KR101856231B1 - 나노패턴을 구비한 투명기판 및 그 제조방법 - Google Patents

나노패턴을 구비한 투명기판 및 그 제조방법 Download PDF

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Publication number
KR101856231B1
KR101856231B1 KR1020110137217A KR20110137217A KR101856231B1 KR 101856231 B1 KR101856231 B1 KR 101856231B1 KR 1020110137217 A KR1020110137217 A KR 1020110137217A KR 20110137217 A KR20110137217 A KR 20110137217A KR 101856231 B1 KR101856231 B1 KR 101856231B1
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South Korea
Prior art keywords
pattern
mold
transparent substrate
width
pattern region
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KR1020110137217A
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English (en)
Korean (ko)
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KR20130070076A (ko
Inventor
이준
유경종
이영재
김진수
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엘지이노텍 주식회사
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Priority to KR1020110137217A priority Critical patent/KR101856231B1/ko
Application filed by 엘지이노텍 주식회사 filed Critical 엘지이노텍 주식회사
Priority to US14/358,701 priority patent/US9536819B2/en
Priority to JP2014547095A priority patent/JP6257522B2/ja
Priority to PCT/KR2012/010739 priority patent/WO2013094918A1/en
Priority to EP12860252.1A priority patent/EP2795666B1/en
Priority to CN201280021740.2A priority patent/CN103503114B/zh
Priority to TW101148093A priority patent/TW201340172A/zh
Publication of KR20130070076A publication Critical patent/KR20130070076A/ko
Priority to US14/506,406 priority patent/US20150022742A1/en
Application granted granted Critical
Publication of KR101856231B1 publication Critical patent/KR101856231B1/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69—Insulating materials thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/036—Multilayers with layers of different types
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Human Computer Interaction (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Laminated Bodies (AREA)
  • Nonlinear Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Position Input By Displaying (AREA)
KR1020110137217A 2011-12-19 2011-12-19 나노패턴을 구비한 투명기판 및 그 제조방법 Active KR101856231B1 (ko)

Priority Applications (8)

Application Number Priority Date Filing Date Title
KR1020110137217A KR101856231B1 (ko) 2011-12-19 2011-12-19 나노패턴을 구비한 투명기판 및 그 제조방법
JP2014547095A JP6257522B2 (ja) 2011-12-19 2012-12-11 導電性および光透過性層及びその製造方法
PCT/KR2012/010739 WO2013094918A1 (en) 2011-12-19 2012-12-11 Transparent substrate having nano pattern and method of manufacturing the same
EP12860252.1A EP2795666B1 (en) 2011-12-19 2012-12-11 Transparent substrate having nano pattern and method of manufacturing the same
US14/358,701 US9536819B2 (en) 2011-12-19 2012-12-11 Transparent substrate having nano pattern and method of manufacturing the same
CN201280021740.2A CN103503114B (zh) 2011-12-19 2012-12-11 具有纳米图案的透明衬底及其制造方法
TW101148093A TW201340172A (zh) 2011-12-19 2012-12-18 具有奈米圖案的透明基板及其製造方法
US14/506,406 US20150022742A1 (en) 2011-12-19 2014-10-03 Pattern substrate and touch panel using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110137217A KR101856231B1 (ko) 2011-12-19 2011-12-19 나노패턴을 구비한 투명기판 및 그 제조방법

Publications (2)

Publication Number Publication Date
KR20130070076A KR20130070076A (ko) 2013-06-27
KR101856231B1 true KR101856231B1 (ko) 2018-05-10

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KR1020110137217A Active KR101856231B1 (ko) 2011-12-19 2011-12-19 나노패턴을 구비한 투명기판 및 그 제조방법

Country Status (7)

Country Link
US (2) US9536819B2 (enExample)
EP (1) EP2795666B1 (enExample)
JP (1) JP6257522B2 (enExample)
KR (1) KR101856231B1 (enExample)
CN (1) CN103503114B (enExample)
TW (1) TW201340172A (enExample)
WO (1) WO2013094918A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101856231B1 (ko) * 2011-12-19 2018-05-10 엘지이노텍 주식회사 나노패턴을 구비한 투명기판 및 그 제조방법
WO2017126673A1 (ja) * 2016-01-22 2017-07-27 Ｓｃｉｖａｘ株式会社 機能構造体
JP6958237B2 (ja) * 2017-10-30 2021-11-02 セイコーエプソン株式会社 エンコーダースケール、エンコーダースケールの製造方法、エンコーダー、ロボット、電子部品搬送装置、プリンターおよびプロジェクター

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JP2003198186A (ja) * 2001-12-25 2003-07-11 Dainippon Printing Co Ltd 電磁波遮蔽シートの製造方法および電磁波遮蔽シート

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WO2002093534A1 (fr) 2001-05-16 2002-11-21 Bridgestone Corporation Fenetre assurant la transmission de la lumiere et une protection contre les ondes electromagnetiques
JP4323219B2 (ja) 2002-05-31 2009-09-02 三星モバイルディスプレイ株式會社 面光源装置とこれを利用した液晶表示素子組立体
JP4262944B2 (ja) 2002-08-08 2009-05-13 アルプス電気株式会社 照明装置および液晶表示装置
US7113249B2 (en) 2003-01-06 2006-09-26 Dai Nippon Printing Co., Ltd. Monochrome liquid crystal display having higher spaces in pixel area than in peripheral area and production method therefor
US20080117509A1 (en) 2004-06-30 2008-05-22 Zeon Corporation Electromagnetic Wave Shielding Grid Polarizer and Its Manufacturing Method and Grid Polarizer Manufacturing Method
JP4396459B2 (ja) * 2004-09-08 2010-01-13 日本ゼオン株式会社 電磁波遮蔽性グリッド偏光子及びその製造方法
JP2007128091A (ja) * 2005-11-03 2007-05-24 Samsung Electronics Co Ltd 表示基板及びその製造方法並びにそれを具備した表示パネル
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JP4336996B2 (ja) 2006-10-03 2009-09-30 セイコーエプソン株式会社 めっき基板の製造方法
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JP2003198186A (ja) * 2001-12-25 2003-07-11 Dainippon Printing Co Ltd 電磁波遮蔽シートの製造方法および電磁波遮蔽シート

Also Published As

Publication number Publication date
JP6257522B2 (ja) 2018-01-10
US9536819B2 (en) 2017-01-03
CN103503114A (zh) 2014-01-08
EP2795666A4 (en) 2015-07-29
WO2013094918A1 (en) 2013-06-27
TW201340172A (zh) 2013-10-01
EP2795666A1 (en) 2014-10-29
US20150022742A1 (en) 2015-01-22
CN103503114B (zh) 2017-05-03
EP2795666B1 (en) 2019-06-12
US20140272316A1 (en) 2014-09-18
JP2015503244A (ja) 2015-01-29
KR20130070076A (ko) 2013-06-27

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