KR101812857B1 - 기판 지지 장치, 및 노광 장치 - Google Patents

기판 지지 장치, 및 노광 장치 Download PDF

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Publication number
KR101812857B1
KR101812857B1 KR1020157003652A KR20157003652A KR101812857B1 KR 101812857 B1 KR101812857 B1 KR 101812857B1 KR 1020157003652 A KR1020157003652 A KR 1020157003652A KR 20157003652 A KR20157003652 A KR 20157003652A KR 101812857 B1 KR101812857 B1 KR 101812857B1
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South Korea
Prior art keywords
substrate
light
rotary drum
pattern
exposure
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English (en)
Korean (ko)
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KR20150048113A (ko
Inventor
마사키 가토
요시아키 기토
마사카즈 호리
도루 기우치
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
KR1020157003652A 2012-08-28 2013-03-13 기판 지지 장치, 및 노광 장치 Active KR101812857B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012188116 2012-08-28
JPJP-P-2012-188116 2012-08-28
PCT/JP2013/057062 WO2014034161A1 (ja) 2012-08-28 2013-03-13 基板支持装置、及び露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020167034212A Division KR101855612B1 (ko) 2012-08-28 2013-03-13 패턴 형성 장치, 및 기판 지지 장치

Publications (2)

Publication Number Publication Date
KR20150048113A KR20150048113A (ko) 2015-05-06
KR101812857B1 true KR101812857B1 (ko) 2017-12-27

Family

ID=50182989

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020157003652A Active KR101812857B1 (ko) 2012-08-28 2013-03-13 기판 지지 장치, 및 노광 장치
KR1020167034212A Active KR101855612B1 (ko) 2012-08-28 2013-03-13 패턴 형성 장치, 및 기판 지지 장치
KR1020187028577A Active KR101999497B1 (ko) 2012-08-28 2013-03-13 패턴 형성 장치
KR1020187009198A Active KR101907365B1 (ko) 2012-08-28 2013-03-13 기판 처리 장치

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020167034212A Active KR101855612B1 (ko) 2012-08-28 2013-03-13 패턴 형성 장치, 및 기판 지지 장치
KR1020187028577A Active KR101999497B1 (ko) 2012-08-28 2013-03-13 패턴 형성 장치
KR1020187009198A Active KR101907365B1 (ko) 2012-08-28 2013-03-13 기판 처리 장치

Country Status (7)

Country Link
JP (4) JP6245174B2 (https=)
KR (4) KR101812857B1 (https=)
CN (3) CN107656427B (https=)
HK (1) HK1246408A1 (https=)
IN (1) IN2015DN01909A (https=)
TW (4) TWI658535B (https=)
WO (1) WO2014034161A1 (https=)

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KR101812857B1 (ko) * 2012-08-28 2017-12-27 가부시키가이샤 니콘 기판 지지 장치, 및 노광 장치
TWI674484B (zh) * 2014-04-01 2019-10-11 日商尼康股份有限公司 基板處理方法
CN106164779B (zh) * 2014-04-01 2019-01-22 株式会社尼康 基板处理装置
TWI709831B (zh) * 2014-09-04 2020-11-11 日商尼康股份有限公司 元件製造方法
KR102345439B1 (ko) * 2015-01-15 2021-12-30 삼성디스플레이 주식회사 롤투롤 노광 시스템
JP6413784B2 (ja) * 2015-01-19 2018-10-31 株式会社ニコン 基板処理装置及びデバイス製造方法
TWI699624B (zh) * 2015-02-27 2020-07-21 日商尼康股份有限公司 基板處理裝置及元件製造方法
CN110596886B (zh) * 2015-03-20 2021-12-07 株式会社尼康 图案描绘装置
JP2017058494A (ja) * 2015-09-16 2017-03-23 株式会社ニコン パターン描画装置、パターン描画方法、基板処理装置、および、デバイス製造方法
CN111781807B (zh) * 2015-10-30 2024-01-12 株式会社尼康 基板处理装置及元件制造方法
JP6551175B2 (ja) * 2015-11-10 2019-07-31 株式会社ニコン 回転円筒体の計測装置、基板処理装置及びデバイス製造方法
US9918375B2 (en) * 2015-11-16 2018-03-13 Kla-Tencor Corporation Plasma based light source having a target material coated on a cylindrically-symmetric element
JP6589607B2 (ja) * 2015-12-04 2019-10-16 株式会社ニコン 描画装置および描画方法
KR102541913B1 (ko) 2016-03-30 2023-06-13 가부시키가이샤 니콘 패턴 묘화 장치, 패턴 묘화 방법, 및 디바이스 제조 방법
WO2017199658A1 (ja) * 2016-05-19 2017-11-23 株式会社ニコン 基板支持装置、露光装置、および、パターニング装置
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
JP6680330B2 (ja) * 2018-09-14 2020-04-15 株式会社ニコン パターン形成装置
JP6587026B2 (ja) * 2018-10-30 2019-10-09 株式会社ニコン パターン露光装置
CN112114499B (zh) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 一种曝光装置、光刻设备及太阳能电池电极的制备方法
JP6787447B2 (ja) * 2019-06-27 2020-11-18 株式会社ニコン 基板処理装置
JP6750712B2 (ja) * 2019-06-27 2020-09-02 株式会社ニコン 基板処理装置、及びデバイス製造方法
JP6996580B2 (ja) * 2020-03-05 2022-01-17 株式会社ニコン 基板処理方法
JP7570826B2 (ja) * 2020-05-25 2024-10-22 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法
US20220244631A1 (en) * 2021-02-03 2022-08-04 Visera Technologies Company Limited Exposure mask
EP4382870A1 (en) * 2022-12-08 2024-06-12 Kaunas University of Technology Anti-fogging incremental scales for optical encoders and fabrication method thereof

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Also Published As

Publication number Publication date
JP2017083855A (ja) 2017-05-18
HK1207694A1 (en) 2016-02-05
KR101907365B1 (ko) 2018-10-11
JP6414308B2 (ja) 2018-10-31
KR20160143892A (ko) 2016-12-14
JPWO2014034161A1 (ja) 2016-08-08
CN107656427B (zh) 2020-07-03
JP2018013805A (ja) 2018-01-25
TW201926542A (zh) 2019-07-01
CN104583874A (zh) 2015-04-29
TWI658535B (zh) 2019-05-01
WO2014034161A1 (ja) 2014-03-06
TWI729366B (zh) 2021-06-01
CN104583874B (zh) 2017-11-03
TWI581362B (zh) 2017-05-01
CN106886133A (zh) 2017-06-23
KR20150048113A (ko) 2015-05-06
JP6245174B2 (ja) 2017-12-13
KR101855612B1 (ko) 2018-05-04
HK1246408A1 (zh) 2018-09-07
KR101999497B1 (ko) 2019-07-11
KR20180035950A (ko) 2018-04-06
TW201409603A (zh) 2014-03-01
TW201727818A (zh) 2017-08-01
CN107656427A (zh) 2018-02-02
JP6558484B2 (ja) 2019-08-14
IN2015DN01909A (https=) 2015-08-07
TW201828405A (zh) 2018-08-01
JP2018189989A (ja) 2018-11-29
CN106886133B (zh) 2018-06-29
TWI624001B (zh) 2018-05-11
KR20180112115A (ko) 2018-10-11
JP6229785B2 (ja) 2017-11-15

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