KR20150091380A - 잉크젯 도포용 감광성 수지 조성물, 열 처리물 및 그 제조 방법, 수지 패턴 제조 방법, 액정 표시 장치, 유기 el 표시 장치, 터치패널 및 그 제조 방법, 및 터치패널 표시 장치 - Google Patents

잉크젯 도포용 감광성 수지 조성물, 열 처리물 및 그 제조 방법, 수지 패턴 제조 방법, 액정 표시 장치, 유기 el 표시 장치, 터치패널 및 그 제조 방법, 및 터치패널 표시 장치 Download PDF

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KR20150091380A
KR20150091380A KR1020157017533A KR20157017533A KR20150091380A KR 20150091380 A KR20150091380 A KR 20150091380A KR 1020157017533 A KR1020157017533 A KR 1020157017533A KR 20157017533 A KR20157017533 A KR 20157017533A KR 20150091380 A KR20150091380 A KR 20150091380A
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KR
South Korea
Prior art keywords
group
resin composition
acid
photosensitive resin
component
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KR1020157017533A
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English (en)
Korean (ko)
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시에 야먀시타
신지 후지모토
Original Assignee
후지필름 가부시키가이샤
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Publication of KR20150091380A publication Critical patent/KR20150091380A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H01L27/3241—
    • H01L51/5275—
    • H01L2251/5369—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/879—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
KR1020157017533A 2013-02-14 2014-02-10 잉크젯 도포용 감광성 수지 조성물, 열 처리물 및 그 제조 방법, 수지 패턴 제조 방법, 액정 표시 장치, 유기 el 표시 장치, 터치패널 및 그 제조 방법, 및 터치패널 표시 장치 KR20150091380A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2013-027048 2013-02-14
JP2013027048 2013-02-14
PCT/JP2014/053024 WO2014126034A1 (fr) 2013-02-14 2014-02-10 Composition de résine photosensible pour application à jet d'encre, substance traitée thermiquement, son procédé de fabrication, procédé de fabrication de motif de résine, affichage à cristaux liquides, affichage électroluminescent organique, panneau tactile, son procédé de fabrication et affichage à panneau tactile

Publications (1)

Publication Number Publication Date
KR20150091380A true KR20150091380A (ko) 2015-08-10

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KR1020157017533A KR20150091380A (ko) 2013-02-14 2014-02-10 잉크젯 도포용 감광성 수지 조성물, 열 처리물 및 그 제조 방법, 수지 패턴 제조 방법, 액정 표시 장치, 유기 el 표시 장치, 터치패널 및 그 제조 방법, 및 터치패널 표시 장치

Country Status (5)

Country Link
JP (1) JPWO2014126034A1 (fr)
KR (1) KR20150091380A (fr)
CN (1) CN104981736A (fr)
TW (1) TW201439229A (fr)
WO (1) WO2014126034A1 (fr)

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TWI693470B (zh) * 2015-06-30 2020-05-11 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜的製造方法、硬化膜及液晶顯示裝置
JP6913435B2 (ja) * 2015-09-30 2021-08-04 日東電工株式会社 インセル液晶パネルおよび液晶表示装置
KR102371148B1 (ko) * 2016-09-09 2022-03-08 도레이 카부시키가이샤 수지 조성물
CN116782448A (zh) * 2016-10-19 2023-09-19 积水化学工业株式会社 有机el显示元件用密封剂
CN108886849B (zh) * 2016-10-19 2022-10-21 积水化学工业株式会社 有机el显示元件用密封剂以及有机el显示元件用密封剂的制造方法
CN110325917A (zh) * 2017-02-22 2019-10-11 富士胶片株式会社 感光性转印材料、电路配线的制造方法及触摸面板的制造方法
KR102658948B1 (ko) * 2017-06-15 2024-04-18 세키스이가가쿠 고교가부시키가이샤 유기 el 표시 소자용 봉지제
EP3663271A4 (fr) 2017-07-31 2021-04-14 Kuraray Noritake Dental Inc. Procédé de fabrication de poudre contenant des particules de zircone et un agent fluorescent
CN110891921A (zh) 2017-07-31 2020-03-17 可乐丽则武齿科株式会社 包含荧光剂的氧化锆烧结体
CN110891903A (zh) 2017-07-31 2020-03-17 可乐丽则武齿科株式会社 包含氧化锆颗粒的粉末的制造方法
JP6986476B2 (ja) * 2018-03-29 2021-12-22 株式会社タムラ製作所 感光性樹脂組成物
TWI829765B (zh) * 2018-09-25 2024-01-21 日商日產化學股份有限公司 塗料組成物
KR102692692B1 (ko) 2019-03-06 2024-08-06 쿠라레 노리타케 덴탈 가부시키가이샤 높은 직선광 투과율을 갖는 지르코니아 소결체
KR102685231B1 (ko) 2019-03-06 2024-07-15 쿠라레 노리타케 덴탈 가부시키가이샤 단시간에 소성 가능한 지르코니아 성형체 및 가소체
EP4324807A1 (fr) 2021-04-16 2024-02-21 Kuraray Noritake Dental Inc. Corps cru de zircone, corps calciné de zircone, corps fritté de zircone, et procédés respectivement de production de ces produits
JPWO2023120674A1 (fr) 2021-12-22 2023-06-29
WO2024127646A1 (fr) 2022-12-16 2024-06-20 クラレノリタケデンタル株式会社 Procédé de fabrication de corps moulé en oxyde-céramique

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JPWO2014126034A1 (ja) 2017-02-02
TW201439229A (zh) 2014-10-16
CN104981736A (zh) 2015-10-14
WO2014126034A1 (fr) 2014-08-21

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