KR101437751B1 - 거대-광개시제 및 그의 경화성 조성물 - Google Patents

거대-광개시제 및 그의 경화성 조성물 Download PDF

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KR101437751B1
KR101437751B1 KR1020127024701A KR20127024701A KR101437751B1 KR 101437751 B1 KR101437751 B1 KR 101437751B1 KR 1020127024701 A KR1020127024701 A KR 1020127024701A KR 20127024701 A KR20127024701 A KR 20127024701A KR 101437751 B1 KR101437751 B1 KR 101437751B1
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photoinitiator
alkyl
group
independently
formula
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KR20130018702A (ko
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존 지. 우즈
로데릭 카피
안토니 에프. 자코빈
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헨켈 유에스 아이피 엘엘씨
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/38Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/56Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00Living radical polymerisation
    • C08F2438/01Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
KR1020127024701A 2010-03-22 2011-02-17 거대-광개시제 및 그의 경화성 조성물 Expired - Fee Related KR101437751B1 (ko)

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Application Number Priority Date Filing Date Title
US31619010P 2010-03-22 2010-03-22
US61/316,190 2010-03-22
PCT/US2011/025153 WO2011119272A2 (en) 2010-03-22 2011-02-17 Macro-photoinitiators and curable compositions thereof

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KR20130018702A KR20130018702A (ko) 2013-02-25
KR101437751B1 true KR101437751B1 (ko) 2014-09-03

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US (1) US8748503B2 (https=)
EP (1) EP2550307B1 (https=)
JP (1) JP5955832B2 (https=)
KR (1) KR101437751B1 (https=)
CN (1) CN102770465B (https=)
CA (1) CA2786630C (https=)
ES (1) ES2657710T3 (https=)
WO (1) WO2011119272A2 (https=)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9097979B2 (en) 2013-03-13 2015-08-04 Wisconsin Alumni Research Foundation Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
WO2016031052A1 (ja) * 2014-08-29 2016-03-03 三菱電機株式会社 半導体装置及び多相用半導体装置
US9587062B2 (en) * 2014-12-15 2017-03-07 Henkel IP & Holding GmbH and Henkel AG & Co. KGaA Photocrosslinkable block copolymers for hot-melt adhesives
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US10492888B2 (en) 2015-07-07 2019-12-03 Align Technology, Inc. Dental materials using thermoset polymers
AU2017250778B2 (en) 2016-04-15 2021-09-23 Beckman Coulter, Inc. Photoactive macromolecules and uses thereof
EP3481872B1 (en) * 2016-07-11 2020-04-08 3M Innovative Properties Company Polymeric material and methods of making using controlled radical initiators
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AU2019262641B2 (en) 2018-05-04 2025-02-06 Align Technology, Inc. Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom
US10781274B2 (en) * 2018-05-04 2020-09-22 Align Technology, Inc. Polymerizable monomers and method of polymerizing the same
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WO2021039253A1 (ja) 2019-08-30 2021-03-04 富士フイルム株式会社 組成物、膜、光学フィルタ及びその製造方法、固体撮像素子、赤外線センサ、並びに、センサモジュール
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WO2024203080A1 (ja) 2023-03-31 2024-10-03 富士フイルム株式会社 薬液、パターン形成方法
CN121271472A (zh) * 2025-10-21 2026-01-06 拓迪化学(上海)股份有限公司 一种uv延迟固化耐电解液胶带及其制备方法和应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458864B1 (en) 1998-05-29 2002-10-01 Ciba Specialty Chemicals Corporation Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers
US6673850B1 (en) 1999-05-10 2004-01-06 Ciba Specialty Chemicals Corporation Photoinitiators and their applications

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IE45111B1 (en) 1976-07-14 1982-06-30 Loctite Ltd Cyanoacrylate adhesive paste compositions
IE45626B1 (en) 1976-07-14 1982-10-20 Loctite Ltd Filled cyanoacrylate adhesive compositions
AU2003253769A1 (en) * 2002-07-03 2004-01-23 The Procter And Gamble Company Radiation curable low stress relaxation elastomeric materials
JP2009209275A (ja) * 2008-03-05 2009-09-17 Fujifilm Corp 光硬化性コーティング組成物、オーバープリント及びその製造方法
US9243083B2 (en) * 2008-04-03 2016-01-26 Henkel IP & Holding GmbH Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458864B1 (en) 1998-05-29 2002-10-01 Ciba Specialty Chemicals Corporation Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers
US6673850B1 (en) 1999-05-10 2004-01-06 Ciba Specialty Chemicals Corporation Photoinitiators and their applications
KR100698799B1 (ko) 1999-05-10 2007-03-26 시바 스페셜티 케미칼스 홀딩 인크. 신규한 광개시제 및 블록 공중합체

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WO2011119272A2 (en) 2011-09-29
US8748503B2 (en) 2014-06-10
EP2550307B1 (en) 2017-11-22
EP2550307A4 (en) 2014-03-19
JP5955832B2 (ja) 2016-07-20
US20130018122A1 (en) 2013-01-17
ES2657710T3 (es) 2018-03-06
CA2786630A1 (en) 2011-09-29
KR20130018702A (ko) 2013-02-25
CN102770465B (zh) 2015-04-22
JP2013522445A (ja) 2013-06-13
EP2550307A2 (en) 2013-01-30
CA2786630C (en) 2016-02-02
CN102770465A (zh) 2012-11-07
WO2011119272A3 (en) 2012-01-05

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