ES2657710T3 - Macro-fotoiniciadores y composiciones curables de los mismos - Google Patents

Macro-fotoiniciadores y composiciones curables de los mismos Download PDF

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Publication number
ES2657710T3
ES2657710T3 ES11759867.2T ES11759867T ES2657710T3 ES 2657710 T3 ES2657710 T3 ES 2657710T3 ES 11759867 T ES11759867 T ES 11759867T ES 2657710 T3 ES2657710 T3 ES 2657710T3
Authority
ES
Spain
Prior art keywords
photoinitiator
macro
alkyl
compounds
independently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES11759867.2T
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English (en)
Spanish (es)
Inventor
John G. Woods
Roderick Coffey
Anthony F. Jacobine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel IP and Holding GmbH
Original Assignee
Henkel IP and Holding GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Henkel IP and Holding GmbH filed Critical Henkel IP and Holding GmbH
Application granted granted Critical
Publication of ES2657710T3 publication Critical patent/ES2657710T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
ES11759867.2T 2010-03-22 2011-02-17 Macro-fotoiniciadores y composiciones curables de los mismos Active ES2657710T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31619010P 2010-03-22 2010-03-22
US316190P 2010-03-22
PCT/US2011/025153 WO2011119272A2 (en) 2010-03-22 2011-02-17 Macro-photoinitiators and curable compositions thereof

Publications (1)

Publication Number Publication Date
ES2657710T3 true ES2657710T3 (es) 2018-03-06

Family

ID=44673796

Family Applications (1)

Application Number Title Priority Date Filing Date
ES11759867.2T Active ES2657710T3 (es) 2010-03-22 2011-02-17 Macro-fotoiniciadores y composiciones curables de los mismos

Country Status (8)

Country Link
US (1) US8748503B2 (https=)
EP (1) EP2550307B1 (https=)
JP (1) JP5955832B2 (https=)
KR (1) KR101437751B1 (https=)
CN (1) CN102770465B (https=)
CA (1) CA2786630C (https=)
ES (1) ES2657710T3 (https=)
WO (1) WO2011119272A2 (https=)

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WO2016031052A1 (ja) * 2014-08-29 2016-03-03 三菱電機株式会社 半導体装置及び多相用半導体装置
US9587062B2 (en) * 2014-12-15 2017-03-07 Henkel IP & Holding GmbH and Henkel AG & Co. KGaA Photocrosslinkable block copolymers for hot-melt adhesives
EP3242899A4 (en) * 2015-01-08 2018-07-04 Henkel IP & Holding GmbH Process for preparing high molecular weight polyacrylates having narrow polydispersity indices
US10492888B2 (en) 2015-07-07 2019-12-03 Align Technology, Inc. Dental materials using thermoset polymers
AU2017250778B2 (en) 2016-04-15 2021-09-23 Beckman Coulter, Inc. Photoactive macromolecules and uses thereof
EP3481872B1 (en) * 2016-07-11 2020-04-08 3M Innovative Properties Company Polymeric material and methods of making using controlled radical initiators
EP3683605B1 (en) 2017-09-15 2022-07-06 FUJIFILM Corporation Composition, film, laminate, infrared transmission filter, solid-state imaging device and infrared sensor
AU2019262641B2 (en) 2018-05-04 2025-02-06 Align Technology, Inc. Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom
US10781274B2 (en) * 2018-05-04 2020-09-22 Align Technology, Inc. Polymerizable monomers and method of polymerizing the same
JP7114724B2 (ja) 2018-09-20 2022-08-08 富士フイルム株式会社 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法
JP7260847B2 (ja) 2019-02-26 2023-04-19 株式会社リコー 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置
KR102652548B1 (ko) 2019-06-27 2024-03-29 후지필름 가부시키가이샤 조성물, 막 및 광 센서
JP7237166B2 (ja) 2019-08-29 2023-03-10 富士フイルム株式会社 組成物、膜、近赤外線カットフィルタ、パターン形成方法、積層体、固体撮像素子、赤外線センサ、画像表示装置、カメラモジュール、及び、化合物
WO2021039253A1 (ja) 2019-08-30 2021-03-04 富士フイルム株式会社 組成物、膜、光学フィルタ及びその製造方法、固体撮像素子、赤外線センサ、並びに、センサモジュール
EP4041119A2 (en) 2019-10-31 2022-08-17 Align Technology, Inc. Crystallizable resins
CN110981995B (zh) * 2019-12-27 2021-12-07 阜阳欣奕华材料科技有限公司 一种低迁移型光引发剂及其制备方法和应用
EP4130147A4 (en) 2020-03-30 2023-08-09 FUJIFILM Corporation COMPOSITION, FILM AND OPTICAL SENSOR
EP4220859A4 (en) 2020-09-28 2024-03-27 FUJIFILM Corporation LAMINATE PRODUCTION PROCESS, ANTENNA-IN-PACKAGE PRODUCTION PROCESS, LAMINATE AND COMPOSITION
CN112430279A (zh) * 2020-11-23 2021-03-02 濮阳展辰新材料有限公司 一种酰化法制备大分子光引发剂的方法及其应用
EP4266094A4 (en) 2020-12-16 2024-08-28 FUJIFILM Corporation Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor
WO2022130773A1 (ja) 2020-12-17 2022-06-23 富士フイルム株式会社 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
WO2022196599A1 (ja) 2021-03-19 2022-09-22 富士フイルム株式会社 膜および光センサ
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
WO2022210175A1 (ja) 2021-03-29 2022-10-06 富士フイルム株式会社 黒色感光性組成物、黒色感光性組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット
KR102627683B1 (ko) 2021-08-31 2024-01-23 후지필름 가부시키가이샤 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액
WO2023054142A1 (ja) 2021-09-29 2023-04-06 富士フイルム株式会社 組成物、樹脂、膜および光センサ
EP4456133A4 (en) 2021-12-23 2025-07-30 Fujifilm Corp Joined body production method, joined body, laminate production method, laminate, device production method, device, and composition for forming polyimide-containing precursor part
EP4485074A4 (en) 2022-02-24 2025-08-13 Fujifilm Corp RESIN COMPOSITION, CURED ARTICLE, LAMINATE, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
JPWO2023190064A1 (https=) 2022-03-29 2023-10-05
JPWO2024043110A1 (https=) 2022-08-22 2024-02-29
TW202424051A (zh) 2022-09-30 2024-06-16 日商富士軟片股份有限公司 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件
KR20250056254A (ko) 2022-09-30 2025-04-25 후지필름 가부시키가이샤 막의 제조 방법, 감광성 수지 조성물, 경화물의 제조 방법, 경화물, 및 적층체
KR20250055605A (ko) 2022-09-30 2025-04-24 후지필름 가부시키가이샤 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스
WO2024203080A1 (ja) 2023-03-31 2024-10-03 富士フイルム株式会社 薬液、パターン形成方法
CN121271472A (zh) * 2025-10-21 2026-01-06 拓迪化学(上海)股份有限公司 一种uv延迟固化耐电解液胶带及其制备方法和应用

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Also Published As

Publication number Publication date
WO2011119272A2 (en) 2011-09-29
US8748503B2 (en) 2014-06-10
EP2550307B1 (en) 2017-11-22
EP2550307A4 (en) 2014-03-19
JP5955832B2 (ja) 2016-07-20
US20130018122A1 (en) 2013-01-17
KR101437751B1 (ko) 2014-09-03
CA2786630A1 (en) 2011-09-29
KR20130018702A (ko) 2013-02-25
CN102770465B (zh) 2015-04-22
JP2013522445A (ja) 2013-06-13
EP2550307A2 (en) 2013-01-30
CA2786630C (en) 2016-02-02
CN102770465A (zh) 2012-11-07
WO2011119272A3 (en) 2012-01-05

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