KR100900117B1 - 용융염욕, 이 용융염욕을 이용해서 얻어진 석출물, 금속제품의 제조방법 및 금속제품 - Google Patents
용융염욕, 이 용융염욕을 이용해서 얻어진 석출물, 금속제품의 제조방법 및 금속제품Info
- Publication number
- KR100900117B1 KR100900117B1 KR1020077009342A KR20077009342A KR100900117B1 KR 100900117 B1 KR100900117 B1 KR 100900117B1 KR 1020077009342 A KR1020077009342 A KR 1020077009342A KR 20077009342 A KR20077009342 A KR 20077009342A KR 100900117 B1 KR100900117 B1 KR 100900117B1
- Authority
- KR
- South Korea
- Prior art keywords
- molten salt
- salt bath
- precipitate
- density
- alumina crucible
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2004-00290519 | 2004-10-01 | ||
JP2004290519 | 2004-10-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070058649A KR20070058649A (ko) | 2007-06-08 |
KR100900117B1 true KR100900117B1 (ko) | 2009-06-01 |
Family
ID=36142554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020077009342A KR100900117B1 (ko) | 2004-10-01 | 2005-09-22 | 용융염욕, 이 용융염욕을 이용해서 얻어진 석출물, 금속제품의 제조방법 및 금속제품 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20080105553A1 (ja) |
JP (1) | JP4785141B2 (ja) |
KR (1) | KR100900117B1 (ja) |
CN (1) | CN101035930B (ja) |
DE (1) | DE112005002435B4 (ja) |
TW (1) | TWI364462B (ja) |
WO (1) | WO2006038476A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4883534B2 (ja) * | 2008-03-26 | 2012-02-22 | 住友電気工業株式会社 | 溶融塩浴、溶融塩浴の製造方法およびタングステン析出物 |
JP5532504B2 (ja) * | 2009-03-05 | 2014-06-25 | 住友電気工業株式会社 | 光触媒素子 |
JP5568883B2 (ja) * | 2009-03-27 | 2014-08-13 | 住友電気工業株式会社 | 溶融塩浴および溶融塩浴の製造方法 |
JP2011011366A (ja) | 2009-06-30 | 2011-01-20 | Sumitomo Electric Ind Ltd | 金属積層構造体の製造方法 |
JP5583985B2 (ja) * | 2010-02-19 | 2014-09-03 | 住友電気工業株式会社 | 金属積層構造体 |
WO2013116510A1 (en) * | 2012-01-31 | 2013-08-08 | Halotechnics, Inc. | Thermal energy storage with molten salt |
JP6405199B2 (ja) * | 2013-11-19 | 2018-10-17 | 住友電気工業株式会社 | 電析用電解質および金属膜の製造方法 |
AU2015315441B2 (en) * | 2014-09-09 | 2020-10-29 | Clean Resources PTE. LTD. | A system, apparatus, and process for leaching metal and storing thermal energy during metal extraction |
CN105714332B (zh) * | 2016-04-15 | 2019-03-22 | 华北理工大学 | 一种熔盐电沉积钒的方法 |
WO2018216320A1 (ja) * | 2017-05-22 | 2018-11-29 | 住友電気工業株式会社 | 溶融塩チタンめっき液組成物およびチタンめっき部材の製造方法 |
WO2018216319A1 (ja) * | 2017-05-22 | 2018-11-29 | 住友電気工業株式会社 | チタンめっき部材の製造方法 |
US11352508B2 (en) * | 2018-01-19 | 2022-06-07 | Dynalene Inc. | Molten salt inhibitor and method for corrosion protection of a steel component |
JP7086172B2 (ja) * | 2018-03-08 | 2022-06-17 | 住友電気工業株式会社 | チタンめっき部材の製造方法及びチタンめっき部材 |
WO2021176769A1 (ja) * | 2020-03-04 | 2021-09-10 | 住友電気工業株式会社 | チタンめっき用電解質及びチタンめっき用電解質を用いたチタンめっき部材の製造方法 |
KR102306152B1 (ko) * | 2021-03-19 | 2021-09-28 | 한국지질자원연구원 | 산소센서를 이용한 금속산화물의 용해도 분석방법, 산소센서를 이용한 금속산화물의 용해도 분석장치, 산소센서를 이용한 금속제련장치 및 산소센서를 이용한 금속제련방법 |
CN116855965B (zh) * | 2023-09-04 | 2023-11-14 | 浙江百能科技有限公司 | 一种pta碱回收炉熔融盐分离提纯装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001279486A (ja) * | 2000-03-30 | 2001-10-10 | Japan Science & Technology Corp | タンタルのめっき法 |
JP2004084059A (ja) * | 2002-07-04 | 2004-03-18 | Sumitomo Electric Ind Ltd | 微細パターンを有するメッキ用型、微細金属構造体、微細加工用型、微細パターンを有するメッキ用型の製造方法、および微細金属構造体の製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2786809A (en) * | 1953-09-30 | 1957-03-26 | Horizons Titanium Corp | Electrolytic cladding |
NL302728A (ja) * | 1963-02-18 | |||
CA2012009C (en) * | 1989-03-16 | 1999-01-19 | Tadashi Ogasawara | Process for the electrolytic production of magnesium |
DK169354B1 (da) * | 1992-07-08 | 1994-10-10 | Danfoss As | Smeltebad og fremgangsmåde til elektrolytisk overfladebelægning med refractory metaller fra fluoridholdige saltsmelter |
US6187168B1 (en) * | 1998-10-06 | 2001-02-13 | Aluminum Company Of America | Electrolysis in a cell having a solid oxide ion conductor |
DK174876B1 (da) * | 2001-02-26 | 2004-01-12 | Danfoss As | Implantat og implantatoverflademodificeringsproces |
WO2006057231A1 (ja) * | 2004-11-24 | 2006-06-01 | Sumitomo Electric Industries, Ltd. | 溶融塩浴、析出物および金属析出物の製造方法 |
-
2005
- 2005-09-22 WO PCT/JP2005/017510 patent/WO2006038476A1/ja active Application Filing
- 2005-09-22 KR KR1020077009342A patent/KR100900117B1/ko active IP Right Grant
- 2005-09-22 US US11/664,095 patent/US20080105553A1/en not_active Abandoned
- 2005-09-22 DE DE112005002435.0T patent/DE112005002435B4/de not_active Expired - Fee Related
- 2005-09-22 JP JP2006539225A patent/JP4785141B2/ja not_active Expired - Fee Related
- 2005-09-22 CN CN2005800335362A patent/CN101035930B/zh active Active
- 2005-09-28 TW TW094133635A patent/TWI364462B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001279486A (ja) * | 2000-03-30 | 2001-10-10 | Japan Science & Technology Corp | タンタルのめっき法 |
JP2004084059A (ja) * | 2002-07-04 | 2004-03-18 | Sumitomo Electric Ind Ltd | 微細パターンを有するメッキ用型、微細金属構造体、微細加工用型、微細パターンを有するメッキ用型の製造方法、および微細金属構造体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2006038476A1 (ja) | 2008-05-15 |
KR20070058649A (ko) | 2007-06-08 |
DE112005002435B4 (de) | 2014-01-02 |
WO2006038476A1 (ja) | 2006-04-13 |
DE112005002435T5 (de) | 2007-08-30 |
TW200617187A (en) | 2006-06-01 |
CN101035930A (zh) | 2007-09-12 |
JP4785141B2 (ja) | 2011-10-05 |
TWI364462B (en) | 2012-05-21 |
US20080105553A1 (en) | 2008-05-08 |
CN101035930B (zh) | 2012-12-12 |
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