KR100885338B1 - 정전기 방지 조성물 - Google Patents
정전기 방지 조성물 Download PDFInfo
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- KR100885338B1 KR100885338B1 KR1020047006822A KR20047006822A KR100885338B1 KR 100885338 B1 KR100885338 B1 KR 100885338B1 KR 1020047006822 A KR1020047006822 A KR 1020047006822A KR 20047006822 A KR20047006822 A KR 20047006822A KR 100885338 B1 KR100885338 B1 KR 100885338B1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0075—Antistatics
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31645—Next to addition polymer from unsaturated monomers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
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Abstract
Description
성분들의 표 | ||
성분 | 설명 | 시판 회사/제법 |
디메틸 술페이트 | (CH3O)2SO2 | 시그마-알드리치 (Sigma-Aldrich, Milwaukee, Wisconsin) |
에토쿼드 (ETHOQUAD, 상표명) C/25 | [C12H25N+(CH3)(CH2CH2O)mH(CH2CH2O)nH-Cl] (m+n=15), 물 중 약 95 % 고체 | 악조 노벨 서피스 케미스트리 엘엘씨 (Akzo Nobel Surface Chemistry LLC, Chicago, Illinois) |
에토쿼드 (상표명) 18/25 | [C18H37N+(CH3)(CH2CH2O)mH(CH2CH2O)nH-Cl] (m+n=15), 물 중 약 95 % 고체 | 악조 노벨 서피스 케미스트리 엘엘씨 |
에토쿼드 (상표명) C/15 | [C12H25N(CH2CH2O)mH(CH2CH2O)nH] (m+n=15) | 악조 노벨 서피스 케미스트리 엘엘씨 |
HQ-115 (상표명) | LiN(SO2CF3)2 | 미네소타 마이닝 앤드 메뉴팩춰링 컴퍼니 (Minnesota Mining and Manufacturing Company, (3M), St. Paul, MN) |
이소프로필 알콜 | CH3CH(OH)CH3 | 시그마-알드리치 |
리튬 노나플레이트 | 리튬 노나플루오로부탄술포네이트 | 3M |
리튬 트리플레이트 | 리튬 트리플루오로메탄술포네이트 (FC 122) | 3M |
MEK | 메틸 에틸 케톤; 2-부타논; CH3C(O)C2H5 | 시그마-알드리치 |
메틸렌 클로라이드 | 디클로로메탄; CH2Cl2 | 시그마-알드리치 |
NaHCO3 | 탄산수소나트륨 | 시그마-알드리치 |
PE6806 | 용융 유동 지수가 105인 아스푼 (ASPUN, 상표명) 6806 폴리에틸렌 | 다우 케미칼 컴퍼니 (Dow Chemical Co., Midland, Michigan) |
PP3960 | 용융 유동 지수가 약 400인 피나 (FINA, 상표명) 3960 폴리프로필렌 | 피나 오일 앤드 케미칼 컴퍼니 (FINA Oil & Chemical Co., LaPorte, Texas) |
PS440-200 | 모르탄 (MORTHANE, 상표명) PS440-200 우레탄 | 모르톤 티오콜 코포레이션 (Morton Thiokol Corp., Chicago, Illinois) |
Claims (19)
- (a) 하나 이상의 하기 화학식 I의 양이온; 및(b) 하기 화학식 1 및 2 중 하나의 플루오르화 음이온으로 구성된 중합체 염을 포함하는 정전기 방지제.<화학식 I>+N[(R1)4-y][[POA]R2]y상기 식에서,POA는 단독중합체, 랜덤 공중합체, 블록 공중합체 또는 교호 공중합체이며, 화학식 ((CH2)m'CH(R3)O)로 표시되는 2 내지 50개의 단위 (여기서, 각 단위는 독립적으로 m'과 R3을 갖고, m'은 1 내지 4의 정수이며, R3은 독립적으로 수소, 또는 1 내지 4개의 탄소 원자를 함유하는 알킬기임)를 포함하고,R1은 독립적으로 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이며,R2는 독립적으로 수소 또는 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이고,y는 1 내지 4의 정수이다.<화학식 1>RfSO3 -<화학식 2>-O3SRf2SO3 -상기 식에서,Rf는 독립적으로 1 내지 12개의 탄소 원자를 갖는 퍼플루오로알킬, 플루오로알킬 또는 플루오로아릴기이고,Rf2는 독립적으로 1 내지 10개의 탄소 원자를 갖는 퍼플루오로알킬렌, 플루오로알킬렌 또는 플루오로아릴렌기이다.
- 삭제
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- 제1항에 있어서, 상기 양이온이 단일 암모늄 중심에 결합된 하나 이상의 폴리옥시알킬렌 잔기를 포함하는 것인 정전기 방지제.
- 제1항에 있어서, 상기 음이온이 퍼플루오로알칸술포네이트, 플루오로아릴술포네이트, 헤테로원자 함유 플루오로알칸술포네이트, 이관능성 플루오로알칸술포네이트, 이관능성 플루오로아릴술포네이트 및 이들의 혼합물로 구성된 군에서 선택되는 정전기 방지제.
- 삭제
- 삭제
- (a) 하나 이상의 하기 화학식 I의 양이온; 및(b) 하기 화학식 1 및 2 중 하나의 플루오르화 음이온으로 구성된 중합체 염을 포함하는 정전기 방지제로 코팅된 절연 물질을 포함하는 물품.<화학식 I>+N[(R1)4-y][[POA]R2]y상기 식에서,POA는 단독중합체, 랜덤 공중합체, 블록 공중합체 또는 교호 공중합체이며, 화학식 ((CH2)m'CH(R3)O)로 표시되는 2 내지 50개의 단위 (여기서, 각 단위는 독립적으로 m'과 R3을 갖고, m'은 1 내지 4의 정수이며, R3은 독립적으로 수소, 또는 1 내지 4개의 탄소 원자를 함유하는 알킬기임)를 포함하고,R1은 독립적으로 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이며,R2는 독립적으로 수소 또는 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이고,y는 1 내지 4의 정수이다.<화학식 1>RfSO3 -<화학식 2>-O3SRf2SO3 -상기 식에서,Rf는 독립적으로 1 내지 12개의 탄소 원자를 갖는 퍼플루오로알킬, 플루오로알킬 또는 플루오로아릴기이고,Rf2는 독립적으로 1 내지 10개의 탄소 원자를 갖는 퍼플루오로알킬렌, 플루오로알킬렌 또는 플루오로아릴렌기이다.
- 삭제
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- (a) (i) 하나 이상의 하기 화학식 I의 양이온; 및 (ii) 하기 화학식 1 및 2 중 하나의 플루오르화 음이온으로 구성된 중합체 염을 포함하는 정전기 방지제; 및(b) 1종 이상의 열가소성 중합체인 절연 물질을 포함하는 정전기 방지 조성물.<화학식 I>+N[(R1)4-y][[POA]R2]y상기 식에서,POA는 단독중합체, 랜덤 공중합체, 블록 공중합체 또는 교호 공중합체이며, 화학식 ((CH2)m'CH(R3)O)로 표시되는 2 내지 50개의 단위 (여기서, 각 단위는 독립적으로 m'과 R3을 갖고, m'은 1 내지 4의 정수이며, R3은 독립적으로 수소, 또는 1 내지 4개의 탄소 원자를 함유하는 알킬기임)를 포함하고,R1은 독립적으로 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이며,R2는 독립적으로 수소 또는 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이고,y는 1 내지 4의 정수이다.<화학식 1>RfSO3 -<화학식 2>-O3SRf2SO3 -상기 식에서,Rf는 독립적으로 1 내지 12개의 탄소 원자를 갖는 퍼플루오로알킬, 플루오로알킬 또는 플루오로아릴기이고,Rf2는 독립적으로 1 내지 10개의 탄소 원자를 갖는 퍼플루오로알킬렌, 플루오로알킬렌 또는 플루오로아릴렌기이다.
- 삭제
- (a) (i) (A) 하나 이상의 하기 화학식 I의 양이온, 및 (B) 하기 화학식 1 및 2 중 하나의 플루오르화 음이온으로 구성된 하나 이상의 중합체 염; 및(ii) 하나 이상의 열가소성 중합체를 조합하는 단계; 및(b) 생성된 조합물을 용융 가공하는 단계를 포함하는 정전기 방지 조성물의 제조 방법.<화학식 I>+N[(R1)4-y][[POA]R2]y상기 식에서,POA는 단독중합체, 랜덤 공중합체, 블록 공중합체 또는 교호 공중합체이며, 화학식 ((CH2)m'CH(R3)O)로 표시되는 2 내지 50개의 단위 (여기서, 각 단위는 독립적으로 m'과 R3을 갖고, m'은 1 내지 4의 정수이며, R3은 독립적으로 수소, 또는 1 내지 4개의 탄소 원자를 함유하는 알킬기임)를 포함하고,R1은 독립적으로 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이며,R2는 독립적으로 수소 또는 하나 이상의 헤테로원자를 임의로 함유하는 알킬기, 지환족기, 아릴기, 알크지환족기, 아릴지환족기 또는 지환족아릴기이고,y는 1 내지 4의 정수이다.<화학식 1>RfSO3 -<화학식 2>-O3SRf2SO3 -상기 식에서,Rf는 독립적으로 1 내지 12개의 탄소 원자를 갖는 퍼플루오로알킬, 플루오로알킬 또는 플루오로아릴기이고,Rf2는 독립적으로 1 내지 10개의 탄소 원자를 갖는 퍼플루오로알킬렌, 플루오로알킬렌 또는 플루오로아릴렌기이다.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/992,878 US6740413B2 (en) | 2001-11-05 | 2001-11-05 | Antistatic compositions |
US09/992,878 | 2001-11-05 |
Publications (2)
Publication Number | Publication Date |
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KR20050026911A KR20050026911A (ko) | 2005-03-16 |
KR100885338B1 true KR100885338B1 (ko) | 2009-02-26 |
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KR1020047006822A KR100885338B1 (ko) | 2001-11-05 | 2002-09-10 | 정전기 방지 조성물 |
Country Status (8)
Country | Link |
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US (1) | US6740413B2 (ko) |
EP (1) | EP1442077B1 (ko) |
JP (1) | JP4444656B2 (ko) |
KR (1) | KR100885338B1 (ko) |
CN (1) | CN100379804C (ko) |
AT (1) | ATE357477T1 (ko) |
DE (1) | DE60219056T2 (ko) |
WO (1) | WO2003040228A1 (ko) |
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CN100412120C (zh) * | 2003-12-30 | 2008-08-20 | 通用电气公司 | 含有聚合物抗静电盐的热塑性组合物、其制造方法和用途 |
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US8299252B2 (en) | 2005-08-05 | 2012-10-30 | Chugai Seiyaku Kabushiki Kaisha | Pyrazolopyridine and pyrrolopyridine multikinase inhibitors |
JP4822269B2 (ja) * | 2006-06-09 | 2011-11-24 | 独立行政法人産業技術総合研究所 | 新規なオニウム塩 |
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Also Published As
Publication number | Publication date |
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CN1630685A (zh) | 2005-06-22 |
JP4444656B2 (ja) | 2010-03-31 |
EP1442077B1 (en) | 2007-03-21 |
KR20050026911A (ko) | 2005-03-16 |
JP2005508427A (ja) | 2005-03-31 |
WO2003040228A1 (en) | 2003-05-15 |
US6740413B2 (en) | 2004-05-25 |
US20030099802A1 (en) | 2003-05-29 |
DE60219056D1 (de) | 2007-05-03 |
ATE357477T1 (de) | 2007-04-15 |
EP1442077A1 (en) | 2004-08-04 |
DE60219056T2 (de) | 2007-12-13 |
CN100379804C (zh) | 2008-04-09 |
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