KR101927037B1 - 수지 조성물, 감광성 수지 조성물, 수지막 및 전자 장치 - Google Patents

수지 조성물, 감광성 수지 조성물, 수지막 및 전자 장치 Download PDF

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KR101927037B1
KR101927037B1 KR1020187007447A KR20187007447A KR101927037B1 KR 101927037 B1 KR101927037 B1 KR 101927037B1 KR 1020187007447 A KR1020187007447 A KR 1020187007447A KR 20187007447 A KR20187007447 A KR 20187007447A KR 101927037 B1 KR101927037 B1 KR 101927037B1
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formula
group
resin composition
resin
polymer
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KR20180031804A (ko
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고헤이 아나다
오사무 오니시
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스미또모 베이크라이트 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • C08G81/02—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/08—Copolymers of styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/14—Modified phenol-aldehyde condensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
KR1020187007447A 2015-08-21 2016-07-21 수지 조성물, 감광성 수지 조성물, 수지막 및 전자 장치 Active KR101927037B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015163438 2015-08-21
JPJP-P-2015-163438 2015-08-21
PCT/JP2016/071401 WO2017033633A1 (ja) 2015-08-21 2016-07-21 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置

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KR20180031804A KR20180031804A (ko) 2018-03-28
KR101927037B1 true KR101927037B1 (ko) 2018-12-07

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JP (3) JP6354802B2 (enExample)
KR (1) KR101927037B1 (enExample)
CN (1) CN107922708A (enExample)
TW (1) TWI694098B (enExample)
WO (1) WO2017033633A1 (enExample)

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JP6338034B1 (ja) * 2016-09-28 2018-06-06 住友ベークライト株式会社 摩擦材用フェノール樹脂組成物および摩擦材
JP7088640B2 (ja) * 2017-08-01 2022-06-21 旭化成株式会社 半導体装置、及びその製造方法
JP7043756B2 (ja) * 2017-08-31 2022-03-30 住友ベークライト株式会社 感光性樹脂組成物、パターン形成方法、電子デバイスの製造方法、ポリマーおよびポリマーの製造方法
JP7020018B2 (ja) * 2017-09-15 2022-02-16 住友ベークライト株式会社 ゴム組成物
JP6764885B2 (ja) * 2018-01-11 2020-10-07 Ｊｆｅケミカル株式会社 熱硬化性樹脂組成物およびその硬化物
JP6950573B2 (ja) * 2018-02-26 2021-10-13 Jnc株式会社 熱硬化性組成物
JP6777275B1 (ja) * 2019-05-08 2020-10-28 住友ベークライト株式会社 感光性樹脂組成物、樹脂膜および電子装置
CN110511532B (zh) * 2019-09-25 2022-03-25 河南工业大学 一种马来酸酐-丙烯酸酯共聚物改性酚醛树脂
JP7559421B2 (ja) * 2020-03-02 2024-10-02 住友ベークライト株式会社 カラーフィルタまたはブラックマトリクス形成用ポリマー溶液
CN116194501A (zh) * 2020-09-23 2023-05-30 住友电木株式会社 聚合物、聚合物溶液和感光性树脂组合物

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JP2002155615A (ja) 2000-09-14 2002-05-31 Premark Rwp Holdings Inc 複数パネルフロア装置のシールを備えたコネクタ
JP2005105209A (ja) 2003-10-01 2005-04-21 Yokohama Rubber Co Ltd:The 高減衰エラストマー組成物

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JP3944966B2 (ja) * 1996-09-30 2007-07-18 日本ゼオン株式会社 変性ノルボルネン系重合体及びその製造方法
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US6534235B1 (en) * 2000-10-31 2003-03-18 Kansai Research Institute, Inc. Photosensitive resin composition and process for forming pattern
CN1500119A (zh) * 2001-02-26 2004-05-26 音思万有限公司 正向光界定多聚羧酸酚醛和热固化树脂组合物
CN1717630A (zh) * 2003-06-30 2006-01-04 株式会社新克 正型感光性组合物
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JP6065750B2 (ja) * 2013-05-29 2017-01-25 住友ベークライト株式会社 感光性樹脂組成物および電子装置
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JP2000122278A (ja) * 1998-10-21 2000-04-28 Okamoto Kagaku Kogyo Kk 感光性組成物および感光性平版印刷版
JP2002155615A (ja) 2000-09-14 2002-05-31 Premark Rwp Holdings Inc 複数パネルフロア装置のシールを備えたコネクタ
JP2005105209A (ja) 2003-10-01 2005-04-21 Yokohama Rubber Co Ltd:The 高減衰エラストマー組成物

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JP6468393B2 (ja) 2019-02-13
KR20180031804A (ko) 2018-03-28
WO2017033633A1 (ja) 2017-03-02
JP2018172700A (ja) 2018-11-08
CN107922708A (zh) 2018-04-17
JP2018109196A (ja) 2018-07-12
JP2017039909A (ja) 2017-02-23
TW201718719A (zh) 2017-06-01
JP6354802B2 (ja) 2018-07-11
TWI694098B (zh) 2020-05-21
JP6414352B2 (ja) 2018-10-31

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