KR100416629B1 - 유동상반응기실리콘증착장치및방법 - Google Patents
유동상반응기실리콘증착장치및방법 Download PDFInfo
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- KR100416629B1 KR100416629B1 KR1019970708925A KR19970708925A KR100416629B1 KR 100416629 B1 KR100416629 B1 KR 100416629B1 KR 1019970708925 A KR1019970708925 A KR 1019970708925A KR 19970708925 A KR19970708925 A KR 19970708925A KR 100416629 B1 KR100416629 B1 KR 100416629B1
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- South Korea
- Prior art keywords
- silicon
- gas
- bead
- inlet
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 327
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 315
- 239000010703 silicon Substances 0.000 title claims abstract description 315
- 238000000034 method Methods 0.000 title claims description 96
- 230000008021 deposition Effects 0.000 title claims description 59
- 239000011324 bead Substances 0.000 claims abstract description 369
- 239000002245 particle Substances 0.000 claims abstract description 232
- 230000005587 bubbling Effects 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 417
- 238000000151 deposition Methods 0.000 claims description 69
- 239000001257 hydrogen Substances 0.000 claims description 57
- 229910052739 hydrogen Inorganic materials 0.000 claims description 57
- 239000000463 material Substances 0.000 claims description 54
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 48
- 238000010438 heat treatment Methods 0.000 claims description 35
- 238000006243 chemical reaction Methods 0.000 claims description 29
- 238000005243 fluidization Methods 0.000 claims description 28
- 238000009826 distribution Methods 0.000 claims description 24
- 239000012530 fluid Substances 0.000 claims description 24
- 239000007787 solid Substances 0.000 claims description 21
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 17
- 239000011261 inert gas Substances 0.000 claims description 17
- 230000002829 reductive effect Effects 0.000 claims description 16
- 238000007872 degassing Methods 0.000 claims description 10
- 239000000843 powder Substances 0.000 claims description 10
- 238000000354 decomposition reaction Methods 0.000 claims description 9
- 238000005191 phase separation Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 6
- 230000008018 melting Effects 0.000 claims description 6
- 230000005484 gravity Effects 0.000 claims description 4
- 238000000227 grinding Methods 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 229920005591 polysilicon Polymers 0.000 claims description 3
- 238000010298 pulverizing process Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 239000002516 radical scavenger Substances 0.000 claims 1
- 230000003467 diminishing effect Effects 0.000 abstract description 24
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 12
- 239000012071 phase Substances 0.000 description 71
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 45
- 239000000047 product Substances 0.000 description 44
- 229910000077 silane Inorganic materials 0.000 description 36
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 35
- 229910021417 amorphous silicon Inorganic materials 0.000 description 29
- 229910052736 halogen Inorganic materials 0.000 description 28
- 238000000926 separation method Methods 0.000 description 28
- 150000002367 halogens Chemical class 0.000 description 25
- 239000011856 silicon-based particle Substances 0.000 description 25
- 230000008569 process Effects 0.000 description 24
- 239000010410 layer Substances 0.000 description 22
- 238000012546 transfer Methods 0.000 description 22
- 235000012239 silicon dioxide Nutrition 0.000 description 20
- 239000010453 quartz Substances 0.000 description 18
- 238000011109 contamination Methods 0.000 description 17
- 239000003085 diluting agent Substances 0.000 description 17
- 238000003860 storage Methods 0.000 description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 15
- 238000013461 design Methods 0.000 description 15
- 238000001914 filtration Methods 0.000 description 15
- 229910052760 oxygen Inorganic materials 0.000 description 15
- 239000001301 oxygen Substances 0.000 description 15
- 239000000356 contaminant Substances 0.000 description 14
- 239000000428 dust Substances 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 13
- 238000004140 cleaning Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 230000007423 decrease Effects 0.000 description 9
- 238000006356 dehydrogenation reaction Methods 0.000 description 9
- 150000002431 hydrogen Chemical class 0.000 description 9
- 238000009413 insulation Methods 0.000 description 9
- 230000007246 mechanism Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000000377 silicon dioxide Substances 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- 239000003570 air Substances 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 8
- 230000001276 controlling effect Effects 0.000 description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- 230000008901 benefit Effects 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 7
- 229910052814 silicon oxide Inorganic materials 0.000 description 7
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000005469 granulation Methods 0.000 description 6
- 230000003179 granulation Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000000376 reactant Substances 0.000 description 6
- 239000005049 silicon tetrachloride Substances 0.000 description 6
- 239000011863 silicon-based powder Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 6
- 239000005052 trichlorosilane Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 5
- 230000001427 coherent effect Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005336 cracking Methods 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 239000008187 granular material Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000010791 quenching Methods 0.000 description 5
- 229910010271 silicon carbide Inorganic materials 0.000 description 5
- 239000012748 slip agent Substances 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 239000001569 carbon dioxide Substances 0.000 description 4
- 229910021419 crystalline silicon Inorganic materials 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000012634 fragment Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- -1 neodymium yttrium aluminum Chemical compound 0.000 description 4
- 238000005204 segregation Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910001868 water Inorganic materials 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000005054 agglomeration Methods 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 239000003518 caustics Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 238000003306 harvesting Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 235000020030 perry Nutrition 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 150000003376 silicon Chemical class 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 241000195493 Cryptophyta Species 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229910003691 SiBr Inorganic materials 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 2
- 239000000571 coke Substances 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- JHGCXUUFRJCMON-UHFFFAOYSA-J silicon(4+);tetraiodide Chemical compound [Si+4].[I-].[I-].[I-].[I-] JHGCXUUFRJCMON-UHFFFAOYSA-J 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000004227 thermal cracking Methods 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000013022 venting Methods 0.000 description 2
- 210000001835 viscera Anatomy 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 230000005526 G1 to G0 transition Effects 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NIMPFLPHNFUHNK-UHFFFAOYSA-N [Si].Cl[SiH](Cl)Cl Chemical compound [Si].Cl[SiH](Cl)Cl NIMPFLPHNFUHNK-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000007806 chemical reaction intermediate Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000009194 climbing Effects 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004939 coking Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005090 crystal field Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011090 industrial biotechnology method and process Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010310 metallurgical process Methods 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000003921 particle size analysis Methods 0.000 description 1
- 239000011860 particles by size Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000003209 petroleum derivative Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000002296 pyrolytic carbon Substances 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 238000009491 slugging Methods 0.000 description 1
- 229940036051 sojourn Drugs 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical compound Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 description 1
- DNAPJAGHXMPFLD-UHFFFAOYSA-N triiodosilane Chemical compound I[SiH](I)I DNAPJAGHXMPFLD-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
- B01J8/245—Spouted-bed technique
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/19—Details relating to the geometry of the reactor
- B01J2219/194—Details relating to the geometry of the reactor round
- B01J2219/1941—Details relating to the geometry of the reactor round circular or disk-shaped
- B01J2219/1942—Details relating to the geometry of the reactor round circular or disk-shaped spherical
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/481,801 | 1995-06-07 | ||
| US08/481,801 US5798137A (en) | 1995-06-07 | 1995-06-07 | Method for silicon deposition |
| US08/487,008 | 1995-06-07 | ||
| US08/487,008 US5810934A (en) | 1995-06-07 | 1995-06-07 | Silicon deposition reactor apparatus |
| US8/481,801 | 1995-06-07 | ||
| US8/487,008 | 1995-06-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR19990022444A KR19990022444A (ko) | 1999-03-25 |
| KR100416629B1 true KR100416629B1 (ko) | 2004-05-31 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019970708925A Expired - Lifetime KR100416629B1 (ko) | 1995-06-07 | 1996-06-07 | 유동상반응기실리콘증착장치및방법 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US5798137A (enExample) |
| JP (1) | JP4219401B2 (enExample) |
| KR (1) | KR100416629B1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011063007A3 (en) * | 2009-11-18 | 2011-09-09 | Rec Silicon Inc | Fluid bed reactor |
| US8235305B2 (en) | 2009-04-20 | 2012-08-07 | Ae Polysilicon Corporation | Methods and system for cooling a reaction effluent gas |
| US8425855B2 (en) | 2009-04-20 | 2013-04-23 | Robert Froehlich | Reactor with silicide-coated metal surfaces |
Families Citing this family (116)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1004886C2 (nl) | 1996-12-23 | 1998-06-24 | Univ Utrecht | Halfgeleiderinrichtingen en werkwijze voor het maken daarvan. |
| DE19735378A1 (de) * | 1997-08-14 | 1999-02-18 | Wacker Chemie Gmbh | Verfahren zur Herstellung von hochreinem Siliciumgranulat |
| US6328804B1 (en) * | 1998-07-10 | 2001-12-11 | Ball Semiconductor, Inc. | Chemical vapor deposition of metals on a spherical shaped semiconductor substrate |
| WO2000020111A1 (en) | 1998-10-02 | 2000-04-13 | Sri International | Fluidized bed reactor having a centrally positioned internal heat source |
| US6468886B2 (en) * | 1999-06-15 | 2002-10-22 | Midwest Research Institute | Purification and deposition of silicon by an iodide disproportionation reaction |
| US6281098B1 (en) * | 1999-06-15 | 2001-08-28 | Midwest Research Institute | Process for Polycrystalline film silicon growth |
| DE19948395A1 (de) * | 1999-10-06 | 2001-05-03 | Wacker Chemie Gmbh | Strahlungsbeheizter Fliessbettreaktor |
| US6368568B1 (en) * | 2000-02-18 | 2002-04-09 | Stephen M Lord | Method for improving the efficiency of a silicon purification process |
| US6451277B1 (en) | 2000-06-06 | 2002-09-17 | Stephen M Lord | Method of improving the efficiency of a silicon purification process |
| US6726955B1 (en) * | 2000-06-27 | 2004-04-27 | Applied Materials, Inc. | Method of controlling the crystal structure of polycrystalline silicon |
| DE10061682A1 (de) * | 2000-12-11 | 2002-07-04 | Solarworld Ag | Verfahren zur Herstellung von Reinstsilicium |
| US6827786B2 (en) * | 2000-12-26 | 2004-12-07 | Stephen M Lord | Machine for production of granular silicon |
| KR100411180B1 (ko) * | 2001-01-03 | 2003-12-18 | 한국화학연구원 | 다결정실리콘의 제조방법과 그 장치 |
| US7118780B2 (en) | 2001-03-16 | 2006-10-10 | Semiconductor Energy Laboratory Co., Ltd. | Heat treatment method |
| US8034531B2 (en) * | 2002-11-28 | 2011-10-11 | Basf Se | Photosensitive resin composition comprising a halogen-free colorant |
| US20040152287A1 (en) * | 2003-01-31 | 2004-08-05 | Sherrill Adrian B. | Deposition of a silicon film |
| US7313262B2 (en) * | 2003-08-06 | 2007-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for visualization of process chamber conditions |
| US8513848B2 (en) | 2003-10-09 | 2013-08-20 | Mag Life, Llc | Aquarium having improved filtration system with neutral buoyancy substrate, pump and sediment removal system |
| US8033252B2 (en) * | 2003-10-09 | 2011-10-11 | Mag-Life Llc | Aquarium having improved filtration system with neutral buoyancy substrate, pump and sediment removal system |
| DE10359587A1 (de) * | 2003-12-18 | 2005-07-14 | Wacker-Chemie Gmbh | Staub- und porenfreies hochreines Polysiliciumgranulat |
| US7141114B2 (en) * | 2004-06-30 | 2006-11-28 | Rec Silicon Inc | Process for producing a crystalline silicon ingot |
| US8257580B2 (en) | 2004-10-13 | 2012-09-04 | Marathon Oil Canada Corporation | Dry, stackable tailings and methods for producing the same |
| US8101067B2 (en) * | 2004-10-13 | 2012-01-24 | Marathon Oil Canada Corporation | Methods for obtaining bitumen from bituminous materials |
| US20060105105A1 (en) * | 2004-11-12 | 2006-05-18 | Memc Electronic Materials, Inc. | High purity granular silicon and method of manufacturing the same |
| EP1843835A4 (en) * | 2005-01-03 | 2010-12-22 | Western Oil Sands Inc | NOZZLE REACTOR AND METHOD OF USE |
| US7927565B2 (en) * | 2005-01-03 | 2011-04-19 | Marathon Oil Canada Corporation | Nozzle reactor and method of use |
| TWI465600B (zh) * | 2005-07-19 | 2014-12-21 | Rec Silicon Inc | 矽的噴流-流化床 |
| DE102005039118A1 (de) * | 2005-08-18 | 2007-02-22 | Wacker Chemie Ag | Verfahren und Vorrichtung zum Zerkleinern von Silicium |
| US20070169687A1 (en) * | 2006-01-26 | 2007-07-26 | Caracal, Inc. | Silicon carbide formation by alternating pulses |
| KR100756310B1 (ko) * | 2006-02-07 | 2007-09-07 | 한국화학연구원 | 입자형 다결정실리콘 제조용 고압 유동층반응기 |
| KR100661284B1 (ko) * | 2006-02-14 | 2006-12-27 | 한국화학연구원 | 유동층 반응기를 이용한 다결정실리콘 제조 방법 |
| US20070261559A1 (en) * | 2006-05-09 | 2007-11-15 | Maroulis Peter J | Analysis of a reactive gas such as silane for particle generating impurities |
| EP1857640A3 (de) * | 2006-05-10 | 2010-05-05 | Silicon Fire AG | Neuartiger kaskadierter Kraftwerksprozess und Verfahren zum Bereitstellen von reversibel einsetzbaren Wasserstoffträgern in einem solchen Kraftwerksprozess |
| DE102006021960A1 (de) * | 2006-05-10 | 2007-11-15 | Sincono Ag | Ölhaltige Sande und Schiefer und ihre Gemische als Ausgangssubstanzen zur Darstellung von kristallinem Silizium und Wasserstoffgas sowie zur Herstellung von Siliziumnitrid, Siliziumcarbid und Silanen |
| US7811444B2 (en) | 2006-06-08 | 2010-10-12 | Marathon Oil Canada Corporation | Oxidation of asphaltenes |
| KR100813131B1 (ko) * | 2006-06-15 | 2008-03-17 | 한국화학연구원 | 유동층 반응기를 이용한 다결정 실리콘의 지속 가능한제조방법 |
| KR100783667B1 (ko) | 2006-08-10 | 2007-12-07 | 한국화학연구원 | 입자형 다결정 실리콘의 제조방법 및 제조장치 |
| US7820126B2 (en) * | 2006-08-18 | 2010-10-26 | Iosil Energy Corporation | Method and apparatus for improving the efficiency of purification and deposition of polycrystalline silicon |
| US7947326B1 (en) | 2006-09-28 | 2011-05-24 | Battelle Energy Alliance, Llc | Methods of forming a fluidized bed of circulating particles |
| US20080220558A1 (en) * | 2007-03-08 | 2008-09-11 | Integrated Photovoltaics, Inc. | Plasma spraying for semiconductor grade silicon |
| DE102007021003A1 (de) | 2007-05-04 | 2008-11-06 | Wacker Chemie Ag | Verfahren zur kontinuierlichen Herstellung von polykristallinem hochreinen Siliciumgranulat |
| US20080299015A1 (en) * | 2007-06-04 | 2008-12-04 | Stephen Michael Lord | Apparatus and method for top removal of granular material from a fluidized bed deposition reactor |
| JP4263761B1 (ja) * | 2008-01-17 | 2009-05-13 | トヨタ自動車株式会社 | 減圧式加熱装置とその加熱方法および電子製品の製造方法 |
| CN102067277B (zh) | 2008-04-11 | 2013-09-18 | 伊奥西尔能源公司 | 从废弃的晶片锯切浆回收硅和碳化硅的方法和设备 |
| CN102083522B (zh) | 2008-06-30 | 2014-03-26 | Memc电子材料有限公司 | 流化床反应器系统及减少硅沉积在反应器壁上的方法 |
| CN103787336B (zh) * | 2008-09-16 | 2016-09-14 | 储晞 | 生产高纯颗粒硅的方法 |
| KR101658356B1 (ko) * | 2008-09-30 | 2016-09-22 | 헴로크세미컨덕터코포레이션 | 오염 물질이 고순도 규소에 제공하는 불순물의 양을 결정하는 방법과 고순도 규소를 처리하기 위한 노 |
| FR2937053B1 (fr) * | 2008-10-09 | 2010-12-17 | Commissariat Energie Atomique | Dispositif pour la synthese de nanoparticules par depot chimique en phase vapeur en lit fluidise |
| US8178051B2 (en) * | 2008-11-05 | 2012-05-15 | Stephen Michael Lord | Apparatus and process for hydrogenation of a silicon tetrahalide and silicon to the trihalosilane |
| US7927984B2 (en) * | 2008-11-05 | 2011-04-19 | Hemlock Semiconductor Corporation | Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition |
| WO2010081099A1 (en) | 2009-01-09 | 2010-07-15 | Rec Silicon Inc. | Method and apparatus for producing granular silicon |
| US8168123B2 (en) * | 2009-02-26 | 2012-05-01 | Siliken Chemicals, S.L. | Fluidized bed reactor for production of high purity silicon |
| US8253058B2 (en) * | 2009-03-19 | 2012-08-28 | Integrated Photovoltaics, Incorporated | Hybrid nozzle for plasma spraying silicon |
| TW201113391A (en) * | 2009-03-19 | 2011-04-16 | Ae Polysilicon Corp | Silicide-coated metal surfaces and methods of utilizing same |
| KR100945748B1 (ko) * | 2009-04-06 | 2010-03-05 | (주)티에스티아이테크 | 폴리실리콘의 제조장치 |
| US8449763B2 (en) * | 2009-04-15 | 2013-05-28 | Marathon Canadian Oil Sands Holding Limited | Nozzle reactor and method of use |
| JP2012524022A (ja) * | 2009-04-20 | 2012-10-11 | エーイー ポリシリコン コーポレーション | 高純度ポリシリコンの製造方法及び装置 |
| KR20100117025A (ko) * | 2009-04-23 | 2010-11-02 | 스미또모 가가꾸 가부시키가이샤 | 포토레지스트 패턴 형성 방법 |
| NO334785B1 (no) | 2009-05-29 | 2014-05-26 | Dynatec Engineering As | Reaktor og fremgangsmåte for fremstilling av silisium |
| US20110017642A1 (en) * | 2009-07-24 | 2011-01-27 | Duyvesteyn Willem P C | System and method for converting material comprising bitumen into light hydrocarbon liquid product |
| US8663462B2 (en) * | 2009-09-16 | 2014-03-04 | Shell Canada Energy Cheveron Canada Limited | Methods for obtaining bitumen from bituminous materials |
| US20110084000A1 (en) * | 2009-10-14 | 2011-04-14 | Marathon Oil Canada Corporation | Systems and methods for processing nozzle reactor pitch |
| KR101792562B1 (ko) | 2009-11-25 | 2017-11-02 | 다이나텍 엔지니어링 에이에스 | 실리콘의 제조를 위한 반응기 및 방법 |
| US8864982B2 (en) * | 2009-12-28 | 2014-10-21 | Shell Canada Energy Cheveron Canada Limited | Methods for obtaining bitumen from bituminous materials |
| WO2011090689A1 (en) * | 2009-12-29 | 2011-07-28 | Memc Electronic Materials, Inc. | Methods for reducing the deposition of silicon on reactor walls using peripheral silicon tetrachloride |
| US8877044B2 (en) * | 2010-01-22 | 2014-11-04 | Shell Canada Energy Cheveron Canada Limited | Methods for extracting bitumen from bituminous material |
| US8435402B2 (en) | 2010-03-29 | 2013-05-07 | Marathon Canadian Oil Sands Holding Limited | Nozzle reactor and method of use |
| US9206508B1 (en) * | 2010-10-16 | 2015-12-08 | Alleppey V. Hariharan | Laser assisted chemical vapor deposition of silicon |
| US8586515B2 (en) | 2010-10-25 | 2013-11-19 | Marathon Oil Canada Corporation | Method for making biofuels and biolubricants |
| US8834074B2 (en) * | 2010-10-29 | 2014-09-16 | General Electric Company | Back mixing device for pneumatic conveying systems |
| US8968556B2 (en) | 2010-12-09 | 2015-03-03 | Shell Canada Energy Cheveron Canada Limited | Process for extracting bitumen and drying the tailings |
| US9156705B2 (en) * | 2010-12-23 | 2015-10-13 | Sunedison, Inc. | Production of polycrystalline silicon by the thermal decomposition of dichlorosilane in a fluidized bed reactor |
| KR101622750B1 (ko) | 2011-03-30 | 2016-05-19 | 빅토르 그리고르예비치 콜레스닉 | SiO2와 FeTiO3 입자와 자기파 사이의 전자기적 상호작용을 발생시킴으로써 실리콘과 티타늄을 환원시키는 방법 |
| JP5905958B2 (ja) | 2011-06-16 | 2016-04-20 | ヘムロック・セミコンダクター・コーポレーション | 固体プロセスバルブ |
| US8920636B2 (en) | 2011-06-28 | 2014-12-30 | Shell Canada Energy and Chervon Canada Limited | Methods of transporting various bitumen extraction products and compositions thereof |
| US20130005010A1 (en) * | 2011-06-30 | 2013-01-03 | Peter Simpson Bell | Bioreactor for syngas fermentation |
| US9023197B2 (en) | 2011-07-26 | 2015-05-05 | Shell Oil Company | Methods for obtaining bitumen from bituminous materials |
| US8636958B2 (en) | 2011-09-07 | 2014-01-28 | Marathon Oil Canada Corporation | Nozzle reactor and method of use |
| NO334776B1 (no) | 2011-09-26 | 2014-05-26 | Dynatec Engineering As | Reaktor og fremgangsmåte for fremstilling av silisium ved kjemisk dampavsetning |
| CN103842069B (zh) | 2011-09-30 | 2016-10-05 | Memc电子材料有限公司 | 通过使硅烷在流化床反应器中热分解而制备多晶硅 |
| KR102165127B1 (ko) | 2011-09-30 | 2020-10-13 | 코너 스타 리미티드 | 유동층 반응기에서의 실란의 열 분해에 의한 다결정 규소의 제조 |
| US20130149228A1 (en) * | 2011-12-09 | 2013-06-13 | Siliken Chemicals, S.L. | Method, system and apparatus for controlling particle size in a fluidized bed reactor |
| US8875728B2 (en) | 2012-07-12 | 2014-11-04 | Siliken Chemicals, S.L. | Cooled gas distribution plate, thermal bridge breaking system, and related methods |
| DE102012212913A1 (de) | 2012-07-24 | 2014-05-15 | Evonik Industries Ag | Verfahren zur Herstellung von Alkenylhalogensilanen und dafür geeigneter Reaktor |
| WO2014026588A1 (zh) * | 2012-08-13 | 2014-02-20 | 江苏中能硅业科技发展有限公司 | 高球形度籽晶和流化床颗粒硅的制备方法 |
| CN104583122B (zh) | 2012-08-29 | 2017-09-05 | 赫姆洛克半导体运营有限责任公司 | 锥形流化床反应器及其使用方法 |
| US9212421B2 (en) | 2013-07-10 | 2015-12-15 | Rec Silicon Inc | Method and apparatus to reduce contamination of particles in a fluidized bed reactor |
| US9587993B2 (en) | 2012-11-06 | 2017-03-07 | Rec Silicon Inc | Probe assembly for a fluid bed reactor |
| DE102013209076A1 (de) | 2013-05-16 | 2014-11-20 | Wacker Chemie Ag | Reaktor zur Herstellung von polykristallinem Silicium und Verfahren zur Entfernung eines Silicium enthaltenden Belags auf einem Bauteil eines solchen Reaktors |
| US10525430B2 (en) | 2013-12-26 | 2020-01-07 | Bruce Hazeltine | Draft tube fluidized bed reactor for deposition of granular silicon |
| US9428830B2 (en) * | 2014-07-02 | 2016-08-30 | Gtat Corporation | Reverse circulation fluidized bed reactor for granular polysilicon production |
| US9238211B1 (en) | 2014-08-15 | 2016-01-19 | Rec Silicon Inc | Segmented silicon carbide liner |
| US9662628B2 (en) * | 2014-08-15 | 2017-05-30 | Rec Silicon Inc | Non-contaminating bonding material for segmented silicon carbide liner in a fluidized bed reactor |
| US9446367B2 (en) | 2014-08-15 | 2016-09-20 | Rec Silicon Inc | Joint design for segmented silicon carbide liner in a fluidized bed reactor |
| US9404177B2 (en) | 2014-08-18 | 2016-08-02 | Rec Silicon Inc | Obstructing member for a fluidized bed reactor |
| DE102015224099A1 (de) | 2015-12-02 | 2017-06-08 | Wacker Chemie Ag | Wirbelschichtreaktor und Verfahren zur Herstellung von polykristallinem Siliciumgranulat |
| DE102016202991A1 (de) * | 2016-02-25 | 2017-08-31 | Wacker Chemie Ag | Verfahren und Vorrichtung zur Herstellung von polykristallinem Siliciumgranulat |
| US10581082B2 (en) * | 2016-11-15 | 2020-03-03 | Nanocomp Technologies, Inc. | Systems and methods for making structures defined by CNT pulp networks |
| US10407310B2 (en) | 2017-01-26 | 2019-09-10 | Rec Silicon Inc | System for reducing agglomeration during annealing of flowable, finely divided solids |
| GB2580033B (en) | 2018-12-19 | 2021-03-10 | Nexeon Ltd | Electroactive materials for metal-Ion batteries |
| GB201818232D0 (en) | 2018-11-08 | 2018-12-26 | Nexeon Ltd | Electroactive materials for metal-ion batteries |
| US12218341B2 (en) | 2018-11-08 | 2025-02-04 | Nexeon Limited | Electroactive materials for metal-ion batteries |
| US12176521B2 (en) | 2018-11-08 | 2024-12-24 | Nexeon Limited | Electroactive materials for metal-ion batteries |
| GB201818235D0 (en) | 2018-11-08 | 2018-12-26 | Nexeon Ltd | Electroactive materials for metal-ion batteries |
| US10508335B1 (en) | 2019-02-13 | 2019-12-17 | Nexeon Limited | Process for preparing electroactive materials for metal-ion batteries |
| CN120149356A (zh) | 2018-12-21 | 2025-06-13 | 奈克松有限公司 | 用于制备金属离子电池用的电活性材料的方法 |
| SG11202111072SA (en) * | 2019-04-05 | 2021-11-29 | Tokuyama Corp | Polycrystalline silicon material |
| US10717061B1 (en) | 2019-06-26 | 2020-07-21 | X Energy, Llc | Fluidized bed reactor system allowing particle sampling during an ongoing reaction |
| US10844483B1 (en) | 2019-12-16 | 2020-11-24 | Quantum Elements Development, Inc. | Quantum printing methods |
| US10964940B1 (en) | 2020-09-17 | 2021-03-30 | Nexeon Limited | Electroactive materials for metal-ion batteries |
| US11484941B2 (en) | 2020-12-15 | 2022-11-01 | Quantum Elements Development Inc. | Metal macrostructures |
| US11623871B2 (en) | 2020-12-15 | 2023-04-11 | Quantum Elements Development Inc. | Rare earth metal instantiation |
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| CN119793341B (zh) * | 2025-01-17 | 2025-10-31 | 中国科学院过程工程研究所 | 一种气体扰动式粘性超细颗粒流化反应装置系统及方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5011285A (en) * | 1987-12-18 | 1991-04-30 | Norsk Hydro A.S. | Method and apparatus for performing automatic particle analysis |
Family Cites Families (154)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA521842A (en) | 1956-02-14 | Hydrocarbon Research | Effecting contact between a fluid and a solid particle contact mass | |
| US2404474A (en) * | 1944-11-29 | 1946-07-23 | Universal Oil Prod Co | Apparatus for measuring carbonaceous deposits |
| US2494716A (en) * | 1945-11-08 | 1950-01-17 | Induction Heating Corp | Method and apparatus for treating materials dielectrically |
| US2533666A (en) * | 1945-12-29 | 1950-12-12 | Standard Oil Co | Hydrocarbon synthesis |
| US2489135A (en) * | 1946-10-07 | 1949-11-22 | Ross M Carrell | High-frequency dielectric heating apparatus |
| US2561396A (en) * | 1946-10-09 | 1951-07-24 | Standard Oil Dev Co | Segregation of solid particles |
| US2602134A (en) * | 1947-10-03 | 1952-07-01 | Gen Electric | High-frequency dielectric heater |
| US2488406A (en) * | 1947-11-25 | 1949-11-15 | Gulf Research Development Co | Method and apparatus for conducting chemical reactions |
| US2595620A (en) * | 1948-11-27 | 1952-05-06 | Union Carbide & Carbon Corp | Hydrogenation of halogenosilanes |
| US2606144A (en) * | 1949-12-10 | 1952-08-05 | Universal Oil Prod Co | Fluidized conversion and coking of heavy petroleums |
| DE839688C (de) | 1951-02-16 | 1952-05-23 | Stoelzle Glasindustrie Ag | Schmelzen elektrisch schlecht leitender Stoffe, vorzugsweise von Glas |
| US2766880A (en) * | 1951-08-04 | 1956-10-16 | Ruhrchemie Ag | Separation of fine-grained portions from granular materials |
| US2925357A (en) * | 1954-11-08 | 1960-02-16 | Union Carbide Corp | Siliconized inert base materials |
| NL211056A (enExample) * | 1955-11-02 | |||
| US2915790A (en) * | 1956-04-02 | 1959-12-08 | Union Asbestos & Rubber Co | Device and method for exfoliating and blending asbestos fiber |
| US3067005A (en) * | 1957-07-05 | 1962-12-04 | American Cyanamid Co | Fixation of unreacted chlorine in titanium tetrachloride manufacture |
| US3041145A (en) * | 1957-07-15 | 1962-06-26 | Robert S Aries | Production of pure silicon |
| US3006734A (en) * | 1957-11-14 | 1961-10-31 | Plessey Co Ltd | Process for preparing pure silicon |
| US3012865A (en) * | 1957-11-25 | 1961-12-12 | Du Pont | Silicon purification process |
| NL101577C (enExample) * | 1957-12-31 | 1900-01-01 | ||
| US3020129A (en) * | 1958-07-25 | 1962-02-06 | Gen Electric | Production of silicon of improved purity |
| US3014791A (en) * | 1958-10-01 | 1961-12-26 | Merck & Co Inc | Pyrolysis apparatus |
| US3104155A (en) * | 1958-11-03 | 1963-09-17 | Exxon Research Engineering Co | Separation of heat carrier from fluidized bed |
| DE1081451B (de) * | 1958-12-19 | 1960-05-12 | Bayer Ag | Verfahren zur Herstellung von Di- und Polyisocyanaten |
| US3050365A (en) * | 1959-08-13 | 1962-08-21 | American Cyanamid Co | Prevention of formation of incrustations during oxidation of ferric chloride |
| US3041144A (en) * | 1959-09-28 | 1962-06-26 | Siemens Ag | Process for production of hyperpure silicon by heat decomposition of a chloro-silane |
| NL256255A (enExample) * | 1959-11-02 | |||
| US3012861A (en) * | 1960-01-15 | 1961-12-12 | Du Pont | Production of silicon |
| US2968683A (en) * | 1960-03-25 | 1961-01-17 | Shawinigan Chem Ltd | Process for heating beds of solid particles spouted with gas |
| NL264188A (enExample) * | 1960-04-29 | |||
| US3359707A (en) * | 1960-06-15 | 1967-12-26 | Jean Olivier Auguste Louis | Method and apparatus for removing co2 and moisture from stale air |
| US3012862A (en) * | 1960-08-16 | 1961-12-12 | Du Pont | Silicon production |
| US3249462A (en) * | 1961-10-23 | 1966-05-03 | Boeing Co | Metal diffusion coating utilizing fluidized bed |
| DE1435745A1 (de) * | 1963-07-11 | 1969-02-13 | Vickers Zimmer Ag | Verfahren und Vorrichtung zum kontinuierlichen Schmelzen von Feststoffen |
| US3305661A (en) * | 1964-02-03 | 1967-02-21 | Shawinigan Chem Ltd | Operation of electrically heated fluidized beds |
| DE1252336B (de) * | 1964-08-13 | 1967-10-19 | The Battelle Development Corporation, Columbus, Ohio (V St A) | Lichtbogenplasmabrenner und Verfahren zum Betrieb eines solchen Brenners |
| US3390078A (en) * | 1964-12-29 | 1968-06-25 | Atomic Energy Commission Usa | Separating salts having inverted solubility curves |
| US3376109A (en) * | 1965-04-30 | 1968-04-02 | Canadian Patents Dev | Preparation of silicon chlorides |
| US3370938A (en) * | 1965-07-30 | 1968-02-27 | Allied Chem | Method and apparatus for controlling particle size of fluidized beds |
| US3288567A (en) * | 1965-08-25 | 1966-11-29 | Stratford Eng Corp | Floating catalyst bed contactor |
| US3499947A (en) * | 1966-08-05 | 1970-03-10 | Phillips Petroleum Co | Electrothermic fluidized bed process |
| US3550773A (en) * | 1966-11-23 | 1970-12-29 | Nat Res Corp | Size separation of fine powders by column elutriation |
| FR1543423A (fr) * | 1967-09-12 | 1968-10-25 | Azote & Prod Chim | Procédé de reformage des hydrocarbures lourds |
| FR1599720A (enExample) * | 1968-07-10 | 1970-07-20 | ||
| US3594215A (en) * | 1968-09-10 | 1971-07-20 | Texas Instruments Inc | Coating of granular particles |
| US3528179A (en) * | 1968-10-28 | 1970-09-15 | Cryodry Corp | Microwave fluidized bed dryer |
| US3577207A (en) * | 1969-05-07 | 1971-05-04 | Vladimir Pavlovich Kirjushin | Microwave plasmatron |
| US3734846A (en) * | 1969-11-20 | 1973-05-22 | Airco Inc | Process for producing ozone using a fluidized bed dielectric |
| US3654126A (en) * | 1969-11-20 | 1972-04-04 | Air Reduction | Fluidized bed ozone generator |
| JPS565572B1 (enExample) * | 1970-12-30 | 1981-02-05 | ||
| US3897010A (en) * | 1971-07-02 | 1975-07-29 | Linde Ag | Method of and apparatus for the milling of granular materials |
| US3941869A (en) * | 1972-05-23 | 1976-03-02 | Warren Fuchs | Process for exothermic reactions |
| US3831747A (en) * | 1972-06-02 | 1974-08-27 | Huber Corp J M | Fluidized bed processing of carbon black |
| US3948645A (en) * | 1973-04-30 | 1976-04-06 | Boliden Aktiebolag | Method of carrying out heat-requiring chemical and/or physical processes in a fluidized bed |
| JPS543104B2 (enExample) * | 1973-12-28 | 1979-02-17 | ||
| US3963838A (en) * | 1974-05-24 | 1976-06-15 | Texas Instruments Incorporated | Method of operating a quartz fluidized bed reactor for the production of silicon |
| US4092446A (en) * | 1974-07-31 | 1978-05-30 | Texas Instruments Incorporated | Process of refining impure silicon to produce purified electronic grade silicon |
| US4154870A (en) * | 1974-11-01 | 1979-05-15 | Texas Instruments Incorporated | Silicon production and processing employing a fluidized bed |
| US4038050A (en) * | 1974-11-27 | 1977-07-26 | W. R. Grace & Co. | Electrical sensing and regenerating system for molecular sieve driers |
| US3993450A (en) * | 1975-02-19 | 1976-11-23 | The United States Of America As Represented By The United States Energy Research And Development Administration | Electrode assembly for a fluidized bed apparatus |
| US3970567A (en) * | 1975-04-17 | 1976-07-20 | W. R. Grace & Co. | Ozonizer with absorption of ozone |
| JPS5823349B2 (ja) * | 1975-08-11 | 1983-05-14 | 新日本製鐵株式会社 | タイカブツノシヨウケツホウホウ |
| US4207360A (en) * | 1975-10-31 | 1980-06-10 | Texas Instruments Incorporated | Silicon seed production process |
| DE2554399C3 (de) * | 1975-12-03 | 1979-09-06 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen von aus Silicium oder Siliciumcarbid bestehenden, direkt-beheizbaren Rohren |
| SU581362A1 (ru) | 1976-04-19 | 1977-11-25 | Предприятие П/Я Г-4466 | Высокочастотна печь дл нагрева диэлектрических материалов |
| US4158695A (en) * | 1976-07-01 | 1979-06-19 | Hiroshi Ishizuka | Electrothermal fluidized bed furnace |
| US4213937A (en) * | 1976-09-22 | 1980-07-22 | Texas Instruments Incorporated | Silicon refinery |
| US4080927A (en) * | 1976-10-06 | 1978-03-28 | General Atomic Company | Fluidized bed-gas coater apparatus |
| US4221182A (en) * | 1976-10-06 | 1980-09-09 | General Atomic Company | Fluidized bed gas coating apparatus |
| US4098224A (en) * | 1976-12-13 | 1978-07-04 | General Atomic Company | Gas coating apparatus |
| US4135889A (en) * | 1976-12-20 | 1979-01-23 | University Of Utah | Single stage, coal gasification reactor |
| DE2704975C2 (de) * | 1977-02-07 | 1982-12-23 | Wacker-Chemie GmbH, 8000 München | Wärmeaustauschvorrichtung für Wirbelbettreaktoren zur Durchführung von Gas/Feststoff-Reaktionen, insbesondere zur Herstellung von Siliciumhalogenverbindungen mittels Silicium-enthaltender Kontaktmassen |
| US4172667A (en) * | 1977-06-06 | 1979-10-30 | General Electric Company | Method and apparatus for blending powders in a fluidized bed |
| US4117094A (en) * | 1977-06-13 | 1978-09-26 | Texas Instruments Incorporated | Process for silicon and trichlorosilane production |
| US4126757A (en) * | 1978-01-25 | 1978-11-21 | Autoclave Engineers, Inc. | Multizone graphite heating element furnace |
| SU681362A1 (ru) | 1978-01-31 | 1979-08-25 | Институт Ботаники Ан Казахской Сср | Способ электрофоретического разделени изоферментов -амилазы |
| US4318942A (en) * | 1978-08-18 | 1982-03-09 | J. C. Schumacher Company | Process for producing polycrystalline silicon |
| US4292344A (en) * | 1979-02-23 | 1981-09-29 | Union Carbide Corporation | Fluidized bed heating process and apparatus |
| US4288162A (en) * | 1979-02-27 | 1981-09-08 | Sumitomo Kinzoku Kogyo Kabushiki Kaisha | Measuring particle size distribution |
| US4249032A (en) * | 1979-04-06 | 1981-02-03 | Autoclave Engineers, Inc. | Multizone graphite heating element furnace |
| US4237151A (en) * | 1979-06-26 | 1980-12-02 | The United States Of America As Represented By The United States Department Of Energy | Thermal decomposition of silane to form hydrogenated amorphous Si film |
| US4433233A (en) * | 1979-09-27 | 1984-02-21 | Emerson Electric Co. | Silicon carbide heating elements |
| US4543240A (en) | 1980-02-08 | 1985-09-24 | Superior Graphite Co. | Method for the continuous production of carbides |
| DE3007711C2 (de) * | 1980-02-29 | 1987-01-02 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Anströmeinheit für einen Wirbelschichtofen |
| US4444811A (en) * | 1980-03-03 | 1984-04-24 | California Institute Of Technology | Fluidized bed silicon deposition from silane |
| US4314525A (en) * | 1980-03-03 | 1982-02-09 | California Institute Of Technology | Fluidized bed silicon deposition from silane |
| US4306891A (en) * | 1980-03-17 | 1981-12-22 | Clarke's Sheet Metal, Inc. | Separator for precipitating particulate from an airflow |
| US4298789A (en) * | 1980-03-24 | 1981-11-03 | General Electric Company | Oven having a cavity heated by at least one monolithic integrated heat source |
| US4519999A (en) * | 1980-03-31 | 1985-05-28 | Union Carbide Corporation | Waste treatment in silicon production operations |
| US4299693A (en) * | 1980-04-30 | 1981-11-10 | Allied Industries | Separator |
| US4299694A (en) * | 1980-08-25 | 1981-11-10 | The Direct Reduction Corporation | Method and apparatus for char separation from the discharge materials of an iron oxide reducing kiln |
| JPS5745335A (en) * | 1980-09-02 | 1982-03-15 | Mitsui Eng & Shipbuild Co Ltd | Heating fluidized bed reactor |
| US4307242A (en) * | 1980-10-03 | 1981-12-22 | General Electric Company | Process for removing impurities from residual silicon powder |
| US4314899A (en) * | 1980-12-23 | 1982-02-09 | Atlantic Richfield Company | Separating spent mineral matter from heat carriers |
| US4443361A (en) * | 1981-02-20 | 1984-04-17 | Emerson Electric Co. | Silicon carbide resistance element |
| US4479920A (en) | 1981-06-29 | 1984-10-30 | Torftech Limited | Apparatus for processing matter in a turbulent mass of particulate material |
| US4435374A (en) * | 1981-07-09 | 1984-03-06 | Helm Jr John L | Method of producing carbon monoxide and hydrogen by gasification of solid carbonaceous material involving microwave irradiation |
| US4341749A (en) * | 1981-08-14 | 1982-07-27 | Union Carbide Corporation | Heating method for silane pyrolysis reactor |
| US4537759A (en) * | 1981-08-24 | 1985-08-27 | Eagle-Picher Industries, Inc. | Production of elemental silicon from impure silane feed |
| US4424199A (en) * | 1981-12-11 | 1984-01-03 | Union Carbide Corporation | Fluid jet seed particle generator for silane pyrolysis reactor |
| EP0082678B1 (en) * | 1981-12-18 | 1987-08-26 | Toray Industries, Inc. | Improved electric resistance heating element and electric resistance heating furnace using the same as heat source |
| DE3203209C1 (de) * | 1982-02-01 | 1983-08-11 | Waeschle Maschinenfabrik Gmbh, 7980 Ravensburg | Umlenksichter |
| US4388080A (en) * | 1982-02-12 | 1983-06-14 | Atlantic Richfield Company | Process for recovery of high purity silicon |
| US4737348A (en) | 1982-06-22 | 1988-04-12 | Harry Levin | Apparatus for making molten silicon |
| US4668493A (en) | 1982-06-22 | 1987-05-26 | Harry Levin | Process for making silicon |
| FR2530607B1 (fr) | 1982-07-26 | 1985-06-28 | Rhone Poulenc Spec Chim | Silicium pur, en poudre dense et son procede de preparation |
| US4642227A (en) | 1982-08-20 | 1987-02-10 | California Institute Of Technology | Reactor for producing large particles of materials from gases |
| US4416913A (en) * | 1982-09-28 | 1983-11-22 | Motorola, Inc. | Ascending differential silicon harvesting means and method |
| US4684513A (en) | 1982-11-05 | 1987-08-04 | Union Carbide Corporation | Zone heating for fluidized bed silane pyrolysis |
| US4818495A (en) | 1982-11-05 | 1989-04-04 | Union Carbide Corporation | Reactor for fluidized bed silane decomposition |
| DE3310828A1 (de) * | 1983-03-24 | 1984-09-27 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von silicium |
| FR2548054B1 (fr) | 1983-06-29 | 1985-11-08 | Snecma | Dispositif d'elutriation pour purification et separation de poudres de densites differentes |
| NL192055C (nl) | 1983-07-22 | 1997-01-07 | Eskla Bv | Inrichting voor het bedrijven van fysische en/of chemische processen, in het bijzonder een warmtewisselaar met circulatie van korrelmassa. |
| JPS6033210A (ja) | 1983-08-02 | 1985-02-20 | Komatsu Denshi Kinzoku Kk | 半導体用シリコンの破砕方法 |
| US4486473A (en) * | 1983-09-21 | 1984-12-04 | Ga Technologies Inc. | Method and apparatus for coating fragile articles in a fluidized bed of particles using chemical vapor deposition |
| JPS6094170A (ja) | 1983-10-29 | 1985-05-27 | Agency Of Ind Science & Technol | 転動流動による連続コ−テイング法及びその装置 |
| US4557904A (en) | 1984-03-26 | 1985-12-10 | Union Carbide Corporation | Integral reactor apparatus |
| US4585673A (en) | 1984-05-07 | 1986-04-29 | Gte Laboratories Incorporated | Method for coating phosphor particles |
| US4825124A (en) | 1984-05-07 | 1989-04-25 | Gte Laboratories Incorporated | Phosphor particle, fluorescent lamp, and manufacturing method |
| DE3419125A1 (de) | 1984-05-23 | 1985-11-28 | Danfoss A/S, Nordborg | Verfahren zum anloeten einer metallelektrode an einem elektrisch leitenden siliziumkarbid-keramikelement und nach dem verfahren hergestelltes siliziumkarbid-keramikelement |
| US4594270A (en) | 1984-08-31 | 1986-06-10 | Carbomedics, Inc. | Bed sampler for a high-temperature fluidized bed |
| US4585643A (en) | 1985-05-31 | 1986-04-29 | Union Carbide Corporation | Process for preparing chlorosilanes from silicon and hydrogen chloride using an oxygen promoter |
| US4642228A (en) | 1985-07-24 | 1987-02-10 | Angel Sanjurjo | Fluxing system for reactors for production of silicon |
| US4676968A (en) | 1985-07-24 | 1987-06-30 | Enichem, S.P.A. | Melt consolidation of silicon powder |
| US4806317A (en) | 1985-08-01 | 1989-02-21 | Ethyl Corporation | Fluidized bed reactor |
| US5059410A (en) | 1985-08-01 | 1991-10-22 | Ethyl Corporation | Production of silicon |
| US4691866A (en) | 1985-11-08 | 1987-09-08 | Ethyl Corporation | Generation of seed particles |
| US4755658A (en) | 1985-11-12 | 1988-07-05 | Ultra Carbon Corporation | Segmented heater system |
| KR880000618B1 (ko) | 1985-12-28 | 1988-04-18 | 재단법인 한국화학연구소 | 초단파 가열 유동상 반응에 의한 고순도 다결정 실리콘의 제조 방법 |
| US4784840A (en) | 1986-08-25 | 1988-11-15 | Ethyl Corporation | Polysilicon fluid bed process and product |
| US4883687A (en) | 1986-08-25 | 1989-11-28 | Ethyl Corporation | Fluid bed process for producing polysilicon |
| US4820587A (en) | 1986-08-25 | 1989-04-11 | Ethyl Corporation | Polysilicon produced by a fluid bed process |
| US4746547A (en) | 1986-12-29 | 1988-05-24 | Ga Technologies Inc. | Method and apparatus for circulating bed coater |
| US4748052A (en) | 1987-08-21 | 1988-05-31 | Ethyl Corporation | Fluid bed reactor and process |
| US4868013A (en) | 1987-08-21 | 1989-09-19 | Ethyl Corporation | Fluidized bed process |
| US4906441A (en) | 1987-11-25 | 1990-03-06 | Union Carbide Chemicals And Plastics Company Inc. | Fluidized bed with heated liners and a method for its use |
| US4851297A (en) | 1987-11-27 | 1989-07-25 | Ethyl Corporation | Dopant coated bead-like silicon particles |
| US4952425A (en) | 1987-11-27 | 1990-08-28 | Ethyl Corporation | Method of preparing high purity dopant alloys |
| US4789596A (en) | 1987-11-27 | 1988-12-06 | Ethyl Corporation | Dopant coated bead-like silicon particles |
| US5139762A (en) | 1987-12-14 | 1992-08-18 | Advanced Silicon Materials, Inc. | Fluidized bed for production of polycrystalline silicon |
| US5165908A (en) | 1988-03-31 | 1992-11-24 | Advanced Silicon Materials, Inc. | Annular heated fluidized bed reactor |
| US4904452A (en) | 1988-03-31 | 1990-02-27 | Union Carbide Chemicals And Plastics Company Inc. | Inner core heating in fluidized bed |
| US4992245A (en) | 1988-03-31 | 1991-02-12 | Advanced Silicon Materials Inc. | Annular heated fluidized bed reactor |
| US5037503A (en) | 1988-05-31 | 1991-08-06 | Osaka Titanium Co., Ltd. | Method for growing silicon single crystal |
| CA1340189C (en) | 1988-10-11 | 1998-12-15 | Albemarle Corporation | Polysilicon with diminished hydrogen content |
| US5326547A (en) | 1988-10-11 | 1994-07-05 | Albemarle Corporation | Process for preparing polysilicon with diminished hydrogen content by using a two-step heating process |
| US5242671A (en) | 1988-10-11 | 1993-09-07 | Ethyl Corporation | Process for preparing polysilicon with diminished hydrogen content by using a fluidized bed with a two-step heating process |
| EP0450494B1 (en) | 1990-03-30 | 1996-06-19 | Sumitomo Sitix Corporation | Manufacturing method for single-crystal silicon |
| US5284676A (en) | 1990-08-17 | 1994-02-08 | Carbon Implants, Inc. | Pyrolytic deposition in a fluidized bed |
| US5225005A (en) | 1991-03-28 | 1993-07-06 | Cooper Power Systems, Inc. | Method of annealing/magnetic annealing of amorphous metal in a fluidized bed and apparatus therefor |
| US5171734A (en) | 1991-04-22 | 1992-12-15 | Sri International | Coating a substrate in a fluidized bed maintained at a temperature below the vaporization temperature of the resulting coating composition |
| US5175942A (en) | 1991-07-19 | 1993-01-05 | Gte Products Corporation | Method for fluidized bed discharge |
| US5358603A (en) | 1992-10-06 | 1994-10-25 | Albemarle Corporation | Process for the removal of a silicon coating from a surface |
| GB2271518B (en) | 1992-10-16 | 1996-09-25 | Korea Res Inst Chem Tech | Heating of fluidized bed reactor by microwave |
-
1995
- 1995-06-07 US US08/481,801 patent/US5798137A/en not_active Expired - Lifetime
- 1995-06-07 US US08/487,008 patent/US5810934A/en not_active Expired - Lifetime
-
1996
- 1996-06-07 KR KR1019970708925A patent/KR100416629B1/ko not_active Expired - Lifetime
- 1996-06-07 JP JP50195297A patent/JP4219401B2/ja not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5011285A (en) * | 1987-12-18 | 1991-04-30 | Norsk Hydro A.S. | Method and apparatus for performing automatic particle analysis |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8235305B2 (en) | 2009-04-20 | 2012-08-07 | Ae Polysilicon Corporation | Methods and system for cooling a reaction effluent gas |
| US8425855B2 (en) | 2009-04-20 | 2013-04-23 | Robert Froehlich | Reactor with silicide-coated metal surfaces |
| WO2011063007A3 (en) * | 2009-11-18 | 2011-09-09 | Rec Silicon Inc | Fluid bed reactor |
| US8075692B2 (en) | 2009-11-18 | 2011-12-13 | Rec Silicon Inc | Fluid bed reactor |
| US9023425B2 (en) | 2009-11-18 | 2015-05-05 | Rec Silicon Inc | Fluid bed reactor |
Also Published As
| Publication number | Publication date |
|---|---|
| KR19990022444A (ko) | 1999-03-25 |
| US5810934A (en) | 1998-09-22 |
| JP4219401B2 (ja) | 2009-02-04 |
| US5798137A (en) | 1998-08-25 |
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