KR101032582B1 - 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제 - Google Patents

헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제 Download PDF

Info

Publication number
KR101032582B1
KR101032582B1 KR1020057010115A KR20057010115A KR101032582B1 KR 101032582 B1 KR101032582 B1 KR 101032582B1 KR 1020057010115 A KR1020057010115 A KR 1020057010115A KR 20057010115 A KR20057010115 A KR 20057010115A KR 101032582 B1 KR101032582 B1 KR 101032582B1
Authority
KR
South Korea
Prior art keywords
meth
alkyl
phenyl
acrylate
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020057010115A
Other languages
English (en)
Korean (ko)
Other versions
KR20050084149A (ko
Inventor
쥬니치 다나베
히사토시 구라
히데타카 오카
마사키 오와
Original Assignee
시바 홀딩 인크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=32405823&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR101032582(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 시바 홀딩 인크 filed Critical 시바 홀딩 인크
Publication of KR20050084149A publication Critical patent/KR20050084149A/ko
Application granted granted Critical
Publication of KR101032582B1 publication Critical patent/KR101032582B1/ko
Assigned to 바스프 슈바이츠 아게 reassignment 바스프 슈바이츠 아게 권리의 전부이전등록 Assignors: 시바 홀딩 인크
Assigned to 바스프 에스이 reassignment 바스프 에스이 권리의 전부이전등록 Assignors: 바스프 슈바이츠 아게
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
    • C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D207/333—Radicals substituted by oxygen or sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
    • C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D207/335—Radicals substituted by nitrogen atoms not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/12—Radicals substituted by oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/30—Indoles; Hydrogenated indoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to carbon atoms of the hetero ring
    • C07D209/42—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/38—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
    • C07D333/54—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C07D333/58—Radicals substituted by nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/06—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/06—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/06—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)
  • Pyrrole Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Hydrogenated Pyridines (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Detergent Compositions (AREA)
KR1020057010115A 2002-12-03 2003-11-24 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제 Expired - Fee Related KR101032582B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02406054.3 2002-12-03
EP02406054 2002-12-03

Publications (2)

Publication Number Publication Date
KR20050084149A KR20050084149A (ko) 2005-08-26
KR101032582B1 true KR101032582B1 (ko) 2011-05-06

Family

ID=32405823

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057010115A Expired - Fee Related KR101032582B1 (ko) 2002-12-03 2003-11-24 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제

Country Status (12)

Country Link
US (1) US7648738B2 (https=)
EP (1) EP1567518B1 (https=)
JP (1) JP4769461B2 (https=)
KR (1) KR101032582B1 (https=)
CN (1) CN1720245B (https=)
AT (1) ATE420877T1 (https=)
AU (1) AU2003294034A1 (https=)
CA (1) CA2505893A1 (https=)
DE (1) DE60325890D1 (https=)
MX (1) MXPA05005817A (https=)
TW (1) TWI326682B (https=)
WO (1) WO2004050653A2 (https=)

Families Citing this family (92)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4830310B2 (ja) * 2004-02-23 2011-12-07 三菱化学株式会社 オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
JP2005300994A (ja) 2004-04-13 2005-10-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
MXPA06015049A (es) * 2004-07-08 2007-02-08 Novo Nordisk As Marcadores prolongadores de polipeptidos que comprenden una porcion tetrazol.
JP4492238B2 (ja) 2004-07-26 2010-06-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4864375B2 (ja) * 2004-08-09 2012-02-01 ドンジン セミケム カンパニー リミテッド スペーサ用感光性樹脂組成物、スペーサ及び液晶表示素子
WO2006018405A1 (en) * 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
JP3992725B2 (ja) * 2004-08-20 2007-10-17 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
TWI385485B (zh) * 2004-11-17 2013-02-11 Jsr股份有限公司 A photosensitive resin composition, a display panel spacer, and a display panel
JP4633582B2 (ja) * 2005-09-06 2011-02-16 東京応化工業株式会社 感光性組成物
JP4761923B2 (ja) * 2005-10-20 2011-08-31 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及び積層体
KR100763744B1 (ko) 2005-11-07 2007-10-04 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물
US8940464B2 (en) * 2005-12-01 2015-01-27 Basf Se Oxime ester photoinitiators
KR101351286B1 (ko) 2005-12-20 2014-02-17 시바 홀딩 인크 옥심 에스테르 광개시제
US7909928B2 (en) * 2006-03-24 2011-03-22 The Regents Of The University Of Michigan Reactive coatings for regioselective surface modification
KR101313538B1 (ko) * 2006-04-06 2013-10-01 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물
TWI403840B (zh) 2006-04-26 2013-08-01 Fujifilm Corp 含染料之負型硬化性組成物、彩色濾光片及其製法
JP5256647B2 (ja) * 2006-05-31 2013-08-07 三菱化学株式会社 保護膜用熱硬化性組成物、硬化物、及び液晶表示装置
JP4586783B2 (ja) * 2006-09-22 2010-11-24 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
JP4913556B2 (ja) * 2006-11-09 2012-04-11 富士フイルム株式会社 感光性組成物、感光性フィルム、永久パターン形成方法、及びプリント基板
KR101477026B1 (ko) * 2006-12-20 2014-12-29 미쓰비시 가가꾸 가부시키가이샤 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치
CN101528682B (zh) 2006-12-27 2012-08-08 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
KR101026612B1 (ko) * 2007-01-19 2011-04-04 주식회사 엘지화학 옥심 에스테르기와 트리아진기를 동시에 포함하는 광활성화합물 및 이를 포함하는 감광성 조성물
US8399047B2 (en) * 2007-03-22 2013-03-19 The Regents Of The Univeristy Of Michigan Multifunctional CVD coatings
JP4855312B2 (ja) * 2007-03-27 2012-01-18 東京応化工業株式会社 感光性組成物
KR101175401B1 (ko) * 2007-04-04 2012-08-20 히다치 가세고교 가부시끼가이샤 감광성 접착제 조성물, 필름상 접착제, 접착 시트, 접착제 패턴, 접착제층 부착 반도체 웨이퍼, 반도체 장치, 및, 반도체 장치의 제조방법
US8252512B2 (en) 2007-05-09 2012-08-28 Adeka Corporation Epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition
US8911921B2 (en) * 2007-05-11 2014-12-16 Ciba Corporation Oxime ester photoinitiators
WO2008138733A1 (en) * 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
JP5535064B2 (ja) * 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
KR20100028020A (ko) 2007-08-01 2010-03-11 가부시키가이샤 아데카 알칼리 현상성 감광성 수지 조성물 및 β-디케톤 화합물
JP2009040762A (ja) * 2007-08-09 2009-02-26 Ciba Holding Inc オキシムエステル光開始剤
JP5056301B2 (ja) * 2007-09-20 2012-10-24 Ｊｓｒ株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
KR100830561B1 (ko) * 2007-10-09 2008-05-22 재단법인서울대학교산학협력재단 다기능성 액정화합물 및 이들의 제조방법 그리고 이로부터얻어진 미세패턴
US8283000B2 (en) 2008-02-22 2012-10-09 Adeka Corporation Liquid crystal composition containing polymerizable compound and liquid crystal display using the liquid crystal composition
KR20110003312A (ko) 2008-04-01 2011-01-11 가부시키가이샤 아데카 3관능 (메타)아크릴레이트 화합물 및 상기 화합물을 함유하는 중합성 조성물
CN101918397B (zh) * 2008-04-10 2013-11-06 株式会社Lg化学 光活性化合物以及含有该光活性化合物的感光性树脂组合物
KR101102248B1 (ko) 2008-04-10 2012-01-03 주식회사 엘지화학 광활성 화합물 및 이를 포함하는 감광성 수지 조성물
JP5566378B2 (ja) 2008-06-06 2014-08-06 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光開始剤
JP5274151B2 (ja) * 2008-08-21 2013-08-28 富士フイルム株式会社 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに、固体撮像素子
JP5284735B2 (ja) 2008-09-18 2013-09-11 株式会社Ａｄｅｋａ 重合性光学活性イミド化合物及び該化合物を含有する重合性組成物
JP5623416B2 (ja) * 2008-11-03 2014-11-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 光開始剤混合物
KR101338676B1 (ko) * 2008-11-05 2013-12-06 도오꾜오까고오교 가부시끼가이샤 감광성 수지 조성물 및 기재
JP5344892B2 (ja) 2008-11-27 2013-11-20 富士フイルム株式会社 インクジェット用インク組成物、及びインクジェット記録方法
WO2010077132A1 (en) 2008-12-31 2010-07-08 Draka Comteq B.V. Uvled apparatus for curing glass-fiber coatings
CN102317863B (zh) * 2009-02-13 2013-11-20 株式会社Lg化学 光活性化合物和含有该化合物的光敏树脂组合物
JP4344400B1 (ja) * 2009-02-16 2009-10-14 株式会社日本化学工業所 オキシムエステル化合物及びこれらを用いた感光性樹脂組成物
CN101565472B (zh) * 2009-05-19 2011-05-04 常州强力电子新材料有限公司 酮肟酯类光引发剂
JP5236587B2 (ja) * 2009-07-15 2013-07-17 太陽ホールディングス株式会社 光硬化性樹脂組成物
EP2502973A4 (en) 2009-11-18 2014-07-23 Adeka Corp LIQUID CRYSTAL COMPOSITION COMPRISING A POLYMERIZABLE COMPOUND AND A LIQUID CRYSTAL DISPLAY ELEMENT COMPRISING THIS LIQUID CRYSTAL COMPOSITION
CN102639501B (zh) 2009-12-07 2015-04-29 爱克发印艺公司 用于uv-led可固化组合物和墨水的光引发剂
AU2010330040B2 (en) 2009-12-07 2013-12-19 Agfa Nv UV-LED curable compositions and inks
JP2012194516A (ja) * 2010-04-27 2012-10-11 Fujifilm Corp 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
EP2388239B1 (en) 2010-05-20 2017-02-15 Draka Comteq B.V. Curing apparatus employing angled UV-LEDs
US8871311B2 (en) 2010-06-03 2014-10-28 Draka Comteq, B.V. Curing method employing UV sources that emit differing ranges of UV radiation
EP2418183B1 (en) 2010-08-10 2018-07-25 Draka Comteq B.V. Method for curing coated glass fibres providing increased UVLED intensitiy
JP5677036B2 (ja) * 2010-11-08 2015-02-25 キヤノン株式会社 有機発光素子
CN102020727B (zh) * 2010-11-23 2013-01-23 常州强力先端电子材料有限公司 一种高感光度咔唑肟酯类光引发剂、其制备方法及应用
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
JP5946657B2 (ja) * 2011-03-08 2016-07-06 株式会社ダイセル フォトレジスト製造用溶剤または溶剤組成物、及びフォトレジスト製造用組成物
JP5944898B2 (ja) * 2011-07-08 2016-07-05 新日鉄住金化学株式会社 光重合開始剤、感光性組成物及び硬化物
JP5713477B2 (ja) * 2011-08-04 2015-05-07 エルジー・ケム・リミテッド 光活性化合物およびこれを含む感光性樹脂組成物
JP5646426B2 (ja) * 2011-09-30 2014-12-24 富士フイルム株式会社 着色感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示装置
KR102013541B1 (ko) * 2012-05-09 2019-08-22 바스프 에스이 옥심 에스테르 광개시제
JP2013047818A (ja) * 2012-10-01 2013-03-07 Taiyo Holdings Co Ltd 光硬化性樹脂組成物
JP5554389B2 (ja) * 2012-11-19 2014-07-23 富士フイルム株式会社 シアン色カラーフィルタ作製用光硬化性組成物及びその製造方法
JP6469669B2 (ja) * 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN105531260B (zh) * 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
TWI668210B (zh) 2013-11-28 2019-08-11 塔可馬科技股份有限公司 光起始劑及包括該光起始劑之光敏性組合物
KR101435652B1 (ko) * 2014-01-17 2014-08-28 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
US10189847B2 (en) 2014-04-04 2019-01-29 Adeka Corporation Oxime ester compound and photopolymerization initiator containing said compound
CN104910053B (zh) * 2014-06-09 2017-09-12 北京英力科技发展有限公司 不对称二肟酯化合物及其制造方法与应用
CN104098720B (zh) * 2014-07-15 2017-01-11 常州强力先端电子材料有限公司 含杂环硫醚基团的肟酯类光引发剂及其制备方法和应用
JP6169545B2 (ja) 2014-09-09 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6169548B2 (ja) 2014-09-26 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6086888B2 (ja) 2014-09-26 2017-03-01 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
JP6799540B2 (ja) * 2015-09-25 2020-12-16 株式会社Adeka オキシムエステル化合物及び該化合物を含有する重合開始剤
EP3246378B1 (en) 2016-05-17 2019-03-20 Merck Patent GmbH Polymerisable liquid crystal material and polymerised liquid crystal film
CN109689840B (zh) * 2016-09-07 2024-01-30 默克专利股份有限公司 液晶介质和光调制元件
KR102121424B1 (ko) 2016-12-02 2020-06-10 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
KR102545326B1 (ko) 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
KR20200006988A (ko) * 2017-05-09 2020-01-21 코베스트로 도이칠란트 아게 광중합체 필름 복합체에서의 홀로그램의 보호를 위한 2개의 건조-적용가능한 uv-경화성 래커 층으로 이루어지는 시스템
CN108069991A (zh) * 2018-01-08 2018-05-25 深圳市佶达德科技有限公司 一种双核双吡唑乙酸香豆素衍生物配合物激光材料及其应用
CN108690389A (zh) * 2018-04-23 2018-10-23 河北晨阳工贸集团有限公司 一种led光固化水性木器漆及其制备方法
WO2020252628A1 (zh) * 2019-06-17 2020-12-24 湖北固润科技股份有限公司 包含五元芳杂环结构的肟酯类光引发剂及其制备和用途
JP7449765B2 (ja) * 2020-04-10 2024-03-14 株式会社Ｄｎｐファインケミカル 感光性着色樹脂組成物、硬化物、カラーフィルタ、表示装置
KR20230121723A (ko) 2020-12-17 2023-08-21 가부시키가이샤 아데카 화합물 및 조성물
KR20240035990A (ko) 2021-07-20 2024-03-19 가부시키가이샤 아데카 반도체용 막 형성 재료, 반도체용 부재 형성 재료, 반도체용 공정 부재 형성 재료, 하층막 형성 재료, 하층막 및 반도체 디바이스
JPWO2024004426A1 (https=) * 2022-06-27 2024-01-04
KR20250091208A (ko) 2022-10-26 2025-06-20 가부시키가이샤 아데카 화합물, 조성물, 경화물, 경화물의 제조 방법 및 전자부품의 제조 방법
WO2024171895A1 (ja) * 2023-02-15 2024-08-22 富士フイルム株式会社 硬化性組成物、硬化物の製造方法、膜、光学素子、イメージセンサ、固体撮像素子、及び、画像表示装置
WO2024181097A1 (ja) * 2023-02-27 2024-09-06 富士フイルム株式会社 光硬化性組成物、硬化物の製造方法、膜、光学素子、イメージセンサ、固体撮像素子、画像表示装置、及び、ラジカル重合開始剤
WO2025110009A1 (ja) * 2023-11-22 2025-05-30 富士フイルム株式会社 硬化性組成物、画素の製造方法、膜、固体撮像素子、画像表示装置および光重合開始剤

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010012596A1 (en) * 1999-12-15 2001-08-09 Kazuhiko Kunimoto Oxime ester photoinitiators

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
FR2393345A1 (fr) * 1977-06-01 1978-12-29 Agfa Gevaert Nv Fabrication d'elements modifies sous forme d'images
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4590145A (en) * 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
US6001517A (en) * 1996-10-31 1999-12-14 Kabushiki Kaisha Toshiba Positive photosensitive polymer composition, method of forming a pattern and electronic parts
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
MY121423A (en) * 1998-06-26 2006-01-28 Ciba Sc Holding Ag Photopolymerizable thermosetting resin compositions

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010012596A1 (en) * 1999-12-15 2001-08-09 Kazuhiko Kunimoto Oxime ester photoinitiators

Also Published As

Publication number Publication date
ATE420877T1 (de) 2009-01-15
AU2003294034A1 (en) 2004-06-23
CN1720245B (zh) 2010-05-26
CN1720245A (zh) 2006-01-11
EP1567518A2 (en) 2005-08-31
KR20050084149A (ko) 2005-08-26
TW200422296A (en) 2004-11-01
JP4769461B2 (ja) 2011-09-07
DE60325890D1 (de) 2009-03-05
TWI326682B (en) 2010-07-01
WO2004050653A2 (en) 2004-06-17
MXPA05005817A (es) 2005-08-29
WO2004050653A3 (en) 2004-09-16
US20060241259A1 (en) 2006-10-26
US7648738B2 (en) 2010-01-19
EP1567518B1 (en) 2009-01-14
JP2006516246A (ja) 2006-06-29
AU2003294034A8 (en) 2004-06-23
CA2505893A1 (en) 2004-06-17

Similar Documents

Publication Publication Date Title
KR101032582B1 (ko) 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제
KR100801457B1 (ko) 결합된 구조를 가지는 옥심 에스테르 광개시제
KR100680729B1 (ko) 옥심 에스테르 광개시제, 이를 포함하는 광중합성 조성물 및 이를 사용한 광중합 방법
KR101282834B1 (ko) 옥심 에스테르 광개시제
KR101351286B1 (ko) 옥심 에스테르 광개시제
CN101321727B (zh) 肟酯光敏引发剂
JP6008822B2 (ja) オキシムエステル光重合開始剤
US9365515B2 (en) Oxime ester photoinitiators
EP2847167B9 (en) Oxime ester photoinitiators
JP5535065B2 (ja) オキシムエステル光重合開始剤
EP3019473B1 (en) Oxime ester photoinitiators
JP5535064B2 (ja) オキシムエステル光重合開始剤
CN101341172B (zh) 肟酯光引发剂

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

A201 Request for examination
AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

J201 Request for trial against refusal decision
PJ0201 Trial against decision of rejection

St.27 status event code: A-3-3-V10-V11-apl-PJ0201

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PB0901 Examination by re-examination before a trial

St.27 status event code: A-6-3-E10-E12-rex-PB0901

B701 Decision to grant
PB0701 Decision of registration after re-examination before a trial

St.27 status event code: A-3-4-F10-F13-rex-PB0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R14-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R14-asn-PN2301

FPAY Annual fee payment

Payment date: 20140404

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

J204 Request for invalidation trial [patent]
PJ0204 Invalidation trial for patent

St.27 status event code: A-5-5-V10-V11-apl-PJ0204

J301 Trial decision

Free format text: TRIAL DECISION FOR INVALIDATION REQUESTED 20140502

Effective date: 20140807

Free format text: TRIAL NUMBER: 2014100001041; TRIAL DECISION FOR INVALIDATION REQUESTED 20140502

Effective date: 20140807

PJ1301 Trial decision

St.27 status event code: A-5-5-V10-V15-crt-PJ1301

Decision date: 20140807

Appeal event data comment text: Appeal Kind Category : Invalidation, Appeal Ground Text : 1032582

Appeal request date: 20140502

Appellate body name: Patent Examination Board

Decision authority category: Office appeal board

Decision identifier: 2014100001041

J2X1 Appeal (before the patent court)

Free format text: TRIAL NUMBER: 2014200006056; INVALIDATION

PJ2001 Appeal

St.27 status event code: A-5-5-V10-V12-crt-PJ2001

J202 Request for trial for correction [limitation]
PJ0202 Trial for correction

St.27 status event code: A-5-5-V10-V11-apl-PJ0202

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

J301 Trial decision

Free format text: TRIAL DECISION FOR CORRECTION REQUESTED 20150127

Effective date: 20150402

Free format text: TRIAL NUMBER: 2015105000012; TRIAL DECISION FOR CORRECTION REQUESTED 20150127

Effective date: 20150402

PJ1301 Trial decision

St.27 status event code: A-5-5-V10-V15-crt-PJ1301

Decision date: 20150402

Appeal event data comment text: Appeal Kind Category : Correction, Appeal Ground Text : 1032582

Appeal request date: 20150127

Appellate body name: Patent Examination Board

Decision authority category: Office appeal board

Decision identifier: 2015105000012

J202 Request for trial for correction [limitation]
PJ0202 Trial for correction

St.27 status event code: A-5-5-V10-V11-apl-PJ0202

PG1701 Publication of correction

St.27 status event code: A-5-5-P10-P19-oth-PG1701

Patent document republication publication date: 20150615

Republication note text: Request for Public Notice of Correction Statement

Gazette number: 1010325820000

Gazette reference publication date: 20110506

L16-X000 Post-grant third party observation filed

St.27 status event code: A-4-5-L10-L16-oth-X000

L16-X000 Post-grant third party observation filed

St.27 status event code: A-4-5-L10-L16-oth-X000

L16-X000 Post-grant third party observation filed

St.27 status event code: A-4-5-L10-L16-oth-X000

FPAY Annual fee payment

Payment date: 20160421

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

J301 Trial decision

Free format text: TRIAL DECISION FOR CORRECTION REQUESTED 20150513

Effective date: 20160429

Free format text: TRIAL NUMBER: 2015105000045; TRIAL DECISION FOR CORRECTION REQUESTED 20150513

Effective date: 20160429

PJ1301 Trial decision

St.27 status event code: A-5-5-V10-V15-crt-PJ1301

Decision date: 20160429

Appeal event data comment text: Appeal Kind Category : Correction, Appeal Ground Text : 1032582

Appeal request date: 20150513

Appellate body name: Patent Examination Board

Decision authority category: Office appeal board

Decision identifier: 2015105000045

PG1701 Publication of correction

St.27 status event code: A-5-5-P10-P19-oth-PG1701

Patent document republication publication date: 20160527

Republication note text: Request for Public Notice of Correction Statement

Gazette number: 1010325820000

Gazette reference publication date: 20110506

J202 Request for trial for correction [limitation]
PJ0202 Trial for correction

St.27 status event code: A-5-5-V10-V11-apl-PJ0202

L16-X000 Post-grant third party observation filed

St.27 status event code: A-4-5-L10-L16-oth-X000

J301 Trial decision

Free format text: TRIAL NUMBER: 2016105000080; TRIAL DECISION FOR CORRECTION REQUESTED 20160726

Effective date: 20161028

PJ1301 Trial decision

St.27 status event code: A-5-5-V10-V15-crt-PJ1301

Decision date: 20161028

Appeal event data comment text: Appeal Kind Category : Correction, Appeal Ground Text : 1032582

Appeal request date: 20160726

Appellate body name: Patent Examination Board

Decision authority category: Office appeal board

Decision identifier: 2016105000080

PG1701 Publication of correction

St.27 status event code: A-5-5-P10-P19-oth-PG1701

Patent document republication publication date: 20161221

Republication note text: Request for Public Notice of Correction Statement

Gazette number: 1010325820000

Gazette reference publication date: 20110506

FPAY Annual fee payment

Payment date: 20170425

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

J2X2 Appeal (before the supreme court)

Free format text: TRIAL NUMBER: 2017300002352; APPEAL BEFORE THE SUPREME COURT FOR INVALIDATION

PJ2002 Appeal before the supreme court

St.27 status event code: A-5-5-V10-V12-crt-PJ2002

J302 Written judgement (patent court)

Free format text: TRIAL NUMBER: 2014200006056; JUDGMENT (PATENT COURT) FOR INVALIDATION REQUESTED 20140825

Effective date: 20170908

PJ1302 Judgment (patent court)

St.27 status event code: A-5-5-V10-V15-crt-PJ1302

Decision date: 20170908

Decision identifier: 2014200006056

Decision authority category: National patent court

Appeal event data comment text: Appeal Kind Category : Invalidation, Appeal Ground Text : 20141041 (1032582)

Appeal request date: 20140825

Appellate body name: Patent Court

J303 Written judgement (supreme court)

Free format text: TRIAL NUMBER: 2017300002352; JUDGMENT (SUPREME COURT) FOR INVALIDATION REQUESTED 20171017

Effective date: 20180131

PJ1303 Judgment (supreme court)

St.27 status event code: A-5-5-V10-V15-crt-PJ1303

Decision date: 20180131

Decision authority category: Court of appeal

Appeal event data comment text: Appeal Kind Category : Invalidation, Appeal Ground Text : 2014 6056 (1032582)

Appeal request date: 20171017

Appellate body name: Supreme Court

Decision identifier: 2017300002352

FPAY Annual fee payment

Payment date: 20180409

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20190412

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20230427

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20230427