KR101565026B1 - 양면 연마 장치용 캐리어 및 이를 이용한 양면 연마 장치, 및 양면 연마 방법 - Google Patents

양면 연마 장치용 캐리어 및 이를 이용한 양면 연마 장치, 및 양면 연마 방법 Download PDF

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KR101565026B1
KR101565026B1 KR1020107018807A KR20107018807A KR101565026B1 KR 101565026 B1 KR101565026 B1 KR 101565026B1 KR 1020107018807 A KR1020107018807 A KR 1020107018807A KR 20107018807 A KR20107018807 A KR 20107018807A KR 101565026 B1 KR101565026 B1 KR 101565026B1
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South Korea
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carrier
double
polishing
holding hole
resin insert
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KR20100123845A (ko
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주니치 우에노
카즈야 사토
슈이치 코바야시
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신에쯔 한도타이 가부시키가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/28—Work carriers for double side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1020107018807A 2008-02-27 2009-02-16 양면 연마 장치용 캐리어 및 이를 이용한 양면 연마 장치, 및 양면 연마 방법 Active KR101565026B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-045479 2008-02-27
JP2008045479A JP4605233B2 (ja) 2008-02-27 2008-02-27 両面研磨装置用キャリア及びこれを用いた両面研磨装置並びに両面研磨方法

Publications (2)

Publication Number Publication Date
KR20100123845A KR20100123845A (ko) 2010-11-25
KR101565026B1 true KR101565026B1 (ko) 2015-11-02

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KR1020107018807A Active KR101565026B1 (ko) 2008-02-27 2009-02-16 양면 연마 장치용 캐리어 및 이를 이용한 양면 연마 장치, 및 양면 연마 방법

Country Status (6)

Country Link
US (1) US9327382B2 (https=)
JP (1) JP4605233B2 (https=)
KR (1) KR101565026B1 (https=)
CN (1) CN101959647B (https=)
DE (1) DE112009000387T5 (https=)
WO (1) WO2009107333A1 (https=)

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KR100898821B1 (ko) * 2007-11-29 2009-05-22 주식회사 실트론 웨이퍼 캐리어의 제조방법
JP5233888B2 (ja) * 2009-07-21 2013-07-10 信越半導体株式会社 両面研磨装置用キャリアの製造方法、両面研磨装置用キャリア及びウェーハの両面研磨方法
JP5614397B2 (ja) * 2011-11-07 2014-10-29 信越半導体株式会社 両面研磨方法
KR101292226B1 (ko) * 2012-01-03 2013-08-02 주식회사 엘지실트론 캐리어 및 이를 포함하는 웨이퍼 연마 장치
JP5748717B2 (ja) 2012-09-06 2015-07-15 信越半導体株式会社 両面研磨方法
CN102950539B (zh) * 2012-11-28 2015-06-24 天津市环欧半导体材料技术有限公司 磨片机研磨盘下砂口的改良构造
JP5807648B2 (ja) * 2013-01-29 2015-11-10 信越半導体株式会社 両面研磨装置用キャリア及びウェーハの両面研磨方法
JP5847789B2 (ja) * 2013-02-13 2016-01-27 信越半導体株式会社 両面研磨装置用キャリアの製造方法およびウエーハの両面研磨方法
CN103433840B (zh) * 2013-08-01 2015-08-19 浙江工业大学 基于介电泳效应的保持架偏心转摆式双平面研磨/抛光圆柱形零件设备
JP6447332B2 (ja) * 2015-04-13 2019-01-09 信越半導体株式会社 両面研磨装置用のキャリアの製造方法およびウェーハの両面研磨方法
JP6424809B2 (ja) * 2015-12-11 2018-11-21 信越半導体株式会社 ウェーハの両面研磨方法
JP6443370B2 (ja) * 2016-03-18 2018-12-26 信越半導体株式会社 両面研磨装置用のキャリアの製造方法およびウェーハの両面研磨方法
JP6589762B2 (ja) * 2016-07-13 2019-10-16 株式会社Sumco 両面研磨装置
JP6673772B2 (ja) 2016-07-27 2020-03-25 スピードファム株式会社 ワークキャリア及びワークキャリアの製造方法
JP6579056B2 (ja) * 2016-07-29 2019-09-25 株式会社Sumco ウェーハの両面研磨方法
KR200484471Y1 (ko) * 2017-01-26 2017-09-08 (주)엔티에스엘 반도체 웨이퍼의 연마 공정에 사용되는 캐리어
JP6743785B2 (ja) * 2017-08-30 2020-08-19 株式会社Sumco キャリアの製造方法およびウェーハの研磨方法
CN109015334A (zh) * 2018-09-17 2018-12-18 杭州中芯晶圆半导体股份有限公司 一种研磨过程中减少刚性材料因碰撞导致破裂的方法
CN111993267B (zh) * 2019-05-27 2024-08-06 创技股份有限公司 工件游星轮及工件游星轮的制造方法
JP7200898B2 (ja) * 2019-09-27 2023-01-10 株式会社Sumco ワークの両面研磨方法
CN111599673A (zh) * 2020-06-03 2020-08-28 福建阿石创新材料股份有限公司 一种钼晶圆片的磨抛方法
KR102718631B1 (ko) * 2022-11-14 2024-10-18 (주)뉴이스트 반도체 웨이퍼의 연마 공정에 사용되는 캐리어 제조 방법
CN115816267B (zh) * 2022-12-29 2025-03-21 西安奕斯伟材料科技股份有限公司 硅片双面抛光装置的承载件及硅片双面抛光装置

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US20080166952A1 (en) 2005-02-25 2008-07-10 Shin-Etsu Handotai Co., Ltd Carrier For Double-Side Polishing Apparatus, Double-Side Polishing Apparatus And Double-Side Polishing Method Using The Same
US20080318493A1 (en) 2004-08-02 2008-12-25 Showa Denko K.K. Method of Manufacturing Polishing Carrier and Silicon Substrate for Magnetic Recording Medium, and Silicon Substrate for Magnetic Recording Medium

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JP2004303280A (ja) 2003-03-28 2004-10-28 Hoya Corp 情報記録媒体用ガラス基板の製造方法
US20080318493A1 (en) 2004-08-02 2008-12-25 Showa Denko K.K. Method of Manufacturing Polishing Carrier and Silicon Substrate for Magnetic Recording Medium, and Silicon Substrate for Magnetic Recording Medium
US20080166952A1 (en) 2005-02-25 2008-07-10 Shin-Etsu Handotai Co., Ltd Carrier For Double-Side Polishing Apparatus, Double-Side Polishing Apparatus And Double-Side Polishing Method Using The Same

Also Published As

Publication number Publication date
JP2009202259A (ja) 2009-09-10
DE112009000387T5 (de) 2011-02-17
CN101959647B (zh) 2012-08-08
CN101959647A (zh) 2011-01-26
JP4605233B2 (ja) 2011-01-05
US20110104995A1 (en) 2011-05-05
US9327382B2 (en) 2016-05-03
WO2009107333A1 (ja) 2009-09-03
KR20100123845A (ko) 2010-11-25

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