JP6257522B2 - 導電性および光透過性層及びその製造方法 - Google Patents

導電性および光透過性層及びその製造方法 Download PDF

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Publication number
JP6257522B2
JP6257522B2 JP2014547095A JP2014547095A JP6257522B2 JP 6257522 B2 JP6257522 B2 JP 6257522B2 JP 2014547095 A JP2014547095 A JP 2014547095A JP 2014547095 A JP2014547095 A JP 2014547095A JP 6257522 B2 JP6257522 B2 JP 6257522B2
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Japan
Prior art keywords
pattern
pattern region
transparent substrate
mold
region
Prior art date
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Expired - Fee Related
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JP2014547095A
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English (en)
Japanese (ja)
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JP2015503244A5 (enExample
JP2015503244A (ja
Inventor
チュン リ
チュン リ
キョン チョン ユ
キョン チョン ユ
ヨン ジェ リ
ヨン ジェ リ
ジン ス キム
ジン ス キム
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LG Innotek Co Ltd
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LG Innotek Co Ltd
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Publication of JP2015503244A publication Critical patent/JP2015503244A/ja
Publication of JP2015503244A5 publication Critical patent/JP2015503244A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69—Insulating materials thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/036—Multilayers with layers of different types
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Human Computer Interaction (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Laminated Bodies (AREA)
  • Nonlinear Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Position Input By Displaying (AREA)
JP2014547095A 2011-12-19 2012-12-11 導電性および光透過性層及びその製造方法 Expired - Fee Related JP6257522B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2011-0137217 2011-12-19
KR1020110137217A KR101856231B1 (ko) 2011-12-19 2011-12-19 나노패턴을 구비한 투명기판 및 그 제조방법
PCT/KR2012/010739 WO2013094918A1 (en) 2011-12-19 2012-12-11 Transparent substrate having nano pattern and method of manufacturing the same

Publications (3)

Publication Number Publication Date
JP2015503244A JP2015503244A (ja) 2015-01-29
JP2015503244A5 JP2015503244A5 (enExample) 2016-02-12
JP6257522B2 true JP6257522B2 (ja) 2018-01-10

Family

ID=48668752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014547095A Expired - Fee Related JP6257522B2 (ja) 2011-12-19 2012-12-11 導電性および光透過性層及びその製造方法

Country Status (7)

Country Link
US (2) US9536819B2 (enExample)
EP (1) EP2795666B1 (enExample)
JP (1) JP6257522B2 (enExample)
KR (1) KR101856231B1 (enExample)
CN (1) CN103503114B (enExample)
TW (1) TW201340172A (enExample)
WO (1) WO2013094918A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101856231B1 (ko) * 2011-12-19 2018-05-10 엘지이노텍 주식회사 나노패턴을 구비한 투명기판 및 그 제조방법
WO2017126673A1 (ja) * 2016-01-22 2017-07-27 Ｓｃｉｖａｘ株式会社 機能構造体
JP6958237B2 (ja) * 2017-10-30 2021-11-02 セイコーエプソン株式会社 エンコーダースケール、エンコーダースケールの製造方法、エンコーダー、ロボット、電子部品搬送装置、プリンターおよびプロジェクター

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WO2002093534A1 (fr) 2001-05-16 2002-11-21 Bridgestone Corporation Fenetre assurant la transmission de la lumiere et une protection contre les ondes electromagnetiques
JP2002341781A (ja) * 2001-05-16 2002-11-29 Bridgestone Corp 表示パネル
JP2003198186A (ja) * 2001-12-25 2003-07-11 Dainippon Printing Co Ltd 電磁波遮蔽シートの製造方法および電磁波遮蔽シート
JP4323219B2 (ja) 2002-05-31 2009-09-02 三星モバイルディスプレイ株式會社 面光源装置とこれを利用した液晶表示素子組立体
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US7737392B2 (en) * 2006-11-09 2010-06-15 The Board Of Trustees Of The University Of Illinois Photonic crystal sensors with integrated fluid containment structure, sample handling devices incorporating same, and uses thereof for biomolecular interaction analysis
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Also Published As

Publication number Publication date
KR101856231B1 (ko) 2018-05-10
US9536819B2 (en) 2017-01-03
CN103503114A (zh) 2014-01-08
EP2795666A4 (en) 2015-07-29
WO2013094918A1 (en) 2013-06-27
TW201340172A (zh) 2013-10-01
EP2795666A1 (en) 2014-10-29
US20150022742A1 (en) 2015-01-22
CN103503114B (zh) 2017-05-03
EP2795666B1 (en) 2019-06-12
US20140272316A1 (en) 2014-09-18
JP2015503244A (ja) 2015-01-29
KR20130070076A (ko) 2013-06-27

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