JPWO2023276812A5 - - Google Patents

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JPWO2023276812A5
JPWO2023276812A5 JP2023531857A JP2023531857A JPWO2023276812A5 JP WO2023276812 A5 JPWO2023276812 A5 JP WO2023276812A5 JP 2023531857 A JP2023531857 A JP 2023531857A JP 2023531857 A JP2023531857 A JP 2023531857A JP WO2023276812 A5 JPWO2023276812 A5 JP WO2023276812A5
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mass
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acid
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JP7664393B2 (ja
JPWO2023276812A1 (https=
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Priority claimed from PCT/JP2022/024862 external-priority patent/WO2023276812A1/ja
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JP2023531857A 2021-06-30 2022-06-22 組成物の製造方法及び非水電解液 Active JP7664393B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021109047 2021-06-30
JP2021109047 2021-06-30
PCT/JP2022/024862 WO2023276812A1 (ja) 2021-06-30 2022-06-22 組成物の製造方法及び非水電解液

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JPWO2023276812A1 JPWO2023276812A1 (https=) 2023-01-05
JPWO2023276812A5 true JPWO2023276812A5 (https=) 2024-11-05
JP7664393B2 JP7664393B2 (ja) 2025-04-17

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US (1) US20240332617A1 (https=)
EP (1) EP4343915B1 (https=)
JP (1) JP7664393B2 (https=)
KR (1) KR20240025009A (https=)
CN (1) CN117480659A (https=)
WO (1) WO2023276812A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025182300A1 (ja) * 2024-02-27 2025-09-04 株式会社日本触媒 非水電解液及びリチウムイオン二次電池
KR102863501B1 (ko) * 2025-01-02 2025-09-24 주식회사 천보 리튬 비스(플루오로설포닐)이미드 및 프로피오네이트 포함 저장 안정용 조성물

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69535612T2 (de) 1994-03-21 2008-07-24 Centre National De La Recherche Scientifique (C.N.R.S.) Ionenleitendes material mit guten korrosionshemmenden eigenschaften
JP4705476B2 (ja) 2006-01-10 2011-06-22 第一工業製薬株式会社 フッ素化合物の製造方法
JP4660596B2 (ja) 2009-01-22 2011-03-30 株式会社日本触媒 フルオロスルホニルイミド類およびその製造方法
JP5208782B2 (ja) 2009-01-22 2013-06-12 株式会社日本触媒 フルオロスルホニルイミド類およびその製造方法
JP4621783B2 (ja) 2008-03-31 2011-01-26 株式会社日本触媒 フルオロスルホニルイミド類およびその製造方法
JP5461401B2 (ja) 2008-07-23 2014-04-02 第一工業製薬株式会社 ビス(フルオロスルホニル)イミドアニオン化合物の製造方法
JP5443118B2 (ja) 2009-03-31 2014-03-19 三菱マテリアル株式会社 ビス(フルオロスルホニル)イミド塩の製造方法、ビス(フルオロスルホニル)イミド塩及びフルオロ硫酸塩の製造方法、並びにビス(フルオロスルホニル)イミド・オニウム塩の製造方法
JP5471045B2 (ja) 2009-06-03 2014-04-16 セントラル硝子株式会社 イミド酸塩の製造方法
HUE039514T2 (hu) 2009-11-27 2019-01-28 Nippon Catalytic Chem Ind Fluorszulfonilimid só és eljárás fluorszulfonilimid só elõállítására
HUE042926T2 (hu) 2010-05-28 2019-07-29 Nippon Catalytic Chem Ind Fluorszulfonil-imid alkálifém só, és eljárás annak elõállítására
KR101744373B1 (ko) 2011-02-10 2017-06-07 닛뽕소다 가부시키가이샤 플루오로술포닐이미드암모늄염의 제조 방법
CA2826375C (en) 2011-03-03 2016-02-16 Nippon Soda Co., Ltd. Process for producing fluorine-containing sulfonylimide salt
EP2660196B1 (en) 2011-03-03 2017-05-03 Nippon Soda Co., Ltd. Manufacturing method for fluorosulfonylimide ammonium salt
US8377406B1 (en) 2012-08-29 2013-02-19 Boulder Ionics Corporation Synthesis of bis(fluorosulfonyl)imide
JP6139944B2 (ja) 2013-04-01 2017-05-31 株式会社日本触媒 フルオロスルホニルイミドのアルカリ金属塩の製造方法
US11637320B2 (en) * 2014-10-03 2023-04-25 Nippon Shokubai Co., Ltd. Method for manufacturing electrolyte solution material
JP6792394B2 (ja) 2016-09-27 2020-11-25 株式会社日本触媒 ビス(フルオロスルホニル)イミドのアルカリ金属塩と有機溶媒とを含む電解液材料の製造方法
KR20190110608A (ko) 2017-01-31 2019-09-30 신시오 케미컬스, 엘엘씨 흡습성 알칼리 금속염 전해질 용액 생산 방법
KR20220012911A (ko) 2019-05-31 2022-02-04 가부시키가이샤 닛폰 쇼쿠바이 전해질 조성물, 용매 조성물, 비수전해액 및 그 용도
JP7346252B2 (ja) * 2019-11-08 2023-09-19 株式会社日本触媒 非水電解液の製造方法及びリチウムイオン二次電池

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