KR100988143B1 - 반도체 발광 소자, 반도체 발광 소자의 제조 방법 및 램프 - Google Patents

반도체 발광 소자, 반도체 발광 소자의 제조 방법 및 램프 Download PDF

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KR100988143B1
KR100988143B1 KR1020087024670A KR20087024670A KR100988143B1 KR 100988143 B1 KR100988143 B1 KR 100988143B1 KR 1020087024670 A KR1020087024670 A KR 1020087024670A KR 20087024670 A KR20087024670 A KR 20087024670A KR 100988143 B1 KR100988143 B1 KR 100988143B1
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South Korea
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light emitting
semiconductor light
izo film
emitting device
layer
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KR20080104363A (ko
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나오끼 후꾸나가
히로시 오사와
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쇼와 덴코 가부시키가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/83—Electrodes
    • H10H20/832—Electrodes characterised by their material
    • H10H20/833—Transparent materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07541—Controlling the environment, e.g. atmosphere composition or temperature
    • H10W72/07554—Controlling the environment, e.g. atmosphere composition or temperature changes in dispositions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/541—Dispositions of bond wires
    • H10W72/547—Dispositions of multiple bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

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KR1020087024670A 2006-04-14 2007-04-13 반도체 발광 소자, 반도체 발광 소자의 제조 방법 및 램프 Active KR100988143B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006112012A JP5265090B2 (ja) 2006-04-14 2006-04-14 半導体発光素子およびランプ
JPJP-P-2006-00112012 2006-04-14

Publications (2)

Publication Number Publication Date
KR20080104363A KR20080104363A (ko) 2008-12-02
KR100988143B1 true KR100988143B1 (ko) 2010-10-18

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KR1020087024670A Active KR100988143B1 (ko) 2006-04-14 2007-04-13 반도체 발광 소자, 반도체 발광 소자의 제조 방법 및 램프

Country Status (7)

Country Link
US (1) US8334200B2 (enExample)
EP (1) EP2012371B1 (enExample)
JP (1) JP5265090B2 (enExample)
KR (1) KR100988143B1 (enExample)
CN (1) CN101421856A (enExample)
TW (1) TWI359509B (enExample)
WO (1) WO2007119830A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5201566B2 (ja) * 2006-12-11 2013-06-05 豊田合成株式会社 化合物半導体発光素子及びその製造方法
WO2008081566A1 (ja) 2006-12-28 2008-07-10 Nec Corporation 電極構造、半導体素子、およびそれらの製造方法
JP2008235877A (ja) * 2007-02-19 2008-10-02 Showa Denko Kk 太陽電池及びその製造方法
JP2009260237A (ja) * 2008-01-24 2009-11-05 Showa Denko Kk 化合物半導体発光素子及びその製造方法、化合物半導体発光素子用導電型透光性電極、ランプ、電子機器並びに機械装置
US20090205707A1 (en) * 2008-02-19 2009-08-20 Showa Denko K.K. Solar cell and method for producing the same
KR101481855B1 (ko) * 2008-03-06 2015-01-12 스미토모 긴조쿠 고잔 가부시키가이샤 반도체 발광소자, 반도체 발광소자의 제조방법 및 이 반도체 발광소자를 사용한 램프
KR101221281B1 (ko) 2008-03-13 2013-01-11 쇼와 덴코 가부시키가이샤 반도체 발광 소자 및 그 제조 방법
JP5083973B2 (ja) * 2008-03-28 2012-11-28 スタンレー電気株式会社 光半導体素子の製造方法
JP2009246275A (ja) * 2008-03-31 2009-10-22 Showa Denko Kk Ｉｉｉ族窒化物半導体発光素子及びランプ
JP2009253056A (ja) * 2008-04-07 2009-10-29 Showa Denko Kk Ｉｉｉ族窒化物半導体発光素子及びランプ
JP2009283551A (ja) 2008-05-20 2009-12-03 Showa Denko Kk 半導体発光素子及びその製造方法、ランプ
JP2011086855A (ja) * 2009-10-19 2011-04-28 Showa Denko Kk 半導体発光素子の製造方法
JP5379703B2 (ja) * 2010-01-26 2013-12-25 パナソニック株式会社 紫外半導体発光素子
US20110244663A1 (en) * 2010-04-01 2011-10-06 Applied Materials, Inc. Forming a compound-nitride structure that includes a nucleation layer
CN101847677B (zh) * 2010-04-07 2012-11-14 中国科学院半导体研究所 采用mvpe两步法制备氧化锌透明电极的方法
JP5829014B2 (ja) * 2010-09-30 2015-12-09 シャープ株式会社 化合物半導体発光素子の製造方法
CN110459658A (zh) * 2018-05-08 2019-11-15 山东浪潮华光光电子股份有限公司 一种P型GaN层的UV LED芯片及其制备方法
CN112420888B (zh) * 2021-01-21 2021-04-23 华灿光电（浙江）有限公司 紫外发光二极管外延片及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6222312A (ja) 1985-07-23 1987-01-30 アルプス電気株式会社 透明導電性被膜の形成方法
JP2000026119A (ja) 1998-07-09 2000-01-25 Hoya Corp 透明導電性酸化物薄膜を有する物品及びその製造方法
WO2001038599A1 (en) 1999-11-25 2001-05-31 Idemitsu Kosan Co., Ltd. Sputtering target, transparent conductive oxide, and method for preparing sputtering target
JP2005217331A (ja) 2004-01-30 2005-08-11 Nichia Chem Ind Ltd 半導体発光素子

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299175A (ja) 1992-04-24 1993-11-12 Fuji Xerox Co Ltd Ｅｌ発光素子
JP2000067657A (ja) * 1998-08-26 2000-03-03 Internatl Business Mach Corp <Ibm> 赤外線透過に優れた透明導電膜及びその製造方法
JP2002164570A (ja) * 2000-11-24 2002-06-07 Shiro Sakai 窒化ガリウム系化合物半導体装置
JP4310984B2 (ja) * 2002-02-06 2009-08-12 株式会社日立製作所 有機発光表示装置
JP3720341B2 (ja) * 2003-02-12 2005-11-24 ローム株式会社 半導体発光素子
JP4259268B2 (ja) 2003-10-20 2009-04-30 豊田合成株式会社 半導体発光素子
JP2005259891A (ja) * 2004-03-10 2005-09-22 Toyoda Gosei Co Ltd 発光装置
KR100634503B1 (ko) * 2004-03-12 2006-10-16 삼성전자주식회사 질화물계 발광소자 및 그 제조방법
US7339255B2 (en) 2004-08-24 2008-03-04 Kabushiki Kaisha Toshiba Semiconductor device having bidirectionally inclined toward <1-100> and <11-20> relative to {0001} crystal planes
US8728615B2 (en) * 2004-09-13 2014-05-20 Sumitomo Metal Mining Co., Ltd. Transparent conductive film and method of fabricating the same, transparent conductive base material, and light-emitting device
JP4578929B2 (ja) 2004-10-15 2010-11-10 日本エステル株式会社 ポリ乳酸系複合バインダー繊維

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6222312A (ja) 1985-07-23 1987-01-30 アルプス電気株式会社 透明導電性被膜の形成方法
JP2000026119A (ja) 1998-07-09 2000-01-25 Hoya Corp 透明導電性酸化物薄膜を有する物品及びその製造方法
WO2001038599A1 (en) 1999-11-25 2001-05-31 Idemitsu Kosan Co., Ltd. Sputtering target, transparent conductive oxide, and method for preparing sputtering target
JP2005217331A (ja) 2004-01-30 2005-08-11 Nichia Chem Ind Ltd 半導体発光素子

Also Published As

Publication number Publication date
KR20080104363A (ko) 2008-12-02
CN101421856A (zh) 2009-04-29
WO2007119830A1 (ja) 2007-10-25
US8334200B2 (en) 2012-12-18
EP2012371A4 (en) 2014-01-22
TW200805714A (en) 2008-01-16
JP5265090B2 (ja) 2013-08-14
TWI359509B (en) 2012-03-01
EP2012371A1 (en) 2009-01-07
JP2007287845A (ja) 2007-11-01
EP2012371B1 (en) 2015-02-25
US20090179220A1 (en) 2009-07-16

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