JPWO2022030445A1 - - Google Patents

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Publication number
JPWO2022030445A1
JPWO2022030445A1 JP2022541534A JP2022541534A JPWO2022030445A1 JP WO2022030445 A1 JPWO2022030445 A1 JP WO2022030445A1 JP 2022541534 A JP2022541534 A JP 2022541534A JP 2022541534 A JP2022541534 A JP 2022541534A JP WO2022030445 A1 JPWO2022030445 A1 JP WO2022030445A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2022541534A
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Japanese (ja)
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JP7415014B2 (ja
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Publication of JPWO2022030445A1 publication Critical patent/JPWO2022030445A1/ja
Priority to JP2023222707A priority Critical patent/JP7716466B2/ja
Application granted granted Critical
Publication of JP7415014B2 publication Critical patent/JP7415014B2/ja
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/52—Phosphorus bound to oxygen only
    • C08K5/521—Esters of phosphoric acids, e.g. of H3PO4
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
JP2022541534A 2020-08-03 2021-08-02 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法 Active JP7415014B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023222707A JP7716466B2 (ja) 2020-08-03 2023-12-28 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020132001 2020-08-03
JP2020132001 2020-08-03
JP2021033804 2021-03-03
JP2021033804 2021-03-03
PCT/JP2021/028611 WO2022030445A1 (ja) 2020-08-03 2021-08-02 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023222707A Division JP7716466B2 (ja) 2020-08-03 2023-12-28 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法

Publications (2)

Publication Number Publication Date
JPWO2022030445A1 true JPWO2022030445A1 (enrdf_load_stackoverflow) 2022-02-10
JP7415014B2 JP7415014B2 (ja) 2024-01-16

Family

ID=80118000

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022541534A Active JP7415014B2 (ja) 2020-08-03 2021-08-02 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法
JP2023222707A Active JP7716466B2 (ja) 2020-08-03 2023-12-28 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023222707A Active JP7716466B2 (ja) 2020-08-03 2023-12-28 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法

Country Status (5)

Country Link
JP (2) JP7415014B2 (enrdf_load_stackoverflow)
KR (1) KR20230015406A (enrdf_load_stackoverflow)
CN (1) CN116057088A (enrdf_load_stackoverflow)
TW (1) TWI881154B (enrdf_load_stackoverflow)
WO (1) WO2022030445A1 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119604818A (zh) * 2022-07-25 2025-03-11 株式会社力森诺科 感光性树脂组合物、树脂固化膜及图像显示元件
CN117069918B (zh) * 2023-08-21 2024-04-26 广东嘉元新材料有限公司 一种改性丙烯酸树脂及其制备方法
CN120349448A (zh) * 2025-06-25 2025-07-22 湖北雨田科技有限公司 墨粉用苯乙烯-丙烯酸酯-环氧接枝共聚物及其制备方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52123427A (en) * 1976-04-09 1977-10-17 Dainippon Ink & Chem Inc Resin composition for powder coating
JPS61111380A (ja) * 1984-11-05 1986-05-29 Mitsui Toatsu Chem Inc 粉体塗料組成物
JPS62256806A (ja) * 1986-04-30 1987-11-09 Japan Synthetic Rubber Co Ltd アクリル系ランダム共重合体および該共重合体を用いた熱硬化性樹脂組成物
JPH0749566A (ja) * 1993-08-06 1995-02-21 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物およびその製造方法
JP2004051953A (ja) * 1993-09-10 2004-02-19 Kansai Paint Co Ltd 自己架橋性樹脂
WO2019188376A1 (ja) * 2018-03-29 2019-10-03 太陽インキ製造株式会社 光硬化性熱硬化性樹脂組成物及びドライフィルム及び硬化物ならびにプリント配線板

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0425846A (ja) 1990-05-21 1992-01-29 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JP4347923B2 (ja) * 1998-04-27 2009-10-21 共栄社化学株式会社 新規カルボキシル基含有エポキシ（メタ）アクリレートオリゴマー
JP4207604B2 (ja) * 2003-03-03 2009-01-14 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの形成方法
JP4492393B2 (ja) 2005-03-08 2010-06-30 チッソ株式会社 感光性組成物およびそれを用いた表示素子
KR101032275B1 (ko) * 2007-11-08 2011-05-06 주식회사 엘지화학 착색 분산액, 감광성 수지조성물 및 블랙매트릭스
JP2011138116A (ja) * 2009-12-04 2011-07-14 Jsr Corp 感放射線性樹脂組成物、層間絶縁膜並びにそれらの形成方法
JP5495991B2 (ja) * 2010-07-12 2014-05-21 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜及びその製造方法、カラーフィルタ、並びに、表示装置
JP5930786B2 (ja) * 2012-03-22 2016-06-08 株式会社日本触媒 硬化性樹脂組成物および感光性樹脂組成物
JP2014010200A (ja) * 2012-06-28 2014-01-20 Fujifilm Corp 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP6158636B2 (ja) * 2012-08-10 2017-07-05 株式会社日本触媒 硬化性樹脂組成物及びその用途
JP5994564B2 (ja) * 2012-10-22 2016-09-21 Jnc株式会社 光配向性を有する熱硬化性組成物
JP6157193B2 (ja) 2013-04-22 2017-07-05 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途
JP2017057305A (ja) * 2015-09-17 2017-03-23 株式会社日本触媒 二重結合含有樹脂の製造方法
JP6644406B2 (ja) * 2015-09-29 2020-02-12 株式会社日本触媒 アルカリ可溶性樹脂及び感光性樹脂組成物
CN105348438B (zh) * 2015-10-12 2019-01-29 宁波南海化学有限公司 一种含环氧基、羟基和酸酐三官能团的高分子聚合物及其制备方法和应用
JP6807791B2 (ja) * 2017-03-23 2021-01-06 株式会社日本触媒 アルカリ可溶性樹脂、感光性樹脂組成物及びその用途
WO2021039799A1 (ja) * 2019-08-27 2021-03-04 株式会社日本触媒 硬化性組成物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52123427A (en) * 1976-04-09 1977-10-17 Dainippon Ink & Chem Inc Resin composition for powder coating
JPS61111380A (ja) * 1984-11-05 1986-05-29 Mitsui Toatsu Chem Inc 粉体塗料組成物
JPS62256806A (ja) * 1986-04-30 1987-11-09 Japan Synthetic Rubber Co Ltd アクリル系ランダム共重合体および該共重合体を用いた熱硬化性樹脂組成物
JPH0749566A (ja) * 1993-08-06 1995-02-21 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物およびその製造方法
JP2004051953A (ja) * 1993-09-10 2004-02-19 Kansai Paint Co Ltd 自己架橋性樹脂
WO2019188376A1 (ja) * 2018-03-29 2019-10-03 太陽インキ製造株式会社 光硬化性熱硬化性樹脂組成物及びドライフィルム及び硬化物ならびにプリント配線板

Also Published As

Publication number Publication date
TW202216812A (zh) 2022-05-01
TWI881154B (zh) 2025-04-21
JP7716466B2 (ja) 2025-07-31
JP2024038213A (ja) 2024-03-19
JP7415014B2 (ja) 2024-01-16
KR20230015406A (ko) 2023-01-31
WO2022030445A1 (ja) 2022-02-10
CN116057088A (zh) 2023-05-02

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