03-05 | 2012-04-17 | Megica Corporation | Structure and manufacturing method of a chip scale package |
US7099293B2 (en) | 2002-05-01 | 2006-08-29 | Stmicroelectronics, Inc. | Buffer-less de-skewing for symbol combination in a CDMA demodulator |
TWI245402B (en) | 2002-01-07 | 2005-12-11 | Megic Corp | Rod soldering structure and manufacturing process thereof |
US6787443B1 (en) * | 2003-05-20 | 2004-09-07 | Intel Corporation | PCB design and method for providing vented blind vias |
US7394161B2 (en) * | 2003-12-08 | 2008-07-01 | Megica Corporation | Chip structure with pads having bumps or wirebonded wires formed thereover or used to be tested thereto |
US8067837B2 (en) * | 2004-09-20 | 2011-11-29 | Megica Corporation | Metallization structure over passivation layer for IC chip |
US8294279B2 (en) * | 2005-01-25 | 2012-10-23 | Megica Corporation | Chip package with dam bar restricting flow of underfill |
KR100771467B1 (ko) * | 2006-10-30 | 2007-10-30 | 삼성전기주식회사 | 회로기판 및 그 제조방법 |
US20090091027A1 (en) * | 2007-10-05 | 2009-04-09 | Powertech Technology Inc. | Semiconductor package having restraining ring surfaces against soldering crack |
US9675443B2 (en) | 2009-09-10 | 2017-06-13 | Johnson & Johnson Vision Care, Inc. | Energized ophthalmic lens including stacked integrated components |
KR20100079183A (ko) * | 2008-12-30 | 2010-07-08 | 주식회사 동부하이텍 | 반도체 패키지 장치와 그 제조 방법 |
US20110169158A1 (en) * | 2010-01-14 | 2011-07-14 | Qualcomm Incorporated | Solder Pillars in Flip Chip Assembly |
US8692390B2 (en) * | 2011-02-18 | 2014-04-08 | Chipbond Technology Corporation | Pyramid bump structure |
US8950862B2 (en) | 2011-02-28 | 2015-02-10 | Johnson & Johnson Vision Care, Inc. | Methods and apparatus for an ophthalmic lens with functional insert layers |
US10451897B2 (en) | 2011-03-18 | 2019-10-22 | Johnson & Johnson Vision Care, Inc. | Components with multiple energization elements for biomedical devices |
US9698129B2 (en) | 2011-03-18 | 2017-07-04 | Johnson & Johnson Vision Care, Inc. | Stacked integrated component devices with energization |
US9914273B2 (en) | 2011-03-18 | 2018-03-13 | Johnson & Johnson Vision Care, Inc. | Method for using a stacked integrated component media insert in an ophthalmic device |
US9804418B2 (en) | 2011-03-21 | 2017-10-31 | Johnson & Johnson Vision Care, Inc. | Methods and apparatus for functional insert with power layer |
US8857983B2 (en) | 2012-01-26 | 2014-10-14 | Johnson & Johnson Vision Care, Inc. | Ophthalmic lens assembly having an integrated antenna structure |
JP6312605B2 (ja) * | 2012-01-26 | 2018-04-18 | ジョンソン・アンド・ジョンソン・ビジョン・ケア・インコーポレイテッドJohnson & Johnson Vision Care, Inc. | 眼科用装置向け積層型統合コンポーネント媒体挿入物 |
US9941547B2 (en) | 2014-08-21 | 2018-04-10 | Johnson & Johnson Vision Care, Inc. | Biomedical energization elements with polymer electrolytes and cavity structures |
US10381687B2 (en) | 2014-08-21 | 2019-08-13 | Johnson & Johnson Vision Care, Inc. | Methods of forming biocompatible rechargable energization elements for biomedical devices |
US10627651B2 (en) | 2014-08-21 | 2020-04-21 | Johnson & Johnson Vision Care, Inc. | Methods and apparatus to form biocompatible energization primary elements for biomedical devices with electroless sealing layers |
US10361404B2 (en) | 2014-08-21 | 2019-07-23 | Johnson & Johnson Vision Care, Inc. | Anodes for use in biocompatible energization elements |
US9715130B2 (en) | 2014-08-21 | 2017-07-25 | Johnson & Johnson Vision Care, Inc. | Methods and apparatus to form separators for biocompatible energization elements for biomedical devices |
US10361405B2 (en) | 2014-08-21 | 2019-07-23 | Johnson & Johnson Vision Care, Inc. | Biomedical energization elements with polymer electrolytes |
US9793536B2 (en) | 2014-08-21 | 2017-10-17 | Johnson & Johnson Vision Care, Inc. | Pellet form cathode for use in a biocompatible battery |
US9383593B2 (en) | 2014-08-21 | 2016-07-05 | Johnson & Johnson Vision Care, Inc. | Methods to form biocompatible energization elements for biomedical devices comprising laminates and placed separators |
US9599842B2 (en) | 2014-08-21 | 2017-03-21 | Johnson & Johnson Vision Care, Inc. | Device and methods for sealing and encapsulation for biocompatible energization elements |
US10345620B2 (en) | 2016-02-18 | 2019-07-09 | Johnson & Johnson Vision Care, Inc. | Methods and apparatus to form biocompatible energization elements incorporating fuel cells for biomedical devices |
US10497657B1 (en) * | 2018-06-13 | 2019-12-03 | Advanced Semiconductor Engineering, Inc. | Semiconductor package device and method of manufacturing the same |
KR20220009218A (ko) | 2020-07-15 | 2022-01-24 | 삼성전자주식회사 | 반도체 패키지, 및 이를 가지는 패키지 온 패키지 |
US11955396B2 (en) * | 2020-11-27 | 2024-04-09 | Yibu Semiconductor Co., Ltd. | Semiconductor packaging method, semiconductor assembly and electronic device comprising semiconductor assembly |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61160946A (ja) * | 1984-12-31 | 1986-07-21 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 半導体装置の接続構造体 |
US5283468A (en) * | 1988-05-30 | 1994-02-01 | Canon Kabushiki Kaisha | Electric circuit apparatus |
JPH01302823A (ja) * | 1988-05-31 | 1989-12-06 | Fujitsu Ltd | 半導体基板の平坦化方法 |
JPH02142134A (ja) * | 1988-11-22 | 1990-05-31 | Hitachi Ltd | 半導体装置の製造方法およびそれにより得られた半導体装置 |
JP2698462B2 (ja) * | 1990-01-12 | 1998-01-19 | 松下電器産業株式会社 | 半導体装置の製造方法 |
JP3150351B2 (ja) * | 1991-02-15 | 2001-03-26 | 株式会社東芝 | 電子装置及びその製造方法 |
JPH06140405A (ja) * | 1991-06-30 | 1994-05-20 | Mitsumi Electric Co Ltd | フリップチップバンプの構造 |
WO1994024704A1 (en) * | 1993-04-12 | 1994-10-27 | Bolger Justin C | Area bonding conductive adhesive preforms |
-
1994
- 1994-07-22 JP JP6170612A patent/JPH0837190A/ja active Pending
-
1995
- 1995-07-21 US US08/505,152 patent/US5600180A/en not_active Expired - Fee Related
- 1995-07-22 KR KR1019950021795A patent/KR0163782B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH0837190A (ja) | 1996-02-06 |
KR0163782B1 (ko) | 1999-02-01 |
US5600180A (en) | 1997-02-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR960005910A (ko) | 반도체 집적 회로 칩상의 범프용 실링구조 | |
KR960016239B1 (ko) | 반도체장치 | |
US5175612A (en) | Heat sink for semiconductor device assembly | |
US7446407B2 (en) | Chip package structure | |
US9984900B2 (en) | Semiconductor device including at least one element | |
US5757080A (en) | Resin-sealed semiconductor device | |
KR970053679A (ko) | 리드노출형 반도체 패키지 | |
KR880001180A (ko) | 인쇄회로장치 | |
KR970030728A (ko) | 수지패키지를 갖는 장치 및 그 제조방법 | |
MY127063A (en) | Method of manufacturing a semiconductor device | |
KR940022755A (ko) | 반도체 장치 및 그 제조방법과 반도체장치용 리드프레임(Lead frame) | |
KR950021434A (ko) | 반도체 장치와 그 제조방법 | |
KR920704343A (ko) | 전도성 중합체 및 전극을 이용한 플립칩 | |
KR930024140A (ko) | 반도체장치 및 그 제조방법 | |
KR960039305A (ko) | 반도체 장치 및 그 제조 방법 | |
KR960019629A (ko) | 반도체 장치 | |
US6190943B1 (en) | Chip scale packaging method | |
KR920001697A (ko) | 수직형 반도체 상호 접촉 방법 및 그 구조 | |
KR890001172A (ko) | 반도체 장치 | |
KR970025350A (ko) | 반도체 장치 | |
US20080164619A1 (en) | Semiconductor chip package and method of manufacturing the same | |
US20050161802A1 (en) | Semiconductor device | |
KR19990056739A (ko) | 반도체 칩의 실장방법 | |
JP2013134928A (ja) | 電子機器、コネクタ、及びコネクタの製造方法 | |
KR980003724A (ko) | 액정 표시장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20040823 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |