KR100481350B1 - 감방사선성착색조성물 - Google Patents

감방사선성착색조성물 Download PDF

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Publication number
KR100481350B1
KR100481350B1 KR10-1998-0008685A KR19980008685A KR100481350B1 KR 100481350 B1 KR100481350 B1 KR 100481350B1 KR 19980008685 A KR19980008685 A KR 19980008685A KR 100481350 B1 KR100481350 B1 KR 100481350B1
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KR
South Korea
Prior art keywords
group
general formula
pigment
formula
radiation
Prior art date
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Expired - Fee Related
Application number
KR10-1998-0008685A
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English (en)
Korean (ko)
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KR19980080278A (ko
Inventor
노부오 스즈키
Original Assignee
후지 샤신 필름 가부시기가이샤
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Publication of KR19980080278A publication Critical patent/KR19980080278A/ko
Application granted granted Critical
Publication of KR100481350B1 publication Critical patent/KR100481350B1/ko
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR10-1998-0008685A 1997-03-14 1998-03-14 감방사선성착색조성물 Expired - Fee Related KR100481350B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP97-61457 1997-03-14
JP06145797A JP3824285B2 (ja) 1997-03-14 1997-03-14 感放射線性着色組成物

Publications (2)

Publication Number Publication Date
KR19980080278A KR19980080278A (ko) 1998-11-25
KR100481350B1 true KR100481350B1 (ko) 2005-11-22

Family

ID=13171598

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-1998-0008685A Expired - Fee Related KR100481350B1 (ko) 1997-03-14 1998-03-14 감방사선성착색조성물

Country Status (3)

Country Link
US (1) US5998091A (enExample)
JP (1) JP3824285B2 (enExample)
KR (1) KR100481350B1 (enExample)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
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EP1033625A1 (en) * 1997-07-24 2000-09-06 JSR Corporation Radiation sensitive composition
JP3838601B2 (ja) * 1998-05-15 2006-10-25 富士写真フイルム株式会社 放射線硬化性組成物
WO2000011041A1 (en) * 1998-08-21 2000-03-02 Ciba Specialty Chemicals Holding Inc. Thermal- and photoinitiated radical polymerization in the presence of an addition fragmentation agent
JP2001174985A (ja) * 1999-12-15 2001-06-29 Sumitomo Chem Co Ltd 顔料分散感光液、その製造方法及びそれを用いる着色画像の形成方法
JP2002031713A (ja) * 2000-02-01 2002-01-31 Mitsubishi Chemicals Corp カラーフィルター用組成物及びカラーフィルター
JP2001249213A (ja) * 2000-03-03 2001-09-14 Fujifilm Arch Co Ltd カラーフィルター用組成物及びカラーフィルター
CN1462284A (zh) 2000-08-16 2003-12-17 部鲁尔科学公司 用于滤色片应用的光敏树脂组合物
JP4486282B2 (ja) * 2001-07-17 2010-06-23 富士フイルム株式会社 顔料分散剤、これを含む顔料分散組成物および着色感光性組成物
US7235296B2 (en) * 2002-03-05 2007-06-26 3M Innovative Properties Co. Formulations for coated diamond abrasive slurries
JP4561101B2 (ja) * 2003-03-06 2010-10-13 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
JP4749658B2 (ja) * 2003-06-26 2011-08-17 富士フイルム株式会社 カラーフィルター用着色樹脂被膜及びその製造方法、カラーフィルター用着色樹脂被膜の評価方法、並びに、カラーフィルター
US20050069644A1 (en) * 2003-09-29 2005-03-31 National Taiwan University Micro-stamping method for photoelectric process
JP4611724B2 (ja) * 2004-12-03 2011-01-12 東京応化工業株式会社 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
JP4675693B2 (ja) * 2005-06-23 2011-04-27 東京応化工業株式会社 感光性樹脂組成物
US7883826B2 (en) * 2006-12-07 2011-02-08 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
KR100881860B1 (ko) 2007-01-17 2009-02-06 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터
US8298452B2 (en) * 2007-02-26 2012-10-30 Dai Nippon Printing Co., Ltd. Negative type resist composition for color filter, color filter using same, and liquid crystal display
JP4988383B2 (ja) * 2007-03-02 2012-08-01 スリーエム イノベイティブ プロパティズ カンパニー （メタ）アクリル系着色フィルム、マーキングフィルム、レセプターシート、及びその製造方法
TWI403838B (zh) * 2007-04-11 2013-08-01 Lg Chemical Ltd 包含由做為鹼溶性樹脂之大分子單體所製備之聚合物之光感樹脂組成物
JP5374903B2 (ja) * 2008-03-31 2013-12-25 大日本印刷株式会社 カラーフィルタ用ネガ型レジスト組成物、カラーフィルタ及び液晶表示装置
JP5401870B2 (ja) * 2008-08-26 2014-01-29 大日本印刷株式会社 カラーフィルタ用ネガ型レジスト組成物、カラーフィルタ及び液晶表示装置
EP2913375A1 (en) 2008-10-09 2015-09-02 Fujifilm Corporation Near-infrared absorptive composition, near-infrared absorptive coated material, near-infrared absorptive liquid dispersion, near-infrared absorptive ink, printed material, and near-infrared absorptive image-forming composition
US8486591B2 (en) 2008-10-24 2013-07-16 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
KR20110077881A (ko) * 2009-12-30 2011-07-07 제일모직주식회사 투명성 및 난연성이 우수한 인계 아크릴계 공중합체 수지 및 그 조성물
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JP5820714B2 (ja) * 2011-12-13 2015-11-24 花王株式会社 カラーフィルター用顔料分散体
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US10011672B2 (en) 2013-05-16 2018-07-03 Samsung Sdi Co., Ltd. Photosensitive resin composition for color filter and color filter using the same
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KR101837563B1 (ko) 2015-06-23 2018-03-12 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물, 및 컬러필터
KR101863249B1 (ko) 2015-08-27 2018-05-31 삼성에스디아이 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101816232B1 (ko) 2015-10-16 2018-01-08 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터
WO2017077908A1 (ja) * 2015-11-06 2017-05-11 住友化学株式会社 アクリル樹脂組成物
JP2017088707A (ja) * 2015-11-06 2017-05-25 住友化学株式会社 アクリル樹脂組成物
KR102020917B1 (ko) 2016-08-17 2019-09-11 삼성에스디아이 주식회사 코어-쉘 염료, 이를 포함하는 감광성 수지 조성물 및 컬러필터
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KR102087259B1 (ko) 2016-09-28 2020-03-10 삼성에스디아이 주식회사 신규한 화합물, 코어-쉘 염료, 이를 포함하는 감광성 수지 조성물 및 컬러필터
KR102061244B1 (ko) 2017-05-17 2019-12-31 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
KR102658622B1 (ko) 2019-02-14 2024-04-18 후지필름 가부시키가이샤 경화성 조성물, 막, 컬러 필터, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치, 및 고분자 화합물
JP7091418B2 (ja) 2019-10-29 2022-06-27 三星エスディアイ株式会社 化合物、これを含む感光性樹脂組成物、感光性樹脂膜、カラーフィルタおよびディスプレイ装置

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JPS62127735A (ja) * 1985-11-29 1987-06-10 Toshiba Corp 感光性樹脂組成物及びこれを用いたカラ−フイルタ−の製造方法
EP0645678B1 (en) * 1993-09-24 1998-03-04 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition
JPH07311461A (ja) * 1994-05-17 1995-11-28 Dainippon Printing Co Ltd 水溶性着色感光性樹脂組成物
JPH0962002A (ja) * 1995-08-21 1997-03-07 Fuji Photo Film Co Ltd 感放射線性組成物

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