IT1148956B - Laser a gas impulsanti in struttura sigillata - Google Patents

Laser a gas impulsanti in struttura sigillata

Info

Publication number
IT1148956B
IT1148956B IT48641/82A IT4864182A IT1148956B IT 1148956 B IT1148956 B IT 1148956B IT 48641/82 A IT48641/82 A IT 48641/82A IT 4864182 A IT4864182 A IT 4864182A IT 1148956 B IT1148956 B IT 1148956B
Authority
IT
Italy
Prior art keywords
sealed structure
gas lasers
pulsing gas
pulsing
lasers
Prior art date
Application number
IT48641/82A
Other languages
English (en)
Other versions
IT8248641A0 (it
Inventor
Eugenio Penco
Renato Marchetti
Adriano Bagaglia
Original Assignee
Selenia Industire Elettroniche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Selenia Industire Elettroniche filed Critical Selenia Industire Elettroniche
Priority to IT48641/82A priority Critical patent/IT1148956B/it
Publication of IT8248641A0 publication Critical patent/IT8248641A0/it
Priority to EP83105881A priority patent/EP0096899B1/en
Priority to US06/504,133 priority patent/US4546482A/en
Priority to DE8383105881T priority patent/DE3373597D1/de
Application granted granted Critical
Publication of IT1148956B publication Critical patent/IT1148956B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0305—Selection of materials for the tube or the coatings thereon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lasers (AREA)
IT48641/82A 1982-06-15 1982-06-15 Laser a gas impulsanti in struttura sigillata IT1148956B (it)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IT48641/82A IT1148956B (it) 1982-06-15 1982-06-15 Laser a gas impulsanti in struttura sigillata
EP83105881A EP0096899B1 (en) 1982-06-15 1983-06-15 Pulsed gas laser in a sealed structure
US06/504,133 US4546482A (en) 1982-06-15 1983-06-15 Sealed CO2 laser
DE8383105881T DE3373597D1 (en) 1982-06-15 1983-06-15 Pulsed gas laser in a sealed structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT48641/82A IT1148956B (it) 1982-06-15 1982-06-15 Laser a gas impulsanti in struttura sigillata

Publications (2)

Publication Number Publication Date
IT8248641A0 IT8248641A0 (it) 1982-06-15
IT1148956B true IT1148956B (it) 1986-12-03

Family

ID=11267796

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48641/82A IT1148956B (it) 1982-06-15 1982-06-15 Laser a gas impulsanti in struttura sigillata

Country Status (4)

Country Link
US (1) US4546482A (it)
EP (1) EP0096899B1 (it)
DE (1) DE3373597D1 (it)
IT (1) IT1148956B (it)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1197768B (it) * 1983-12-29 1988-12-06 Selenia Ind Elettroniche Preionizzatore ad effetto corona per laser a gas
IT1197769B (it) * 1983-12-29 1988-12-06 Enea Laser con preionizzazione corona ad alta cadenza ripetitiva
DE3443539A1 (de) * 1984-11-29 1986-06-05 Eltro GmbH, Gesellschaft für Strahlungstechnik, 6900 Heidelberg Verfahren und vorrichtung zum betreiben eines elektrisch angeregten gaslasers
JPS61280499A (ja) * 1985-06-05 1986-12-11 Sumitomo Chem Co Ltd ホスフイン酸アルミニウム塩のアミン付加化合物およびそれを有効成分とする植物病害防除剤
US4750182A (en) * 1986-06-05 1988-06-07 Uniphase Corporation Gas lasers
US4833686A (en) * 1987-06-29 1989-05-23 Hughes Aircraft Company Electrodes for transversely excited gas lasers
US5040184A (en) * 1990-06-04 1991-08-13 Raytheon Company Starter circuit for an RF laser
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6414979B2 (en) 2000-06-09 2002-07-02 Cymer, Inc. Gas discharge laser with blade-dielectric electrode
US6654403B2 (en) 2000-06-09 2003-11-25 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
US7132123B2 (en) * 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6560263B1 (en) 2000-06-09 2003-05-06 Cymer, Inc. Discharge laser having electrodes with sputter cavities and discharge peaks
US7190708B2 (en) 2000-11-01 2007-03-13 Cymer, Inc. Annealed copper alloy electrodes for fluorine containing gas discharge lasers
US6363094B1 (en) 2000-06-09 2002-03-26 Cymer, Inc. Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects
US6711202B2 (en) 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface
US6690706B2 (en) 2000-06-09 2004-02-10 Cymer, Inc. High rep-rate laser with improved electrodes
US6466602B1 (en) 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
RU2002120302A (ru) * 2002-07-31 2004-03-20 Владимир Михайлович Борисов Эксимерный лазер
US7633989B2 (en) * 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
US7540945B2 (en) * 2005-07-29 2009-06-02 Marquez Salvatierra Manuel Antonio Anticorrosive treatment for shaving blades
US7706424B2 (en) * 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
WO2015115624A1 (ja) * 2014-01-30 2015-08-06 京セラ株式会社 筒体、プラズマ装置、ガスレーザー装置、および筒体の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2338502A1 (de) * 1973-07-30 1975-02-20 Siemens Ag Entladungsgefaess fuer einen gaslaser
CH612298A5 (it) * 1976-06-23 1979-07-13 Battelle Memorial Institute
DE2861391D1 (en) * 1977-12-23 1982-01-28 Battelle Memorial Institute Electrically excited impulse laser having an active gas medium
JPS5720488A (en) * 1980-07-14 1982-02-02 Ushio Inc Discharge electrode body for exciting gas laser
DE3138570C2 (de) * 1981-09-28 1983-11-03 Siemens AG, 1000 Berlin und 8000 München Gaslaser

Also Published As

Publication number Publication date
DE3373597D1 (en) 1987-10-15
EP0096899A2 (en) 1983-12-28
EP0096899A3 (en) 1984-04-04
US4546482A (en) 1985-10-08
EP0096899B1 (en) 1987-09-09
IT8248641A0 (it) 1982-06-15

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