KR101055247B1 - 기판의 처리 장치 및 처리 방법 - Google Patents

기판의 처리 장치 및 처리 방법 Download PDF

Info

Publication number
KR101055247B1
KR101055247B1 KR1020040055566A KR20040055566A KR101055247B1 KR 101055247 B1 KR101055247 B1 KR 101055247B1 KR 1020040055566 A KR1020040055566 A KR 1020040055566A KR 20040055566 A KR20040055566 A KR 20040055566A KR 101055247 B1 KR101055247 B1 KR 101055247B1
Authority
KR
South Korea
Prior art keywords
substrate
board
nozzle
liquid
processing
Prior art date
Application number
KR1020040055566A
Other languages
English (en)
Korean (ko)
Other versions
KR20050009695A (ko
Inventor
이소아키노리
니시베유키노부
와카쓰키다카히코
Original Assignee
시바우라 메카트로닉스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바우라 메카트로닉스 가부시키가이샤 filed Critical 시바우라 메카트로닉스 가부시키가이샤
Publication of KR20050009695A publication Critical patent/KR20050009695A/ko
Application granted granted Critical
Publication of KR101055247B1 publication Critical patent/KR101055247B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/54—Arrangements for reducing warping-twist

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020040055566A 2003-07-18 2004-07-16 기판의 처리 장치 및 처리 방법 KR101055247B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003199087 2003-07-18
JPJP-P-2003-00199087 2003-07-18
JPJP-P-2004-00191134 2004-06-29
JP2004191134A JP4421956B2 (ja) 2003-07-18 2004-06-29 基板の処理装置及び処理方法

Publications (2)

Publication Number Publication Date
KR20050009695A KR20050009695A (ko) 2005-01-25
KR101055247B1 true KR101055247B1 (ko) 2011-08-08

Family

ID=34379735

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040055566A KR101055247B1 (ko) 2003-07-18 2004-07-16 기판의 처리 장치 및 처리 방법

Country Status (4)

Country Link
JP (1) JP4421956B2 (ja)
KR (1) KR101055247B1 (ja)
CN (1) CN100419501C (ja)
TW (1) TWI347629B (ja)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4627681B2 (ja) * 2005-04-20 2011-02-09 芝浦メカトロニクス株式会社 基板の処理装置及び処理方法
TWI319213B (en) * 2005-11-28 2010-01-01 Hitachi High Tech Corp A substrate processing device, a substrate processing method and a production method for a substrate
JP4557872B2 (ja) * 2005-11-28 2010-10-06 株式会社日立ハイテクノロジーズ 基板処理装置、基板処理方法、及び基板の製造方法
JP4685618B2 (ja) * 2005-12-13 2011-05-18 芝浦メカトロニクス株式会社 基板の処理装置
KR100835745B1 (ko) * 2006-12-29 2008-06-09 최찬규 하향식 유리 박형화 방법
JP2008277556A (ja) * 2007-04-27 2008-11-13 Shibaura Mechatronics Corp 基板の処理装置
JP4575932B2 (ja) * 2007-05-29 2010-11-04 化研テック株式会社 パレット洗浄装置およびパレット洗浄方法
KR100865475B1 (ko) * 2007-08-30 2008-10-27 세메스 주식회사 노즐 어셈블리, 이를 갖는 처리액 공급 장치 및 이를이용하는 처리액 공급 방법
JP5362623B2 (ja) * 2010-03-03 2013-12-11 大日本スクリーン製造株式会社 基板処理装置
DE102010013909A1 (de) * 2010-04-01 2011-10-06 Lp Vermarktungs Gmbh & Co. Kg Vorrichtung und Verfahren zum Besprühen einer Oberfläche eines Substrates
CN102094199A (zh) * 2010-11-23 2011-06-15 黄佳佳 一种电子软标签的蚀刻设备
US8458842B2 (en) * 2011-05-10 2013-06-11 Nanya Technology Corp. Post-CMP wafer cleaning apparatus
KR101342616B1 (ko) * 2013-04-26 2013-12-20 창성 주식회사 수직형 기판 박리 시스템
KR102223764B1 (ko) * 2013-12-27 2021-03-05 세메스 주식회사 기판처리장치 및 방법
CN105158829B (zh) * 2015-07-30 2019-06-04 京东方科技集团股份有限公司 基板、彩色滤光片模组、形成基板模组的方法和显示装置
JP6667241B2 (ja) * 2015-09-28 2020-03-18 株式会社Ｓｃｒｅｅｎホールディングス 処理液供給装置、基板処理システムおよび処理液供給方法
CN106992136B (zh) * 2017-04-20 2020-04-07 武汉华星光电技术有限公司 湿法蚀刻设备及湿法蚀刻方法
KR102433317B1 (ko) * 2017-10-11 2022-08-17 삼성디스플레이 주식회사 습식 식각 장치
CN111006262A (zh) * 2019-12-31 2020-04-14 美埃（中国）环境净化有限公司 一种水洗型除油烟净化装置及其水洗控制方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10118583A (ja) 1996-10-24 1998-05-12 Nippon Electric Glass Co Ltd 板状物の洗浄装置
JPH1133503A (ja) * 1997-07-24 1999-02-09 Dainippon Screen Mfg Co Ltd 基板処理装置
KR19990023551A (ko) * 1997-08-28 1999-03-25 이시다 아키라 기판처리장치
JP2000188272A (ja) * 1998-12-22 2000-07-04 Dainippon Screen Mfg Co Ltd 基板処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001343632A (ja) * 2000-06-02 2001-12-14 Sharp Corp 液晶表示素子の製造方法
JP3622842B2 (ja) * 2000-12-11 2005-02-23 住友精密工業株式会社 搬送式基板処理装置
WO2002049087A1 (fr) * 2000-12-12 2002-06-20 Sumitomo Precision Products Co., Ltd Dispositif de traitement de substrat de transfert à douche oscillante
JP4180250B2 (ja) * 2001-05-30 2008-11-12 東京エレクトロン株式会社 基板処理装置及び基板処理方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10118583A (ja) 1996-10-24 1998-05-12 Nippon Electric Glass Co Ltd 板状物の洗浄装置
JPH1133503A (ja) * 1997-07-24 1999-02-09 Dainippon Screen Mfg Co Ltd 基板処理装置
KR19990023551A (ko) * 1997-08-28 1999-03-25 이시다 아키라 기판처리장치
JP2000188272A (ja) * 1998-12-22 2000-07-04 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
KR20050009695A (ko) 2005-01-25
JP4421956B2 (ja) 2010-02-24
JP2005052825A (ja) 2005-03-03
CN100419501C (zh) 2008-09-17
TW200507038A (en) 2005-02-16
CN1576961A (zh) 2005-02-09
TWI347629B (en) 2011-08-21

Similar Documents

Publication Publication Date Title
KR101055247B1 (ko) 기판의 처리 장치 및 처리 방법
KR100981212B1 (ko) 액처리방법 및 액처리장치
KR101408757B1 (ko) 기판의 처리 장치
KR100624653B1 (ko) 기판의 처리 장치 및 처리 방법
CA2630885A1 (en) Apparatus and method for wet-chemical processing of flat, thin substrates in a continuous method
CN101219427A (zh) 基板处理装置
KR101218449B1 (ko) 기판 처리 장치
KR101204725B1 (ko) 기판의 처리 장치
JP3837720B2 (ja) 基板処理方法及び基板処理装置
KR100871893B1 (ko) 인쇄회로기판의 이송장치 및 그에 사용되는 인쇄회로기판
JP3384666B2 (ja) 基板処理装置
JP3550277B2 (ja) 基板処理装置
JP5352426B2 (ja) 基板の処理装置
KR101149455B1 (ko) 기판의 처리 장치, 반송 장치 및 처리 방법
JP3901635B2 (ja) 板材の酸処理設備
JP4280075B2 (ja) 基板の処理装置
JP4328342B2 (ja) 基板処理方法及び基板処理装置
JP3957569B2 (ja) 液処理装置
JP3766968B2 (ja) 基板処理方法及び基板処理装置
JPH09155307A (ja) 基板処理装置
TWI345260B (en) Resist elimination device
KR102379013B1 (ko) 액처리 모듈, 이를 포함하는 기판 처리 장치 및 방법
JP2006289240A (ja) 基板の処理装置及び処理方法
JP3595606B2 (ja) 基板表面処理装置
JP4892543B2 (ja) 基板の処理装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20140721

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20150716

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20160630

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20170719

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20180718

Year of fee payment: 8

FPAY Annual fee payment

Payment date: 20190718

Year of fee payment: 9