TWI364462B - Melted salt bath, extraction article obtained by using the melted salt bath, a process for preparing a metal manufacture, and a metal manufacture - Google Patents
Melted salt bath, extraction article obtained by using the melted salt bath, a process for preparing a metal manufacture, and a metal manufacture Download PDFInfo
- Publication number
- TWI364462B TWI364462B TW094133635A TW94133635A TWI364462B TW I364462 B TWI364462 B TW I364462B TW 094133635 A TW094133635 A TW 094133635A TW 94133635 A TW94133635 A TW 94133635A TW I364462 B TWI364462 B TW I364462B
- Authority
- TW
- Taiwan
- Prior art keywords
- salt bath
- metal manufacture
- melted salt
- preparing
- article obtained
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 3
- 239000002184 metal Substances 0.000 title 2
- 150000003839 salts Chemical class 0.000 title 2
- 238000000605 extraction Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004290519 | 2004-10-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200617187A TW200617187A (en) | 2006-06-01 |
TWI364462B true TWI364462B (en) | 2012-05-21 |
Family
ID=36142554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094133635A TWI364462B (en) | 2004-10-01 | 2005-09-28 | Melted salt bath, extraction article obtained by using the melted salt bath, a process for preparing a metal manufacture, and a metal manufacture |
Country Status (7)
Country | Link |
---|---|
US (1) | US20080105553A1 (ja) |
JP (1) | JP4785141B2 (ja) |
KR (1) | KR100900117B1 (ja) |
CN (1) | CN101035930B (ja) |
DE (1) | DE112005002435B4 (ja) |
TW (1) | TWI364462B (ja) |
WO (1) | WO2006038476A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4883534B2 (ja) * | 2008-03-26 | 2012-02-22 | 住友電気工業株式会社 | 溶融塩浴、溶融塩浴の製造方法およびタングステン析出物 |
JP5532504B2 (ja) * | 2009-03-05 | 2014-06-25 | 住友電気工業株式会社 | 光触媒素子 |
JP5568883B2 (ja) * | 2009-03-27 | 2014-08-13 | 住友電気工業株式会社 | 溶融塩浴および溶融塩浴の製造方法 |
JP2011011366A (ja) | 2009-06-30 | 2011-01-20 | Sumitomo Electric Ind Ltd | 金属積層構造体の製造方法 |
JP5583985B2 (ja) * | 2010-02-19 | 2014-09-03 | 住友電気工業株式会社 | 金属積層構造体 |
WO2013116510A1 (en) * | 2012-01-31 | 2013-08-08 | Halotechnics, Inc. | Thermal energy storage with molten salt |
JP6405199B2 (ja) * | 2013-11-19 | 2018-10-17 | 住友電気工業株式会社 | 電析用電解質および金属膜の製造方法 |
AU2015315441B2 (en) * | 2014-09-09 | 2020-10-29 | Clean Resources PTE. LTD. | A system, apparatus, and process for leaching metal and storing thermal energy during metal extraction |
CN105714332B (zh) * | 2016-04-15 | 2019-03-22 | 华北理工大学 | 一种熔盐电沉积钒的方法 |
WO2018216320A1 (ja) * | 2017-05-22 | 2018-11-29 | 住友電気工業株式会社 | 溶融塩チタンめっき液組成物およびチタンめっき部材の製造方法 |
WO2018216319A1 (ja) * | 2017-05-22 | 2018-11-29 | 住友電気工業株式会社 | チタンめっき部材の製造方法 |
US11352508B2 (en) * | 2018-01-19 | 2022-06-07 | Dynalene Inc. | Molten salt inhibitor and method for corrosion protection of a steel component |
JP7086172B2 (ja) * | 2018-03-08 | 2022-06-17 | 住友電気工業株式会社 | チタンめっき部材の製造方法及びチタンめっき部材 |
WO2021176769A1 (ja) * | 2020-03-04 | 2021-09-10 | 住友電気工業株式会社 | チタンめっき用電解質及びチタンめっき用電解質を用いたチタンめっき部材の製造方法 |
KR102306152B1 (ko) * | 2021-03-19 | 2021-09-28 | 한국지질자원연구원 | 산소센서를 이용한 금속산화물의 용해도 분석방법, 산소센서를 이용한 금속산화물의 용해도 분석장치, 산소센서를 이용한 금속제련장치 및 산소센서를 이용한 금속제련방법 |
CN116855965B (zh) * | 2023-09-04 | 2023-11-14 | 浙江百能科技有限公司 | 一种pta碱回收炉熔融盐分离提纯装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2786809A (en) * | 1953-09-30 | 1957-03-26 | Horizons Titanium Corp | Electrolytic cladding |
NL302728A (ja) * | 1963-02-18 | |||
CA2012009C (en) * | 1989-03-16 | 1999-01-19 | Tadashi Ogasawara | Process for the electrolytic production of magnesium |
DK169354B1 (da) * | 1992-07-08 | 1994-10-10 | Danfoss As | Smeltebad og fremgangsmåde til elektrolytisk overfladebelægning med refractory metaller fra fluoridholdige saltsmelter |
US6187168B1 (en) * | 1998-10-06 | 2001-02-13 | Aluminum Company Of America | Electrolysis in a cell having a solid oxide ion conductor |
JP3594530B2 (ja) * | 2000-03-30 | 2004-12-02 | 独立行政法人 科学技術振興機構 | タンタルのめっき法 |
DK174876B1 (da) * | 2001-02-26 | 2004-01-12 | Danfoss As | Implantat og implantatoverflademodificeringsproces |
JP2004084059A (ja) * | 2002-07-04 | 2004-03-18 | Sumitomo Electric Ind Ltd | 微細パターンを有するメッキ用型、微細金属構造体、微細加工用型、微細パターンを有するメッキ用型の製造方法、および微細金属構造体の製造方法 |
WO2006057231A1 (ja) * | 2004-11-24 | 2006-06-01 | Sumitomo Electric Industries, Ltd. | 溶融塩浴、析出物および金属析出物の製造方法 |
-
2005
- 2005-09-22 WO PCT/JP2005/017510 patent/WO2006038476A1/ja active Application Filing
- 2005-09-22 KR KR1020077009342A patent/KR100900117B1/ko active IP Right Grant
- 2005-09-22 US US11/664,095 patent/US20080105553A1/en not_active Abandoned
- 2005-09-22 DE DE112005002435.0T patent/DE112005002435B4/de not_active Expired - Fee Related
- 2005-09-22 JP JP2006539225A patent/JP4785141B2/ja not_active Expired - Fee Related
- 2005-09-22 CN CN2005800335362A patent/CN101035930B/zh active Active
- 2005-09-28 TW TW094133635A patent/TWI364462B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPWO2006038476A1 (ja) | 2008-05-15 |
KR20070058649A (ko) | 2007-06-08 |
DE112005002435B4 (de) | 2014-01-02 |
WO2006038476A1 (ja) | 2006-04-13 |
KR100900117B1 (ko) | 2009-06-01 |
DE112005002435T5 (de) | 2007-08-30 |
TW200617187A (en) | 2006-06-01 |
CN101035930A (zh) | 2007-09-12 |
JP4785141B2 (ja) | 2011-10-05 |
US20080105553A1 (en) | 2008-05-08 |
CN101035930B (zh) | 2012-12-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |