KR950009897A - 포토 마스크의 방진 보호를 위해 프레임에 지지되는 펠리클 - Google Patents

포토 마스크의 방진 보호를 위해 프레임에 지지되는 펠리클 Download PDF

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Publication number
KR950009897A
KR950009897A KR1019940022140A KR19940022140A KR950009897A KR 950009897 A KR950009897 A KR 950009897A KR 1019940022140 A KR1019940022140 A KR 1019940022140A KR 19940022140 A KR19940022140 A KR 19940022140A KR 950009897 A KR950009897 A KR 950009897A
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KR
South Korea
Prior art keywords
frame
pellicle
photo mask
dustproof protection
supported
Prior art date
Application number
KR1019940022140A
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English (en)
Inventor
사께 가와구찌
유이찌 하마다
도루 시라사끼
요시히꼬 나가따
메구루 가시다
요시히로 구보따
Original Assignee
가나가와 지히로
신에쓰가가꾸고오교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가나가와 지히로, 신에쓰가가꾸고오교 가부시끼가이샤 filed Critical 가나가와 지히로
Publication of KR950009897A publication Critical patent/KR950009897A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12556—Organic component
    • Y10T428/12569—Synthetic resin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12736—Al-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12736—Al-base component
    • Y10T428/12743—Next to refractory [Group IVB, VB, or VIB] metal-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12736—Al-base component
    • Y10T428/1275—Next to Group VIII or IB metal-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12736—Al-base component
    • Y10T428/12764—Next to Al-base component

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

미세 전자부품과 장치의 제조를 위한 사진식각 패터닝 공정에 사용되는것으로 단단한 프레임과, 느슨하지 않은 모양으로 프레임의 끝 표면에 고착적으로 결합되는 투명한 플라스틱 멤브레인으로 구성되는 포토 마스크의 방진 보호를 위한 프레임에 지지된 펠리클에대한 개선이 제안 되었다. 이 개선은 금속 평탄층 프레임 표면의 극히 매끈함에 의하여 홀더 케이스의 내부 표면과의 접촉에 의해 먼지 입자가 발생하는 결과로 수송과 취급하는 동안 펠리클멤브레인 상에 부착된 먼지입자에 의한 피할 수 없는 지금까지의 문제를 완전히 해결하기 위해 니켈 혹은 크롬의 금속 도금층을 갖는 알루미늄 합금으로 만들어진 펠리클 프레임 표면에 의해 제공된다.

Description

포토 마스크의 방진 보호를 위해 프레임에 지지되는 펠리클
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (2)

  1. 포토 마스크의 방진 보호를 위한 프레임에 지지된 펠리클에 있어서, 주로 알루미늄으로 구성되는 합금으로 만들어지고 전 표면에 니켈 혹은 크롬의 금속 평탄층이 제공되어 만들어지는 프레임과, 슬랙 없는 형태로 프레임의 일측 끝 표면으로 펼쳐지고 점착적으로 결합되는 플라스틱 수지의 투명막을 포함하는 포토 마스크의 방진보호를 위해 프레임에 지지되는 펠리클.
  2. 제1항에 있어서, 상기 평탄층은 1내지 50㎛범위의 두께를 갖는 것을 특징으로 하는 포토 마스크의 방진 보호를 위해 프레임에 지지되는 펠리클.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940022140A 1993-09-02 1994-09-02 포토 마스크의 방진 보호를 위해 프레임에 지지되는 펠리클 KR950009897A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24205393A JPH0772617A (ja) 1993-09-02 1993-09-02 ペリクル
JP93-242053 1993-09-02

Publications (1)

Publication Number Publication Date
KR950009897A true KR950009897A (ko) 1995-04-26

Family

ID=17083580

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940022140A KR950009897A (ko) 1993-09-02 1994-09-02 포토 마스크의 방진 보호를 위해 프레임에 지지되는 펠리클

Country Status (3)

Country Link
US (1) US5419972A (ko)
JP (1) JPH0772617A (ko)
KR (1) KR950009897A (ko)

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JP3493090B2 (ja) * 1995-12-15 2004-02-03 信越化学工業株式会社 ペリクル
US6632619B1 (en) * 1997-05-16 2003-10-14 The Governors Of The University Of Alberta Microfluidic system and methods of use
JP3388162B2 (ja) * 1997-12-03 2003-03-17 信越化学工業株式会社 リソグラフィー用ペリクルの製造方法
TW497165B (en) 1999-06-30 2002-08-01 Hitachi Ltd Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor
US6338560B1 (en) 1999-10-28 2002-01-15 Tufts University Self-cleaning rotating mirrors
EP1160624B1 (en) 2000-06-01 2006-04-26 Asahi Glass Company Ltd. Pellicle and method of using the same
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
TWI270504B (en) * 2004-12-15 2007-01-11 Gudeng Prec Ind Co Ltd Photo-mask protection film frame
KR100612737B1 (ko) * 2005-08-24 2006-08-21 (주)파워셀 포토리소그래피용 펠리클프레임 제조방법
JP5645067B2 (ja) * 2010-09-30 2014-12-24 日立オートモティブシステムズ株式会社 ディスクブレーキおよび摺動部材
JP6027319B2 (ja) * 2012-03-02 2016-11-16 旭化成株式会社 塗装材及びペリクル
JP6008784B2 (ja) * 2013-04-15 2016-10-19 信越化学工業株式会社 ペリクルフレーム及びその製作方法とペリクル
JP5950467B2 (ja) * 2013-09-24 2016-07-13 信越化学工業株式会社 ペリクル
JP6344923B2 (ja) * 2014-01-29 2018-06-20 株式会社Uacj 高強度アルミニウム合金及びその製造方法
JP7061494B2 (ja) * 2018-03-28 2022-04-28 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置
TW202328808A (zh) * 2021-11-01 2023-07-16 日商信越化學工業股份有限公司 防塵薄膜組件框架、防塵薄膜組件、帶有防塵薄膜組件的曝光原版及防塵薄膜組件的製造方法

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JPS60220933A (ja) * 1984-04-18 1985-11-05 Nec Corp Ｘ線露光マスク及びその製造方法
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JP2915744B2 (ja) * 1993-04-13 1999-07-05 信越化学工業株式会社 ペリクル

Also Published As

Publication number Publication date
US5419972A (en) 1995-05-30
JPH0772617A (ja) 1995-03-17

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