KR20230154957A - 폴리실세스퀴옥산 조성물, 및, 경화물 - Google Patents
폴리실세스퀴옥산 조성물, 및, 경화물 Download PDFInfo
- Publication number
- KR20230154957A KR20230154957A KR1020237034089A KR20237034089A KR20230154957A KR 20230154957 A KR20230154957 A KR 20230154957A KR 1020237034089 A KR1020237034089 A KR 1020237034089A KR 20237034089 A KR20237034089 A KR 20237034089A KR 20230154957 A KR20230154957 A KR 20230154957A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- polysilsesquioxane
- compound
- alkyl group
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/13—Phenols; Phenolates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
- C08K5/378—Thiols containing heterocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/50—Phosphorus bound to carbon only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
- C08K5/5317—Phosphonic compounds, e.g. R—P(:O)(OR')2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/52—Phosphorus bound to oxygen only
- C08K5/521—Esters of phosphoric acids, e.g. of H3PO4
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
- C08K5/5317—Phosphonic compounds, e.g. R—P(:O)(OR')2
- C08K5/5333—Esters of phosphonic acids
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2021-052091 | 2021-03-25 | ||
| JP2021052091 | 2021-03-25 | ||
| PCT/JP2022/013113 WO2022202800A1 (ja) | 2021-03-25 | 2022-03-22 | ポリシルセスキオキサン組成物、及び、硬化物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20230154957A true KR20230154957A (ko) | 2023-11-09 |
Family
ID=83395861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020237034089A Pending KR20230154957A (ko) | 2021-03-25 | 2022-03-22 | 폴리실세스퀴옥산 조성물, 및, 경화물 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240270908A1 (https=) |
| JP (1) | JP7642063B2 (https=) |
| KR (1) | KR20230154957A (https=) |
| CN (1) | CN117043276A (https=) |
| WO (1) | WO2022202800A1 (https=) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014208838A (ja) | 2007-04-10 | 2014-11-06 | ハネウェル・インターナショナル・インコーポレーテッド | オプトエレクトロニクスデバイス用の組成物、層、及びフィルム、並びにこれらの使用 |
| JP2018516998A (ja) | 2015-04-13 | 2018-06-28 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2646289B2 (ja) * | 1990-06-01 | 1997-08-27 | 富士写真フイルム株式会社 | レジスト組成物 |
| JP3628098B2 (ja) * | 1996-03-29 | 2005-03-09 | ダウ コーニング アジア株式会社 | 放射線硬化性組成物およびこれを用いた硬化物パターンの製造方法 |
| JPH11300273A (ja) * | 1998-04-21 | 1999-11-02 | Tokiwa Electric Co Ltd | 光触媒被覆の形成方法 |
| JP2001226634A (ja) * | 2000-02-16 | 2001-08-21 | Showa Denko Kk | コーティング組成物 |
| US6842577B2 (en) * | 2002-12-02 | 2005-01-11 | Shipley Company L.L.C. | Photoimageable waveguide composition and waveguide formed therefrom |
| JP4834972B2 (ja) * | 2004-09-17 | 2011-12-14 | 東レ株式会社 | コーティング用組成物およびそれを用いた表示装置 |
| JP2006096806A (ja) * | 2004-09-28 | 2006-04-13 | Fuji Photo Film Co Ltd | セルロースアシレートフィルム並びにそれを用いた光学フィルム、画像表示装置 |
| JP2006328231A (ja) * | 2005-05-26 | 2006-12-07 | Nagase Chemtex Corp | 光素子用封止樹脂組成物 |
| KR101296551B1 (ko) * | 2007-02-09 | 2013-08-13 | 가부시키가이샤 닛폰 쇼쿠바이 | 실란 화합물, 그 제조 방법 및 실란 화합물을 포함하는 수지 조성물 |
| JP5075680B2 (ja) * | 2007-03-28 | 2012-11-21 | リンテック株式会社 | 光素子用封止材および光素子封止体 |
| KR101512529B1 (ko) * | 2007-11-19 | 2015-04-15 | 도아고세이가부시키가이샤 | 폴리실록산 및 그의 제조 방법 및 경화물의 제조 방법 |
| JP5333723B2 (ja) * | 2008-07-23 | 2013-11-06 | 住友ゴム工業株式会社 | ゴム組成物 |
| JP2010044870A (ja) * | 2008-08-08 | 2010-02-25 | Nippon Shokubai Co Ltd | フラットパネルディスプレイ用封着層形成材料、フラットパネルディスプレイ用封着層、及び、フラットパネルディスプレイ |
| JP4973877B2 (ja) * | 2008-09-17 | 2012-07-11 | 信越化学工業株式会社 | 金属表面処理剤、表面処理鋼材及びその処理方法、並びに塗装鋼材及びその製造方法 |
| JP5215931B2 (ja) * | 2009-05-07 | 2013-06-19 | 株式会社日本触媒 | 重合性イミド組成物 |
| JP5443940B2 (ja) * | 2009-10-21 | 2014-03-19 | 東亞合成株式会社 | 硬化型コーティング剤組成物 |
| JP2011241380A (ja) * | 2010-04-22 | 2011-12-01 | Nippon Shokubai Co Ltd | 硬化成型体用樹脂組成物及び硬化成型体 |
| CN103476870A (zh) * | 2011-03-31 | 2013-12-25 | 道康宁公司 | 包含磷酸酯催化剂的组合物以及该组合物的制备和使用方法 |
| US20140039089A1 (en) * | 2011-03-31 | 2014-02-06 | Dow Corning Corporation | Compositions Containing Phosphonate Catalysts And Methods For The Preparation And Use Of The Compositions |
| EP2781553A4 (en) * | 2011-11-15 | 2015-07-08 | Nippon Catalytic Chem Ind | SILICONE COMPOSITION, HARDENABLE RESIN COMPOSITION AND SEALING MATERIAL |
| JP2013163786A (ja) * | 2012-02-13 | 2013-08-22 | Asahi Kasei E-Materials Corp | 感光性シリコーン樹脂組成物 |
| JP2015230339A (ja) * | 2014-06-03 | 2015-12-21 | 株式会社日本触媒 | 感光性樹脂組成物及びその用途 |
| JP2016069475A (ja) * | 2014-09-29 | 2016-05-09 | 株式会社日本触媒 | 硬化性樹脂組成物 |
| JP6524786B2 (ja) * | 2015-04-27 | 2019-06-05 | Jsr株式会社 | ポジ型感放射線性樹脂組成物、赤外線遮蔽膜、その形成方法、及び固体撮像素子、照度センサー |
| JP2018119023A (ja) * | 2017-01-23 | 2018-08-02 | 国立大学法人大阪大学 | 導電性組成物及び半導体装置 |
| JP7194496B2 (ja) * | 2017-12-06 | 2022-12-22 | 株式会社日本触媒 | 分散体及び樹脂組成物 |
| JP2019137841A (ja) * | 2018-02-09 | 2019-08-22 | 株式会社日本触媒 | 硬化性樹脂組成物、それを用いた封止材及び半導体装置 |
-
2022
- 2022-03-22 CN CN202280023995.6A patent/CN117043276A/zh active Pending
- 2022-03-22 JP JP2023509189A patent/JP7642063B2/ja active Active
- 2022-03-22 WO PCT/JP2022/013113 patent/WO2022202800A1/ja not_active Ceased
- 2022-03-22 KR KR1020237034089A patent/KR20230154957A/ko active Pending
- 2022-03-22 US US18/551,764 patent/US20240270908A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014208838A (ja) | 2007-04-10 | 2014-11-06 | ハネウェル・インターナショナル・インコーポレーテッド | オプトエレクトロニクスデバイス用の組成物、層、及びフィルム、並びにこれらの使用 |
| JP2018516998A (ja) | 2015-04-13 | 2018-06-28 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202248297A (zh) | 2022-12-16 |
| WO2022202800A1 (ja) | 2022-09-29 |
| US20240270908A1 (en) | 2024-08-15 |
| JPWO2022202800A1 (https=) | 2022-09-29 |
| JP7642063B2 (ja) | 2025-03-07 |
| CN117043276A (zh) | 2023-11-10 |
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