KR20230015406A - 공중합체, 공중합체 용액, 감광성 수지 조성물, 경화물, 공중합체의 제조 방법, 및, 공중합체 용액의 제조 방법 - Google Patents

공중합체, 공중합체 용액, 감광성 수지 조성물, 경화물, 공중합체의 제조 방법, 및, 공중합체 용액의 제조 방법 Download PDF

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Publication number
KR20230015406A
KR20230015406A KR1020227044795A KR20227044795A KR20230015406A KR 20230015406 A KR20230015406 A KR 20230015406A KR 1020227044795 A KR1020227044795 A KR 1020227044795A KR 20227044795 A KR20227044795 A KR 20227044795A KR 20230015406 A KR20230015406 A KR 20230015406A
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South Korea
Prior art keywords
group
copolymer
acid
formula
parts
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Pending
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KR1020227044795A
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English (en)
Korean (ko)
Inventor
히로키 마츠우라
노부히로 마에다
다쿠마 데라다
류이치 히라오카
Original Assignee
가부시키가이샤 닛폰 쇼쿠바이
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Publication of KR20230015406A publication Critical patent/KR20230015406A/ko
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/52—Phosphorus bound to oxygen only
    • C08K5/521—Esters of phosphoric acids, e.g. of H3PO4
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
KR1020227044795A 2020-08-03 2021-08-02 공중합체, 공중합체 용액, 감광성 수지 조성물, 경화물, 공중합체의 제조 방법, 및, 공중합체 용액의 제조 방법 Pending KR20230015406A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020132001 2020-08-03
JPJP-P-2020-132001 2020-08-03
JPJP-P-2021-033804 2021-03-03
JP2021033804 2021-03-03
PCT/JP2021/028611 WO2022030445A1 (ja) 2020-08-03 2021-08-02 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法

Publications (1)

Publication Number Publication Date
KR20230015406A true KR20230015406A (ko) 2023-01-31

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227044795A Pending KR20230015406A (ko) 2020-08-03 2021-08-02 공중합체, 공중합체 용액, 감광성 수지 조성물, 경화물, 공중합체의 제조 방법, 및, 공중합체 용액의 제조 방법

Country Status (5)

Country Link
JP (2) JP7415014B2 (enrdf_load_stackoverflow)
KR (1) KR20230015406A (enrdf_load_stackoverflow)
CN (1) CN116057088A (enrdf_load_stackoverflow)
TW (1) TWI881154B (enrdf_load_stackoverflow)
WO (1) WO2022030445A1 (enrdf_load_stackoverflow)

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* Cited by examiner, † Cited by third party
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CN119604818A (zh) * 2022-07-25 2025-03-11 株式会社力森诺科 感光性树脂组合物、树脂固化膜及图像显示元件
CN117069918B (zh) * 2023-08-21 2024-04-26 广东嘉元新材料有限公司 一种改性丙烯酸树脂及其制备方法
CN120349448A (zh) * 2025-06-25 2025-07-22 湖北雨田科技有限公司 墨粉用苯乙烯-丙烯酸酯-环氧接枝共聚物及其制备方法

Citations (3)

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JPH0425846A (ja) 1990-05-21 1992-01-29 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JP2006251009A (ja) 2005-03-08 2006-09-21 Chisso Corp 感光性組成物およびそれを用いた表示素子
JP2014210892A (ja) 2013-04-22 2014-11-13 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途

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JPS62256806A (ja) * 1986-04-30 1987-11-09 Japan Synthetic Rubber Co Ltd アクリル系ランダム共重合体および該共重合体を用いた熱硬化性樹脂組成物
JP3363211B2 (ja) * 1993-08-06 2003-01-08 東京応化工業株式会社 感光性樹脂組成物およびその製造方法
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JP4347923B2 (ja) * 1998-04-27 2009-10-21 共栄社化学株式会社 新規カルボキシル基含有エポキシ（メタ）アクリレートオリゴマー
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KR101032275B1 (ko) * 2007-11-08 2011-05-06 주식회사 엘지화학 착색 분산액, 감광성 수지조성물 및 블랙매트릭스
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JP6158636B2 (ja) * 2012-08-10 2017-07-05 株式会社日本触媒 硬化性樹脂組成物及びその用途
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Publication number Priority date Publication date Assignee Title
JPH0425846A (ja) 1990-05-21 1992-01-29 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JP2006251009A (ja) 2005-03-08 2006-09-21 Chisso Corp 感光性組成物およびそれを用いた表示素子
JP2014210892A (ja) 2013-04-22 2014-11-13 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途

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TW202216812A (zh) 2022-05-01
TWI881154B (zh) 2025-04-21
JP7716466B2 (ja) 2025-07-31
JP2024038213A (ja) 2024-03-19
JP7415014B2 (ja) 2024-01-16
WO2022030445A1 (ja) 2022-02-10
JPWO2022030445A1 (enrdf_load_stackoverflow) 2022-02-10
CN116057088A (zh) 2023-05-02

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