KR101324348B1 - 웨이퍼 검사용 인터페이스 장치 및 웨이퍼 검사 장치 - Google Patents
웨이퍼 검사용 인터페이스 장치 및 웨이퍼 검사 장치 Download PDFInfo
- Publication number
- KR101324348B1 KR101324348B1 KR1020110092498A KR20110092498A KR101324348B1 KR 101324348 B1 KR101324348 B1 KR 101324348B1 KR 1020110092498 A KR1020110092498 A KR 1020110092498A KR 20110092498 A KR20110092498 A KR 20110092498A KR 101324348 B1 KR101324348 B1 KR 101324348B1
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- inspection
- probe card
- region
- alignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measuring Leads Or Probes (AREA)
- Tests Of Electronic Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2010-207224 | 2010-09-15 | ||
| JP2010207224A JP5675239B2 (ja) | 2010-09-15 | 2010-09-15 | ウエハ検査用インターフェース及びウエハ検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20120028835A KR20120028835A (ko) | 2012-03-23 |
| KR101324348B1 true KR101324348B1 (ko) | 2013-10-31 |
Family
ID=45806058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020110092498A Expired - Fee Related KR101324348B1 (ko) | 2010-09-15 | 2011-09-14 | 웨이퍼 검사용 인터페이스 장치 및 웨이퍼 검사 장치 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8975904B2 (https=) |
| JP (1) | JP5675239B2 (https=) |
| KR (1) | KR101324348B1 (https=) |
| CN (1) | CN102401874B (https=) |
| TW (1) | TWI525727B (https=) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2012023180A1 (ja) * | 2010-08-17 | 2013-10-28 | 株式会社アドバンテスト | 接続装置、それを備えた半導体ウェハ試験装置、及び接続方法 |
| JP5889581B2 (ja) * | 2010-09-13 | 2016-03-22 | 東京エレクトロン株式会社 | ウエハ検査装置 |
| JP2012204695A (ja) * | 2011-03-25 | 2012-10-22 | Tokyo Electron Ltd | プローブカード検出装置、ウエハの位置合わせ装置及びウエハの位置合わせ方法 |
| JP6001326B2 (ja) * | 2012-05-23 | 2016-10-05 | 東京エレクトロン株式会社 | プローブ装置及びプローブ装置用ウエハ載置台 |
| JP5952645B2 (ja) | 2012-06-06 | 2016-07-13 | 東京エレクトロン株式会社 | ウエハ検査用インターフェース及びウエハ検査装置 |
| JP6099347B2 (ja) | 2012-10-03 | 2017-03-22 | 東京エレクトロン株式会社 | ウエハ取り付け方法及びウエハ検査装置 |
| KR102138794B1 (ko) * | 2013-03-18 | 2020-07-28 | 삼성전자주식회사 | 반도체 패키지 위치정렬트레이, 그를 이용하는 테스트 핸들러, 반도체 패키지 위치 정렬 방법, 그리고 그를 이용하는 반도체 패키지 테스트 방법 |
| JP6267928B2 (ja) | 2013-10-29 | 2018-01-24 | 東京エレクトロン株式会社 | ウエハ検査装置の整備用台車及びウエハ検査装置の整備方法 |
| CN105181157B (zh) * | 2014-06-20 | 2017-07-28 | 沈阳芯源微电子设备有限公司 | 一种测温晶圆微调装置 |
| JP5858312B1 (ja) * | 2014-07-25 | 2016-02-10 | 株式会社東京精密 | プロービング装置及びプローブコンタクト方法 |
| JP6333112B2 (ja) * | 2014-08-20 | 2018-05-30 | 東京エレクトロン株式会社 | ウエハ検査装置 |
| JP6625423B2 (ja) * | 2015-12-17 | 2019-12-25 | 東京エレクトロン株式会社 | ウエハ検査装置及びそのメンテナンス方法 |
| JP6283760B2 (ja) * | 2017-03-14 | 2018-02-21 | 東京エレクトロン株式会社 | ウエハ検査装置 |
| JP6785375B2 (ja) * | 2017-06-21 | 2020-11-18 | 東京エレクトロン株式会社 | 検査システム |
| JP3214100U (ja) * | 2017-10-06 | 2017-12-21 | ワイエイシイガーター株式会社 | 測定装置、及び分類装置 |
| US10566256B2 (en) | 2018-01-04 | 2020-02-18 | Winway Technology Co., Ltd. | Testing method for testing wafer level chip scale packages |
| JP7018368B2 (ja) * | 2018-07-12 | 2022-02-10 | 東京エレクトロン株式会社 | 検査装置及び検査装置の清浄化方法 |
| JP7170494B2 (ja) * | 2018-10-15 | 2022-11-14 | 東京エレクトロン株式会社 | 中間接続部材及び検査装置 |
| JP6700366B2 (ja) * | 2018-11-05 | 2020-05-27 | 東京エレクトロン株式会社 | ウエハ検査装置 |
| JP6655703B2 (ja) * | 2018-12-26 | 2020-02-26 | 東京エレクトロン株式会社 | 被整備テストヘッド及びウエハ検査装置 |
| JP6903725B2 (ja) * | 2018-12-26 | 2021-07-14 | 東京エレクトロン株式会社 | ウエハ検査システム |
| JP7267111B2 (ja) * | 2019-05-31 | 2023-05-01 | 東京エレクトロン株式会社 | 位置決め機構及び位置決め方法 |
| JPWO2021064788A1 (https=) * | 2019-09-30 | 2021-04-08 | ||
| JP7308776B2 (ja) * | 2020-02-17 | 2023-07-14 | 東京エレクトロン株式会社 | プローブカード保持装置及び検査装置 |
| JP7382888B2 (ja) * | 2020-04-06 | 2023-11-17 | 東京エレクトロン株式会社 | 検査装置、及び、検査装置の制御方法 |
| JP2020145446A (ja) * | 2020-04-30 | 2020-09-10 | 東京エレクトロン株式会社 | ウエハ検査装置 |
| TWM641397U (zh) * | 2022-12-30 | 2023-05-21 | 致茂電子股份有限公司 | 晶圓檢測系統 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6124725A (en) | 1997-11-29 | 2000-09-26 | Tokyo Electron Limited | Apparatus and method for testing semiconductor devices formed on a semiconductor wafer |
| JP2009295686A (ja) | 2008-06-03 | 2009-12-17 | Micronics Japan Co Ltd | プロービング装置 |
| JP2010186998A (ja) | 2009-02-12 | 2010-08-26 | Advantest Corp | 半導体ウェハ試験装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3648699B2 (ja) * | 1997-02-03 | 2005-05-18 | 東京エレクトロン株式会社 | ウエハの一括検査装置及びウエハの一括検査方法 |
| JP3388271B2 (ja) * | 1997-05-19 | 2003-03-17 | 東京エレクトロン株式会社 | プローブ装置 |
| JPH11186349A (ja) | 1997-12-24 | 1999-07-09 | Matsushita Electric Ind Co Ltd | ウェハバーンイン装置 |
| US6073681A (en) * | 1997-12-31 | 2000-06-13 | Temptronic Corporation | Workpiece chuck |
| US6812718B1 (en) * | 1999-05-27 | 2004-11-02 | Nanonexus, Inc. | Massively parallel interface for electronic circuits |
| US6483336B1 (en) * | 2000-05-03 | 2002-11-19 | Cascade Microtech, Inc. | Indexing rotatable chuck for a probe station |
| JP4544707B2 (ja) * | 2000-07-17 | 2010-09-15 | アピックヤマダ株式会社 | ワークの搬送治具 |
| JP3891798B2 (ja) * | 2001-06-19 | 2007-03-14 | 松下電器産業株式会社 | プローブ装置 |
| US6885206B2 (en) * | 2003-02-11 | 2005-04-26 | Strasbaugh | Device for supporting thin semiconductor wafers |
| US7138629B2 (en) * | 2003-04-22 | 2006-11-21 | Ebara Corporation | Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| DE102004034421A1 (de) * | 2004-07-15 | 2006-02-09 | Pac Tech - Packaging Technologies Gmbh | Verfahren und Vorrichtung zur wechselseitigen Kontaktierung von zwei Wafern |
| TW200846668A (en) * | 2007-01-23 | 2008-12-01 | Nictech Co Ltd | Probe and probe card having the same |
| JP5134864B2 (ja) * | 2007-05-30 | 2013-01-30 | 株式会社日本マイクロニクス | 半導体検査装置 |
| JP4999615B2 (ja) * | 2007-08-31 | 2012-08-15 | 東京エレクトロン株式会社 | 検査装置及び検査方法 |
| KR100959372B1 (ko) * | 2008-03-24 | 2010-05-24 | 미래산업 주식회사 | 반도체 소자 이송장치, 핸들러, 및 반도체 소자 제조방법 |
-
2010
- 2010-09-15 JP JP2010207224A patent/JP5675239B2/ja active Active
-
2011
- 2011-09-09 TW TW100132651A patent/TWI525727B/zh not_active IP Right Cessation
- 2011-09-12 US US13/230,161 patent/US8975904B2/en active Active
- 2011-09-14 KR KR1020110092498A patent/KR101324348B1/ko not_active Expired - Fee Related
- 2011-09-15 CN CN201110273307.5A patent/CN102401874B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6124725A (en) | 1997-11-29 | 2000-09-26 | Tokyo Electron Limited | Apparatus and method for testing semiconductor devices formed on a semiconductor wafer |
| JP2009295686A (ja) | 2008-06-03 | 2009-12-17 | Micronics Japan Co Ltd | プロービング装置 |
| JP2010186998A (ja) | 2009-02-12 | 2010-08-26 | Advantest Corp | 半導体ウェハ試験装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20120062258A1 (en) | 2012-03-15 |
| KR20120028835A (ko) | 2012-03-23 |
| JP2012063227A (ja) | 2012-03-29 |
| CN102401874A (zh) | 2012-04-04 |
| TWI525727B (zh) | 2016-03-11 |
| JP5675239B2 (ja) | 2015-02-25 |
| CN102401874B (zh) | 2014-10-08 |
| US8975904B2 (en) | 2015-03-10 |
| TW201232688A (en) | 2012-08-01 |
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