KR101169474B1 - 감방사선성 수지 조성물, 스페이서 및 그의 형성 방법 및 액정 표시 소자 - Google Patents

감방사선성 수지 조성물, 스페이서 및 그의 형성 방법 및 액정 표시 소자 Download PDF

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KR101169474B1
KR101169474B1 KR1020050039215A KR20050039215A KR101169474B1 KR 101169474 B1 KR101169474 B1 KR 101169474B1 KR 1020050039215 A KR1020050039215 A KR 1020050039215A KR 20050039215 A KR20050039215 A KR 20050039215A KR 101169474 B1 KR101169474 B1 KR 101169474B1
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ethylenically unsaturated
weight
ether
resin composition
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KR1020050039215A
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KR20060046050A (ko
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다이고 이찌노헤
도시히로 니시오
도모꼬 이와부찌
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제이에스알 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020050039215A 2004-05-12 2005-05-11 감방사선성 수지 조성물, 스페이서 및 그의 형성 방법 및 액정 표시 소자 KR101169474B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00142821 2004-05-12
JP2004142821A JP4539165B2 (ja) 2004-05-12 2004-05-12 感放射線性樹脂組成物、スペーサー、およびその形成方法、並びに液晶表示素子

Publications (2)

Publication Number Publication Date
KR20060046050A KR20060046050A (ko) 2006-05-17
KR101169474B1 true KR101169474B1 (ko) 2012-07-30

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KR1020050039215A KR101169474B1 (ko) 2004-05-12 2005-05-11 감방사선성 수지 조성물, 스페이서 및 그의 형성 방법 및 액정 표시 소자

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JP (1) JP4539165B2 (ja)
KR (1) KR101169474B1 (ja)
CN (1) CN1696827A (ja)
TW (1) TW200609673A (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005338831A (ja) * 2004-05-25 2005-12-08 Samsung Electronics Co Ltd 液晶表示装置の有機膜フォトレジスト組成物、そのスピンレスコーティング方法、これを用いた有機膜パターン形成方法及びこれにより製造された液晶表示装置
JP4772482B2 (ja) * 2005-12-02 2011-09-14 富士フイルム株式会社 カラーフィルタ及びその製造方法、並びにカラーフィルタを有する表示装置
JP4816917B2 (ja) * 2006-03-17 2011-11-16 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示パネル用スペーサー、液晶表示パネル用スペーサーの形成方法、および液晶表示パネル
JP4895034B2 (ja) * 2006-05-24 2012-03-14 Ｊｓｒ株式会社 感放射線性樹脂組成物、スペーサーおよびその形成方法
JP4998735B2 (ja) * 2006-12-28 2012-08-15 Ｊｓｒ株式会社 感放射線性組成物、カラーフィルタ、ブラックマトリックスおよび液晶表示素子
KR101473511B1 (ko) * 2007-10-09 2014-12-16 쇼와 덴코 가부시키가이샤 감광성 그래프트 폴리머 및 그것을 함유하는 감광성 수지 조성물
JP5817237B2 (ja) * 2010-07-29 2015-11-18 Jsr株式会社 感放射線性樹脂組成物、硬化膜、カラーフィルタ、硬化膜の形成方法及びカラーフィルタの形成方法
CN102385251B (zh) * 2010-08-17 2015-04-01 Jsr株式会社 放射线敏感性树脂组合物、固化膜、固化膜的形成方法、滤色器以及滤色器的形成方法
JP5966268B2 (ja) * 2011-07-22 2016-08-10 Jsr株式会社 アレイ基板、液晶表示素子およびアレイ基板の製造方法
JP6135063B2 (ja) * 2011-08-30 2017-05-31 住友化学株式会社 硬化性樹脂組成物
WO2013084283A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント
WO2013084282A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント
JP2013160921A (ja) * 2012-02-06 2013-08-19 Fujifilm Corp 着色感光性樹脂組成物、カラーフィルタ、液晶表示パネル及び液晶表示素子
CN107329330B (zh) * 2017-07-28 2020-05-19 武汉华星光电技术有限公司 液晶显示面板及其制作方法、柱状隔垫物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000319354A (ja) 1999-05-10 2000-11-21 Jsr Corp 感放射線性樹脂組成物、層間絶縁膜およびスペーサー
JP2001151829A (ja) 1999-11-26 2001-06-05 Jsr Corp 感放射線性樹脂組成物およびスペーサー
JP2001154206A (ja) 1999-11-25 2001-06-08 Jsr Corp スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
JP2003107703A (ja) * 2001-09-19 2003-04-09 Qimei Industry Co Ltd 液晶ディスプレーのスペーサー用感光性樹脂組成物

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JPS62278545A (ja) * 1986-05-27 1987-12-03 Nec Corp パタ−ン形成方法
JPS63257748A (ja) * 1987-04-15 1988-10-25 Fuji Photo Film Co Ltd 水溶性感光性組成物
JP3471425B2 (ja) * 1994-05-30 2003-12-02 三菱化学株式会社 カラーフィルター用重合組成物
JPH10142793A (ja) * 1996-11-15 1998-05-29 Taiyo Ink Mfg Ltd アルカリ現像可能なソルダーレジスト組成物
JPH11133600A (ja) * 1997-10-30 1999-05-21 Jsr Corp 表示パネルスペーサー用感放射線性樹脂組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000319354A (ja) 1999-05-10 2000-11-21 Jsr Corp 感放射線性樹脂組成物、層間絶縁膜およびスペーサー
JP2001154206A (ja) 1999-11-25 2001-06-08 Jsr Corp スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
JP2001151829A (ja) 1999-11-26 2001-06-05 Jsr Corp 感放射線性樹脂組成物およびスペーサー
JP2003107703A (ja) * 2001-09-19 2003-04-09 Qimei Industry Co Ltd 液晶ディスプレーのスペーサー用感光性樹脂組成物

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KR20060046050A (ko) 2006-05-17
JP4539165B2 (ja) 2010-09-08
TW200609673A (en) 2006-03-16
CN1696827A (zh) 2005-11-16

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