KR102195240B1 - 기판 검사 장치 및 기판 검사 방법 - Google Patents

기판 검사 장치 및 기판 검사 방법 Download PDF

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Publication number
KR102195240B1
KR102195240B1 KR1020180136170A KR20180136170A KR102195240B1 KR 102195240 B1 KR102195240 B1 KR 102195240B1 KR 1020180136170 A KR1020180136170 A KR 1020180136170A KR 20180136170 A KR20180136170 A KR 20180136170A KR 102195240 B1 KR102195240 B1 KR 102195240B1
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KR
South Korea
Prior art keywords
coating film
light
substrate
reflectance
laser light
Prior art date
Application number
KR1020180136170A
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English (en)
Korean (ko)
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KR20190062190A (ko
Inventor
홍영주
홍덕화
김민규
최정훈
Original Assignee
주식회사 고영테크놀러지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 주식회사 고영테크놀러지 filed Critical 주식회사 고영테크놀러지
Priority to EP18208784.1A priority Critical patent/EP3489620B1/en
Priority to CN201821975696.XU priority patent/CN209399934U/zh
Priority to CN201811434729.4A priority patent/CN109974599B/zh
Priority to JP2018222331A priority patent/JP6732858B6/ja
Priority to US16/202,543 priority patent/US10852125B2/en
Publication of KR20190062190A publication Critical patent/KR20190062190A/ko
Application granted granted Critical
Publication of KR102195240B1 publication Critical patent/KR102195240B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0658—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of emissivity or reradiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
KR1020180136170A 2017-11-28 2018-11-07 기판 검사 장치 및 기판 검사 방법 KR102195240B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP18208784.1A EP3489620B1 (en) 2017-11-28 2018-11-28 Apparatus for inspecting substrate and method thereof
CN201821975696.XU CN209399934U (zh) 2017-11-28 2018-11-28 基板检查装置
CN201811434729.4A CN109974599B (zh) 2017-11-28 2018-11-28 基板检查装置及基板检查方法
JP2018222331A JP6732858B6 (ja) 2017-11-28 2018-11-28 基板検査装置及び基板検査方法
US16/202,543 US10852125B2 (en) 2017-11-28 2018-11-28 Apparatus for inspecting film on substrate by using optical interference and method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20170160680 2017-11-28
KR1020170160680 2017-11-28

Publications (2)

Publication Number Publication Date
KR20190062190A KR20190062190A (ko) 2019-06-05
KR102195240B1 true KR102195240B1 (ko) 2020-12-24

Family

ID=66844650

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020180136170A KR102195240B1 (ko) 2017-11-28 2018-11-07 기판 검사 장치 및 기판 검사 방법
KR1020180136165A KR102138622B1 (ko) 2017-11-28 2018-11-07 기판 검사 장치 및 기판 검사 방법
KR1020200090258A KR102275556B1 (ko) 2017-11-28 2020-07-21 기판 검사 장치 및 기판 검사 방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020180136165A KR102138622B1 (ko) 2017-11-28 2018-11-07 기판 검사 장치 및 기판 검사 방법
KR1020200090258A KR102275556B1 (ko) 2017-11-28 2020-07-21 기판 검사 장치 및 기판 검사 방법

Country Status (3)

Country Link
JP (3) JP6732858B6 (ja)
KR (3) KR102195240B1 (ja)
CN (5) CN109974599B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102195240B1 (ko) * 2017-11-28 2020-12-24 주식회사 고영테크놀러지 기판 검사 장치 및 기판 검사 방법
US10859371B2 (en) 2017-11-28 2020-12-08 Koh Young Technology Inc. Apparatus for inspecting substrate and method thereof
US10852125B2 (en) 2017-11-28 2020-12-01 Koh Young Technology Inc. Apparatus for inspecting film on substrate by using optical interference and method thereof
KR102204449B1 (ko) * 2019-10-23 2021-01-18 주식회사 유니아이 광간섭 방식을 이용한 컨포말 코팅 두께 측정 장치
KR102320506B1 (ko) * 2020-07-22 2021-11-03 이화다이아몬드공업 주식회사 데미지층의 깊이 및 데미지층 내의 결함의 농도를 측정하는 방법 및 상기 방법을 수행하는 시스템
WO2022102010A1 (ja) * 2020-11-11 2022-05-19 日本電信電話株式会社 膜厚測定装置および方法
WO2023058784A1 (ko) * 2021-10-05 2023-04-13 이화다이아몬드공업 주식회사 데미지층의 깊이 및 데미지층 내의 결함의 농도를 측정하는 방법 및 상기 방법을 수행하는 시스템
CN114440808A (zh) * 2022-02-24 2022-05-06 广东奥迪威传感科技股份有限公司 超声波测厚方法及装置
WO2024194924A1 (ja) * 2023-03-17 2024-09-26 ヤマハ発動機株式会社 検査装置および検査方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007198771A (ja) * 2006-01-24 2007-08-09 Ricoh Co Ltd 膜厚測定方法及び膜厚測定装置
JP2013205253A (ja) * 2012-03-28 2013-10-07 Chiba Univ 膜厚測定方法および膜厚測定装置
JP2014100230A (ja) * 2012-11-19 2014-06-05 Topcon Corp 光画像計測装置
WO2014192734A1 (ja) * 2013-05-30 2014-12-04 新日鐵住金株式会社 膜厚測定方法、膜厚測定装置及び記録媒体

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3322962A (en) * 1963-10-01 1967-05-30 Kalle Ag Method and apparatus for continuously measuring applied coatings employing photoelectric means
JPS6211106A (ja) * 1985-03-01 1987-01-20 Agency Of Ind Science & Technol 干渉法膜厚測定装置
JPS61212705A (ja) * 1985-03-18 1986-09-20 Fujitsu Ltd 磁気デイスク媒体の膜厚測定方法
JPS649449A (en) * 1987-07-01 1989-01-12 Hitachi Ltd Method and device for measuring photoresist characteristic
EP0396010A3 (en) * 1989-05-05 1991-03-27 Applied Materials, Inc. Method and apparatus for monitoring growth and etch rates of materials
JPH03252512A (ja) * 1990-03-01 1991-11-11 Sumitomo Light Metal Ind Ltd 油膜または塗膜のオンライン測定法およびその装置
NZ244186A (en) * 1991-09-06 1995-04-27 Commw Scient Ind Res Org Determination of parameters of object optically and validation of object
DE4342904C1 (de) * 1993-03-02 1995-04-27 Duma Masch Anlagenbau Abblasvorrichtung
FR2716531B1 (fr) * 1994-02-18 1996-05-03 Saint Gobain Cinematique Contr Procédé de mesure d'épaisseur d'un matériau transparent.
JP2917861B2 (ja) * 1995-05-15 1999-07-12 ブリヂストンスポーツ株式会社 ゴルフボール塗膜の膜厚測定方法及び装置
US6507747B1 (en) 1998-12-02 2003-01-14 Board Of Regents, The University Of Texas System Method and apparatus for concomitant structural and biochemical characterization of tissue
KR100437024B1 (ko) * 2001-10-18 2004-06-23 엘지전자 주식회사 박막 검사 방법 및 그 장치
JP4955240B2 (ja) * 2005-09-02 2012-06-20 パナソニック株式会社 膜測定装置およびそれを用いる塗工装置
US20080062429A1 (en) 2006-09-12 2008-03-13 Rongguang Liang Low coherence dental oct imaging
JP5276875B2 (ja) * 2008-03-31 2013-08-28 富士フイルム株式会社 フィルム欠陥検査方法及び装置
CN101358879A (zh) * 2008-08-27 2009-02-04 中国科学院光电技术研究所 傅立叶域光学相干层析技术中可变插值间隔的插值方法
JP5525739B2 (ja) * 2008-09-16 2014-06-18 株式会社ニューフレアテクノロジー パターン検査装置及びパターン検査方法
US7708408B1 (en) * 2008-10-10 2010-05-04 Amo Development Llc. Single-arm optical coherence tomography pachymetry system and method
DE102010064593A1 (de) * 2009-05-21 2015-07-30 Koh Young Technology Inc. Formmessgerät und -verfahren
JP2010281580A (ja) * 2009-06-02 2010-12-16 Rexxam Co Ltd 基板検査装置、照射装置、及び基板検査方法
DE102011051146B3 (de) * 2011-06-17 2012-10-04 Precitec Optronik Gmbh Prüfverfahren zum Prüfen einer Verbindungsschicht zwischen waferförmigen Proben
JP2013205252A (ja) * 2012-03-28 2013-10-07 Chiba Univ 膜厚測定方法、測定装置、膜厚変化測定方法および測定装置
EP2702935A1 (de) 2012-08-29 2014-03-05 Agfa HealthCare N.V. System und Verfahren zur optischen Kohärenztomographie sowie Positionierelement
JP2014192734A (ja) 2013-03-27 2014-10-06 Panasonic Corp 基地局装置およびデータ送信方法
KR101486271B1 (ko) 2013-05-13 2015-01-27 한국표준과학연구원 삼차원 박막 두께 형상 측정 방법
US9581433B2 (en) * 2013-12-11 2017-02-28 Honeywell Asca Inc. Caliper sensor and method using mid-infrared interferometry
JP6378776B2 (ja) * 2014-10-27 2018-08-22 富士フイルム株式会社 光侵入深さ評価方法、その評価方法を用いた性能検査方法および光断層画像撮像装置
KR20160082076A (ko) * 2014-12-30 2016-07-08 한양대학교 산학협력단 간섭계 기반 단층영상 및 표면형상 동시 획득 장치
JP2016188801A (ja) * 2015-03-30 2016-11-04 東京エレクトロン株式会社 膜厚測定装置および膜厚測定方法
KR20170085279A (ko) 2016-01-14 2017-07-24 주식회사 임펙 엔터프라이즈 전자부품이 실장된 인쇄회로기판의 코팅 검사장치 및 검사방법
KR20160136255A (ko) * 2016-11-09 2016-11-29 (주)우리테크 Pcb 기판의 컨포멀 코팅 두께 및 코팅 영역 검사방법 및 시스템
KR102195240B1 (ko) * 2017-11-28 2020-12-24 주식회사 고영테크놀러지 기판 검사 장치 및 기판 검사 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007198771A (ja) * 2006-01-24 2007-08-09 Ricoh Co Ltd 膜厚測定方法及び膜厚測定装置
JP2013205253A (ja) * 2012-03-28 2013-10-07 Chiba Univ 膜厚測定方法および膜厚測定装置
JP2014100230A (ja) * 2012-11-19 2014-06-05 Topcon Corp 光画像計測装置
WO2014192734A1 (ja) * 2013-05-30 2014-12-04 新日鐵住金株式会社 膜厚測定方法、膜厚測定装置及び記録媒体

Also Published As

Publication number Publication date
KR20200092905A (ko) 2020-08-04
CN109974598B (zh) 2021-05-28
JP2019101038A (ja) 2019-06-24
JP6732858B2 (ja) 2020-07-29
KR102138622B1 (ko) 2020-07-28
CN209399934U (zh) 2019-09-17
CN113324487A (zh) 2021-08-31
JP2019101037A (ja) 2019-06-24
CN113324487B (zh) 2023-08-25
CN109974598A (zh) 2019-07-05
KR20190062190A (ko) 2019-06-05
KR102275556B1 (ko) 2021-07-09
CN109974599B (zh) 2021-03-16
KR20190062189A (ko) 2019-06-05
JP6734352B6 (ja) 2020-09-02
JP2020173269A (ja) 2020-10-22
CN209399935U (zh) 2019-09-17
JP6955305B2 (ja) 2021-10-27
CN109974599A (zh) 2019-07-05
JP6732858B6 (ja) 2020-08-26
JP6734352B2 (ja) 2020-08-05

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