CN102770465B - 大分子光引发剂及其可固化组合物 - Google Patents
大分子光引发剂及其可固化组合物 Download PDFInfo
- Publication number
- CN102770465B CN102770465B CN201180010476.8A CN201180010476A CN102770465B CN 102770465 B CN102770465 B CN 102770465B CN 201180010476 A CN201180010476 A CN 201180010476A CN 102770465 B CN102770465 B CN 102770465B
- Authority
- CN
- China
- Prior art keywords
- group
- alkyl
- residue
- photoinitiator
- macrophotoinitiator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
- C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31619010P | 2010-03-22 | 2010-03-22 | |
| US61/316,190 | 2010-03-22 | ||
| PCT/US2011/025153 WO2011119272A2 (en) | 2010-03-22 | 2011-02-17 | Macro-photoinitiators and curable compositions thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102770465A CN102770465A (zh) | 2012-11-07 |
| CN102770465B true CN102770465B (zh) | 2015-04-22 |
Family
ID=44673796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180010476.8A Expired - Fee Related CN102770465B (zh) | 2010-03-22 | 2011-02-17 | 大分子光引发剂及其可固化组合物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8748503B2 (https=) |
| EP (1) | EP2550307B1 (https=) |
| JP (1) | JP5955832B2 (https=) |
| KR (1) | KR101437751B1 (https=) |
| CN (1) | CN102770465B (https=) |
| CA (1) | CA2786630C (https=) |
| ES (1) | ES2657710T3 (https=) |
| WO (1) | WO2011119272A2 (https=) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9097979B2 (en) | 2013-03-13 | 2015-08-04 | Wisconsin Alumni Research Foundation | Block copolymer-based mask structures for the growth of nanopatterned polymer brushes |
| CN106663676B (zh) * | 2014-08-29 | 2019-05-28 | 三菱电机株式会社 | 半导体装置以及多相用半导体装置 |
| US9587062B2 (en) * | 2014-12-15 | 2017-03-07 | Henkel IP & Holding GmbH and Henkel AG & Co. KGaA | Photocrosslinkable block copolymers for hot-melt adhesives |
| JP2018501383A (ja) * | 2015-01-08 | 2018-01-18 | ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング | 狭い多分散指数を有する高分子量ポリアクリレートの製造方法、および、それから製造された組成物 |
| US10492888B2 (en) | 2015-07-07 | 2019-12-03 | Align Technology, Inc. | Dental materials using thermoset polymers |
| EP4610656A3 (en) | 2016-04-15 | 2025-11-19 | Beckman Coulter, Inc. | Photoactive macromolecules and uses thereof |
| JP6949099B2 (ja) * | 2016-07-11 | 2021-10-13 | スリーエム イノベイティブ プロパティズ カンパニー | ポリマー材料及び制御ラジカル開始剤を使用した製造方法 |
| WO2019054281A1 (ja) | 2017-09-15 | 2019-03-21 | 富士フイルム株式会社 | 組成物、膜、積層体、赤外線透過フィルタ、固体撮像素子および赤外線センサ |
| CA3098621A1 (en) | 2018-05-04 | 2019-11-07 | Align Technology, Inc. | Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom |
| CN116640061A (zh) * | 2018-05-04 | 2023-08-25 | 阿莱恩技术有限公司 | 可聚合单体及其聚合方法 |
| JP7114724B2 (ja) | 2018-09-20 | 2022-08-08 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法 |
| JP7260847B2 (ja) | 2019-02-26 | 2023-04-19 | 株式会社リコー | 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置 |
| TWI842917B (zh) | 2019-06-27 | 2024-05-21 | 日商富士軟片股份有限公司 | 組成物、膜及光感測器 |
| WO2021039205A1 (ja) | 2019-08-29 | 2021-03-04 | 富士フイルム株式会社 | 組成物、膜、近赤外線カットフィルタ、パターン形成方法、積層体、固体撮像素子、赤外線センサ、画像表示装置、カメラモジュール、及び、化合物 |
| KR102838505B1 (ko) | 2019-08-30 | 2025-07-25 | 후지필름 가부시키가이샤 | 조성물, 막, 광학 필터 및 그 제조 방법, 고체 촬상 소자, 적외선 센서, 및, 센서 모듈 |
| US12215223B2 (en) | 2019-10-31 | 2025-02-04 | Align Technology, Inc. | Crystallizable resins |
| CN110981995B (zh) * | 2019-12-27 | 2021-12-07 | 阜阳欣奕华材料科技有限公司 | 一种低迁移型光引发剂及其制备方法和应用 |
| WO2021199748A1 (ja) | 2020-03-30 | 2021-10-07 | 富士フイルム株式会社 | 組成物、膜及び光センサ |
| EP4220859A4 (en) | 2020-09-28 | 2024-03-27 | FUJIFILM Corporation | LAMINATE PRODUCTION PROCESS, ANTENNA-IN-PACKAGE PRODUCTION PROCESS, LAMINATE AND COMPOSITION |
| CN112430279A (zh) * | 2020-11-23 | 2021-03-02 | 濮阳展辰新材料有限公司 | 一种酰化法制备大分子光引发剂的方法及其应用 |
| WO2022131191A1 (ja) | 2020-12-16 | 2022-06-23 | 富士フイルム株式会社 | 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ |
| WO2022130773A1 (ja) | 2020-12-17 | 2022-06-23 | 富士フイルム株式会社 | 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ |
| JPWO2022196599A1 (https=) | 2021-03-19 | 2022-09-22 | ||
| TW202248755A (zh) | 2021-03-22 | 2022-12-16 | 日商富士軟片股份有限公司 | 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件 |
| EP4318057A4 (en) | 2021-03-29 | 2024-11-06 | FUJIFILM Corporation | BLACK PHOTOSENSITIVE COMPOSITION, METHOD FOR MANUFACTURING BLACK PHOTOSENSITIVE COMPOSITION, CURED FILM, COLOR FILTER, LIGHT-SHIELDING FILM, OPTICAL ELEMENT, SOLID-STATE IMAGE PICK-UP ELEMENT, AND HEADLIGHT UNIT |
| JP7259141B1 (ja) | 2021-08-31 | 2023-04-17 | 富士フイルム株式会社 | 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液 |
| EP4410855A4 (en) | 2021-09-29 | 2024-12-18 | FUJIFILM Corporation | COMPOSITION, RESIN, FILM AND OPTICAL SENSOR |
| JP7354479B1 (ja) | 2021-12-23 | 2023-10-02 | 富士フイルム株式会社 | 接合体の製造方法、接合体、積層体の製造方法、積層体、デバイスの製造方法、及び、デバイス、並びに、ポリイミド含有前駆体部形成用組成物 |
| KR102927378B1 (ko) | 2022-02-24 | 2026-02-13 | 후지필름 가부시키가이샤 | 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스 |
| KR20240156619A (ko) | 2022-03-29 | 2024-10-30 | 후지필름 가부시키가이샤 | 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스 |
| WO2024043110A1 (ja) | 2022-08-22 | 2024-02-29 | 富士フイルム株式会社 | 感光性組成物、膜および光センサ |
| TW202424051A (zh) | 2022-09-30 | 2024-06-16 | 日商富士軟片股份有限公司 | 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件 |
| CN120051506A (zh) | 2022-09-30 | 2025-05-27 | 富士胶片株式会社 | 树脂组合物、固化物、层叠体、固化物的制造方法、层叠体的制造方法、半导体器件的制造方法及半导体器件 |
| EP4597225A4 (en) | 2022-09-30 | 2026-01-21 | Fujifilm Corp | FILM PRODUCTION PROCESS, PHOTOSENSITIVE RESIN COMPOSITION, HARDENED PRODUCT PROCESS, HARDENED AND LAMINATED PRODUCT |
| JPWO2024203080A1 (https=) | 2023-03-31 | 2024-10-03 | ||
| CN121271472A (zh) * | 2025-10-21 | 2026-01-06 | 拓迪化学(上海)股份有限公司 | 一种uv延迟固化耐电解液胶带及其制备方法和应用 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458864B1 (en) * | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IE45111B1 (en) | 1976-07-14 | 1982-06-30 | Loctite Ltd | Cyanoacrylate adhesive paste compositions |
| IE45626B1 (en) | 1976-07-14 | 1982-10-20 | Loctite Ltd | Filled cyanoacrylate adhesive compositions |
| US6673850B1 (en) | 1999-05-10 | 2004-01-06 | Ciba Specialty Chemicals Corporation | Photoinitiators and their applications |
| DE60326845D1 (de) * | 2002-07-03 | 2009-05-07 | Procter & Gamble | Strahlungshärtbare elastomere materialien mit geringer spannungsrelaxation |
| JP2009209275A (ja) * | 2008-03-05 | 2009-09-17 | Fujifilm Corp | 光硬化性コーティング組成物、オーバープリント及びその製造方法 |
| US9243083B2 (en) * | 2008-04-03 | 2016-01-26 | Henkel IP & Holding GmbH | Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications |
-
2011
- 2011-02-17 WO PCT/US2011/025153 patent/WO2011119272A2/en not_active Ceased
- 2011-02-17 CN CN201180010476.8A patent/CN102770465B/zh not_active Expired - Fee Related
- 2011-02-17 CA CA2786630A patent/CA2786630C/en not_active Expired - Fee Related
- 2011-02-17 EP EP11759867.2A patent/EP2550307B1/en not_active Not-in-force
- 2011-02-17 ES ES11759867.2T patent/ES2657710T3/es active Active
- 2011-02-17 KR KR1020127024701A patent/KR101437751B1/ko not_active Expired - Fee Related
- 2011-02-17 JP JP2013501267A patent/JP5955832B2/ja not_active Expired - Fee Related
-
2012
- 2012-09-21 US US13/623,982 patent/US8748503B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458864B1 (en) * | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
Non-Patent Citations (2)
| Title |
|---|
| Synthesis of block copolymers by combination of ATRP and photoiniferter processes;Yasemin Yuksel Durmaz et.al;《Polymer International》;20080813;第57卷(第10期);第1182-1187页 * |
| Yasemin Yuksel Durmaz et.al.Synthesis of block copolymers by combination of ATRP and photoiniferter processes.《Polymer International》.2008,第57卷(第10期),第1182-1187页. * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013522445A (ja) | 2013-06-13 |
| JP5955832B2 (ja) | 2016-07-20 |
| ES2657710T3 (es) | 2018-03-06 |
| US20130018122A1 (en) | 2013-01-17 |
| EP2550307B1 (en) | 2017-11-22 |
| US8748503B2 (en) | 2014-06-10 |
| CN102770465A (zh) | 2012-11-07 |
| EP2550307A2 (en) | 2013-01-30 |
| CA2786630A1 (en) | 2011-09-29 |
| EP2550307A4 (en) | 2014-03-19 |
| CA2786630C (en) | 2016-02-02 |
| KR101437751B1 (ko) | 2014-09-03 |
| KR20130018702A (ko) | 2013-02-25 |
| WO2011119272A2 (en) | 2011-09-29 |
| WO2011119272A3 (en) | 2012-01-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102770465B (zh) | 大分子光引发剂及其可固化组合物 | |
| JP5240798B2 (ja) | 屈折率向上剤、並びにそれを含む樹脂組成物、重合若しくは硬化性組成物及び光学材料 | |
| CN1121420C (zh) | 通过光聚合可控制分子量的聚合物 | |
| KR101722395B1 (ko) | 폴리머캡토계 실세스퀴옥산 및 이를 이용한 기능성 폴리실세스퀴옥산의 제조방법 | |
| CN115746186B (zh) | 含有氧杂环丁烷官能团的丙烯酸系预聚物及其制备和应用 | |
| TW201922824A (zh) | (甲基)丙烯酸系嵌段共聚物及含有其之活性能量線硬化性組成物 | |
| JP5571787B2 (ja) | 架橋フルオロポリマー網目構造 | |
| JP7545023B2 (ja) | 重合性組成物並びにそれから得られる光学材料及び色調変化材料 | |
| CA2871327A1 (en) | Grafted telechelic polyisobutylenes possessing reactive functionality, processes for preparing the same and curable compositions comprising the same | |
| KR101512390B1 (ko) | 사슬 말단 부근에 수분-경화성 관능기 클러스터를 갖는 경화성 조성물 | |
| JP7521524B2 (ja) | 光学材料用重合性組成物 | |
| CN114402001A (zh) | 含氟化合物的制造方法和共聚物的制造方法 | |
| JP7234677B2 (ja) | 多官能プロパルギル化合物及びそれを含む光学用組成物 | |
| US10329369B2 (en) | Process for making branched reactive block polymers | |
| CN106221474A (zh) | 涂料及其制备方法 | |
| JP6069645B2 (ja) | チオカーボナートとスルフィド骨格をもつメタクリル酸エステルの櫛型共重合体およびその製造方法並びにそのuv硬化物 | |
| JP2021038354A (ja) | 光学材料用樹脂組成物 | |
| WO1990003987A1 (fr) | Derives polycycliques d'ester polyacrylique | |
| JP5897786B2 (ja) | ポリオレフィンからの、コントロールされたフリーラジカルグラフティング | |
| WO2012050951A2 (en) | Vinyl ether functional oligomers and methods for making and using same | |
| JP7688900B2 (ja) | 光重合性組成物、重合体、及び重合体の製造方法 | |
| JP2009096862A (ja) | 重合性化合物および重合体 | |
| JP7483417B2 (ja) | 感光性樹脂組成物、及びその硬化物 | |
| JP2014097957A (ja) | 金属ジチオカルバメートモノマー、及びその重合物 | |
| WO2024228342A1 (ja) | 重合性組成物及びそれを重合硬化してなる樹脂、並びに該樹脂を含む光学材料 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: HENKEL US IP LLC Free format text: FORMER OWNER: HENKEL CORP. Effective date: 20141124 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20141124 Address after: American Connecticut Applicant after: Henkel U.S. Intellectual Property Limited Liability Company Address before: American Connecticut Applicant before: Henkel Corp. |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: HENKEL CORP. Free format text: FORMER OWNER: HENKEL US IP LLC Effective date: 20150422 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20150422 Address after: Dusseldorf Patentee after: Henkel intellectual property Holdings Co.,Ltd Address before: American Connecticut Patentee before: Henkel U.S. Intellectual Property Limited Liability Company |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150422 Termination date: 20200217 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |