KR101365784B1 - 에칭 후 포토레지스트 및 바닥 반사 방지 코팅의 제거에 유용한 조성물 - Google Patents

에칭 후 포토레지스트 및 바닥 반사 방지 코팅의 제거에 유용한 조성물 Download PDF

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Publication number
KR101365784B1
KR101365784B1 KR1020077017990A KR20077017990A KR101365784B1 KR 101365784 B1 KR101365784 B1 KR 101365784B1 KR 1020077017990 A KR1020077017990 A KR 1020077017990A KR 20077017990 A KR20077017990 A KR 20077017990A KR 101365784 B1 KR101365784 B1 KR 101365784B1
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South Korea
Prior art keywords
triazine
composition
photoresist
group
barc
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Expired - Lifetime
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KR1020077017990A
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Korean (ko)
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KR20070099012A (ko
Inventor
데이비드 더블유 민섹
웨이후아 왕
데이비드 디 버나드
토마스 에이치 바움
멜리사 케이 래스
Original Assignee
어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드
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Publication of KR20070099012A publication Critical patent/KR20070099012A/ko
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Assigned to 인티그리스, 인코포레이티드 reassignment 인티그리스, 인코포레이티드 권리의 전부이전등록 Assignors: 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020077017990A 2005-01-07 2006-01-09 에칭 후 포토레지스트 및 바닥 반사 방지 코팅의 제거에 유용한 조성물 Expired - Lifetime KR101365784B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/031,118 US20060154186A1 (en) 2005-01-07 2005-01-07 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings
US11/031,118 2005-01-07
PCT/US2006/000366 WO2006074316A1 (en) 2005-01-07 2006-01-09 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings

Publications (2)

Publication Number Publication Date
KR20070099012A KR20070099012A (ko) 2007-10-08
KR101365784B1 true KR101365784B1 (ko) 2014-02-20

Family

ID=36647826

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077017990A Expired - Lifetime KR101365784B1 (ko) 2005-01-07 2006-01-09 에칭 후 포토레지스트 및 바닥 반사 방지 코팅의 제거에 유용한 조성물

Country Status (9)

Country Link
US (2) US20060154186A1 (https=)
EP (2) EP1844367A4 (https=)
JP (1) JP2008527447A (https=)
KR (1) KR101365784B1 (https=)
CN (2) CN101137939B (https=)
IL (1) IL184483A0 (https=)
SG (1) SG164385A1 (https=)
TW (1) TWI426361B (https=)
WO (1) WO2006074316A1 (https=)

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JP2008546036A (ja) 2005-06-07 2008-12-18 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 金属および誘電体相溶性の犠牲反射防止コーティング浄化および除去組成物
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Also Published As

Publication number Publication date
CN101137939A (zh) 2008-03-05
CN101137939B (zh) 2014-09-03
US20090215659A1 (en) 2009-08-27
TWI426361B (zh) 2014-02-11
EP2482134A2 (en) 2012-08-01
US7994108B2 (en) 2011-08-09
IL184483A0 (en) 2007-10-31
EP1844367A4 (en) 2011-08-31
SG164385A1 (en) 2010-09-29
WO2006074316A1 (en) 2006-07-13
CN104199261A (zh) 2014-12-10
JP2008527447A (ja) 2008-07-24
KR20070099012A (ko) 2007-10-08
EP2482134A3 (en) 2012-11-07
TW200629012A (en) 2006-08-16
US20060154186A1 (en) 2006-07-13
EP1844367A1 (en) 2007-10-17
CN104199261B (zh) 2019-07-09

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