KR100720203B1 - Ag 합금 반사막, 이를 위한 스퍼터링 타겟, 및 이를사용한 광 정보 기록매체 - Google Patents
Ag 합금 반사막, 이를 위한 스퍼터링 타겟, 및 이를사용한 광 정보 기록매체 Download PDFInfo
- Publication number
- KR100720203B1 KR100720203B1 KR1020050063819A KR20050063819A KR100720203B1 KR 100720203 B1 KR100720203 B1 KR 100720203B1 KR 1020050063819 A KR1020050063819 A KR 1020050063819A KR 20050063819 A KR20050063819 A KR 20050063819A KR 100720203 B1 KR100720203 B1 KR 100720203B1
- Authority
- KR
- South Korea
- Prior art keywords
- alloy
- atomic
- reflective film
- information recording
- optical information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/007—Arrangement of the information on the record carrier, e.g. form of tracks, actual track shape, e.g. wobbled, or cross-section, e.g. v-shaped; Sequential information structures, e.g. sectoring or header formats within a track
- G11B7/00736—Auxiliary data, e.g. lead-in, lead-out, Power Calibration Area [PCA], Burst Cutting Area [BCA], control information
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2004-00208686 | 2004-07-15 | ||
| JP2004208686 | 2004-07-15 | ||
| JPJP-P-2005-00067262 | 2005-03-10 | ||
| JP2005067262A JP3907666B2 (ja) | 2004-07-15 | 2005-03-10 | レーザーマーキング用再生専用光情報記録媒体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20060050179A KR20060050179A (ko) | 2006-05-19 |
| KR100720203B1 true KR100720203B1 (ko) | 2007-05-21 |
Family
ID=35241160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020050063819A Expired - Fee Related KR100720203B1 (ko) | 2004-07-15 | 2005-07-14 | Ag 합금 반사막, 이를 위한 스퍼터링 타겟, 및 이를사용한 광 정보 기록매체 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7695790B2 (enExample) |
| EP (3) | EP2043097A1 (enExample) |
| JP (1) | JP3907666B2 (enExample) |
| KR (1) | KR100720203B1 (enExample) |
| AT (1) | ATE424025T1 (enExample) |
| DE (1) | DE602005012891D1 (enExample) |
| SG (1) | SG119296A1 (enExample) |
| TW (1) | TWI327602B (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100568392B1 (ko) * | 2002-06-24 | 2006-04-05 | 가부시키가이샤 코베루코 카겐 | 은 합금 스퍼터링 타겟 및 그의 제조 방법 |
| US7514037B2 (en) * | 2002-08-08 | 2009-04-07 | Kobe Steel, Ltd. | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
| JP3993530B2 (ja) * | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ag−Bi系合金スパッタリングターゲットおよびその製造方法 |
| JP2006294195A (ja) * | 2005-04-14 | 2006-10-26 | Kobe Steel Ltd | 光情報記録用Ag合金反射膜、光情報記録媒体および光情報記録用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
| JP4377861B2 (ja) * | 2005-07-22 | 2009-12-02 | 株式会社神戸製鋼所 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
| JP4527624B2 (ja) * | 2005-07-22 | 2010-08-18 | 株式会社神戸製鋼所 | Ag合金反射膜を有する光情報媒体 |
| JP2007035104A (ja) * | 2005-07-22 | 2007-02-08 | Kobe Steel Ltd | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
| JP4377877B2 (ja) | 2005-12-21 | 2009-12-02 | ソニー株式会社 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
| JP2007335061A (ja) | 2006-05-16 | 2007-12-27 | Sony Corp | 光情報記録媒体とそのBCA(BurstCuttingArea)マーキング方法 |
| JP2008021393A (ja) * | 2006-07-14 | 2008-01-31 | Mitsubishi Kagaku Media Co Ltd | 光記録媒体およびディスク媒体認識信号の記録方法 |
| US8092889B2 (en) * | 2006-08-28 | 2012-01-10 | Kobe Steel, Ltd. | Silver alloy reflective film for optical information storage media, optical information storage medium, and sputtering target for the deposition of silver alloy reflective film for optical information storage media |
| JP2008117470A (ja) * | 2006-11-02 | 2008-05-22 | Sony Corp | 光情報記録媒体および光情報記録媒体の製造方法、BCA(BurstCuttingArea)マーキング方法 |
| JP4540687B2 (ja) * | 2007-04-13 | 2010-09-08 | 株式会社ソニー・ディスクアンドデジタルソリューションズ | 読み出し専用の光情報記録媒体 |
| JP4694543B2 (ja) * | 2007-08-29 | 2011-06-08 | 株式会社コベルコ科研 | Ag基合金スパッタリングターゲット、およびその製造方法 |
| JP4833942B2 (ja) * | 2007-08-29 | 2011-12-07 | 株式会社コベルコ科研 | Ag基合金スパッタリングターゲット |
| JP2009076129A (ja) * | 2007-09-19 | 2009-04-09 | Kobe Steel Ltd | 読み出し専用の光情報記録媒体 |
| US8399100B2 (en) * | 2007-09-25 | 2013-03-19 | Kobe Steel, Ltd. | Reflection film, reflection film laminate, LED, organic EL display, and organic EL illuminating instrument |
| JP5046890B2 (ja) * | 2007-11-29 | 2012-10-10 | 株式会社コベルコ科研 | Ag系スパッタリングターゲット |
| JP2010049736A (ja) * | 2008-08-21 | 2010-03-04 | Taiyo Yuden Co Ltd | 光情報記録媒体 |
| JP5331420B2 (ja) | 2008-09-11 | 2013-10-30 | 株式会社神戸製鋼所 | 読み出し専用の光情報記録媒体および該光情報記録媒体の半透過反射膜形成用スパッタリングターゲット |
| JP2010225572A (ja) * | 2008-11-10 | 2010-10-07 | Kobe Steel Ltd | 有機elディスプレイ用の反射アノード電極および配線膜 |
| CN102308030B (zh) * | 2009-02-06 | 2015-01-07 | 出分由佳里 | 含银合金电镀浴以及使用该电镀浴的电解电镀方法 |
| WO2010119888A1 (ja) | 2009-04-14 | 2010-10-21 | 株式会社神戸製鋼所 | 光情報記録媒体、光情報記録媒体の反射膜形成用スパッタリングターゲット |
| CA2769569C (en) | 2009-07-31 | 2014-07-15 | M-Tech Japan Co., Ltd. | Tin-containing alloy plating bath, electroplating method using same, and substrate with the electroplating deposited thereon |
| JP5719179B2 (ja) * | 2010-01-25 | 2015-05-13 | 株式会社神戸製鋼所 | 反射膜積層体 |
| KR101432362B1 (ko) | 2011-06-29 | 2014-08-20 | 후지쯔 콤포넌트 가부시끼가이샤 | 프린터 장치 |
| JP2013077547A (ja) * | 2011-09-15 | 2013-04-25 | Mitsubishi Materials Corp | 導電性膜及びその製造方法並びに導電性膜形成用銀合金スパッタリングターゲット及びその製造方法 |
| JP5159962B1 (ja) * | 2012-01-10 | 2013-03-13 | 三菱マテリアル株式会社 | 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法 |
| JP5159963B1 (ja) * | 2012-01-13 | 2013-03-13 | 三菱マテリアル株式会社 | 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07315874A (ja) * | 1994-03-30 | 1995-12-05 | Nippon Sheet Glass Co Ltd | 熱線遮蔽ガラス |
| JP2002015464A (ja) * | 2000-04-28 | 2002-01-18 | Kobe Steel Ltd | 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US274205A (en) * | 1883-03-20 | Straw-stacker | ||
| US292651A (en) * | 1884-01-29 | Refuse attachment for table-plates | ||
| US293072A (en) * | 1884-02-05 | Fire-escape | ||
| US292662A (en) * | 1884-01-29 | Centrifugal creamer | ||
| US4998239A (en) * | 1987-10-07 | 1991-03-05 | The Dow Chemical Company | Optical information recording medium containing a metal alloy as a reflective material |
| US5948497A (en) * | 1992-10-19 | 1999-09-07 | Eastman Kodak Company | High stability silver based alloy reflectors for use in a writable compact disk |
| DE69731705T2 (de) * | 1996-09-24 | 2005-04-07 | Fuji Photo Film Co., Ltd., Minami-Ashigara | Optische Informationsaufzeichnungsplatte |
| US6007889A (en) * | 1998-06-22 | 1999-12-28 | Target Technology, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
| US6544616B2 (en) * | 2000-07-21 | 2003-04-08 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
| US6852384B2 (en) * | 1998-06-22 | 2005-02-08 | Han H. Nee | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
| JP2000169959A (ja) | 1998-12-04 | 2000-06-20 | Japan Energy Corp | 光ディスク反射膜形成用スパッタリングターゲット |
| CN1202521C (zh) * | 1999-07-22 | 2005-05-18 | 索尼株式会社 | 光记录媒体、光记录及再生方法、光记录及再生装置 |
| SG116432A1 (en) * | 2000-12-26 | 2005-11-28 | Kobe Steel Ltd | Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media. |
| CN1217028C (zh) | 2001-03-16 | 2005-08-31 | 石福金属兴业株式会社 | 溅射靶材 |
| TW583323B (en) | 2001-08-20 | 2004-04-11 | Cosmos Vacuum Technology Corp | Manufacturing process of depositing anti-reflection film at room temperature and low reflectivity polarizer manufactured by the same |
| JP3772972B2 (ja) | 2001-11-26 | 2006-05-10 | 三菱マテリアル株式会社 | 光記録媒体の反射層形成用銀合金スパッタリングターゲット |
| KR100491931B1 (ko) * | 2002-01-25 | 2005-05-30 | 가부시키가이샤 고베 세이코쇼 | 반사 필름, 반사형 액정 표시소자 및 상기 반사 필름을형성하기 위한 스퍼터링 타겟 |
| KR100568392B1 (ko) * | 2002-06-24 | 2006-04-05 | 가부시키가이샤 코베루코 카겐 | 은 합금 스퍼터링 타겟 및 그의 제조 방법 |
| US20040005432A1 (en) | 2002-07-08 | 2004-01-08 | Ridout James W. | Reflective or semi-reflective metal alloy coatings |
| JP3655907B2 (ja) | 2002-08-20 | 2005-06-02 | 株式会社神戸製鋼所 | 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体 |
| US7514037B2 (en) * | 2002-08-08 | 2009-04-07 | Kobe Steel, Ltd. | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
| WO2004094135A1 (en) * | 2003-04-18 | 2004-11-04 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
| JP3993530B2 (ja) | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ag−Bi系合金スパッタリングターゲットおよびその製造方法 |
| JP4009564B2 (ja) * | 2003-06-27 | 2007-11-14 | 株式会社神戸製鋼所 | リフレクター用Ag合金反射膜、及び、このAg合金反射膜を用いたリフレクター、並びに、このAg合金反射膜のAg合金薄膜の形成用のAg合金スパッタリングターゲット |
| JP2005029849A (ja) * | 2003-07-07 | 2005-02-03 | Kobe Steel Ltd | リフレクター用Ag合金反射膜、及び、このAg合金反射膜を用いたリフレクター、並びに、このAg合金反射膜の形成用のAg合金スパッタリングターゲット |
| US20050112019A1 (en) * | 2003-10-30 | 2005-05-26 | Kabushiki Kaisha Kobe Seiko Sho(Kobe Steel, Ltd.) | Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording |
| TWI325134B (en) | 2004-04-21 | 2010-05-21 | Kobe Steel Ltd | Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target |
-
2005
- 2005-03-10 JP JP2005067262A patent/JP3907666B2/ja not_active Expired - Fee Related
- 2005-06-22 TW TW094120841A patent/TWI327602B/zh not_active IP Right Cessation
- 2005-06-22 US US11/158,079 patent/US7695790B2/en not_active Expired - Fee Related
- 2005-06-30 EP EP08020402A patent/EP2043097A1/en not_active Withdrawn
- 2005-06-30 DE DE602005012891T patent/DE602005012891D1/de not_active Expired - Lifetime
- 2005-06-30 EP EP08020403A patent/EP2077556A1/en not_active Withdrawn
- 2005-06-30 AT AT05014211T patent/ATE424025T1/de active
- 2005-06-30 EP EP05014211A patent/EP1617427B1/en not_active Expired - Lifetime
- 2005-07-06 SG SG200504273A patent/SG119296A1/en unknown
- 2005-07-14 KR KR1020050063819A patent/KR100720203B1/ko not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07315874A (ja) * | 1994-03-30 | 1995-12-05 | Nippon Sheet Glass Co Ltd | 熱線遮蔽ガラス |
| JP2002015464A (ja) * | 2000-04-28 | 2002-01-18 | Kobe Steel Ltd | 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1617427A3 (en) | 2006-03-15 |
| KR20060050179A (ko) | 2006-05-19 |
| EP1617427B1 (en) | 2009-02-25 |
| US20060013988A1 (en) | 2006-01-19 |
| TWI327602B (en) | 2010-07-21 |
| DE602005012891D1 (de) | 2009-04-09 |
| EP2077556A1 (en) | 2009-07-08 |
| SG119296A1 (en) | 2006-02-28 |
| JP2006054032A (ja) | 2006-02-23 |
| ATE424025T1 (de) | 2009-03-15 |
| US7695790B2 (en) | 2010-04-13 |
| EP1617427A2 (en) | 2006-01-18 |
| EP2043097A1 (en) | 2009-04-01 |
| TW200622011A (en) | 2006-07-01 |
| JP3907666B2 (ja) | 2007-04-18 |
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