KR101290941B1 - 희토류 금속 또는 이들의 산화물로 이루어지는 타깃의 보관 방법 - Google Patents

희토류 금속 또는 이들의 산화물로 이루어지는 타깃의 보관 방법 Download PDF

Info

Publication number
KR101290941B1
KR101290941B1 KR1020117006460A KR20117006460A KR101290941B1 KR 101290941 B1 KR101290941 B1 KR 101290941B1 KR 1020117006460 A KR1020117006460 A KR 1020117006460A KR 20117006460 A KR20117006460 A KR 20117006460A KR 101290941 B1 KR101290941 B1 KR 101290941B1
Authority
KR
South Korea
Prior art keywords
target
rare earth
earth metal
oxide
storage
Prior art date
Application number
KR1020117006460A
Other languages
English (en)
Korean (ko)
Other versions
KR20110047235A (ko
Inventor
가즈유키 사토
요시마사 고이도
Original Assignee
제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 filed Critical 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤
Publication of KR20110047235A publication Critical patent/KR20110047235A/ko
Application granted granted Critical
Publication of KR101290941B1 publication Critical patent/KR101290941B1/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D81/00—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
    • B65D81/24—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants
    • B65D81/26—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants with provision for draining away, or absorbing, or removing by ventilation, fluids, e.g. exuded by contents; Applications of corrosion inhibitors or desiccators
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F15/00—Other methods of preventing corrosion or incrustation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Food Science & Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Packages (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
KR1020117006460A 2008-10-29 2009-10-23 희토류 금속 또는 이들의 산화물로 이루어지는 타깃의 보관 방법 KR101290941B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008277725 2008-10-29
JPJP-P-2008-277725 2008-10-29
PCT/JP2009/068248 WO2010050409A1 (ja) 2008-10-29 2009-10-23 希土類金属又はこれらの酸化物からなるターゲットの保管方法

Publications (2)

Publication Number Publication Date
KR20110047235A KR20110047235A (ko) 2011-05-06
KR101290941B1 true KR101290941B1 (ko) 2013-07-29

Family

ID=42128772

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117006460A KR101290941B1 (ko) 2008-10-29 2009-10-23 희토류 금속 또는 이들의 산화물로 이루어지는 타깃의 보관 방법

Country Status (6)

Country Link
US (1) US20110162322A1 (zh)
JP (1) JP5032662B2 (zh)
KR (1) KR101290941B1 (zh)
CN (1) CN102203314B (zh)
TW (1) TWI472458B (zh)
WO (1) WO2010050409A1 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2224024A4 (en) * 2007-12-28 2011-03-09 Nippon Mining Co HIGH PURITY LANTHANE, CATHODIC SPUTTER TARGET COMPRISING HIGH PURITY LANTHANE AND METAL GRID FILM COMPRISING HIGHLY PURETHYLANTANT LANTHANE
CN102089258B (zh) * 2008-07-07 2014-04-16 Jx日矿日石金属株式会社 氧化镧基烧结体、包含该烧结体的溅射靶、氧化镧基烧结体的制造方法及通过该制造方法制造溅射靶的方法
EP2298712B1 (en) * 2008-07-07 2014-10-01 JX Nippon Mining & Metals Corporation Sputtering target comprising the sintered object, process for producing the sintered object, and process for producing sputtering target comprising the sintered object
EP2412843B1 (en) 2009-03-27 2013-11-06 JX Nippon Mining & Metals Corporation Lanthanum target for sputtering
EP2415899B1 (en) 2009-03-31 2013-11-20 JX Nippon Mining & Metals Corporation Lanthanum target for sputtering
KR101975741B1 (ko) 2009-11-13 2019-05-09 가부시키가이샤 한도오따이 에네루기 켄큐쇼 타깃 재료의 포장 방법 및 타깃의 장착 방법
KR20120023725A (ko) 2009-11-17 2012-03-13 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 란탄 산화물 타겟의 보관 방법 및 진공 밀봉한 란탄 산화물 타겟
CA2825301C (en) 2011-01-21 2015-05-12 Jx Nippon Mining & Metals Corporation Method for producing high-purity lanthanum, high-purity lanthanum, sputtering target formed from high-purity lanthanum, and metal gate film having high-purity lanthanum as main component
KR20130109170A (ko) * 2011-03-01 2013-10-07 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 금속 란탄 타깃의 보관 방법, 진공 밀봉한 금속 란탄 타깃 및 금속 란탄 타깃을 이용하여 스퍼터링에 의해 형성한 박막
CN102417042A (zh) * 2011-07-25 2012-04-18 武汉科技大学 易水化粉末标准样品/物质的包装与贮存方法
CN104309865A (zh) * 2014-05-30 2015-01-28 微密科技(无锡)有限公司 一种防颗粒污染的包装方法
JP6178455B1 (ja) * 2016-03-30 2017-08-09 Ｊｘ金属株式会社 円筒型スパッタリングターゲット及びその梱包方法
JP6348940B2 (ja) * 2016-09-21 2018-06-27 Ｊｘ金属株式会社 円筒型焼結体及びその梱包方法
JP6885981B2 (ja) * 2019-03-29 2021-06-16 Ｊｘ金属株式会社 スパッタリングターゲットの梱包物の作製方法及び輸送方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08246145A (ja) * 1995-03-13 1996-09-24 Vacuum Metallurgical Co Ltd 誘電体ターゲットの保管容器および保管方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4427992A (en) * 1975-12-17 1984-01-24 Motorola, Inc. Method for incorporating a desiccant in a semiconductor package
DE2927428C3 (de) * 1979-07-06 1982-05-19 Siemens AG, 1000 Berlin und 8000 München Leuchtstoff
JPH02159372A (ja) * 1988-12-12 1990-06-19 Nec Corp スパッタリングターゲット用保護容器
JPH04231461A (ja) * 1990-12-27 1992-08-20 Tosoh Corp スパッタリングターゲットの保護具及び包装方法
US5866263A (en) * 1996-04-26 1999-02-02 Semi-Alloys Company Adsorbent lid construction
US6030514A (en) * 1997-05-02 2000-02-29 Sony Corporation Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor
JP2000073054A (ja) * 1998-08-31 2000-03-07 Toyota Motor Corp 酸化防止剤およびその使用方法
TW546396B (en) * 1999-12-22 2003-08-11 Mitsui Mining & Smelting Co Packed high purity target
JP2001240959A (ja) * 1999-12-22 2001-09-04 Mitsui Mining & Smelting Co Ltd 梱包された高純度ターゲット
US6733882B2 (en) * 2000-08-10 2004-05-11 Shin-Etsu Chemical Co., Ltd. Rare earth hydroxide and method for the preparation thereof
US6390179B1 (en) * 2000-11-08 2002-05-21 Pcc Structurals, Inc. Method for processing materials to increase slurry lifetime
JP2002212718A (ja) * 2001-01-17 2002-07-31 Sumitomo Metal Mining Co Ltd 保護膜付きターゲットおよび表面処理方法
JP3887253B2 (ja) * 2002-03-19 2007-02-28 日鉱金属株式会社 スパッタリングターゲット用運搬箱
JP4391478B2 (ja) * 2003-10-15 2009-12-24 日鉱金属株式会社 ホローカソード型スパッタリングターゲットの包装装置及び包装方法
US7498015B1 (en) * 2004-02-27 2009-03-03 Kovio, Inc. Method of making silane compositions
KR20130090932A (ko) * 2005-06-03 2013-08-14 프레자코르, 인크. 원소 금속을 포함하는 조성물 및 그의 용도
KR20160027244A (ko) * 2006-03-10 2016-03-09 인티그리스, 인코포레이티드 티타네이트, 란타네이트 및 탄탈레이트 유전막의 원자층 증착 및 화학 증기 증착용 전구체 조성물
WO2008001745A1 (fr) * 2006-06-29 2008-01-03 Mitsui Mining & Smelting Co., Ltd. Agent déshumidifiant/désoxydant
KR100778518B1 (ko) * 2006-12-06 2007-11-22 삼성에스디아이 주식회사 유기 발광 표시 장치
EP2091096A1 (en) * 2008-02-15 2009-08-19 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Encapsulated electronic device and method of manufacturing
KR20120023725A (ko) * 2009-11-17 2012-03-13 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 란탄 산화물 타겟의 보관 방법 및 진공 밀봉한 란탄 산화물 타겟
KR20130109170A (ko) * 2011-03-01 2013-10-07 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 금속 란탄 타깃의 보관 방법, 진공 밀봉한 금속 란탄 타깃 및 금속 란탄 타깃을 이용하여 스퍼터링에 의해 형성한 박막
CN102312115B (zh) * 2011-09-23 2012-12-26 太原理工大学 一种氧化镧变质剂的制备方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08246145A (ja) * 1995-03-13 1996-09-24 Vacuum Metallurgical Co Ltd 誘電体ターゲットの保管容器および保管方法

Also Published As

Publication number Publication date
JPWO2010050409A1 (ja) 2012-03-29
CN102203314B (zh) 2013-07-17
CN102203314A (zh) 2011-09-28
KR20110047235A (ko) 2011-05-06
WO2010050409A1 (ja) 2010-05-06
TW201016551A (en) 2010-05-01
US20110162322A1 (en) 2011-07-07
JP5032662B2 (ja) 2012-09-26
TWI472458B (zh) 2015-02-11

Similar Documents

Publication Publication Date Title
KR101290941B1 (ko) 희토류 금속 또는 이들의 산화물로 이루어지는 타깃의 보관 방법
US8911600B2 (en) Method of storing lanthanum oxide target, and vacuum-sealed lanthanum oxide target
EP2082619B1 (en) Nanoparticulate encapsulation barrier stack
US7833327B2 (en) Thermal insulator
EP2990712B1 (en) Insulator including gas adsorbent
CN112020571B (zh) 溅射靶的包装物的制作方法及运输方法
EP2682497A1 (en) Method for storing metallic lanthanum target, vacuum-sealed metallic lanthanum target, and thin film formed by sputtering using metallic lanthanum target
JP6178455B1 (ja) 円筒型スパッタリングターゲット及びその梱包方法
JP6306929B2 (ja) 焼結体の製造方法
JP2009063033A (ja) 断熱体
CN109896073A (zh) 一种分子筛包的制造工艺
JP4797614B2 (ja) 断熱体
JP2004059154A (ja) 封着材料梱包体及び封着材料の梱包方法
JP7422615B2 (ja) 窒化アルミニウム粉末の包装方法
JP6348940B2 (ja) 円筒型焼結体及びその梱包方法
JP2003026251A (ja) 吸湿性セラミックスの包装方法及び保管方法
EP1657747A1 (en) Method of manufacturing highly moisture-sensitive electronic device elements
TW201509865A (zh) Ｉｎ－Ｇａ－Ｚｎ系複合氧化物燒結體及其製造方法
JP2017179585A (ja) 円筒型スパッタリングターゲット及びその梱包方法
JPH05195730A (ja) 内燃機関の中空バルブ

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20160616

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20170616

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20180628

Year of fee payment: 6