KR100548976B1 - 비휘발성 페닐글리옥살산 에스테르 - Google Patents
비휘발성 페닐글리옥살산 에스테르Info
- Publication number
- KR100548976B1 KR100548976B1 KR1019997006856A KR19997006856A KR100548976B1 KR 100548976 B1 KR100548976 B1 KR 100548976B1 KR 1019997006856 A KR1019997006856 A KR 1019997006856A KR 19997006856 A KR19997006856 A KR 19997006856A KR 100548976 B1 KR100548976 B1 KR 100548976B1
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- alkyl
- phenyl
- alkoxy
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 Cc1c(*)c(C)c(*)c(C)c1* Chemical compound Cc1c(*)c(C)c(*)c(C)c1* 0.000 description 2
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Holo Graphy (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Cosmetics (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Fats And Perfumes (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH195/97 | 1997-01-30 | ||
| CH19597 | 1997-01-30 | ||
| PCT/EP1998/000351 WO1998033761A1 (en) | 1997-01-30 | 1998-01-23 | Non-volatile phenylglyoxalic esters |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20000070608A KR20000070608A (ko) | 2000-11-25 |
| KR100548976B1 true KR100548976B1 (ko) | 2006-02-03 |
Family
ID=4181427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019997006856A Expired - Fee Related KR100548976B1 (ko) | 1997-01-30 | 1998-01-23 | 비휘발성 페닐글리옥살산 에스테르 |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US6048660A (https=) |
| EP (1) | EP0956280B1 (https=) |
| JP (1) | JP4171073B2 (https=) |
| KR (1) | KR100548976B1 (https=) |
| CN (1) | CN1157359C (https=) |
| AU (1) | AU718619B2 (https=) |
| BR (1) | BR9806940B1 (https=) |
| CA (1) | CA2275667A1 (https=) |
| DE (1) | DE69809029T2 (https=) |
| DK (1) | DK0956280T3 (https=) |
| ES (1) | ES2184233T3 (https=) |
| TW (1) | TW460450B (https=) |
| WO (1) | WO1998033761A1 (https=) |
| ZA (1) | ZA98724B (https=) |
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| TWI244495B (en) | 2000-08-14 | 2005-12-01 | Ciba Sc Holding Ag | Process for producing coatings siloxane photoinitiators |
| TW557298B (en) | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
| US6470128B1 (en) | 2001-03-30 | 2002-10-22 | Alcatel | UV-curable coating composition for optical fiber for a fast cure and with improved adhesion to glass |
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| JP2005517022A (ja) * | 2002-02-04 | 2005-06-09 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 界面活性光開始剤 |
| AU2003205688A1 (en) * | 2002-02-04 | 2003-09-02 | Ciba Specialty Chemicals Holding Inc. | Fluorinated photoinitiators in highly fluorinated monomers |
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| JP2004231863A (ja) * | 2003-01-31 | 2004-08-19 | Fuji Photo Film Co Ltd | インクジェット記録用インクおよび画像形成方法 |
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| US12428514B2 (en) | 2024-01-02 | 2025-09-30 | Covestro Llc | Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions |
| WO2025147343A1 (en) | 2024-01-02 | 2025-07-10 | Covestro Llc | Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions |
| US12187852B1 (en) | 2024-01-02 | 2025-01-07 | Covestro Llc | Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions |
| WO2025147337A1 (en) | 2024-01-02 | 2025-07-10 | Covestro Llc | Polysilanes, methods for their preparation, and the use thereof in coating compositions |
| US20250215139A1 (en) | 2024-01-02 | 2025-07-03 | Covestro Llc | Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3532737A (en) * | 1967-02-02 | 1970-10-06 | Sterling Drug Inc | Esters of arylglyoxylic acids |
| US3754006A (en) * | 1967-02-02 | 1973-08-21 | Sterling Drug Inc | Esters and amides of substituted glyoxylic acids |
| US3704313A (en) * | 1968-10-10 | 1972-11-28 | Rorer Inc William H | P-cyclohexylphenylglycolic acid and derivatives thereof |
| US3657325A (en) * | 1969-12-03 | 1972-04-18 | Sterling Drug Inc | Esters of substituted glyoxylic acids |
| US3930868A (en) * | 1973-05-23 | 1976-01-06 | The Richardson Company | Light sensitive arylglyoxyacrylate compositions |
| US3991416A (en) * | 1975-09-18 | 1976-11-09 | Hughes Aircraft Company | AC biased and resonated liquid crystal display |
| US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| DE2825955A1 (de) * | 1978-06-14 | 1980-01-03 | Bayer Ag | Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln |
| US4475999A (en) * | 1983-06-06 | 1984-10-09 | Stauffer Chemical Company | Sensitization of glyoxylate photoinitiators |
| AU569084B2 (en) * | 1983-06-27 | 1988-01-21 | Stauffer Chemical Company | Photopolymerizable composition |
| US4507187A (en) * | 1984-04-19 | 1985-03-26 | Loctite Corporation | Siloxane photoinitiators with aryoyl formate groups |
| US4987159A (en) * | 1990-04-11 | 1991-01-22 | Fratelli Lamberti S.P.A. | Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use |
| US5795581A (en) * | 1995-03-31 | 1998-08-18 | Sandia Corporation | Controlled release of molecular components of dendrimer/bioactive complexes |
-
1998
- 1998-01-23 DK DK98905335T patent/DK0956280T3/da active
- 1998-01-23 KR KR1019997006856A patent/KR100548976B1/ko not_active Expired - Fee Related
- 1998-01-23 DE DE69809029T patent/DE69809029T2/de not_active Expired - Lifetime
- 1998-01-23 CA CA002275667A patent/CA2275667A1/en not_active Abandoned
- 1998-01-23 ES ES98905335T patent/ES2184233T3/es not_active Expired - Lifetime
- 1998-01-23 BR BRPI9806940-3A patent/BR9806940B1/pt not_active IP Right Cessation
- 1998-01-23 EP EP98905335A patent/EP0956280B1/en not_active Expired - Lifetime
- 1998-01-23 TW TW087100902A patent/TW460450B/zh active
- 1998-01-23 WO PCT/EP1998/000351 patent/WO1998033761A1/en not_active Ceased
- 1998-01-23 JP JP53250998A patent/JP4171073B2/ja not_active Expired - Lifetime
- 1998-01-23 AU AU60963/98A patent/AU718619B2/en not_active Ceased
- 1998-01-23 CN CNB98801985XA patent/CN1157359C/zh not_active Expired - Lifetime
- 1998-01-28 US US09/014,555 patent/US6048660A/en not_active Expired - Lifetime
- 1998-01-29 ZA ZA98724A patent/ZA98724B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AU718619B2 (en) | 2000-04-20 |
| US6048660A (en) | 2000-04-11 |
| DK0956280T3 (da) | 2003-02-24 |
| CA2275667A1 (en) | 1998-08-06 |
| JP2001511137A (ja) | 2001-08-07 |
| JP4171073B2 (ja) | 2008-10-22 |
| CN1157359C (zh) | 2004-07-14 |
| AU6096398A (en) | 1998-08-25 |
| ES2184233T3 (es) | 2003-04-01 |
| EP0956280B1 (en) | 2002-10-30 |
| CN1244190A (zh) | 2000-02-09 |
| DE69809029T2 (de) | 2003-06-05 |
| ZA98724B (en) | 1998-07-30 |
| BR9806940B1 (pt) | 2010-12-14 |
| BR9806940A (pt) | 2000-03-28 |
| WO1998033761A1 (en) | 1998-08-06 |
| TW460450B (en) | 2001-10-21 |
| EP0956280A1 (en) | 1999-11-17 |
| KR20000070608A (ko) | 2000-11-25 |
| DE69809029D1 (de) | 2002-12-05 |
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