CN104981736A - 喷墨涂布用感光性树脂组合物、热处理物及其制造方法、树脂图案制造方法、液晶显示装置、有机el显示装置、触摸屏及其制造方法、以及触摸屏显示装置 - Google Patents

喷墨涂布用感光性树脂组合物、热处理物及其制造方法、树脂图案制造方法、液晶显示装置、有机el显示装置、触摸屏及其制造方法、以及触摸屏显示装置 Download PDF

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Publication number
CN104981736A
CN104981736A CN201480008348.3A CN201480008348A CN104981736A CN 104981736 A CN104981736 A CN 104981736A CN 201480008348 A CN201480008348 A CN 201480008348A CN 104981736 A CN104981736 A CN 104981736A
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China
Prior art keywords
photosensitive polymer
polymer combination
mentioned
ink
group
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Pending
Application number
CN201480008348.3A
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English (en)
Chinese (zh)
Inventor
山下史绘
藤本进二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Filing date
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Publication of CN104981736A publication Critical patent/CN104981736A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/879—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN201480008348.3A 2013-02-14 2014-02-10 喷墨涂布用感光性树脂组合物、热处理物及其制造方法、树脂图案制造方法、液晶显示装置、有机el显示装置、触摸屏及其制造方法、以及触摸屏显示装置 Pending CN104981736A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013-027048 2013-02-14
JP2013027048 2013-02-14
PCT/JP2014/053024 WO2014126034A1 (fr) 2013-02-14 2014-02-10 Composition de résine photosensible pour application à jet d'encre, substance traitée thermiquement, son procédé de fabrication, procédé de fabrication de motif de résine, affichage à cristaux liquides, affichage électroluminescent organique, panneau tactile, son procédé de fabrication et affichage à panneau tactile

Publications (1)

Publication Number Publication Date
CN104981736A true CN104981736A (zh) 2015-10-14

Family

ID=51354037

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480008348.3A Pending CN104981736A (zh) 2013-02-14 2014-02-10 喷墨涂布用感光性树脂组合物、热处理物及其制造方法、树脂图案制造方法、液晶显示装置、有机el显示装置、触摸屏及其制造方法、以及触摸屏显示装置

Country Status (5)

Country Link
JP (1) JPWO2014126034A1 (fr)
KR (1) KR20150091380A (fr)
CN (1) CN104981736A (fr)
TW (1) TW201439229A (fr)
WO (1) WO2014126034A1 (fr)

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CN110325917A (zh) * 2017-02-22 2019-10-11 富士胶片株式会社 感光性转印材料、电路配线的制造方法及触摸面板的制造方法
CN110320753A (zh) * 2018-03-29 2019-10-11 株式会社田村制作所 感光性树脂组合物
CN110731127A (zh) * 2017-06-15 2020-01-24 积水化学工业株式会社 有机el显示元件用密封剂
CN112771130A (zh) * 2018-09-25 2021-05-07 日产化学株式会社 墨液组合物

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TWI693470B (zh) * 2015-06-30 2020-05-11 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜的製造方法、硬化膜及液晶顯示裝置
JP6913435B2 (ja) * 2015-09-30 2021-08-04 日東電工株式会社 インセル液晶パネルおよび液晶表示装置
KR102371148B1 (ko) * 2016-09-09 2022-03-08 도레이 카부시키가이샤 수지 조성물
WO2018074507A1 (fr) * 2016-10-19 2018-04-26 積水化学工業株式会社 Agent de scellement pour élément d'affichage électroluminescent organique, et procédé de fabrication de celui-ci
KR20220100723A (ko) * 2016-10-19 2022-07-15 세키스이가가쿠 고교가부시키가이샤 유기 el 표시 소자용 봉지제
EP3663272A4 (fr) 2017-07-31 2021-04-14 Kuraray Noritake Dental Inc. Corps fritté de zircone contenant un agent fluorescent
US11479510B2 (en) 2017-07-31 2022-10-25 Kuraray Noritake Dental Inc. Method for producing zirconia particle-containing powder
WO2019026810A1 (fr) 2017-07-31 2019-02-07 クラレノリタケデンタル株式会社 Procédé de fabrication de poudre contenant des particules de zircone et un agent fluorescent
JPWO2020179876A1 (ja) 2019-03-06 2021-12-23 クラレノリタケデンタル株式会社 高い直線光透過率を有するジルコニア焼結体
WO2020179877A1 (fr) 2019-03-06 2020-09-10 クラレノリタケデンタル株式会社 Corps moulé en zircone permettant une cuisson de courte durée, et corps calciné
KR20230169209A (ko) 2021-04-16 2023-12-15 쿠라레 노리타케 덴탈 가부시키가이샤 지르코니아 성형체, 지르코니아 가소체 및 지르코니아 소결체 그리고 이들의 제조 방법
KR20240099440A (ko) 2021-12-22 2024-06-28 쿠라레 노리타케 덴탈 가부시키가이샤 지르코니아 조성물, 지르코니아 가소체 및 지르코니아 소결체 그리고 이것들의 제조 방법
WO2024127646A1 (fr) 2022-12-16 2024-06-20 クラレノリタケデンタル株式会社 Procédé de fabrication de corps moulé en oxyde-céramique

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JP2006098985A (ja) * 2004-09-30 2006-04-13 Dainippon Printing Co Ltd 固体撮像素子レンズ用感光性樹脂組成物、これを用いた固体撮像素子レンズ及び固体撮像素子レンズの形成方法、並びに固体撮像素子
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JP2004110019A (ja) * 2002-08-30 2004-04-08 Toray Ind Inc ポジ型感光性ペースト、それを用いたパターンの形成方法およびプラズマディスプレイの製造方法
KR100637174B1 (ko) * 2004-10-06 2006-10-20 삼성에스디아이 주식회사 Ｐｄｐ 전극 형성용 포지티브형 감광성 페이스트 조성물,이를 이용하여 제조된 ｐｄｐ 전극 및 이를 포함하는 ｐｄｐ
JP2008208253A (ja) * 2007-02-27 2008-09-11 Fujifilm Corp 樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
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CN101553758A (zh) * 2006-12-25 2009-10-07 Az电子材料（日本）株式会社 图案的形成方法及其所使用的感光性树脂组合物
CN102792227A (zh) * 2010-03-11 2012-11-21 富士胶片株式会社 正型感光性树脂组合物、固化膜的形成方法、固化膜、液晶显示装置、以及有机el显示装置
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CN102870045A (zh) * 2010-04-28 2013-01-09 Jsr株式会社 喷出喷嘴式涂布法用正型射线敏感性组合物、显示元件用层间绝缘膜及其形成方法
CN102759859A (zh) * 2011-04-27 2012-10-31 富士胶片株式会社 树脂组成物、硬化物的制造方法、树脂图案制造方法、硬化物及光学部件

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110325917A (zh) * 2017-02-22 2019-10-11 富士胶片株式会社 感光性转印材料、电路配线的制造方法及触摸面板的制造方法
CN110731127A (zh) * 2017-06-15 2020-01-24 积水化学工业株式会社 有机el显示元件用密封剂
CN110731127B (zh) * 2017-06-15 2022-08-19 积水化学工业株式会社 有机el显示元件用密封剂
CN110320753A (zh) * 2018-03-29 2019-10-11 株式会社田村制作所 感光性树脂组合物
CN112771130A (zh) * 2018-09-25 2021-05-07 日产化学株式会社 墨液组合物
CN112771130B (zh) * 2018-09-25 2024-03-29 日产化学株式会社 墨液组合物

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JPWO2014126034A1 (ja) 2017-02-02
WO2014126034A1 (fr) 2014-08-21
TW201439229A (zh) 2014-10-16
KR20150091380A (ko) 2015-08-10

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Application publication date: 20151014