MY176620A - Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate - Google Patents

Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate

Info

Publication number
MY176620A
MY176620A MYPI2016702659A MYPI2016702659A MY176620A MY 176620 A MY176620 A MY 176620A MY PI2016702659 A MYPI2016702659 A MY PI2016702659A MY PI2016702659 A MYPI2016702659 A MY PI2016702659A MY 176620 A MY176620 A MY 176620A
Authority
MY
Malaysia
Prior art keywords
polishing slurry
glass substrate
used polishing
disk glass
manufacturing magnetic
Prior art date
Application number
MYPI2016702659A
Inventor
Kyosuke Iiizumi
Masanori Tamaki
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of MY176620A publication Critical patent/MY176620A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/12—Devices for exhausting mist of oil or coolant; Devices for collecting or recovering materials resulting from grinding or polishing, e.g. of precious metals, precious stones, diamonds or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Treatment Of Sludge (AREA)

Abstract

Provided is a method for regenerating a used polishing slurry according to which a solid portion generated by centrifuging a used polishing slurry can be sufficiently crushed, whereby it is possible to suppress the occurrence of blemishes on a glass substrate in the polishing processing. An aspect of the present invention is a method for regenerating a used polishing slurry containing polishing abrasive particles used in processing for polishing a glass substrate, and the method includes a step of forming a mixture by adding a saccharide to the used polishing slurry, a step of removing at least a portion of glass components included in the mixture by centrifuging the mixture, and a step of crushing a solid portion obtained by the centrifugation.
MYPI2016702659A 2014-01-31 2015-02-02 Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate MY176620A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014017105 2014-01-31

Publications (1)

Publication Number Publication Date
MY176620A true MY176620A (en) 2020-08-18

Family

ID=53757217

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2016702659A MY176620A (en) 2014-01-31 2015-02-02 Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate

Country Status (5)

Country Link
JP (1) JP6204506B2 (en)
CN (1) CN105939817B (en)
MY (1) MY176620A (en)
SG (1) SG11201606000VA (en)
WO (1) WO2015115652A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7053153B2 (en) * 2016-11-11 2022-04-12 ザ・キュレイターズ・オブ・ザ・ユニバーシティ・オブ・ミズーリ Nanodiamond salted ultrasonic deagglomeration
WO2020145121A1 (en) * 2019-01-10 2020-07-16 コニカミノルタ株式会社 Method for regenerating polishing agent, and polishing agent recycling treatment system

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001009723A (en) * 1999-07-02 2001-01-16 Kurita Water Ind Ltd Abrasive recovering device
JP2001192645A (en) * 2000-01-14 2001-07-17 Asahi Kasei Corp Composition for polishing for producing semiconductor device
US6652611B1 (en) * 2000-08-18 2003-11-25 J. M. Huber Corporation Method for making abrasive compositions and products thereof
TWI281493B (en) * 2000-10-06 2007-05-21 Mitsui Mining & Smelting Co Polishing material
DE60144346D1 (en) * 2001-05-29 2011-05-12 Memc Electronic Materials Process for the treatment of a spent glycol slurry
JP2004063858A (en) * 2002-07-30 2004-02-26 Renesas Technology Corp Method for manufacturing semiconductor device
JP2004306210A (en) * 2003-04-08 2004-11-04 Speedfam Co Ltd Processing method and processing equipment for reusing cerium oxide-based polishing agent and water, in drainage in glass polishing
ITRM20050329A1 (en) * 2005-06-24 2006-12-25 Guido Fragiacomo PROCEDURE FOR TREATING ABRASIVE SUSPENSIONS EXHAUSTED FOR THE RECOVERY OF THEIR RECYCLABLE COMPONENTS AND ITS PLANT.
JP2007098485A (en) * 2005-09-30 2007-04-19 Hoya Glass Disk Thailand Ltd Glass substrate for magnetic record medium and manufacturing method of magnetic disk
JP5335289B2 (en) * 2008-06-05 2013-11-06 花王株式会社 Collection method of inorganic powder
JP2011011307A (en) * 2009-07-03 2011-01-20 Sumco Corp Recycling method and recycling apparatus of slurry for use in wafer polishing
CN102585708A (en) * 2012-03-13 2012-07-18 上海华明高纳稀土新材料有限公司 Rare earth polishing material and preparation method thereof

Also Published As

Publication number Publication date
CN105939817B (en) 2018-04-10
JP6204506B2 (en) 2017-09-27
JPWO2015115652A1 (en) 2017-03-23
CN105939817A (en) 2016-09-14
SG11201606000VA (en) 2016-09-29
WO2015115652A1 (en) 2015-08-06

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