KR20030048032A - 연마재 - Google Patents
연마재 Download PDFInfo
- Publication number
- KR20030048032A KR20030048032A KR10-2003-7003566A KR20037003566A KR20030048032A KR 20030048032 A KR20030048032 A KR 20030048032A KR 20037003566 A KR20037003566 A KR 20037003566A KR 20030048032 A KR20030048032 A KR 20030048032A
- Authority
- KR
- South Korea
- Prior art keywords
- abrasive
- polishing
- dispersion medium
- sodium
- test
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
- B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
- B24D3/344—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
Abstract
Description
고화 방지제(0.3중량%) | 분산제(0.3중량%) | |
a | 알긴산프로필렌글리콜에스테르 | 폴리아크릴산나트륨 |
b | 알긴산프로필렌글리콜에스테르 | 헥사메타인산나트륨 |
c | 합성실리카 | 폴리아크릴산나트륨 |
d | 콜로이달실리카 | 아크릴산-말레인산 공중합체 나트륨염 |
e | 콜로이달실리카 | 피로인산나트륨 |
f | 결정 셀룰로오즈 | 아크릴산-말레인산 공중합체 나트륨염 |
g | 알긴산나트륨 | 폴리스티렌설폰산나트륨 |
h | 알긴산나트륨 | 헥사메타인산나트륨 |
i | 결정 셀룰로오즈+카르복시메틸셀룰로오즈나트륨 | 폴리스티렌설폰산나트륨 |
j | 퓸드실리카 | 폴리옥시에틸렌솔비탄트리스테아레이트 |
k | 퓸드실리카 | 피로인산나트륨 |
l | β-나프탈렌설폰산나트륨포르말린축합물 | 폴리옥시에틸렌솔비탄트리스테아레이트 |
m | 결정 셀룰로오즈+카르복시메틸셀룰로오즈나트륨 | 테트라올레인산폴리옥시에틸렌솔비트 |
n | 알긴산프로필렌글리콜에스테르 | 테트라올레인산폴리옥시에틸렌솔비트 |
Claims (8)
- 산화세륨을 포함하는 희토류 산화물을 주성분으로 하는 연마재에 있어서, 분산매에 연마재 지립을 분산시킨 때에 상기 연마재 지립의 침전을 부드럽게 만드는 고화 방지제와, 분산매중에 상기 연마재 지립을 분산시키는 분산제를 포함하는 것을 특징으로 하는 연마재.
- 제 1항에 있어서, 고화 방지제는 셀룰로오즈 또는 셀룰로오즈 유도체, 실리카, 알긴산 또는 알긴산 유도체, 방향족 설폰산포르말린 축합물의 염, 칼슘함유 화합물로 이루어지는 군으로부터 선택되는 것인 연마재.
- 제 2항에 있어서, 고화 방지제는 결정 셀룰로오즈, 제2인산칼슘, β-나프탈렌설폰산나트륨포르말린 축합물, 합성실리카 중 어느 하나의 것인 연마재.
- 제 1항 내지 제 3항중 어느 한 항에 있어서, 분산제는 축합인산 또는 축합인산염, 폴리스티렌설폰산염, 폴리카본산형 고분자화합물, 폴리옥시에틸렌솔비탄지방산에스테르, 폴리옥시에틸렌솔비톨지방산에스테르로 이루어지는 군으로부터 선택되는 것인 연마재.
- 제 4항에 있어서, 분산제는 헥사메타인산나트륨 또는 피로인산나트륨인 연마재.
- 제 1항 내지 제 5항중 어느 한 항에 있어서, 고화 방지제 0.02∼2.0중량%와, 분산제 0.02∼2.0중량%를 함유하는 것인 연마재.
- 제 1항 내지 제 6항중 어느 한 항에 있어서, 산화세륨(CeO2)/총 산화희토(TREO)가 40∼99%의 것인 연마재.
- 제 1항 내지 제 7항중 어느 한 항에 기재된 연마재를 수계 분산매에 분산시킨 연마재 슬러리.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000307100 | 2000-10-06 | ||
JPJP-P-2000-00307100 | 2000-10-06 | ||
PCT/JP2001/008671 WO2002031079A1 (fr) | 2000-10-06 | 2001-10-02 | Matière abrasive |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030048032A true KR20030048032A (ko) | 2003-06-18 |
KR100539007B1 KR100539007B1 (ko) | 2005-12-26 |
Family
ID=18787662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2003-7003566A KR100539007B1 (ko) | 2000-10-06 | 2001-10-02 | 연마재 |
Country Status (11)
Country | Link |
---|---|
US (1) | US6824578B2 (ko) |
EP (1) | EP1338636B1 (ko) |
JP (1) | JP3986960B2 (ko) |
KR (1) | KR100539007B1 (ko) |
CN (1) | CN1300277C (ko) |
AT (1) | ATE494345T1 (ko) |
AU (1) | AU2001292332A1 (ko) |
DE (1) | DE60143812D1 (ko) |
MY (1) | MY136599A (ko) |
TW (1) | TWI281493B (ko) |
WO (1) | WO2002031079A1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101028622B1 (ko) * | 2005-10-19 | 2011-04-11 | 히다치 가세고교 가부시끼가이샤 | 산화세륨 슬러리, 산화세륨 연마액 및 이들을 이용한기판의 연마 방법 |
KR101072269B1 (ko) * | 2004-03-30 | 2011-10-11 | 주식회사 동진쎄미켐 | 에쳔트를 포함하는 화학-기계적 연마 슬러리 조성물 |
KR20120010968A (ko) * | 2010-07-26 | 2012-02-06 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 합성 석영 유리 기판용 연마제 및 이를 이용한 합성 석영 유리 기판의 제조 방법 |
US9493677B2 (en) | 2012-06-22 | 2016-11-15 | SK Hynix Inc. | Polishing composition, method for fabricating thereof and method of chemical mechanical polishing using the same |
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US7004819B2 (en) * | 2002-01-18 | 2006-02-28 | Cabot Microelectronics Corporation | CMP systems and methods utilizing amine-containing polymers |
JP3463999B1 (ja) * | 2002-05-16 | 2003-11-05 | 三井金属鉱業株式会社 | セリウム系研摩材の製造方法 |
KR100663781B1 (ko) | 2003-01-31 | 2007-01-02 | 히다치 가세고교 가부시끼가이샤 | Cμρ연마제 및 연마방법 |
US7073496B2 (en) * | 2003-03-26 | 2006-07-11 | Saint-Gobain Abrasives, Inc. | High precision multi-grit slicing blade |
US7300478B2 (en) * | 2003-05-22 | 2007-11-27 | Ferro Corporation | Slurry composition and method of use |
CN101311205A (zh) * | 2004-07-23 | 2008-11-26 | 日立化成工业株式会社 | Cmp研磨剂以及衬底的研磨方法 |
US7531105B2 (en) * | 2004-11-05 | 2009-05-12 | Cabot Microelectronics Corporation | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
US7504044B2 (en) * | 2004-11-05 | 2009-03-17 | Cabot Microelectronics Corporation | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
TWI271555B (en) * | 2005-06-13 | 2007-01-21 | Basf Ag | Slurry composition for polishing color filter |
KR100813100B1 (ko) * | 2006-06-29 | 2008-03-17 | 성균관대학교산학협력단 | 실시간 확장 가능한 스테레오 매칭 시스템 및 방법 |
WO2008004534A1 (fr) * | 2006-07-04 | 2008-01-10 | Hitachi Chemical Co., Ltd. | Liquide de polissage pour le polissage mécano-chimique |
TWI400142B (zh) * | 2006-07-28 | 2013-07-01 | Toray Industries | 相互侵入高分子網目構造體及研磨墊與其製法 |
US7696095B2 (en) * | 2007-02-23 | 2010-04-13 | Ferro Corporation | Auto-stopping slurries for chemical-mechanical polishing of topographic dielectric silicon dioxide |
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MY176620A (en) * | 2014-01-31 | 2020-08-18 | Hoya Corp | Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate |
CN103992743B (zh) * | 2014-05-09 | 2018-06-19 | 杰明纳微电子股份有限公司 | 含有二氧化铈粉体与胶体二氧化硅混合磨料的抛光液及其制备工艺 |
WO2016017819A1 (ja) * | 2014-07-31 | 2016-02-04 | Hoya株式会社 | 研磨スラリーの作製方法、研磨砥粒、研磨スラリー、およびガラス基板の製造方法 |
US20180370848A1 (en) * | 2015-12-16 | 2018-12-27 | Rhodia Operations | Method for polishing a phosphate glass or a fluorophosphate glass substrate |
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WO2024014425A1 (ja) * | 2022-07-12 | 2024-01-18 | 株式会社レゾナック | セリウム系研磨材、研磨液、研磨液の製造方法、及びガラス研磨方法 |
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BR9810241A (pt) * | 1997-06-04 | 2000-09-05 | Toto Ltd | Agente de limpeza para limpar a superfìcie de um substrato, composição de sub-revestimento para formar um sub-revestimento sobre a superfìcie de um substrato, processo para formar um revestimento fotocataliticamente hidrofilicável sobre a superfìcie de um substrato, conjunto, e, membro |
US6248143B1 (en) * | 1998-01-27 | 2001-06-19 | Showa Denko Kabushiki Kaisha | Composition for polishing glass and polishing method |
JP3857799B2 (ja) | 1998-01-27 | 2006-12-13 | 昭和電工株式会社 | ガラス研磨用研磨材組成物およびその研磨方法 |
JP2000063806A (ja) * | 1998-08-17 | 2000-02-29 | Okamoto Machine Tool Works Ltd | 研磨剤スラリ−およびその調製方法 |
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-
2001
- 2001-09-24 TW TW090123439A patent/TWI281493B/zh not_active IP Right Cessation
- 2001-09-25 MY MYPI20014476A patent/MY136599A/en unknown
- 2001-10-02 KR KR10-2003-7003566A patent/KR100539007B1/ko active IP Right Grant
- 2001-10-02 WO PCT/JP2001/008671 patent/WO2002031079A1/ja active IP Right Grant
- 2001-10-02 AT AT01972649T patent/ATE494345T1/de not_active IP Right Cessation
- 2001-10-02 DE DE60143812T patent/DE60143812D1/de not_active Expired - Lifetime
- 2001-10-02 CN CNB018169368A patent/CN1300277C/zh not_active Expired - Lifetime
- 2001-10-02 US US10/363,678 patent/US6824578B2/en not_active Expired - Lifetime
- 2001-10-02 JP JP2002534451A patent/JP3986960B2/ja not_active Expired - Fee Related
- 2001-10-02 EP EP01972649A patent/EP1338636B1/en not_active Expired - Lifetime
- 2001-10-02 AU AU2001292332A patent/AU2001292332A1/en not_active Abandoned
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101072269B1 (ko) * | 2004-03-30 | 2011-10-11 | 주식회사 동진쎄미켐 | 에쳔트를 포함하는 화학-기계적 연마 슬러리 조성물 |
KR101028622B1 (ko) * | 2005-10-19 | 2011-04-11 | 히다치 가세고교 가부시끼가이샤 | 산화세륨 슬러리, 산화세륨 연마액 및 이들을 이용한기판의 연마 방법 |
KR20120010968A (ko) * | 2010-07-26 | 2012-02-06 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 합성 석영 유리 기판용 연마제 및 이를 이용한 합성 석영 유리 기판의 제조 방법 |
US9493677B2 (en) | 2012-06-22 | 2016-11-15 | SK Hynix Inc. | Polishing composition, method for fabricating thereof and method of chemical mechanical polishing using the same |
Also Published As
Publication number | Publication date |
---|---|
ATE494345T1 (de) | 2011-01-15 |
DE60143812D1 (de) | 2011-02-17 |
MY136599A (en) | 2008-10-31 |
JPWO2002031079A1 (ja) | 2004-02-19 |
AU2001292332A1 (en) | 2002-04-22 |
WO2002031079A1 (fr) | 2002-04-18 |
EP1338636B1 (en) | 2011-01-05 |
JP3986960B2 (ja) | 2007-10-03 |
KR100539007B1 (ko) | 2005-12-26 |
TWI281493B (en) | 2007-05-21 |
EP1338636A4 (en) | 2007-08-29 |
CN1697869A (zh) | 2005-11-16 |
EP1338636A1 (en) | 2003-08-27 |
US6824578B2 (en) | 2004-11-30 |
CN1300277C (zh) | 2007-02-14 |
US20040010978A1 (en) | 2004-01-22 |
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