KR101493621B1 - 데이터 변환 방법, 묘화 시스템 및 기록 매체 - Google Patents

데이터 변환 방법, 묘화 시스템 및 기록 매체 Download PDF

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KR101493621B1
KR101493621B1 KR20130165211A KR20130165211A KR101493621B1 KR 101493621 B1 KR101493621 B1 KR 101493621B1 KR 20130165211 A KR20130165211 A KR 20130165211A KR 20130165211 A KR20130165211 A KR 20130165211A KR 101493621 B1 KR101493621 B1 KR 101493621B1
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South Korea
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KR20130165211A
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Korean (ko)
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KR20140109241A (ko
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료 야마다
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가부시키가이샤 스크린 홀딩스
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F12/00—Accessing, addressing or allocating within memory systems or architectures
    • G06F12/02—Addressing or allocation; Relocation
    • G06F12/08—Addressing or allocation; Relocation in hierarchically structured memory systems, e.g. virtual memory systems
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F12/00—Accessing, addressing or allocating within memory systems or architectures
    • G06F12/02—Addressing or allocation; Relocation
    • G06F12/08—Addressing or allocation; Relocation in hierarchically structured memory systems, e.g. virtual memory systems
    • G06F12/0802—Addressing of a memory level in which the access to the desired data or data block requires associative addressing means, e.g. caches
    • G06F12/0806—Multiuser, multiprocessor or multiprocessing cache systems
    • G06F12/0811—Multiuser, multiprocessor or multiprocessing cache systems with multilevel cache hierarchies
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Image Generation (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR20130165211A 2013-03-01 2013-12-27 데이터 변환 방법, 묘화 시스템 및 기록 매체 KR101493621B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013040388A JP6150560B2 (ja) 2013-03-01 2013-03-01 データ変換方法、描画システムおよびプログラム
JPJP-P-2013-040388 2013-03-01

Publications (2)

Publication Number Publication Date
KR20140109241A KR20140109241A (ko) 2014-09-15
KR101493621B1 true KR101493621B1 (ko) 2015-02-13

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ID=51437991

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KR20130165211A KR101493621B1 (ko) 2013-03-01 2013-12-27 데이터 변환 방법, 묘화 시스템 및 기록 매체

Country Status (4)

Country Link
JP (1) JP6150560B2 (ja)
KR (1) KR101493621B1 (ja)
CN (1) CN104021237B (ja)
TW (1) TWI505043B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7463154B2 (ja) * 2020-03-24 2024-04-08 株式会社Ｓｃｒｅｅｎホールディングス 描画装置、データ処理装置、描画方法、および描画データ生成方法
CN111830797B (zh) * 2020-07-27 2023-06-09 上海华力集成电路制造有限公司 Opc监控图形生成方法及其生成模块

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050024619A (ko) * 2003-09-05 2005-03-10 펜탁스 인더스트리얼 인스트루먼츠 가부시키가이샤 벡터 그래픽 데이터 처리 방법 및 묘화 장치
JP2006293627A (ja) 2005-04-08 2006-10-26 Toshiba Corp 描画方法及び描画装置
KR100834596B1 (ko) 2006-03-10 2008-06-02 가부시끼가이샤 도시바 묘화장치와 묘화방법 및 묘화 프로그램을 구비한 컴퓨터 독출가능 기록매체
KR20100100626A (ko) * 2009-03-04 2010-09-15 다이닛뽕스크린 세이조오 가부시키가이샤 묘화장치, 묘화장치용의 데이터 처리장치 및 묘화장치용의 묘화 데이터 생성방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01277055A (ja) * 1988-04-28 1989-11-07 Dainippon Screen Mfg Co Ltd 多値描画のためのラスターデータ生成方法
KR19980018034U (ko) * 1996-09-25 1998-07-06 양재신 탑승자 허리받침 수단을 갖는 자동차 시이트
JP3952358B2 (ja) * 2001-09-25 2007-08-01 大日本スクリーン製造株式会社 データ変換装置およびその方法、並びに当該方法を用いたプログラム
JP2003099771A (ja) * 2001-09-26 2003-04-04 Dainippon Screen Mfg Co Ltd データ変換装置およびその方法、並びに当該方法を用いたプログラム
JP5009822B2 (ja) * 2008-01-21 2012-08-22 大日本スクリーン製造株式会社 データ変換方法、描画システムおよびプログラム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050024619A (ko) * 2003-09-05 2005-03-10 펜탁스 인더스트리얼 인스트루먼츠 가부시키가이샤 벡터 그래픽 데이터 처리 방법 및 묘화 장치
JP2006293627A (ja) 2005-04-08 2006-10-26 Toshiba Corp 描画方法及び描画装置
KR100834596B1 (ko) 2006-03-10 2008-06-02 가부시끼가이샤 도시바 묘화장치와 묘화방법 및 묘화 프로그램을 구비한 컴퓨터 독출가능 기록매체
KR20100100626A (ko) * 2009-03-04 2010-09-15 다이닛뽕스크린 세이조오 가부시키가이샤 묘화장치, 묘화장치용의 데이터 처리장치 및 묘화장치용의 묘화 데이터 생성방법

Also Published As

Publication number Publication date
TW201439687A (zh) 2014-10-16
TWI505043B (zh) 2015-10-21
JP6150560B2 (ja) 2017-06-21
CN104021237A (zh) 2014-09-03
JP2014170030A (ja) 2014-09-18
CN104021237B (zh) 2017-04-26
KR20140109241A (ko) 2014-09-15

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