KR101086600B1 - 화학 제염 장치 및 그 제염 방법 - Google Patents

화학 제염 장치 및 그 제염 방법 Download PDF

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Publication number
KR101086600B1
KR101086600B1 KR1020087020497A KR20087020497A KR101086600B1 KR 101086600 B1 KR101086600 B1 KR 101086600B1 KR 1020087020497 A KR1020087020497 A KR 1020087020497A KR 20087020497 A KR20087020497 A KR 20087020497A KR 101086600 B1 KR101086600 B1 KR 101086600B1
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KR
South Korea
Prior art keywords
ozone
water
reactor
decontamination
pressure vessel
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Expired - Fee Related
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KR1020087020497A
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English (en)
Korean (ko)
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KR20080087041A (ko
Inventor
마사미 엔다
나가요시 이찌가와
마사유끼 가네다
다께시 가나사끼
도시히로 요시
유미 야이따
이찌로 이나미
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가부시끼가이샤 도시바
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Priority claimed from JP2006032575A external-priority patent/JP4204596B2/ja
Priority claimed from JP2006053698A external-priority patent/JP4183714B2/ja
Application filed by 가부시끼가이샤 도시바 filed Critical 가부시끼가이샤 도시바
Publication of KR20080087041A publication Critical patent/KR20080087041A/ko
Application granted granted Critical
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/28—Treating solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
    • G21F9/002—Decontamination of the surface of objects with chemical or electrochemical processes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
    • G21F9/002—Decontamination of the surface of objects with chemical or electrochemical processes
    • G21F9/004—Decontamination of the surface of objects with chemical or electrochemical processes of metallic surfaces

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  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Food Science & Technology (AREA)
  • Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
KR1020087020497A 2006-02-09 2007-02-06 화학 제염 장치 및 그 제염 방법 Expired - Fee Related KR101086600B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00032575 2006-02-09
JP2006032575A JP4204596B2 (ja) 2006-02-09 2006-02-09 化学除染装置およびその除染方法
JPJP-P-2006-00053698 2006-02-28
JP2006053698A JP4183714B2 (ja) 2006-02-28 2006-02-28 炉内化学除染装置およびその除染方法
PCT/JP2007/052028 WO2007091559A1 (ja) 2006-02-09 2007-02-06 化学除染装置およびその除染方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020107021613A Division KR101063132B1 (ko) 2006-02-09 2007-02-06 화학 제염 장치 및 그 제염 방법

Publications (2)

Publication Number Publication Date
KR20080087041A KR20080087041A (ko) 2008-09-29
KR101086600B1 true KR101086600B1 (ko) 2011-11-23

Family

ID=38345155

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020107021613A Expired - Fee Related KR101063132B1 (ko) 2006-02-09 2007-02-06 화학 제염 장치 및 그 제염 방법
KR1020087020497A Expired - Fee Related KR101086600B1 (ko) 2006-02-09 2007-02-06 화학 제염 장치 및 그 제염 방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020107021613A Expired - Fee Related KR101063132B1 (ko) 2006-02-09 2007-02-06 화학 제염 장치 및 그 제염 방법

Country Status (6)

Country Link
US (1) US8440876B2 (enExample)
EP (1) EP1983526B1 (enExample)
KR (2) KR101063132B1 (enExample)
CN (1) CN102262909B (enExample)
TW (1) TW200746176A (enExample)
WO (1) WO2007091559A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101341143B1 (ko) 2011-12-06 2013-12-13 (주)에네시스 마이크로 버블을 이용한 제염 장치 및 그의 제염 방법

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FR2937054B1 (fr) * 2008-10-13 2010-12-10 Commissariat Energie Atomique Procede et dispositif de decontamination d'une surface metallique.
JP5422238B2 (ja) * 2009-03-23 2014-02-19 株式会社東芝 防錆剤含有廃液処理関連施工方法及び関連システム
KR101130270B1 (ko) * 2011-01-07 2012-03-26 한국원자력연구원 제염제 재생이 동시에 수행되는 일체형 금속 제염 장치 및 이를 이용한 제염방법
JP5649541B2 (ja) * 2011-09-15 2015-01-07 株式会社東芝 腐食抑制剤注入方法
CN102978642A (zh) * 2012-11-26 2013-03-20 安徽长青电子机械（集团）有限公司 一种自循环式化学除油设备
KR101523763B1 (ko) * 2013-06-19 2015-06-01 한국원자력연구원 금속 표면 고착성 방사능 오염 산화막 제거를 위한 산화 제염제 및 이를 이용한 산화 제염방법
JP6226646B2 (ja) * 2013-09-02 2017-11-08 株式会社東芝 原子炉圧力容器の除染方法及びその除染システム
JP6501482B2 (ja) * 2014-10-16 2019-04-17 三菱重工業株式会社 除染処理システム及び除染廃水の分解方法
JP6270880B2 (ja) * 2016-01-27 2018-01-31 株式会社東芝 化学除染実施方法
CN105716919A (zh) * 2016-02-22 2016-06-29 苏州热工研究院有限公司 一种含放射性核素的不锈钢预生氧化膜试样的制备方法
CN107170503B (zh) * 2017-06-02 2019-04-02 苏州热工研究院有限公司 一种降低在役压水堆核电厂集体剂量的化学清洗方法

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JP2002228796A (ja) 2001-02-01 2002-08-14 Toshiba Corp 放射線取扱い施設の構造部品の化学除染方法およびその装置
JP2002361269A (ja) * 2001-06-06 2002-12-17 Nippon Gosei Alcohol Kk 燐含有水の処理方法
JP2003098294A (ja) * 2001-09-27 2003-04-03 Hitachi Ltd オゾンを用いた除染方法及びその装置

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EP0278256A1 (de) * 1987-01-28 1988-08-17 Siemens Aktiengesellschaft Verfahren und Einrichtung zum Entfernen von Oxidschichten
US5070589A (en) * 1989-02-08 1991-12-10 Westinghouse Electric Corp. Process for servicing a jet pump hold down beam in a nuclear reactor
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JP2620839B2 (ja) 1993-11-15 1997-06-18 森川産業株式会社 放射性汚染物質を有するキレート剤液の処理方法
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KR100724710B1 (ko) 2002-11-21 2007-06-04 가부시끼가이샤 도시바 방사화 부품의 화학적 오염제거 시스템 및 방법
JP2004191259A (ja) * 2002-12-12 2004-07-08 Toshiba Corp 化学除染方法
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JP2002228796A (ja) 2001-02-01 2002-08-14 Toshiba Corp 放射線取扱い施設の構造部品の化学除染方法およびその装置
JP2002361269A (ja) * 2001-06-06 2002-12-17 Nippon Gosei Alcohol Kk 燐含有水の処理方法
JP2003098294A (ja) * 2001-09-27 2003-04-03 Hitachi Ltd オゾンを用いた除染方法及びその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101341143B1 (ko) 2011-12-06 2013-12-13 (주)에네시스 마이크로 버블을 이용한 제염 장치 및 그의 제염 방법

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Publication number Publication date
KR20100110399A (ko) 2010-10-12
EP1983526A1 (en) 2008-10-22
CN102262909A (zh) 2011-11-30
US8440876B2 (en) 2013-05-14
CN102262909B (zh) 2014-06-25
US20100168497A1 (en) 2010-07-01
TWI355003B (enExample) 2011-12-21
KR20080087041A (ko) 2008-09-29
WO2007091559A1 (ja) 2007-08-16
EP1983526A4 (en) 2014-03-19
EP1983526B1 (en) 2018-01-10
KR101063132B1 (ko) 2011-09-07
TW200746176A (en) 2007-12-16

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