KR101367839B1 - 고품질 표면을 생성하기 위한 방법과 고품질 표면을 가진 제품 - Google Patents

고품질 표면을 생성하기 위한 방법과 고품질 표면을 가진 제품 Download PDF

Info

Publication number
KR101367839B1
KR101367839B1 KR1020087023267A KR20087023267A KR101367839B1 KR 101367839 B1 KR101367839 B1 KR 101367839B1 KR 1020087023267 A KR1020087023267 A KR 1020087023267A KR 20087023267 A KR20087023267 A KR 20087023267A KR 101367839 B1 KR101367839 B1 KR 101367839B1
Authority
KR
South Korea
Prior art keywords
target
coating
coated
delete delete
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020087023267A
Other languages
English (en)
Korean (ko)
Other versions
KR20090005302A (ko
Inventor
레이요 라팔라이넌
베사 뮈뤼메키
라세 풀리
유하 메키탈로
Original Assignee
피코데온 리미티드 오와이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 피코데온 리미티드 오와이 filed Critical 피코데온 리미티드 오와이
Publication of KR20090005302A publication Critical patent/KR20090005302A/ko
Application granted granted Critical
Publication of KR101367839B1 publication Critical patent/KR101367839B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605Carbon
    • C23C14/0611Diamond
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/081Oxides of aluminium, magnesium or beryllium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/087Oxides of copper or solid solutions thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Laser Beam Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Photovoltaic Devices (AREA)
  • Laminated Bodies (AREA)
KR1020087023267A 2006-02-23 2007-02-23 고품질 표면을 생성하기 위한 방법과 고품질 표면을 가진 제품 Expired - Fee Related KR101367839B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20060177 2006-02-23
FI20060177A FI20060177A7 (fi) 2006-02-23 2006-02-23 Menetelmä tuottaa hyvälaatuisia pintoja ja hyvälaatuisen pinnan omaava tuote
PCT/FI2007/000046 WO2007096461A2 (en) 2006-02-23 2007-02-23 Method for producing high-quality surfaces and a product having a high-quality surface

Publications (2)

Publication Number Publication Date
KR20090005302A KR20090005302A (ko) 2009-01-13
KR101367839B1 true KR101367839B1 (ko) 2014-03-14

Family

ID=35953641

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087023267A Expired - Fee Related KR101367839B1 (ko) 2006-02-23 2007-02-23 고품질 표면을 생성하기 위한 방법과 고품질 표면을 가진 제품

Country Status (9)

Country Link
US (1) US20090169871A1 (https=)
EP (1) EP1991386A2 (https=)
JP (1) JP5437640B2 (https=)
KR (1) KR101367839B1 (https=)
CN (4) CN101389439A (https=)
FI (1) FI20060177A7 (https=)
IL (1) IL193646A0 (https=)
RU (1) RU2435871C2 (https=)
WO (1) WO2007096461A2 (https=)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006017311A1 (en) 2004-07-12 2006-02-16 Cardinal Cg Company Low-maintenance coatings
US20100221489A1 (en) * 2006-02-23 2010-09-02 Picodeon Ltd Oy Coating on a glass substrate and a coated glass product
EP2013150B1 (en) 2006-04-11 2018-02-28 Cardinal CG Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
FI20070889A7 (fi) * 2007-11-21 2009-05-22 Picodeon Ltd Oy Pinnankäsittelymenetelmä
WO2009091331A1 (en) * 2008-01-18 2009-07-23 Sandvik Intellectual Property Ab Method of making a coated medical bone implant and a medical bone implant made thereby
ES2343668B1 (es) * 2009-02-04 2011-07-22 Consejo Superior De Investigaciones Cientificas (Csic)(50%) Procedimiento de marcaje, encriptacion, etiquetado y codificacion optica.
DE102009019166B3 (de) * 2009-04-23 2010-12-02 Axo Dresden Gmbh Verfahren zur Herstellung eines Referenzkörpers für Röntgenfluoreszenzuntersuchungen an Substraten und mit dem Verfahren hergestellter Referenzkörper
FI20096154A0 (fi) 2009-11-06 2009-11-06 Beneq Oy Menetelmä kalvon muodostamiseksi, kalvo ja sen käyttöjä
US20130256286A1 (en) * 2009-12-07 2013-10-03 Ipg Microsystems Llc Laser processing using an astigmatic elongated beam spot and using ultrashort pulses and/or longer wavelengths
US20120221099A1 (en) * 2011-02-24 2012-08-30 Alexander Borck Coated biological material having improved properties
CN102418082B (zh) * 2011-11-21 2013-10-30 中国矿业大学 薄膜涂层微纳米织构制备方法及其装置
CN102496658B (zh) * 2011-12-27 2013-11-20 天威新能源控股有限公司 一种太阳能电池减反射膜的制备方法
DE102011122510A1 (de) * 2011-12-29 2013-07-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Beschichtung von optischen Wellenleitern
US8513045B1 (en) * 2012-01-31 2013-08-20 Sunpower Corporation Laser system with multiple laser pulses for fabrication of solar cells
CN102677045B (zh) * 2012-05-22 2014-10-01 山东能源机械集团大族再制造有限公司 一种激光熔覆方法
TW201446378A (zh) * 2013-05-30 2014-12-16 Ipg Microsystems Llc 使用散光加長型光束點以及使用超短脈波及/或較長波長的雷射處理方法
US20150014289A1 (en) * 2013-07-12 2015-01-15 Benxin Wu Laser-induced plasma deburring
RU2556177C1 (ru) * 2014-01-09 2015-07-10 Федеральное государственное бюджетное образовательное учреждение высшего образования "Сибирский государственный университет геосистем и технологий" (СГУГиТ) Способ сублимационного лазерного профилирования или сверления прозрачных подложек
CA2979303A1 (en) * 2014-03-11 2015-09-17 Les Innovations Materium Inc. Processes for preparing silica-carbon allotrope composite materials and using same
FI126659B (fi) * 2014-09-24 2017-03-31 Picodeon Ltd Oy Menetelmä Li-akkujen separaattorikalvojen pinnoittamiseksi ja pinnoitettu separaattorikalvo
EP3250728A1 (de) * 2015-01-28 2017-12-06 Siltectra GmbH Transparenter und hochstabiler displayschutz
CN106556898A (zh) * 2015-09-25 2017-04-05 国网辽宁省电力有限公司本溪供电公司 一种光缆绝缘防火涂层喷涂工艺
RU2614330C1 (ru) * 2015-11-09 2017-03-24 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Алтайский государственный университет" Способ получения тонкой наноалмазной пленки на стеклянной подложке
US10946579B2 (en) 2015-12-14 2021-03-16 The Board Of Trustees Of The Leland Stanford Junior University Device fabrication using 3D printing
RU2630941C1 (ru) * 2016-07-04 2017-09-14 Федеральное государственное бюджетное образовательное учреждение высшего образования "Юго-Западный государственный университет" (ЮЗ ГУ) Цистерна для транспортирования сжиженного природного газа
CN109862991A (zh) * 2016-07-28 2019-06-07 伊雷克托科学工业股份有限公司 镭射处理设备和镭射处理工件的方法
TWI637805B (zh) * 2016-10-25 2018-10-11 財團法人工業技術研究院 金屬表面之雷射加工系統及其方法
EP3541762B1 (en) 2016-11-17 2022-03-02 Cardinal CG Company Static-dissipative coating technology
DE102017002986B4 (de) * 2016-12-13 2019-08-29 AIXLens GmbH Verfahren zur Herstellung einer transmitiven Optik und Intraokularlinse
RU2675194C1 (ru) * 2017-07-18 2018-12-17 Федеральное государственное бюджетное учреждение науки Физико-технический институт им. А.Ф. Иоффе Российской академии наук Способ упрочнения поверхности вольфрамовой пластины
CN109848569A (zh) * 2017-11-29 2019-06-07 北京自动化控制设备研究所 一种mems硅结构的激光刻蚀方法
CN108857941A (zh) * 2018-05-23 2018-11-23 彩虹集团有限公司 一种大尺寸玻璃基板溢流砖工作基准面的加工刀具和方法
CN109954966A (zh) * 2019-03-28 2019-07-02 大族激光科技产业集团股份有限公司 通过飞秒激光进行金属表面处理的方法
CN111203651B (zh) * 2020-01-15 2021-06-22 北京理工大学 空间整形飞秒激光在透明材料内部加工计算全息图的方法
RU2751608C1 (ru) * 2020-10-06 2021-07-15 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технологический университет "СТАНКИН" (ФГБОУ ВО "МГТУ "СТАНКИН") Способ модификации поверхностного слоя режущих пластин из инструментальной керамики, предназначенной для точения никелевых сплавов
CN112719617A (zh) * 2020-12-24 2021-04-30 鹤山市精工制版有限公司 一种激光雕刻镭射全息图案生产工艺
CN114763259B (zh) * 2021-02-02 2023-07-25 天津大学 利用激光烧蚀法在衬底表面制备氮化碳薄膜涂层的方法及其应用
CN113523577A (zh) * 2021-07-09 2021-10-22 济南森峰激光科技股份有限公司 基于转镜的perc电池片高速激光开槽方法、装置及perc电池片
RU2766421C1 (ru) * 2021-11-29 2022-03-15 Дмитрий Юрьевич Старцев Способ нанесения оксидированной нержавеющей стали на стеклянные изделия
CN114843543A (zh) * 2022-06-01 2022-08-02 冠驰新能科技(南京)有限公司 一种超疏冷凝水表面及其制备方法、电池极板和燃料电池
CN116559145B (zh) * 2023-06-15 2025-10-28 山东大学 一种基于拉曼光谱的激光烧蚀阈值测试装置及测试方法
US12364965B2 (en) * 2023-07-11 2025-07-22 Honeywell Federal Manufacturing & Technologies, Llc High-energy laser surface processing for industrial column packing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001515965A (ja) * 1997-09-11 2001-09-25 ジ・オーストラリアン・ナショナル・ユニバーシティー 薄膜の蒸着方法
KR20030045082A (ko) * 2000-09-20 2003-06-09 에이지티 원 피티와이 리미티드 레이저 제거 방법을 이용한 박막의 증착

Family Cites Families (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US933A (en) 1838-09-19 Mode of covering the roofs of buildings with tin-plate or other metal
US4099830A (en) * 1976-12-15 1978-07-11 A. J. Bingley Limited Optical systems including polygonal mirrors rotatable about two axes
DE2918283C2 (de) * 1979-05-07 1983-04-21 Carl Baasel, Lasertechnik KG, 8000 München Gerät zur Substratbehandlung mit einem Drehspiegel od. dgl.
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
FR2496703A1 (fr) * 1980-12-24 1982-06-25 Labo Electronique Physique Source d'evaporation de manganese sur substrat dans le vide, notamment sur substrat de couche photosensible dans un tube photo-electrique et procede de fabrication
US4394236A (en) * 1982-02-16 1983-07-19 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4686128A (en) * 1985-07-01 1987-08-11 Raytheon Company Laser hardened missile casing
JPS62174370A (ja) * 1986-01-28 1987-07-31 Mitsubishi Electric Corp セラミツクスコ−テイング装置
JP2505375B2 (ja) * 1986-10-27 1996-06-05 株式会社日立製作所 化合物膜の成膜方法及び成膜装置
US5098737A (en) * 1988-04-18 1992-03-24 Board Of Regents The University Of Texas System Amorphic diamond material produced by laser plasma deposition
US5411797A (en) * 1988-04-18 1995-05-02 Board Of Regents, The University Of Texas System Nanophase diamond films
JPH02122813A (ja) * 1988-11-02 1990-05-10 Nippon Atom Ind Group Co Ltd 金属蒸気発生装置
JPH05804A (ja) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd 大面積複合酸化物超電導薄膜の成膜装置
DE69203633T2 (de) * 1991-03-18 1996-01-25 Gen Motors Corp Filme aus kohlenstofflegiertem, kubischem Bornitrid.
JPH0532491A (ja) * 1991-07-29 1993-02-09 Sumitomo Electric Ind Ltd 複合酸化物超電導薄膜の成膜方法
JP3101636B2 (ja) * 1991-11-21 2000-10-23 日本たばこ産業株式会社 帯状シートの穿孔装置
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
WO1995002709A2 (en) * 1993-07-15 1995-01-26 President And Fellows Of Harvard College EXTENDED NITRIDE MATERIAL COMPRISING β-C3N¿4?
US5578229A (en) * 1994-10-18 1996-11-26 Michigan State University Method and apparatus for cutting boards using opposing convergent laser beams
US5683601A (en) * 1994-10-24 1997-11-04 Panasonic Technologies, Inc. Laser ablation forward metal deposition with electrostatic assisted bonding
JPH08325714A (ja) * 1995-05-26 1996-12-10 Mitsubishi Electric Corp 蒸着装置
US6063455A (en) 1995-10-09 2000-05-16 Institute For Advanced Engineering Apparatus for manufacturing diamond film having a large area and method thereof
JPH09118589A (ja) * 1995-10-26 1997-05-06 International Superconductivity Technology Center 酸化物薄膜生成法
USH1933H1 (en) * 1996-04-08 2001-01-02 The United States Of America As Represented By The Secretary Of The Air Force Magnetron sputter-pulsed laser deposition system and method
US5742028A (en) * 1996-07-24 1998-04-21 General Electric Company Preloaded laser shock peening
US5736709A (en) * 1996-08-12 1998-04-07 Armco Inc. Descaling metal with a laser having a very short pulse width and high average power
US6683783B1 (en) * 1997-03-07 2004-01-27 William Marsh Rice University Carbon fibers formed from single-wall carbon nanotubes
US5880552A (en) * 1997-05-27 1999-03-09 The United States Of America As Represented By The Secretary Of The Navy Diamond or diamond like carbon coated chemical sensors and a method of making same
US5858478A (en) * 1997-12-02 1999-01-12 The Aerospace Corporation Magnetic field pulsed laser deposition of thin films
JPH11189472A (ja) * 1997-12-25 1999-07-13 Hamamatsu Photonics Kk 窒化炭素の合成方法
FR2775005B1 (fr) * 1998-02-17 2000-05-26 Univ Lille Sciences Tech Revetement a base de nitrure de carbone ultra-dur et souple et son procede de preparation
US6159832A (en) * 1998-03-18 2000-12-12 Mayer; Frederick J. Precision laser metallization
US6198069B1 (en) * 1998-08-13 2001-03-06 The Regents Of The University Of California Laser beam temporal and spatial tailoring for laser shock processing
AU6431199A (en) * 1998-10-12 2000-05-01 Regents Of The University Of California, The Laser deposition of thin films
KR20000026066A (ko) * 1998-10-17 2000-05-06 윤종용 회전반사경 조립체 및 이를 채용한 인쇄장치
JP4480809B2 (ja) * 1999-03-30 2010-06-16 Hoya株式会社 酸化インジウム薄膜及びその製造方法
US6428762B1 (en) * 1999-07-27 2002-08-06 William Marsh Rice University Powder synthesis and characterization of amorphous carbon nitride, a-C3N4
JP3531865B2 (ja) * 2000-07-06 2004-05-31 独立行政法人 科学技術振興機構 超平坦透明導電膜およびその製造方法
RU2205893C2 (ru) * 2001-04-23 2003-06-10 ООО "Инженерно-физический центр" Способ и устройство нанесения покрытий методом плазмохимического осаждения
JP2003021818A (ja) * 2001-07-05 2003-01-24 Toshiba Corp 平面表示素子の製造方法
US6676811B1 (en) * 2001-08-13 2004-01-13 The United States Of America As Represented By The Secretary Of The Air Force Method of depositing nanoparticles for flux pinning into a superconducting material
US6884328B2 (en) * 2001-11-29 2005-04-26 Seagate Technology Llc Selective annealing of magnetic recording films
US6677552B1 (en) * 2001-11-30 2004-01-13 Positive Light, Inc. System and method for laser micro-machining
US20030145681A1 (en) * 2002-02-05 2003-08-07 El-Shall M. Samy Copper and/or zinc alloy nanopowders made by laser vaporization and condensation
US6809291B1 (en) * 2002-08-30 2004-10-26 Southeastern Universities Research Assn., Inc. Process for laser machining and surface treatment
KR100565051B1 (ko) * 2002-09-16 2006-03-30 삼성전자주식회사 광주사유닛 및 이를 채용한 전자사진방식 화상형성장치
US20040250769A1 (en) * 2002-10-28 2004-12-16 Finisar Corporation Pulsed laser deposition for mass production
KR100821810B1 (ko) * 2002-11-08 2008-04-11 도꾸리쯔교세이호진 상교기쥬쯔 소고겡뀨죠 기판상의 막형성 방법
US7397592B2 (en) * 2003-04-21 2008-07-08 Semiconductor Energy Laboratory Co., Ltd. Beam irradiation apparatus, beam irradiation method, and method for manufacturing a thin film transistor
JP4515136B2 (ja) * 2003-04-21 2010-07-28 株式会社半導体エネルギー研究所 レーザビーム照射装置、薄膜トランジスタの作製方法
US20050061779A1 (en) * 2003-08-06 2005-03-24 Walter Blumenfeld Laser ablation feedback spectroscopy
RU2242532C1 (ru) * 2003-09-09 2004-12-20 Гуревич Сергей Александрович Способ получения наночастиц
US20050067389A1 (en) * 2003-09-25 2005-03-31 Greer James A. Target manipulation for pulsed laser deposition
JP4141933B2 (ja) * 2003-10-10 2008-08-27 独立行政法人科学技術振興機構 微粒子捕捉用の穴状回転フィルター板を有する成膜装置及び成膜方法
US7049543B2 (en) * 2003-11-07 2006-05-23 The Regents Of The University Of California Method of defining features on materials with a femtosecond laser
US7879410B2 (en) * 2004-06-09 2011-02-01 Imra America, Inc. Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
US7527824B2 (en) * 2004-06-25 2009-05-05 Becker Michael F Methods for producing coated nanoparticles from microparticles
CN1312734C (zh) * 2005-01-28 2007-04-25 华中科技大学 飞秒脉冲激光制备β-FeSi2半导体薄膜的方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001515965A (ja) * 1997-09-11 2001-09-25 ジ・オーストラリアン・ナショナル・ユニバーシティー 薄膜の蒸着方法
KR20030045082A (ko) * 2000-09-20 2003-06-09 에이지티 원 피티와이 리미티드 레이저 제거 방법을 이용한 박막의 증착

Also Published As

Publication number Publication date
CN101389440A (zh) 2009-03-18
CN101389439A (zh) 2009-03-18
RU2008137493A (ru) 2010-03-27
CN101389441B (zh) 2014-09-10
CN101389441A (zh) 2009-03-18
EP1991386A2 (en) 2008-11-19
CN101421071A (zh) 2009-04-29
RU2435871C2 (ru) 2011-12-10
JP5437640B2 (ja) 2014-03-12
CN101389440B (zh) 2014-10-15
FI20060177L (fi) 2007-08-24
JP2009527642A (ja) 2009-07-30
KR20090005302A (ko) 2009-01-13
WO2007096461A3 (en) 2007-10-18
WO2007096461A2 (en) 2007-08-30
IL193646A0 (en) 2009-05-04
FI20060177A0 (fi) 2006-02-23
US20090169871A1 (en) 2009-07-02
FI20060177A7 (fi) 2007-08-24

Similar Documents

Publication Publication Date Title
KR101367839B1 (ko) 고품질 표면을 생성하기 위한 방법과 고품질 표면을 가진 제품
JP2009527642A5 (https=)
CN101437644B (zh) 涂覆方法
KR101565099B1 (ko) 타겟의 광자 융발을 위한 방법 및 장치
JP2009527644A5 (https=)
KR20090003255A (ko) 탄소 질화물 코팅 및 탄소 질화물 코팅된 제품
US20080160295A1 (en) Method for adjusting ablation threshold
US20070245956A1 (en) Surface treatment technique and surface treatment apparatus associated with ablation technology
WO2007096460A2 (en) Surface treatment technique and surface treatment apparatus associated with ablation technology
US20090166343A1 (en) Method for Producing Surfaces and Materials by Laser Ablation
JP2009527359A5 (https=)
WO2007096483A2 (en) Coating on a stone or ceramic substrate and a coated stone or ceramic product
WO2009066011A2 (en) Surface processing method
JP5091686B2 (ja) パルスレーザ蒸着方法
RU2467092C2 (ru) Способ нанесения покрытия и металлическое изделие, снабженное покрытием
CN101128616A (zh) 脉冲激光沉积方法
WO2007116124A1 (en) Method for adjusting ablation threshold

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20170219

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20170219

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000