KR100235378B1 - 금속-함유 표면을 가지는 금속성 지지체 물품, 평탄한 금속 표면을 제조하는 방법 및 이를 위한 전해조 - Google Patents

금속-함유 표면을 가지는 금속성 지지체 물품, 평탄한 금속 표면을 제조하는 방법 및 이를 위한 전해조 Download PDF

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Publication number
KR100235378B1
KR100235378B1 KR1019910024456A KR910024456A KR100235378B1 KR 100235378 B1 KR100235378 B1 KR 100235378B1 KR 1019910024456 A KR1019910024456 A KR 1019910024456A KR 910024456 A KR910024456 A KR 910024456A KR 100235378 B1 KR100235378 B1 KR 100235378B1
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KR
South Korea
Prior art keywords
metal
microinches
average
article
coating
Prior art date
Application number
KR1019910024456A
Other languages
English (en)
Korean (ko)
Other versions
KR920011628A (ko
Inventor
엠 어니스 린
시이 카 알슨 리차아드
엘 하아디 케니스
Original Assignee
캐스린 이이 켄트
엘텍 시스템즈 코오포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24541661&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR100235378(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 캐스린 이이 켄트, 엘텍 시스템즈 코오포레이션 filed Critical 캐스린 이이 켄트
Publication of KR920011628A publication Critical patent/KR920011628A/ko
Application granted granted Critical
Publication of KR100235378B1 publication Critical patent/KR100235378B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Pinball Game Machines (AREA)
KR1019910024456A 1990-12-26 1991-12-26 금속-함유 표면을 가지는 금속성 지지체 물품, 평탄한 금속 표면을 제조하는 방법 및 이를 위한 전해조 KR100235378B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US63391490A 1990-12-26 1990-12-26
US07/633,914 1990-12-26
US7/633,914 1990-12-26

Publications (2)

Publication Number Publication Date
KR920011628A KR920011628A (ko) 1992-07-24
KR100235378B1 true KR100235378B1 (ko) 1999-12-15

Family

ID=24541661

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910024456A KR100235378B1 (ko) 1990-12-26 1991-12-26 금속-함유 표면을 가지는 금속성 지지체 물품, 평탄한 금속 표면을 제조하는 방법 및 이를 위한 전해조

Country Status (12)

Country Link
EP (1) EP0493326B1 (de)
JP (1) JP2825383B2 (de)
KR (1) KR100235378B1 (de)
AT (1) ATE154834T1 (de)
AU (1) AU643350B2 (de)
CA (1) CA2056943C (de)
DE (1) DE69126656T2 (de)
DK (1) DK0493326T3 (de)
ES (1) ES2104684T3 (de)
GR (1) GR3024677T3 (de)
MX (1) MX9102511A (de)
TW (1) TW197475B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5314601A (en) * 1989-06-30 1994-05-24 Eltech Systems Corporation Electrodes of improved service life
JP3228644B2 (ja) * 1993-11-05 2001-11-12 東京エレクトロン株式会社 真空処理装置用素材及びその製造方法
WO1997017478A1 (de) * 1995-11-08 1997-05-15 Fissler Gmbh Verfahren zur erzeugung einer antihaftbeschichtung sowie mit einer solchen versehene gegenstände
EP1937862A4 (de) * 2005-09-20 2011-02-16 Kudu Ind Inc Verfahren zum auftragsschweissen eines rotors von exzenterschneckenpumpen/-motoren
FI118159B (fi) * 2005-10-21 2007-07-31 Outotec Oyj Menetelmä elektrokatalyyttisen pinnan muodostamiseksi elektrodiin ja elektrodi
ITMI20070980A1 (it) * 2007-05-15 2008-11-16 Industrie De Nora Spa Elettrodo per celle elettrolitiche a membrana
EP2022447A1 (de) 2007-07-09 2009-02-11 Astra Tech AB Nanooberfläche
ITMI20102354A1 (it) * 2010-12-22 2012-06-23 Industrie De Nora Spa Elettrodo per cella elettrolitica
CN104073842A (zh) * 2011-10-13 2014-10-01 金川集团有限公司 一种电积、电解镍的阴极板
AU2013278446B2 (en) 2012-06-18 2016-12-22 Asahi Kasei Kabushiki Kaisha Bipolar alkaline water electrolysis unit and electrolytic cell
JP6234754B2 (ja) * 2013-09-18 2017-11-22 株式会社神戸製鋼所 電極用金属板及び電極
WO2015116123A2 (en) * 2014-01-31 2015-08-06 Hewlett-Packard Development Company, L.P. Surface treatments of metal substrates
DE102020120412A1 (de) 2020-08-03 2022-02-03 Canon Production Printing Holding B.V. Vorrichtung zum Erwärmen eines Aufzeichnungsträgers mit einem auf dem Aufzeichnungsträger gedruckten Druckbild

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2320329A (en) * 1942-08-06 1943-05-25 Metallizing Engineering Co Inc Spray metal coated, metal surfaced articles
DE2300422C3 (de) * 1973-01-05 1981-10-15 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung einer Elektrode
JPS5137837A (ja) * 1974-09-27 1976-03-30 Tokyo Metarikon Kk Himakukeiseiho
DE3106587A1 (de) * 1981-02-21 1982-09-02 Heraeus-Elektroden Gmbh, 6450 Hanau "elektrode"
JPS60159199A (ja) * 1984-01-27 1985-08-20 Plasma Giken Kogyo Kk 二酸化鉛電極
JPS63176453A (ja) * 1987-01-16 1988-07-20 Dainippon Toryo Co Ltd 金属溶射被膜の作製方法
DE3712684A1 (de) * 1987-04-14 1988-10-27 Castolin Sa Verfahren zum herstellen einer gespritzten oberflaeche mit definierter rauhigkeit sowie dessen verwendung
JPH01150000A (ja) * 1987-12-07 1989-06-13 Nippon Steel Corp 電気メッキ用不溶性陽極
JPH01152294A (ja) * 1987-12-09 1989-06-14 Nippon Mining Co Ltd 不溶性アノード用材料の製造方法
JPH01177399A (ja) * 1988-01-07 1989-07-13 Kawasaki Steel Corp 電気めっき用Ｐｂ系不溶性陽極
JPH02200799A (ja) * 1989-01-27 1990-08-09 Kobe Steel Ltd 電解用不溶性電極及びそれを使用したカチオン電着塗装方法
GB8903322D0 (en) * 1989-02-14 1989-04-05 Ici Plc Electrolytic process
TW214570B (de) * 1989-06-30 1993-10-11 Eltech Systems Corp

Also Published As

Publication number Publication date
EP0493326A3 (en) 1993-03-17
JP2825383B2 (ja) 1998-11-18
DE69126656D1 (de) 1997-07-31
DK0493326T3 (da) 1997-12-29
DE69126656T2 (de) 1998-01-02
AU643350B2 (en) 1993-11-11
EP0493326A2 (de) 1992-07-01
KR920011628A (ko) 1992-07-24
AU8995491A (en) 1992-07-02
TW197475B (de) 1993-01-01
ATE154834T1 (de) 1997-07-15
GR3024677T3 (en) 1997-12-31
EP0493326B1 (de) 1997-06-25
MX9102511A (es) 1992-06-01
CA2056943A1 (en) 1992-06-27
ES2104684T3 (es) 1997-10-16
JPH04301062A (ja) 1992-10-23
CA2056943C (en) 1997-11-11

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