SG11201606000VA - Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate - Google Patents

Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate

Info

Publication number
SG11201606000VA
SG11201606000VA SG11201606000VA SG11201606000VA SG11201606000VA SG 11201606000V A SG11201606000V A SG 11201606000VA SG 11201606000V A SG11201606000V A SG 11201606000VA SG 11201606000V A SG11201606000V A SG 11201606000VA SG 11201606000V A SG11201606000V A SG 11201606000VA
Authority
SG
Singapore
Prior art keywords
glass substrate
polishing slurry
disk glass
manufacturing magnetic
used polishing
Prior art date
Application number
SG11201606000VA
Inventor
Kyosuke Iiizumi
Masanori Tamaki
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG11201606000VA publication Critical patent/SG11201606000VA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/12—Devices for exhausting mist of oil or coolant; Devices for collecting or recovering materials resulting from grinding or polishing, e.g. of precious metals, precious stones, diamonds or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Treatment Of Sludge (AREA)
SG11201606000VA 2014-01-31 2015-02-02 Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate SG11201606000VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014017105 2014-01-31
PCT/JP2015/052891 WO2015115652A1 (en) 2014-01-31 2015-02-02 Regenerating method for used polishing slurry and manufacturing method for magnetic disc glass substrate

Publications (1)

Publication Number Publication Date
SG11201606000VA true SG11201606000VA (en) 2016-09-29

Family

ID=53757217

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201606000VA SG11201606000VA (en) 2014-01-31 2015-02-02 Method for regenerating used polishing slurry, and method for manufacturing magnetic-disk glass substrate

Country Status (5)

Country Link
JP (1) JP6204506B2 (en)
CN (1) CN105939817B (en)
MY (1) MY176620A (en)
SG (1) SG11201606000VA (en)
WO (1) WO2015115652A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7053153B2 (en) * 2016-11-11 2022-04-12 ザ・キュレイターズ・オブ・ザ・ユニバーシティ・オブ・ミズーリ Nanodiamond salted ultrasonic deagglomeration
CN113365781B (en) * 2019-01-10 2023-07-18 柯尼卡美能达株式会社 Method for regenerating polishing agent and polishing agent recovery processing system

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001009723A (en) * 1999-07-02 2001-01-16 Kurita Water Ind Ltd Abrasive recovering device
JP2001192645A (en) * 2000-01-14 2001-07-17 Asahi Kasei Corp Composition for polishing for producing semiconductor device
US6652611B1 (en) * 2000-08-18 2003-11-25 J. M. Huber Corporation Method for making abrasive compositions and products thereof
TWI281493B (en) * 2000-10-06 2007-05-21 Mitsui Mining & Smelting Co Polishing material
US7223344B2 (en) * 2001-05-29 2007-05-29 Memc Electronic Materials, Spa Method for treating an exhausted glycol-based slurry
JP2004063858A (en) * 2002-07-30 2004-02-26 Renesas Technology Corp Method for manufacturing semiconductor device
JP2004306210A (en) * 2003-04-08 2004-11-04 Speedfam Co Ltd Processing method and processing equipment for reusing cerium oxide-based polishing agent and water, in drainage in glass polishing
ITRM20050329A1 (en) * 2005-06-24 2006-12-25 Guido Fragiacomo PROCEDURE FOR TREATING ABRASIVE SUSPENSIONS EXHAUSTED FOR THE RECOVERY OF THEIR RECYCLABLE COMPONENTS AND ITS PLANT.
JP2007098485A (en) * 2005-09-30 2007-04-19 Hoya Glass Disk Thailand Ltd Glass substrate for magnetic record medium and manufacturing method of magnetic disk
JP5335289B2 (en) * 2008-06-05 2013-11-06 花王株式会社 Collection method of inorganic powder
JP2011011307A (en) * 2009-07-03 2011-01-20 Sumco Corp Recycling method and recycling apparatus of slurry for use in wafer polishing
CN102585708A (en) * 2012-03-13 2012-07-18 上海华明高纳稀土新材料有限公司 Rare earth polishing material and preparation method thereof

Also Published As

Publication number Publication date
MY176620A (en) 2020-08-18
JPWO2015115652A1 (en) 2017-03-23
WO2015115652A1 (en) 2015-08-06
CN105939817B (en) 2018-04-10
JP6204506B2 (en) 2017-09-27
CN105939817A (en) 2016-09-14

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