KR101420471B1 - 포토레지스트 박리제조성물 - Google Patents

포토레지스트 박리제조성물 Download PDF

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Publication number
KR101420471B1
KR101420471B1 KR1020097024223A KR20097024223A KR101420471B1 KR 101420471 B1 KR101420471 B1 KR 101420471B1 KR 1020097024223 A KR1020097024223 A KR 1020097024223A KR 20097024223 A KR20097024223 A KR 20097024223A KR 101420471 B1 KR101420471 B1 KR 101420471B1
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South Korea
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weight
photoresist
sorbitol
group
uracil
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KR20100017192A (ko
Inventor
타카후미 야마베
요시타카 니시지마
히데쿠니 야스에
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나가세케무텍쿠스가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
KR1020097024223A 2007-05-15 2008-05-13 포토레지스트 박리제조성물 Active KR101420471B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2007-129699 2007-05-15
JP2007129699A JP4716225B2 (ja) 2007-05-15 2007-05-15 フォトレジスト剥離剤組成物
PCT/JP2008/058750 WO2008140076A1 (ja) 2007-05-15 2008-05-13 フォトレジスト剥離剤組成物

Publications (2)

Publication Number Publication Date
KR20100017192A KR20100017192A (ko) 2010-02-16
KR101420471B1 true KR101420471B1 (ko) 2014-07-16

Family

ID=40002266

Family Applications (1)

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KR1020097024223A Active KR101420471B1 (ko) 2007-05-15 2008-05-13 포토레지스트 박리제조성물

Country Status (5)

Country Link
JP (1) JP4716225B2 (enExample)
KR (1) KR101420471B1 (enExample)
CN (1) CN101681129B (enExample)
TW (1) TWI434150B (enExample)
WO (1) WO2008140076A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102124414B (zh) * 2009-04-17 2014-04-02 长瀬化成株式会社 光致抗蚀剂剥离剂组合物以及光致抗蚀剂剥离方法
JP5890306B2 (ja) * 2009-07-29 2016-03-22 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 洗浄液組成物及びこれを用いたパネルの洗浄方法
JP5023128B2 (ja) * 2009-10-07 2012-09-12 東京エレクトロン株式会社 塗布現像装置及び塗布現像方法
JP5709075B2 (ja) * 2010-09-10 2015-04-30 ナガセケムテックス株式会社 リン酸及び／又はリン酸塩の水溶液のパーティクル数経時安定化方法及びレジスト残渣剥離剤組成物
KR101089211B1 (ko) * 2010-12-02 2011-12-02 엘티씨 (주) 1차 알칸올 아민을 포함하는 ｌｃｄ 제조용 포토레지스트 박리액 조성물
JP5885046B1 (ja) * 2015-03-24 2016-03-15 パナソニックＩｐマネジメント株式会社 レジスト剥離液
CN111781808B (zh) * 2015-09-16 2024-06-07 东友精细化工有限公司 抗蚀剂剥离液组合物、平板显示器基板及其制造方法
WO2017065153A1 (ja) * 2015-10-13 2017-04-20 ナガセケムテックス株式会社 フォトレジスト剥離液
JP6160893B1 (ja) * 2016-09-30 2017-07-12 パナソニックＩｐマネジメント株式会社 レジスト剥離液
JP7176089B2 (ja) 2018-07-20 2022-11-21 インテグリス・インコーポレーテッド 腐食防止剤を含む洗浄組成物
KR102334425B1 (ko) * 2019-11-21 2021-12-01 엘티씨 (주) 디스플레이 제조용 포토레지스트 박리액 조성물

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001350276A (ja) 2000-06-05 2001-12-21 Nagase Kasei Kogyo Kk フォトレジスト剥離剤組成物及びその使用方法
JP2002351093A (ja) 2001-05-22 2002-12-04 Nagase Chemtex Corp レジスト剥離用組成物
JP2004287288A (ja) 2003-03-24 2004-10-14 Nagase Chemtex Corp レジスト剥離用組成物及びレジスト剥離方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08262746A (ja) * 1995-03-28 1996-10-11 Mitsubishi Gas Chem Co Inc フォトレジスト剥離剤組成物および剥離方法
JP4628209B2 (ja) * 2004-11-18 2011-02-09 花王株式会社 剥離剤組成物
JP4692497B2 (ja) * 2007-02-28 2011-06-01 ナガセケムテックス株式会社 フォトレジスト剥離剤組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001350276A (ja) 2000-06-05 2001-12-21 Nagase Kasei Kogyo Kk フォトレジスト剥離剤組成物及びその使用方法
JP2002351093A (ja) 2001-05-22 2002-12-04 Nagase Chemtex Corp レジスト剥離用組成物
JP2004287288A (ja) 2003-03-24 2004-10-14 Nagase Chemtex Corp レジスト剥離用組成物及びレジスト剥離方法

Also Published As

Publication number Publication date
JP4716225B2 (ja) 2011-07-06
CN101681129A (zh) 2010-03-24
KR20100017192A (ko) 2010-02-16
WO2008140076A1 (ja) 2008-11-20
JP2008286881A (ja) 2008-11-27
CN101681129B (zh) 2012-05-30
TW200900884A (en) 2009-01-01
TWI434150B (zh) 2014-04-11

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