KR101818272B1 - 시클로헥사실란 화합물의 제조 방법 - Google Patents

시클로헥사실란 화합물의 제조 방법 Download PDF

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Publication number
KR101818272B1
KR101818272B1 KR1020127021848A KR20127021848A KR101818272B1 KR 101818272 B1 KR101818272 B1 KR 101818272B1 KR 1020127021848 A KR1020127021848 A KR 1020127021848A KR 20127021848 A KR20127021848 A KR 20127021848A KR 101818272 B1 KR101818272 B1 KR 101818272B1
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tertiary
trichlorosilane
reagent composition
divalent anion
reagent
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KR20130010111A (ko
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아루무가사미 에란고반
케네스 앤더슨
필립 알 바우드조크
더글라스 엘 슐츠
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엔디에스유 리서치 파운데이션
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/025—Silicon compounds without C-silicon linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/54—Quaternary phosphonium compounds
    • C07F9/5442—Aromatic phosphonium compounds (P-C aromatic linkage)

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
KR1020127021848A 2010-01-28 2011-01-25 시클로헥사실란 화합물의 제조 방법 Expired - Fee Related KR101818272B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US29928710P 2010-01-28 2010-01-28
US61/299,287 2010-01-28
US31111810P 2010-03-05 2010-03-05
US61/311,118 2010-03-05
PCT/US2011/022360 WO2011094191A1 (en) 2010-01-28 2011-01-25 Method of producing cyclohexasilane compounds

Publications (2)

Publication Number Publication Date
KR20130010111A KR20130010111A (ko) 2013-01-25
KR101818272B1 true KR101818272B1 (ko) 2018-02-21

Family

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Family Applications (1)

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KR1020127021848A Expired - Fee Related KR101818272B1 (ko) 2010-01-28 2011-01-25 시클로헥사실란 화합물의 제조 방법

Country Status (6)

Country Link
US (1) US8975429B2 (enExample)
EP (1) EP2528864B1 (enExample)
JP (1) JP5697692B2 (enExample)
KR (1) KR101818272B1 (enExample)
CN (1) CN102762497B (enExample)
WO (1) WO2011094191A1 (enExample)

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EP2528864B1 (en) 2010-01-28 2017-03-29 Ndsu Research Foundation Method of producing cyclohexasilane compounds
DE102010040231A1 (de) * 2010-09-03 2012-03-08 Evonik Degussa Gmbh p-Dotierte Siliciumschichten
JP5808646B2 (ja) * 2011-10-31 2015-11-10 株式会社日本触媒 環状シラン中間体の製造方法および環状水素化シランもしくは環状有機シランの製造方法
JP6014392B2 (ja) * 2012-07-04 2016-10-25 株式会社日本触媒 シクロヘキサシラン類の製造方法
JP5902572B2 (ja) * 2012-07-04 2016-04-13 株式会社日本触媒 ケイ素−ハロゲン結合を有するハロゲン化環状シラン化合物またはその塩の製造方法
JP6063310B2 (ja) * 2013-03-18 2017-01-18 株式会社日本触媒 環状シランの製造方法
US11091649B2 (en) 2013-09-05 2021-08-17 Jiangsu Nata Opto-Electronic Materials Co. Ltd. 2,2,4,4-tetrasilylpentasilane and its compositions, methods and uses
TWI634073B (zh) 2013-09-05 2018-09-01 道康寧公司 2,2,4,4-四矽基五矽烷及其組成物、方法及用途
DE102013021306A1 (de) 2013-12-19 2015-06-25 Johann Wolfgang Goethe-Universität Verfahren zum Herstellen von linearen, cyclischen und/oder käfigartigen perhalogenierten Oligo- und Polysilyl-Anionen
JP6349246B2 (ja) * 2013-12-20 2018-06-27 株式会社日本触媒 環状シラン中性錯体の製造方法および環状水素化シランもしくは環状有機シランの製造方法
DE102014118658B4 (de) 2014-12-15 2020-12-31 Evonik Operations Gmbh Verfahren zum Herstellen von perhalogeniertem Hexasilan-Anion
WO2016095898A2 (de) 2014-12-15 2016-06-23 Johann Wolfgang Goethe-Universität Verfahren zum herstellen von perhalogeniertem hexasilan-anion und verfahren zum herstellen einer cyclischen silanverbindung
JP5942027B2 (ja) * 2015-09-04 2016-06-29 株式会社日本触媒 環状シラン中間体の製造方法および環状水素化シランもしくは環状有機シランの製造方法
US10544171B2 (en) 2018-03-13 2020-01-28 Nippon Shokubai Co., Ltd Process for producing cyclic hydrogenated silane compound
WO2020205723A1 (en) * 2019-03-29 2020-10-08 The Coretec Group Inc. Method of preparing cyclosilane

Citations (2)

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Publication number Priority date Publication date Assignee Title
US5942637A (en) 1998-03-30 1999-08-24 North Dakota State University Research Foundation Compounds containing tetradecachlorocyclohexasilane dianion
US20060281841A1 (en) 2004-07-30 2006-12-14 Weller Keith J Silane compositions, processes for their preparation and rubber compositions containing same

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FR2552436B1 (fr) 1983-09-28 1985-10-25 Rhone Poulenc Spec Chim Nouveau procede de fabrication d'hydrogeno-silanes par reaction de redistribution
US4683147A (en) 1984-04-16 1987-07-28 Canon Kabushiki Kaisha Method of forming deposition film
US4657777A (en) 1984-12-17 1987-04-14 Canon Kabushiki Kaisha Formation of deposited film
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US4910153A (en) 1986-02-18 1990-03-20 Solarex Corporation Deposition feedstock and dopant materials useful in the fabrication of hydrogenated amorphous silicon alloys for photovoltaic devices and other semiconductor devices
DE3711444A1 (de) 1987-04-04 1988-10-13 Huels Troisdorf Verfahren und vorrichtung zur herstellung von dichlorsilan
US4841083A (en) 1987-06-03 1989-06-20 Mitsui Toatsu Chemicals, Incorporated Ladder polysilanes
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EP0902030B1 (en) * 1997-08-27 2002-10-02 Dow Corning Corporation Compounds containing tetradecachlorocyclohexasilane dianion
CN1223011C (zh) 1999-03-30 2005-10-12 精工爱普生株式会社 太阳能电池的制造方法
US6767775B1 (en) 1999-03-30 2004-07-27 Seiko Epson Corporation Method of manufacturing thin-film transistor
TW539709B (en) 1999-03-30 2003-07-01 Jsr Corp Coating composition
KR100436319B1 (ko) 1999-03-30 2004-06-18 제이에스알 가부시끼가이샤 실리콘 막의 형성방법
DE60038931D1 (de) 1999-03-30 2008-07-03 Seiko Epson Corp Verfahren zur Herstellung einer Siliziumschicht und Tintenstrahlzusammensetzung für Tintenstrahldrucker
DE60128611T2 (de) 2000-03-13 2008-01-31 Jsr Corp. Cyclosilan, eine flüssige Zusammensetzung und ein Verfahren zur Bildung eines Silicium-Films
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US20060025506A1 (en) * 2004-07-30 2006-02-02 Weller Keith J Silane compositions, processes for their preparation and rubber compositions containing same
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Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5942637A (en) 1998-03-30 1999-08-24 North Dakota State University Research Foundation Compounds containing tetradecachlorocyclohexasilane dianion
US20060281841A1 (en) 2004-07-30 2006-12-14 Weller Keith J Silane compositions, processes for their preparation and rubber compositions containing same

Also Published As

Publication number Publication date
JP5697692B2 (ja) 2015-04-08
JP2013518109A (ja) 2013-05-20
EP2528864A4 (en) 2015-12-30
US8975429B2 (en) 2015-03-10
CN102762497B (zh) 2015-11-25
EP2528864B1 (en) 2017-03-29
US20120294791A1 (en) 2012-11-22
WO2011094191A1 (en) 2011-08-04
CN102762497A (zh) 2012-10-31
KR20130010111A (ko) 2013-01-25
EP2528864A1 (en) 2012-12-05

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