KR20070094974A - 연마 패드 및 그 제조 방법 - Google Patents
연마 패드 및 그 제조 방법 Download PDFInfo
- Publication number
- KR20070094974A KR20070094974A KR1020077018737A KR20077018737A KR20070094974A KR 20070094974 A KR20070094974 A KR 20070094974A KR 1020077018737 A KR1020077018737 A KR 1020077018737A KR 20077018737 A KR20077018737 A KR 20077018737A KR 20070094974 A KR20070094974 A KR 20070094974A
- Authority
- KR
- South Korea
- Prior art keywords
- polishing pad
- polyurethane resin
- diisocyanate
- isocyanate
- polishing
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 333
- 238000000034 method Methods 0.000 title claims description 98
- 230000008569 process Effects 0.000 title claims description 21
- 239000006260 foam Substances 0.000 claims abstract description 146
- 239000012948 isocyanate Substances 0.000 claims abstract description 134
- 229920005749 polyurethane resin Polymers 0.000 claims abstract description 124
- 150000002513 isocyanates Chemical class 0.000 claims abstract description 109
- -1 aromatic diol Chemical class 0.000 claims abstract description 68
- 239000004970 Chain extender Substances 0.000 claims abstract description 57
- 229920005862 polyol Polymers 0.000 claims abstract description 45
- 150000003077 polyols Chemical class 0.000 claims abstract description 45
- 125000005442 diisocyanate group Chemical group 0.000 claims abstract description 31
- 238000006243 chemical reaction Methods 0.000 claims abstract description 30
- 125000003118 aryl group Chemical group 0.000 claims abstract description 20
- 229920000768 polyamine Polymers 0.000 claims abstract description 19
- 150000004982 aromatic amines Chemical class 0.000 claims abstract description 18
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 13
- 238000002844 melting Methods 0.000 claims abstract description 12
- 230000008018 melting Effects 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims description 58
- 229920001296 polysiloxane Polymers 0.000 claims description 47
- 239000004094 surface-active agent Substances 0.000 claims description 42
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 37
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 34
- 239000004065 semiconductor Substances 0.000 claims description 27
- 239000006185 dispersion Substances 0.000 claims description 23
- 239000002994 raw material Substances 0.000 claims description 20
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 13
- 230000005484 gravity Effects 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical group CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 claims description 13
- 229920002050 silicone resin Polymers 0.000 claims description 12
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims description 11
- 229920000909 polytetrahydrofuran Polymers 0.000 claims description 11
- RQEOBXYYEPMCPJ-UHFFFAOYSA-N 4,6-diethyl-2-methylbenzene-1,3-diamine Chemical compound CCC1=CC(CC)=C(N)C(C)=C1N RQEOBXYYEPMCPJ-UHFFFAOYSA-N 0.000 claims description 10
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 claims description 10
- TXDBDYPHJXUHEO-UHFFFAOYSA-N 2-methyl-4,6-bis(methylsulfanyl)benzene-1,3-diamine Chemical compound CSC1=CC(SC)=C(N)C(C)=C1N TXDBDYPHJXUHEO-UHFFFAOYSA-N 0.000 claims description 9
- PISLZQACAJMAIO-UHFFFAOYSA-N 2,4-diethyl-6-methylbenzene-1,3-diamine Chemical compound CCC1=CC(C)=C(N)C(CC)=C1N PISLZQACAJMAIO-UHFFFAOYSA-N 0.000 claims description 8
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical group C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 claims description 8
- AOFIWCXMXPVSAZ-UHFFFAOYSA-N 4-methyl-2,6-bis(methylsulfanyl)benzene-1,3-diamine Chemical group CSC1=CC(C)=C(N)C(SC)=C1N AOFIWCXMXPVSAZ-UHFFFAOYSA-N 0.000 claims description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims description 7
- 229960001755 resorcinol Drugs 0.000 claims description 7
- NWIVYGKSHSJHEF-UHFFFAOYSA-N 4-[(4-amino-3,5-diethylphenyl)methyl]-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(CC)C=2)=C1 NWIVYGKSHSJHEF-UHFFFAOYSA-N 0.000 claims description 6
- QJENIOQDYXRGLF-UHFFFAOYSA-N 4-[(4-amino-3-ethyl-5-methylphenyl)methyl]-2-ethyl-6-methylaniline Chemical compound CC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(C)C=2)=C1 QJENIOQDYXRGLF-UHFFFAOYSA-N 0.000 claims description 6
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 claims description 6
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims description 5
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- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 4
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 claims description 4
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 claims description 4
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 4
- FSWDLYNGJBGFJH-UHFFFAOYSA-N n,n'-di-2-butyl-1,4-phenylenediamine Chemical compound CCC(C)NC1=CC=C(NC(C)CC)C=C1 FSWDLYNGJBGFJH-UHFFFAOYSA-N 0.000 claims description 4
- 239000002736 nonionic surfactant Substances 0.000 claims description 4
- 229920001281 polyalkylene Polymers 0.000 claims description 3
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 claims description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 claims description 2
- KXBFLNPZHXDQLV-UHFFFAOYSA-N [cyclohexyl(diisocyanato)methyl]cyclohexane Chemical group C1CCCCC1C(N=C=O)(N=C=O)C1CCCCC1 KXBFLNPZHXDQLV-UHFFFAOYSA-N 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 abstract 2
- 125000002723 alicyclic group Chemical group 0.000 abstract 1
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- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 28
- IBOFVQJTBBUKMU-UHFFFAOYSA-N 4,4'-methylene-bis-(2-chloroaniline) Chemical compound C1=C(Cl)C(N)=CC=C1CC1=CC=C(N)C(Cl)=C1 IBOFVQJTBBUKMU-UHFFFAOYSA-N 0.000 description 25
- 238000000227 grinding Methods 0.000 description 22
- 238000003756 stirring Methods 0.000 description 22
- 239000002002 slurry Substances 0.000 description 19
- 241001112258 Moca Species 0.000 description 18
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- 239000010408 film Substances 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 14
- 238000005187 foaming Methods 0.000 description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 13
- 238000005259 measurement Methods 0.000 description 13
- 238000006116 polymerization reaction Methods 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 13
- BJZYYSAMLOBSDY-QMMMGPOBSA-N (2s)-2-butoxybutan-1-ol Chemical compound CCCCO[C@@H](CC)CO BJZYYSAMLOBSDY-QMMMGPOBSA-N 0.000 description 12
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- 230000000052 comparative effect Effects 0.000 description 12
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- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 10
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- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2101/00—Manufacture of cellular products
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- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- Mechanical Treatment Of Semiconductor (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (34)
- 이소시아네이트 말단 프리폴리머를 포함하는 제1 성분과 쇄연장제를 포함하는 제2 성분을 혼합하고, 경화하여 폴리우레탄 수지 발포체를 제조하는 공정(1)을 포함하는 연마 패드의 제조 방법에 있어서,상기 공정(1)은, 상기 제1 성분에 실리콘계 계면활성제를 폴리우레탄 수지 발포체 내에 0.05∼10중량%가 되도록 첨가하고, 또한 상기 제1 성분을 비반응성 기체와 교반하여 상기 비반응성 기체를 미세 기포로서 분산시킨 기포 분산액을 제조한 후, 상기 기포 분산액에 상기 제2 성분을 혼합하고, 경화하여 폴리우레탄 수지 발포체를 제조하는 공정이며, 동시에 상기 쇄연장제는 융점이 70℃ 이하의 방향족 폴리아민인 것을 특징으로 하는 연마 패드의 제조 방법.
- 제1항에 있어서,상기 방향족 폴리아민이, 3,5-비스(메틸티오)-2,4-톨루엔디아민, 3,5-비스(메틸티오)-2,6-톨루엔디아민, 3,5-디에틸-2,4-톨루엔디아민, 3,5-디에틸-2,6-톨루엔디아민, N,N'-디-sec-부틸-4,4'-디아미노디페닐메탄, 3,3'-디에틸-4,4'-디아미노디페닐메탄, m-크실렌디아민, N,N'-디-sec-부틸-p-페닐렌디아민, m-페닐렌디아민, p-크실렌디아민, 및 하기 일반식(1)으로 표시되는 폴리알킬렌옥시드-디-p-아미노벤조에이트로 이루어진 군에서 선택되는 적어도 1종인 것을 특징으로 하는 연마 패드의 제조 방법.(단, m은 2∼4의 정수이며, n은 1∼20의 정수임)
- 제1항에 있어서,상기 이소시아네이트 말단 프리폴리머는, 저분자량 폴리올을 원료 성분으로서 함유하는 것을 특징으로 하는 연마 패드의 제조 방법.
- 제1항에 있어서,상기 이소시아네이트 말단 프리폴리머의 원료 성분인 이소시아네이트 성분은, 방향족 디이소시아네이트 및 지환식 디이소시아네이트인 것을 특징으로 하는 연마 패드의 제조 방법.
- 제4항에 있어서,상기 방향족 디이소시아네이트는 톨루엔디이소시아네이트이며, 지환식 디이소시아네이트는 디시클로헥실메탄디이소시아네이트인 것을 특징으로 하는 연마 패드의 제조 방법.
- 제1항의 방법에 의해 제조되는 연마 패드.
- 폴리우레탄 수지 발포체로 이루어지는 연마층을 가지는 연마 패드에 있어서, 상기 폴리우레탄 수지 발포체는, 이소시아네이트 성분 및 고분자량 폴리올을 함유하여 이루어지는 이소시아네이트 말단 프리폴리머와, 하이드로퀴논, 레조르신, p-크실렌글리콜, 및 비스페놀 A로 이루어진 군에서 선택되는 적어도 1종의 방향족 디올의 에틸렌옥사이드 부가체 및/또는 프로필렌옥사이드 부가체를 함유하는 쇄연장제의 반응 경화물인 것을 특징으로 하는 연마 패드.
- 제7항에 있어서,상기 이소시아네이트 성분은, 방향족 이소시아네이트를 90몰% 이상 함유하는 것을 특징으로 하는 연마 패드.
- 제8항에 있어서,상기 방향족 이소시아네이트는, 디페닐메탄디이소시아네이트인 것을 특징으로 하는 연마 패드.
- 제7항에 있어서,상기 고분자량 폴리올은, 수평균 분자량 500∼1500의 폴리테트라메틸렌에테르글리콜인 것을 특징으로 하는 연마 패드.
- 제7항에 있어서,상기 이소시아네이트 말단 프리폴리머는, 저분자량 폴리올을 원료 성분으로서 함유하는 것을 특징으로 하는 연마 패드.
- 제7항에 있어서,상기 에틸렌옥사이드 및/또는 프로필렌옥사이드의 부가량은, 상기 방향족 디올 1몰에 대하여 2∼4몰인 것을 특징으로 하는 연마 패드.
- 이소시아네이트 말단 프리폴리머를 포함하는 제1 성분과 쇄연장제를 포함하는 제2 성분을 혼합하고, 경화하여 폴리우레탄 수지 발포체를 제조하는 공정(1)을 포함하는 연마 패드의 제조 방법에 있어서,상기 공정(1)은, 이소시아네이트 말단 프리폴리머를 포함하는 제1 성분에 실리콘계 계면활성제를 폴리우레탄 수지 발포체 내에 0.05∼10중량%가 되도록 첨가하고, 또한 상기 제1 성분을 비반응성 기체와 교반하여 상기 비반응성 기체를 미세 기포로서 분산시킨 기포 분산액을 제조한 후, 상기 기포 분산액에 쇄연장제를 포함하는 제2 성분을 혼합하고, 경화하여 폴리우레탄 수지 발포체를 제조하는 공정이며, 상기 쇄연장제는 하이드로퀴논, 레조르신, p-크실렌글리콜, 및 비스페놀 A로 이루어진 군에서 선택되는 적어도 1종의 방향족 디올의 에틸렌옥사이드 부가체 및/또는 프로필렌옥사이드 부가체를 함유하는 것을 특징으로 하는 연마 패드의 제조 방법.
- 폴리우레탄 수지 발포체로 이루어지는 연마층을 가지는 연마 패드에 있어서, 상기 폴리우레탄 수지 발포체는, 지방족 및/또는 지환족 이소시아네이트 말단 프리폴리머와, 하기 일반식(2)∼(4)으로 이루어진 군에서 선택되는 적어도 1종의 비할로겐계 방향족 아민을 포함하는 쇄연장제의 반응 경화물인 것을 특징으로 하는 연마 패드.(단, 일반식(2)에서, R1∼R3은 각각 독립적으로 탄소수 1∼3의 알킬기, 또는 메틸티오기임)(단, 일반식(3)에서, R4∼R7은 각각 독립적으로 H 또는 탄소수 1∼4의 알킬기임)(단, m은 2∼4의 정수이며, n은 1∼20의 정수임)
- 제14항에 있어서,상기 일반식(2)의 비할로겐계 방향족 아민은, 3,5-디에틸-2,4-톨루엔디아민, 3,5-디에틸-2,6-톨루엔디아민, 3,5-비스(메틸티오)-2,4-톨루엔디아민, 및 3,5-비스(메틸티오)-2,6-톨루엔디아민인 것을 특징으로 하는 연마 패드.
- 제14항에 있어서,상기 일반식(3)의 비할로겐계 방향족 아민은, 4,4'-디아미노디페닐메탄, 4,4'-디아미노-3,3'-디에틸-5,5'-디메틸디페닐메탄, 4,4'-디아미노-3,3',5,5'-테트라에틸디페닐메탄, 4,4'-디아미노-3,3'-디이소프로필-5,5'-디메틸디페닐메탄, 및 4,4'-디아미노-3,3',5,5'-테트라이소프로필디페닐메탄인 것을 특징으로 하는 연마 패드.
- 제14항에 있어서,상기 일반식(4)의 비할로겐계 방향족 아민은, 트리메틸렌글리콜-디-p-아미노벤조에이트, 및 폴리테트라메틸렌옥시드-디-p-아미노벤조에이트인 것을 특징으로 하는 연마 패드.
- 제14항에 있어서,상기 지환족 이소시아네이트 말단 프리폴리머를 구성하는 이소시아네이트 성분은, 4,4'-디시클로헥실메탄디이소시아네이트인 것을 특징으로 하는 연마 패드.
- 제14항에 있어서,상기 지방족 및/또는 지환족 이소시아네이트 말단 프리폴리머를 구성하는 고분자량 폴리올은, 수평균 분자량 500∼1500의 폴리테트라메틸렌에테르글리콜인 것을 특징으로 하는 연마 패드.
- 제14항에 있어서,상기 지방족 및/또는 지환족 이소시아네이트 말단 프리폴리머는, 저분자량 폴리올을 원료 성분으로서 함유하는 것을 특징으로 하는 연마 패드.
- 이소시아네이트 말단 프리폴리머를 포함하는 제1 성분과 쇄연장제를 포함하는 제2 성분을 혼합하고, 경화하여 폴리우레탄 수지 발포체를 제조하는 공정(1)을 포함하는 연마 패드의 제조 방법에 있어서,상기 공정(1)은, 상기 이소시아네이트 말단 프리폴리머를 포함하는 제1 성분에 실리콘계 계면활성제를 폴리우레탄 수지 발포체 내에 0.05∼10중량%가 되도록 첨가하고, 또한 상기 제1 성분을 비반응성 기체와 교반하여 상기 비반응성 기체를 미세 기포로서 분산시킨 기포 분산액을 제조한 후, 상기 기포 분산액에 상기 쇄연장제를 포함하는 제2 성분을 혼합하고, 경화하여 폴리우레탄 수지 발포체를 제조하는 공정이며, 상기 이소시아네이트 말단 프리폴리머는 지방족 및/또는 지환족 이소시아네이트 말단 프리폴리머이며, 동시에 상기 쇄연장제는 하기 일반식(2)∼(4)으로 이루어진 군에서 선택되는 적어도 1종의 비할로겐계 방향족 아민을 포함하는 것 을 특징으로 하는 연마 패드의 제조 방법.(단, 일반식(2)에서, R1∼R3은 각각 독립적으로 탄소수 1∼3의 알킬기, 또는 메틸티오기임)(단, 일반식(3)에서, R4∼R7은 각각 독립적으로 H 또는 탄소수 1∼4의 알킬기임)(단, m은 2∼4의 정수이며, n은 1∼20의 정수임)
- 제21항에 있어서,상기 실리콘계 계면활성제는, 중량 평균 분자량이 1OOO∼6OOO이며, 또한 분자 내의 에틸렌옥사이드/프로필렌옥사이드(몰비)가 70/30∼100/0인 실리콘 수지를 함유하는 것을 특징으로 하는 연마 패드의 제조 방법.
- 제22항에 있어서,상기 실리콘 수지는, 실록산 골격의 측쇄의 말단에 수산기를 가지는 것을 특징으로 하는 연마 패드의 제조 방법.
- 미세 기포를 가지는 폴리우레탄 수지 발포체로 이루어지는 연마층을 가지는 연마 패드에 있어서, 상기 폴리우레탄 수지 발포체의 원료인 이소시아네이트 성분이 다량화(多量化) 디이소시아네이트 및 방향족 디이소시아네이트인 것을 특징으로 하는 연마 패드.
- 제24항에 있어서,상기 폴리우레탄 수지 발포체는, 다량화 디이소시아네이트 및 방향족 디이소시아네이트를 함유하여 이루어지는 이소시아네이트 말단 프리폴리머와 쇄연장제의 반응 경화체인 것을 특징으로 하는 연마 패드.
- 제24항에 있어서,상기 다량화 디이소시아네이트와 방향족 디이소시아네이트의 함유 중량비(전자/후자)는, 1/99∼65/35인 것을 특징으로 하는 연마 패드.
- 제24항에 있어서,상기 다량화 디이소시아네이트는 다량화 지방족 디이소시아네이트이며, 상기 방향족 디이소시아네이트는 톨루엔디이소시아네이트인 것을 특징으로 하는 연마 패드.
- 제27항에 있어서,상기 다량화 지방족 디이소시아네이트는, 다량화 헥사메틸렌디이소시아네이트인 것을 특징으로 하는 연마 패드.
- 제24항에 있어서,상기 다량화 디이소시아네이트는, 우레탄 변성된 것임을 특징으로 하는 연마 패드.
- 제24항에 있어서,상기 폴리우레탄 수지 발포체는, 비중이 0.5∼1.0인 것을 특징으로 하는 연마 패드.
- 제24항에 있어서,상기 폴리우레탄 수지 발포체는, 아스카 D 경도가 45∼65도인 것을 특징으로 하는 연마 패드.
- 제24항에 있어서,상기 폴리우레탄 수지 발포체는, 실리콘계 비이온성 계면활성제를 O.O5∼10중량% 함유하는 것을 특징으로 하는 연마 패드.
- 제24항에 있어서,드레싱 속도가 4.5∼10μm/min인 것을 특징으로 하는 연마 패드.
- 제6항, 제7항, 제14항 및 제24항 중 어느 한 항에 따른 연마 패드를 이용하여 반도체 웨이퍼의 표면을 연마하는 공정을 포함하는 반도체 디바이스의 제조 방법.
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KR20210048343A (ko) * | 2019-10-23 | 2021-05-03 | 에스케이씨솔믹스 주식회사 | 연마패드용 조성물, 연마패드 및 이의 제조방법 |
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WO2006095591A1 (ja) | 2006-09-14 |
CN101115779A (zh) | 2008-01-30 |
CN101115779B (zh) | 2012-09-19 |
TW200637877A (en) | 2006-11-01 |
TWI404736B (zh) | 2013-08-11 |
SG160370A1 (en) | 2010-04-29 |
US20080085943A1 (en) | 2008-04-10 |
SG160368A1 (en) | 2010-04-29 |
US8148441B2 (en) | 2012-04-03 |
SG160369A1 (en) | 2010-04-29 |
MY146806A (en) | 2012-09-28 |
KR100909605B1 (ko) | 2009-07-27 |
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