KR101430516B1 - 가스 방전 레이저용 연장가능한 전극 - Google Patents

가스 방전 레이저용 연장가능한 전극 Download PDF

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KR101430516B1
KR101430516B1 KR1020097022448A KR20097022448A KR101430516B1 KR 101430516 B1 KR101430516 B1 KR 101430516B1 KR 1020097022448 A KR1020097022448 A KR 1020097022448A KR 20097022448 A KR20097022448 A KR 20097022448A KR 101430516 B1 KR101430516 B1 KR 101430516B1
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elongated
electrode
discharge
inclined surface
elongated member
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KR20090129492A (ko
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리차드 엘. 샌드스트롬
태 에이치. 정
리차드 씨. 우자즈도우스키
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사이머 엘엘씨
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
KR1020097022448A 2007-04-16 2008-03-25 가스 방전 레이저용 연장가능한 전극 Active KR101430516B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/787,463 2007-04-16
US11/787,463 US7856044B2 (en) 1999-05-10 2007-04-16 Extendable electrode for gas discharge laser
PCT/US2008/003890 WO2008130474A1 (en) 2007-04-16 2008-03-25 Extendable electrode for gas discharge laser

Publications (2)

Publication Number Publication Date
KR20090129492A KR20090129492A (ko) 2009-12-16
KR101430516B1 true KR101430516B1 (ko) 2014-08-18

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Country Status (6)

Country Link
US (3) US7856044B2 (cg-RX-API-DMAC7.html)
EP (1) EP2137796B1 (cg-RX-API-DMAC7.html)
JP (1) JP5680403B2 (cg-RX-API-DMAC7.html)
KR (1) KR101430516B1 (cg-RX-API-DMAC7.html)
TW (1) TWI395385B (cg-RX-API-DMAC7.html)
WO (1) WO2008130474A1 (cg-RX-API-DMAC7.html)

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US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
JP5650547B2 (ja) * 2008-03-14 2015-01-07 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ カムロック電極クランプ
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
USRE45957E1 (en) * 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
CN102761047B (zh) * 2012-07-30 2013-09-25 中国科学院光电研究院 一种气体激光器放电腔的电极机构
WO2014046186A1 (ja) * 2012-09-21 2014-03-27 ギガフォトン株式会社 レーザ装置
JP6383729B2 (ja) 2013-10-02 2018-08-29 ギガフォトン株式会社 レーザ装置
TWI490254B (zh) 2013-12-31 2015-07-01 Ind Tech Res Inst 無機鈍化塗料、其形成方法、及所形成之無機鈍化保護膜
JP6364476B2 (ja) * 2014-03-18 2018-07-25 ギガフォトン株式会社 ガスレーザ装置及びその制御方法
WO2016143105A1 (ja) * 2015-03-11 2016-09-15 ギガフォトン株式会社 エキシマレーザチャンバ装置
US10074953B2 (en) * 2015-09-30 2018-09-11 Cymer, Llc Erosion resistant electrodes for use in generating gas discharge laser
JP7095084B2 (ja) * 2017-10-24 2022-07-04 サイマー リミテッド ライアビリティ カンパニー レーザチャンバ内の電極の寿命を延ばす方法及び装置
KR102445660B1 (ko) * 2018-01-17 2022-09-20 사이머 엘엘씨 레이저 챔버에서 방전 성능을 튜닝하기 위한 장치
CN109411996A (zh) * 2018-11-29 2019-03-01 北京科益虹源光电技术有限公司 一种准分子激光器电极结构及准分子激光器
CN119029651A (zh) * 2019-10-11 2024-11-26 西默有限公司 用于放电激光器的传导构件
KR102668769B1 (ko) * 2021-08-18 2024-06-24 주식회사 아밀이엔지 전기유압 약물분사 장치의 사용 방법
WO2025202806A1 (en) * 2024-03-28 2025-10-02 Cymer, Llc Systems and methods for electrode position sensing and adjustment

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US7856044B2 (en) 2010-12-21
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US8526481B2 (en) 2013-09-03
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US20070253459A1 (en) 2007-11-01
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