KR850005148A - 절단막으로부터 반도체 웨이퍼의 제거방법 - Google Patents

절단막으로부터 반도체 웨이퍼의 제거방법 Download PDF

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Publication number
KR850005148A
KR850005148A KR1019840006939A KR840006939A KR850005148A KR 850005148 A KR850005148 A KR 850005148A KR 1019840006939 A KR1019840006939 A KR 1019840006939A KR 840006939 A KR840006939 A KR 840006939A KR 850005148 A KR850005148 A KR 850005148A
Authority
KR
South Korea
Prior art keywords
semiconductor wafer
microns
support film
thickness
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1019840006939A
Other languages
English (en)
Korean (ko)
Inventor
앤토니 오리키오 죠세프
Original Assignee
로버트 씨. 술리반
스타우퍼 케미칼 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 로버트 씨. 술리반, 스타우퍼 케미칼 캄파니 filed Critical 로버트 씨. 술리반
Publication of KR850005148A publication Critical patent/KR850005148A/ko
Abandoned legal-status Critical Current

Links

Classifications

    • H10P72/0442—
    • H10P14/46—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • H10P50/00—
    • H10P72/50—
    • H10P72/7402—
    • H10P72/7404—
    • H10W46/00—
    • H10P72/7416—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
    • Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062—Prior to assembly
    • Y10T156/1075—Prior to assembly of plural laminae from single stock and assembling to each other or to additional lamina
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Dicing (AREA)
  • Die Bonding (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
KR1019840006939A 1983-12-19 1984-11-06 절단막으로부터 반도체 웨이퍼의 제거방법 Abandoned KR850005148A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/562,899 US4664739A (en) 1983-12-19 1983-12-19 Removal of semiconductor wafers from dicing film
US562899 1983-12-19

Publications (1)

Publication Number Publication Date
KR850005148A true KR850005148A (ko) 1985-08-21

Family

ID=24248262

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840006939A Abandoned KR850005148A (ko) 1983-12-19 1984-11-06 절단막으로부터 반도체 웨이퍼의 제거방법

Country Status (5)

Country Link
US (1) US4664739A (cg-RX-API-DMAC10.html)
EP (1) EP0146197A3 (cg-RX-API-DMAC10.html)
JP (1) JPS60136331A (cg-RX-API-DMAC10.html)
KR (1) KR850005148A (cg-RX-API-DMAC10.html)
PH (1) PH21462A (cg-RX-API-DMAC10.html)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PH25206A (en) * 1985-12-12 1991-03-27 Lintec K K Control apparatus for reducing adhesive force of adhesive agent adhering between semiconductor wafer and substrate
US4793883A (en) * 1986-07-14 1988-12-27 National Starch And Chemical Corporation Method of bonding a semiconductor chip to a substrate
US5030308A (en) * 1986-07-14 1991-07-09 National Starch And Chemical Investment Holding Corporation Method of bonding a semiconductor chip to a substrate
US4826553A (en) * 1987-06-18 1989-05-02 The United States Of America As Represented By The Secretary Of The Air Force Method for replicating an optical element
US4921564A (en) * 1988-05-23 1990-05-01 Semiconductor Equipment Corp. Method and apparatus for removing circuit chips from wafer handling tape
US5154793A (en) * 1988-09-27 1992-10-13 General Electric Company Method and apparatus for removing components bonded to a substrate
JPH0369135A (ja) * 1989-08-08 1991-03-25 Nec Kyushu Ltd 半導体装置製造用粘着シート
US5123986A (en) * 1989-08-10 1992-06-23 Casio Computer Co., Ltd. Conductive connecting method
JPH03135048A (ja) * 1989-10-20 1991-06-10 Fujitsu Ltd 半導体装置の製造方法
WO1992007455A1 (de) * 1990-10-15 1992-04-30 Miroslav Tresky Vorrichtung zum entfernen defekter bauteile aus schaltungen
US5106450A (en) * 1990-12-20 1992-04-21 International Business Machines Corporation Dry film resist transport and lamination system for semiconductor wafers
US5240546A (en) * 1991-04-26 1993-08-31 Sumitomo Electric Industries, Ltd. Apparatus for peeling semiconductor substrate
US5258236A (en) * 1991-05-03 1993-11-02 Ibm Corporation Multi-layer thin film structure and parallel processing method for fabricating same
JP3467611B2 (ja) * 1995-09-29 2003-11-17 日本テキサス・インスツルメンツ株式会社 半導体装置の製造方法
KR100471936B1 (ko) * 1996-06-04 2005-09-09 미쓰비시 마테리알 가부시키가이샤 웨이퍼의세정·박리방법및장치
US5757073A (en) * 1996-12-13 1998-05-26 International Business Machines Corporation Heatsink and package structure for wirebond chip rework and replacement
JP2000349101A (ja) * 1999-06-07 2000-12-15 Lintec Corp 転写用テープおよびその使用方法
US6723620B1 (en) * 1999-11-24 2004-04-20 International Rectifier Corporation Power semiconductor die attach process using conductive adhesive film
US6426552B1 (en) 2000-05-19 2002-07-30 Micron Technology, Inc. Methods employing hybrid adhesive materials to secure components of semiconductor device assemblies and packages to one another and assemblies and packages including components secured to one another with such hybrid adhesive materials
DE10140827B4 (de) * 2001-08-21 2004-07-29 Infineon Technologies Ag Vorrichtung zum Debonden von Dünnwafern
EP1490894A1 (de) * 2002-04-04 2004-12-29 Georg Sillner Verfahren zum verarbeiten von elektrischen bauelementen, insbesondere von halbleiterchips, sowie vorrichtung zum durchf hren des verfahrens
US6652707B2 (en) 2002-04-29 2003-11-25 Applied Optoelectronics, Inc. Method and apparatus for demounting workpieces from adhesive film
US6960813B2 (en) * 2002-06-10 2005-11-01 New Wave Research Method and apparatus for cutting devices from substrates
US6580054B1 (en) * 2002-06-10 2003-06-17 New Wave Research Scribing sapphire substrates with a solid state UV laser
US6806544B2 (en) 2002-11-05 2004-10-19 New Wave Research Method and apparatus for cutting devices from conductive substrates secured during cutting by vacuum pressure
JP4107417B2 (ja) 2002-10-15 2008-06-25 日東電工株式会社 チップ状ワークの固定方法
TWI248244B (en) * 2003-02-19 2006-01-21 J P Sercel Associates Inc System and method for cutting using a variable astigmatic focal beam spot
JP4283596B2 (ja) * 2003-05-29 2009-06-24 日東電工株式会社 チップ状ワークの固定方法
WO2005061227A1 (ja) * 2003-12-24 2005-07-07 Teijin Limited 積層体
JP4275522B2 (ja) * 2003-12-26 2009-06-10 日東電工株式会社 ダイシング・ダイボンドフィルム
JP4443962B2 (ja) * 2004-03-17 2010-03-31 日東電工株式会社 ダイシング・ダイボンドフィルム
WO2008032367A1 (en) * 2006-09-12 2008-03-20 Nitto Denko Corporation Dicing/die bonding film
US20110132885A1 (en) * 2009-12-07 2011-06-09 J.P. Sercel Associates, Inc. Laser machining and scribing systems and methods
US20130256286A1 (en) * 2009-12-07 2013-10-03 Ipg Microsystems Llc Laser processing using an astigmatic elongated beam spot and using ultrashort pulses and/or longer wavelengths
JP6723644B2 (ja) * 2016-05-16 2020-07-15 株式会社ディスコ エキスパンドシート
CN111217140A (zh) * 2020-01-08 2020-06-02 歌尔股份有限公司 感应取料装置及其取料方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3600246A (en) * 1968-05-17 1971-08-17 Rca Corp Method of making laminated semiconductor devices
GB1299177A (en) * 1969-01-17 1972-12-06 Ciba Geigy Uk Ltd Reinforced composites
FR2081250A1 (en) * 1970-03-23 1971-12-03 Silec Semi Conducteurs Abrasive jet cutting of semiconductor slices - using resin mask
US3963551A (en) * 1974-03-05 1976-06-15 Stromberg-Carlson Corporation Method for bonding semiconductor chips
JPS5542326U (cg-RX-API-DMAC10.html) * 1978-09-12 1980-03-18
JPS59105327A (ja) * 1982-12-08 1984-06-18 Toshiba Corp 半導体素子の半田付け方法

Also Published As

Publication number Publication date
JPH0334853B2 (cg-RX-API-DMAC10.html) 1991-05-24
EP0146197A2 (en) 1985-06-26
PH21462A (en) 1987-10-28
US4664739A (en) 1987-05-12
EP0146197A3 (en) 1986-12-30
JPS60136331A (ja) 1985-07-19

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Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PC1902 Submission of document of abandonment before decision of registration

St.27 status event code: N-1-6-B10-B11-nap-PC1902

SUBM Surrender of laid-open application requested
P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000