SG11202001636RA - Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk - Google Patents

Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk

Info

Publication number
SG11202001636RA
SG11202001636RA SG11202001636RA SG11202001636RA SG11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA
Authority
SG
Singapore
Prior art keywords
manufacturing
glass substrate
magnetic disk
polishing liquid
manufacturing glass
Prior art date
Application number
SG11202001636RA
Inventor
Toshio Takizawa
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG11202001636RA publication Critical patent/SG11202001636RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
    • B24B7/245—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass discontinuous
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/02—Lapping machines or devices; Accessories designed for working surfaces of revolution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/241—Methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
SG11202001636RA 2017-10-31 2018-10-31 Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk SG11202001636RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017210817 2017-10-31
PCT/JP2018/040610 WO2019088209A1 (en) 2017-10-31 2018-10-31 Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk

Publications (1)

Publication Number Publication Date
SG11202001636RA true SG11202001636RA (en) 2020-03-30

Family

ID=66331926

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202001636RA SG11202001636RA (en) 2017-10-31 2018-10-31 Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk

Country Status (5)

Country Link
US (3) US11214713B2 (en)
JP (3) JP6692006B2 (en)
CN (2) CN111094502B (en)
SG (1) SG11202001636RA (en)
WO (1) WO2019088209A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11202001636RA (en) * 2017-10-31 2020-03-30 Hoya Corp Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk
CN112266729A (en) * 2020-11-17 2021-01-26 云南光电辅料有限公司 Polishing solution for ultralow-dispersion glass lens and preparation method thereof

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4885352B2 (en) 2000-12-12 2012-02-29 昭和電工株式会社 Abrasive slurry and fine abrasive
JP4807905B2 (en) 2001-04-05 2011-11-02 昭和電工株式会社 Abrasive slurry and fine abrasive
JP2002371267A (en) 2001-06-15 2002-12-26 Mitsui Mining & Smelting Co Ltd Method for manufacturing cerium-containing abrasive particle and cerium-containing abrasive particle
JP5256832B2 (en) 2007-04-17 2013-08-07 日立化成株式会社 Abrasive and production method thereof
SG172309A1 (en) * 2008-12-22 2011-07-28 Kao Corp Polishing liquid composition for magnetic-disk substrate
CN101486879A (en) 2009-02-20 2009-07-22 包头迅博新材料有限公司 Rare earth fine polished material and process for manufacturing the same
JP2011110637A (en) * 2009-11-25 2011-06-09 Asahi Glass Co Ltd Method for manufacturing glass substrate for magnetic disk
CN102079950A (en) 2009-11-27 2011-06-01 东莞市卓越研磨材料有限公司 Preparation method of monodisperse rare earth polishing powder
PL2534113T3 (en) * 2010-02-10 2018-05-30 Saint-Gobain Ceramics & Plastics Inc. Ceramic particles and methods for making the same
JP5736681B2 (en) 2010-07-15 2015-06-17 旭硝子株式会社 Polishing liquid and method for producing glass substrate for magnetic disk
US8938990B2 (en) * 2010-09-30 2015-01-27 Hoya Corporation Method for producing glass substrate for information storage medium, and information storage medium
US8421536B2 (en) * 2011-09-21 2013-04-16 Analog Devices, Inc. Apparatus and methods for electronic amplification
JPWO2013069720A1 (en) * 2011-11-09 2015-04-02 Ｄｏｗａエコシステム株式会社 Abrasive recycling method
JPWO2013146090A1 (en) * 2012-03-30 2015-12-10 Hoya株式会社 Manufacturing method of glass substrate for magnetic disk
CN104603878B (en) 2012-08-29 2016-10-12 Hoya株式会社 Glass substrate for disc, disk
US20160239913A1 (en) 2013-08-13 2016-08-18 Cfph, Llc Foreign exchange trading
SG11201609794RA (en) 2014-06-30 2016-12-29 Hoya Corp Method for manufacturing magnetic-disk glass substrate
TWI654288B (en) 2015-01-12 2019-03-21 美商慧盛材料美國責任有限公司 Composite honing grain for chemical mechanical planarization composition and method of use thereof
CN106479371A (en) * 2016-08-15 2017-03-08 惠州市米特仑科技有限公司 A kind of high precision composite polishing liquid and preparation method thereof
SG11202001636RA (en) * 2017-10-31 2020-03-30 Hoya Corp Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk

Also Published As

Publication number Publication date
US20230287244A1 (en) 2023-09-14
CN111094502A (en) 2020-05-01
JPWO2019088209A1 (en) 2020-06-11
JP7201639B2 (en) 2023-01-10
JP6692006B2 (en) 2020-05-13
US20220119680A1 (en) 2022-04-21
JP2020128539A (en) 2020-08-27
US20200208015A1 (en) 2020-07-02
JP2023052035A (en) 2023-04-11
US11214713B2 (en) 2022-01-04
CN113913156B (en) 2022-06-24
WO2019088209A1 (en) 2019-05-09
US11680187B2 (en) 2023-06-20
CN113913156A (en) 2022-01-11
CN111094502B (en) 2021-11-16

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