ATE346847T1 - Neue photoinitiatoren und deren anwendungen - Google Patents

Neue photoinitiatoren und deren anwendungen

Info

Publication number
ATE346847T1
ATE346847T1 AT00929446T AT00929446T ATE346847T1 AT E346847 T1 ATE346847 T1 AT E346847T1 AT 00929446 T AT00929446 T AT 00929446T AT 00929446 T AT00929446 T AT 00929446T AT E346847 T1 ATE346847 T1 AT E346847T1
Authority
AT
Austria
Prior art keywords
group
formula
inter alia
applications
c12alkyl
Prior art date
Application number
AT00929446T
Other languages
English (en)
Inventor
Hitoshi Yamato
Masaki Ohwa
Toshikage Asakura
Akira Matsumoto
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE346847T1 publication Critical patent/ATE346847T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/54—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and unsaturated
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F295/00—Macromolecular compounds obtained by polymerisation using successively different catalyst types without deactivating the intermediate polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D153/02—Vinyl aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00—Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00—Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C09J153/02—Vinyl aromatic monomers and conjugated dienes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
AT00929446T 1999-05-10 2000-04-27 Neue photoinitiatoren und deren anwendungen ATE346847T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP99810413 1999-05-10

Publications (1)

Publication Number Publication Date
ATE346847T1 true ATE346847T1 (de) 2006-12-15

Family

ID=8242821

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00929446T ATE346847T1 (de) 1999-05-10 2000-04-27 Neue photoinitiatoren und deren anwendungen

Country Status (8)

Country Link
US (1) US6673850B1 (de)
EP (1) EP1177182B1 (de)
JP (1) JP2002544205A (de)
KR (1) KR100698799B1 (de)
AT (1) ATE346847T1 (de)
AU (1) AU4752200A (de)
DE (1) DE60032131T2 (de)
WO (1) WO2000068218A1 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1241196A3 (de) * 2001-03-12 2002-11-20 Ciba SC Holding AG ROMP mit Alkoxa-Ether Gruppen
MXPA02002378A (es) 2001-03-12 2002-09-24 Ciba Sc Holding Ag "romp con grupos alcoxi eter".
US7237893B2 (en) 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
US7235195B2 (en) * 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
CA2535089A1 (en) * 2003-08-08 2005-02-17 Calhoun Vision Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
US7141354B2 (en) 2003-09-30 2006-11-28 Dai Nippon Printing Co., Ltd. Photo radical generator, photo sensitive resin composition and article
JP4504142B2 (ja) * 2003-09-30 2010-07-14 大日本印刷株式会社 光ラジカル発生剤、感光性樹脂組成物及び、物品
US7713628B2 (en) * 2005-05-31 2010-05-11 Chemque, Inc. Actinic radiation curable coating compositions
EP3118841B1 (de) 2006-07-14 2021-01-06 Dexerials Corporation Harzzusammensetzung und anzeigevorrichtung
FR2909093B1 (fr) * 2006-11-28 2012-07-13 Arkema France Memoire optique 3d comprenant un copolymere a blocs contenant un monomere photoactif porteur d'un groupement photoisomerisable.
JP5401824B2 (ja) 2007-04-09 2014-01-29 デクセリアルズ株式会社 画像表示装置
WO2008126868A1 (ja) * 2007-04-09 2008-10-23 Sony Chemical & Information Device Corporation 画像表示装置
JP2009186957A (ja) * 2007-04-09 2009-08-20 Sony Chemical & Information Device Corp 樹脂組成物及び表示装置
JP5470735B2 (ja) * 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
GB0708531D0 (en) * 2007-05-03 2007-06-13 Fujifilm Imaging Colorants Ltd Process, compound, ink and use
KR100825420B1 (ko) * 2007-10-24 2008-04-29 주식회사 코오롱 자외선 및 열 경화형 액정디스플레이 패널용 접착제의제조방법
CN101320208B (zh) * 2008-07-21 2011-06-01 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法
CA2769210A1 (en) * 2009-06-29 2011-01-06 Dic Corporation Michael addition reaction product and active energy ray-curable composition
JP5640978B2 (ja) * 2009-08-26 2014-12-17 Jsr株式会社 新規化合物、その製造方法、この新規化合物を含有する感放射線性組成物及び硬化膜
JP5955832B2 (ja) * 2010-03-22 2016-07-20 ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング マクロ光開始剤およびそれらの硬化性組成物
US8022243B1 (en) * 2010-05-24 2011-09-20 Chitec Technology Co. Ltd. Low odour oligomeric photoinitiator and method of making the same
EP2997008B1 (de) * 2014-03-20 2016-06-29 F.I.S.- Fabbrica Italiana Sintetici S.p.A. Verfahren zur herstellung wichtiger zwischenprodukte von omarigliptin
JP6662870B2 (ja) 2014-10-27 2020-03-11 シーテック アドヒーシブス リミティド ライアビリティ カンパニー Ｕｖ硬化性粘着剤（ｐｓａ）又は段階処理可能なｐｓａ系を用いた組立て方法
WO2018177488A1 (en) * 2017-03-31 2018-10-04 Coloplast A/S Acrylami de photoi ni ti ators
CN107569403B (zh) * 2017-08-02 2020-05-22 珠海市傲博化妆品有限公司 一种可酒精卸除的甲油胶及其制备方法
CN111032102B (zh) * 2017-08-17 2022-03-22 科洛普拉斯特公司 聚合物涂层
CN107793503A (zh) * 2017-09-28 2018-03-13 大连天源基化学有限公司 一种紫外光引发剂及其合成方法
US11511480B2 (en) * 2018-10-26 2022-11-29 Continuous Composites Inc. System for additive manufacturing
KR102446362B1 (ko) 2019-10-15 2022-09-21 삼성에스디아이 주식회사 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법
CN114591241B (zh) * 2022-03-14 2024-02-13 内蒙古扬帆新材料有限公司 一种含有吡唑啉和α-氨基酮的分子内敏化大分子光引发剂及其制备方法和应用
CN114591452B (zh) * 2022-03-14 2023-10-17 内蒙古扬帆新材料有限公司 一种含有α-氨基酮多官能化大分子光引发剂及其制造方法和应用

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0088050B1 (de) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
EP0117233B1 (de) * 1983-02-18 1987-08-26 Ciba-Geigy Ag Photohärtbare gefärbte Massen
GB8312721D0 (en) * 1983-05-09 1983-06-15 Vickers Plc Photoinitiators
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3738567A1 (de) * 1987-03-12 1988-09-22 Merck Patent Gmbh Coreaktive fotoinitiatoren
DE3880868D1 (en) * 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
DE3880920T2 (de) * 1987-08-05 1993-10-07 Ciba Geigy Verbindungen.
US5264533A (en) * 1988-06-16 1993-11-23 Basf Aktiengesellschaft Benzophenone derivatives and their preparation
FR2697840B1 (fr) * 1992-11-10 1994-12-02 Rhone Poulenc Chimie Utilisation de diènes comme agent de transfert lors de la préparation de polymères.
WO1994029355A1 (en) * 1993-06-04 1994-12-22 Henkel Corporation Citral acetal ethers of alpha-hydroxy phenyl ketones and polymerizable compositions
TW328535B (en) * 1993-07-02 1998-03-21 Novartis Ag Functional photoinitiators and their manufacture
US5506279A (en) * 1993-10-13 1996-04-09 Minnesota Mining And Manufacturing Company Acrylamido functional disubstituted acetyl aryl ketone photoinitiators
TW353086B (en) * 1994-12-30 1999-02-21 Novartis Ag Method for multistep coating of a surface
TW434456B (en) 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
DE59504366D1 (de) * 1994-12-30 1999-01-07 Novartis Ag Polymere auf der grundlage von blockcopolymeren
TW452575B (en) * 1996-12-06 2001-09-01 Ciba Sc Holding Ag New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
FR2770219A1 (fr) * 1997-10-24 1999-04-30 Atochem Elf Sa Procede de fabrication de copolymeres a architecture controlee a l'aide d'amorceurs radicalaires fonctionnels en polymerisation radicalaire vivante, et composes amorceurs et copolymeres correspondants
US6458864B1 (en) * 1998-05-29 2002-10-01 Ciba Specialty Chemicals Corporation Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers

Also Published As

Publication number Publication date
EP1177182B1 (de) 2006-11-29
AU4752200A (en) 2000-11-21
US6673850B1 (en) 2004-01-06
KR20010113921A (ko) 2001-12-28
WO2000068218A1 (en) 2000-11-16
KR100698799B1 (ko) 2007-03-26
EP1177182A1 (de) 2002-02-06
DE60032131T2 (de) 2007-10-25
JP2002544205A (ja) 2002-12-24
DE60032131D1 (de) 2007-01-11

Similar Documents

Publication Publication Date Title
DE60032131D1 (de) Neue photoinitiatoren und deren anwendungen
MY120488A (en) Oxime ester photoinitiators
IL126610A0 (en) N-(amidinophenyl)-n'-(subst.)-3h-2,4-benzodiazepin-3- one derivatives as factor xa inhibitors
NO329484B1 (no) Nye kinuklidinderivater og medisinske sammensetninger inneholdende det samme, samt anvendelse derav for fremstilling av medikamenter
DE69608916D1 (de) Verbindungen und ihre zusammensetzungen mit entzündungshemmenden und anti-thrombotischen wirkungen
DE69531543D1 (de) N,n'-bis(chinolin-4-yl)-diamin derivate, deren herstellung und deren verwendung als antimalaria-mittel
YU11997A (sh) Laktamski derivati i njihove farmaceutske kompozicije
TR200100693T2 (tr) Azetidin türevleri, hazırlanmaları ve bunları içeren ilaçlar
TR200101339T2 (tr) Potasyum kanal modülatörleri olarak 3-yer-alanlı-4-arilkinolin-2-on türevleri, 3,4-okzadiazolon türevleri
DK0666858T3 (da) 5-arylindolderivater og deres anvendelse som serotonin(5-HT1)-agonister
HUP9901590A2 (hu) Szubsztituált aza- és diaza-cikloheptán- és -ciklooktán-származékok, alkalmazásuk, a vegyületeket tartalmazó gyógyászati készítmények
ATE348839T1 (de) Acylierte betulin- und dihydrobetulinderivate, ihre herstellung und verwendung
DK1100789T3 (da) Substituerede benzoylcyclohexandioner
IT1232252B (it) Derivati della n fenil benzamide ad attivita' antiulcera ed antiallerica e procedimento per la loro preparazione
ATE262509T1 (de) Indolinderivate als lichtschutzmittel
BR9915692A (pt) Monohidrato de bromidrato de eletriptano
ATE257139T1 (de) Ein (1'r,2's,5'r)-3-l-menthoxypropan-1-ol, das eine kühlende empfindung erzeugt
DK0888379T3 (da) Forbindelser tilhørende amidinium-familien, farmaceutiske præparater indeholdende disse forbindelser og anvendelsen deraf
DE3686232D1 (de) Lactamderivate, deren herstellung und deren benutzung als hypotensive mittel.
EP0998906A3 (de) Shampoozusammensetzung
ATE297389T1 (de) 1,3-dihydroxybenzol-derivate und diese verbindungen enthaltende färbemittel
ATE477263T1 (de) Zusammensetzung enthaltend ferrocen-derivate und treibstoff diese enthaltend
ATE346127T1 (de) Aromatische verbindungen mit kondensierten ringen,materialien für lichtemittierende geräte und lichtemittierende geräte in denen solche verwendet werden
ATE183502T1 (de) Octahydro-2-naphthalincarbonsäure-derivate, ihre herstellung und verwendung
ATE203533T1 (de) INDOLDERIVATE ALS PRODRUGS VON ß5-HT1-LIKEß REZEPTOR AGONISTEN

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties