WO2023276812A1 - 組成物の製造方法及び非水電解液 - Google Patents
組成物の製造方法及び非水電解液 Download PDFInfo
- Publication number
- WO2023276812A1 WO2023276812A1 PCT/JP2022/024862 JP2022024862W WO2023276812A1 WO 2023276812 A1 WO2023276812 A1 WO 2023276812A1 JP 2022024862 W JP2022024862 W JP 2022024862W WO 2023276812 A1 WO2023276812 A1 WO 2023276812A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acid
- electrolyte
- mass
- solution
- group
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 121
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 50
- 239000011255 nonaqueous electrolyte Substances 0.000 title claims description 15
- 230000018044 dehydration Effects 0.000 claims abstract description 141
- 238000006297 dehydration reaction Methods 0.000 claims abstract description 141
- -1 sulfonylimide compound Chemical class 0.000 claims abstract description 134
- 239000003792 electrolyte Substances 0.000 claims abstract description 114
- 150000001450 anions Chemical class 0.000 claims abstract description 98
- 239000003125 aqueous solvent Substances 0.000 claims abstract description 83
- 239000002253 acid Substances 0.000 claims abstract description 73
- 239000002904 solvent Substances 0.000 claims abstract description 69
- 238000000034 method Methods 0.000 claims abstract description 50
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 19
- 238000010494 dissociation reaction Methods 0.000 claims abstract description 12
- 230000005593 dissociations Effects 0.000 claims abstract description 12
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 12
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 9
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 7
- 150000003839 salts Chemical class 0.000 claims description 87
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 82
- 125000004432 carbon atom Chemical group C* 0.000 claims description 55
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims description 40
- 229910052783 alkali metal Inorganic materials 0.000 claims description 29
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 24
- 125000005842 heteroatom Chemical group 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 19
- 150000005678 chain carbonates Chemical class 0.000 claims description 17
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 8
- 125000002252 acyl group Chemical group 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 claims description 8
- 150000001340 alkali metals Chemical class 0.000 claims description 7
- 125000004429 atom Chemical group 0.000 claims description 7
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 2
- 238000006467 substitution reaction Methods 0.000 abstract description 4
- 229910005143 FSO2 Inorganic materials 0.000 abstract description 2
- 206010013457 Dissociation Diseases 0.000 abstract 1
- 208000018459 dissociative disease Diseases 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 162
- VDVLPSWVDYJFRW-UHFFFAOYSA-N lithium;bis(fluorosulfonyl)azanide Chemical compound [Li+].FS(=O)(=O)[N-]S(F)(=O)=O VDVLPSWVDYJFRW-UHFFFAOYSA-N 0.000 description 120
- 229910010941 LiFSI Inorganic materials 0.000 description 110
- 125000005463 sulfonylimide group Chemical group 0.000 description 67
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 58
- 125000000129 anionic group Chemical group 0.000 description 48
- 239000012535 impurity Substances 0.000 description 47
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 39
- 229910003002 lithium salt Inorganic materials 0.000 description 38
- 159000000002 lithium salts Chemical class 0.000 description 38
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 24
- 239000008151 electrolyte solution Substances 0.000 description 20
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 19
- 239000007864 aqueous solution Substances 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 19
- 238000004821 distillation Methods 0.000 description 18
- 229910052744 lithium Inorganic materials 0.000 description 18
- 238000002360 preparation method Methods 0.000 description 18
- 229940021013 electrolyte solution Drugs 0.000 description 17
- 239000012071 phase Substances 0.000 description 16
- 150000001768 cations Chemical class 0.000 description 15
- 229910019142 PO4 Inorganic materials 0.000 description 13
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 13
- 235000021317 phosphate Nutrition 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- 229910052808 lithium carbonate Inorganic materials 0.000 description 12
- 239000012528 membrane Substances 0.000 description 12
- 239000010452 phosphate Substances 0.000 description 11
- 239000003660 carbonate based solvent Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 238000001944 continuous distillation Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 8
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 8
- 235000011054 acetic acid Nutrition 0.000 description 8
- 239000000654 additive Substances 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 7
- 150000003949 imides Chemical class 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 239000000725 suspension Substances 0.000 description 7
- 238000005292 vacuum distillation Methods 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 6
- 159000000009 barium salts Chemical class 0.000 description 6
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 6
- 159000000007 calcium salts Chemical class 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 6
- 239000003759 ester based solvent Substances 0.000 description 6
- 239000004210 ether based solvent Substances 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 229910001416 lithium ion Inorganic materials 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 159000000000 sodium salts Chemical class 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 239000008346 aqueous phase Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 5
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 description 5
- SAPIQCCFEBULSH-UHFFFAOYSA-M lithium;sulfamate Chemical compound [Li+].NS([O-])(=O)=O SAPIQCCFEBULSH-UHFFFAOYSA-M 0.000 description 5
- 159000000003 magnesium salts Chemical class 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 239000012074 organic phase Substances 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 159000000001 potassium salts Chemical class 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 5
- VKPSKYDESGTTFR-UHFFFAOYSA-N 2,2,4,6,6-pentamethylheptane Chemical compound CC(C)(C)CC(C)CC(C)(C)C VKPSKYDESGTTFR-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 229910013872 LiPF Inorganic materials 0.000 description 4
- 101150058243 Lipf gene Proteins 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 238000004255 ion exchange chromatography Methods 0.000 description 4
- 229910001386 lithium phosphate Inorganic materials 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 150000002825 nitriles Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 4
- 159000000008 strontium salts Chemical class 0.000 description 4
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 4
- 125000004434 sulfur atom Chemical group 0.000 description 4
- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical compound NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 4
- TWQULNDIKKJZPH-UHFFFAOYSA-K trilithium;phosphate Chemical compound [Li+].[Li+].[Li+].[O-]P([O-])([O-])=O TWQULNDIKKJZPH-UHFFFAOYSA-K 0.000 description 4
- 239000002351 wastewater Substances 0.000 description 4
- HYFLWBNQFMXCPA-UHFFFAOYSA-N 1-ethyl-2-methylbenzene Chemical compound CCC1=CC=CC=C1C HYFLWBNQFMXCPA-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 3
- VWIIJDNADIEEDB-UHFFFAOYSA-N 3-methyl-1,3-oxazolidin-2-one Chemical compound CN1CCOC1=O VWIIJDNADIEEDB-UHFFFAOYSA-N 0.000 description 3
- SBLRHMKNNHXPHG-UHFFFAOYSA-N 4-fluoro-1,3-dioxolan-2-one Chemical compound FC1COC(=O)O1 SBLRHMKNNHXPHG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 229910013075 LiBF Inorganic materials 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 159000000004 beryllium salts Chemical class 0.000 description 3
- 159000000006 cesium salts Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000005676 cyclic carbonates Chemical class 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- KTQDYGVEEFGIIL-UHFFFAOYSA-N n-fluorosulfonylsulfamoyl fluoride Chemical compound FS(=O)(=O)NS(F)(=O)=O KTQDYGVEEFGIIL-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 3
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 3
- 239000013557 residual solvent Substances 0.000 description 3
- 159000000005 rubidium salts Chemical class 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 125000003944 tolyl group Chemical group 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 125000005023 xylyl group Chemical group 0.000 description 3
- SSYDTHANSGMJTP-ZXZARUISSA-N (3s,4r)-oxolane-3,4-diol Chemical compound O[C@H]1COC[C@H]1O SSYDTHANSGMJTP-ZXZARUISSA-N 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- GWHJZXXIDMPWGX-UHFFFAOYSA-N 1,2,4-trimethylbenzene Chemical compound CC1=CC=C(C)C(C)=C1 GWHJZXXIDMPWGX-UHFFFAOYSA-N 0.000 description 2
- VCJPCEVERINRSG-UHFFFAOYSA-N 1,2,4-trimethylcyclohexane Chemical compound CC1CCC(C)C(C)C1 VCJPCEVERINRSG-UHFFFAOYSA-N 0.000 description 2
- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 description 2
- KVZJLSYJROEPSQ-UHFFFAOYSA-N 1,2-dimethylcyclohexane Chemical compound CC1CCCCC1C KVZJLSYJROEPSQ-UHFFFAOYSA-N 0.000 description 2
- CXWGKAYMVASWDQ-UHFFFAOYSA-N 1,2-dithiane Chemical compound C1CCSSC1 CXWGKAYMVASWDQ-UHFFFAOYSA-N 0.000 description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N 1,3,5-trimethylbenzene Chemical compound CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
- ODNRTOSCFYDTKF-UHFFFAOYSA-N 1,3,5-trimethylcyclohexane Chemical compound CC1CC(C)CC(C)C1 ODNRTOSCFYDTKF-UHFFFAOYSA-N 0.000 description 2
- SGVUHPSBDNVHKL-UHFFFAOYSA-N 1,3-dimethylcyclohexane Chemical compound CC1CCCC(C)C1 SGVUHPSBDNVHKL-UHFFFAOYSA-N 0.000 description 2
- VAYTZRYEBVHVLE-UHFFFAOYSA-N 1,3-dioxol-2-one Chemical compound O=C1OC=CO1 VAYTZRYEBVHVLE-UHFFFAOYSA-N 0.000 description 2
- QRMPKOFEUHIBNM-UHFFFAOYSA-N 1,4-dimethylcyclohexane Chemical compound CC1CCC(C)CC1 QRMPKOFEUHIBNM-UHFFFAOYSA-N 0.000 description 2
- CHLICZRVGGXEOD-UHFFFAOYSA-N 1-Methoxy-4-methylbenzene Chemical compound COC1=CC=C(C)C=C1 CHLICZRVGGXEOD-UHFFFAOYSA-N 0.000 description 2
- UHOPWFKONJYLCF-UHFFFAOYSA-N 2-(2-sulfanylethyl)isoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(CCS)C(=O)C2=C1 UHOPWFKONJYLCF-UHFFFAOYSA-N 0.000 description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- CMJLMPKFQPJDKP-UHFFFAOYSA-N 3-methylthiolane 1,1-dioxide Chemical compound CC1CCS(=O)(=O)C1 CMJLMPKFQPJDKP-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- GKZFQPGIDVGTLZ-UHFFFAOYSA-N 4-(trifluoromethyl)-1,3-dioxolan-2-one Chemical compound FC(F)(F)C1COC(=O)O1 GKZFQPGIDVGTLZ-UHFFFAOYSA-N 0.000 description 2
- ZKOGUIGAVNCCKH-UHFFFAOYSA-N 4-phenyl-1,3-dioxolan-2-one Chemical compound O1C(=O)OCC1C1=CC=CC=C1 ZKOGUIGAVNCCKH-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 241000209094 Oryza Species 0.000 description 2
- 235000007164 Oryza sativa Nutrition 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- YPWFISCTZQNZAU-UHFFFAOYSA-N Thiane Chemical compound C1CCSCC1 YPWFISCTZQNZAU-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- IXRFQWWRSJGLAD-UHFFFAOYSA-L [Li+].[Li+].[O-]P([O-])=O Chemical compound [Li+].[Li+].[O-]P([O-])=O IXRFQWWRSJGLAD-UHFFFAOYSA-L 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 229910000266 aqualite Inorganic materials 0.000 description 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- GGBJHURWWWLEQH-UHFFFAOYSA-N butylcyclohexane Chemical compound CCCCC1CCCCC1 GGBJHURWWWLEQH-UHFFFAOYSA-N 0.000 description 2
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- DMEGYFMYUHOHGS-UHFFFAOYSA-N cycloheptane Chemical compound C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- LOZWAPSEEHRYPG-UHFFFAOYSA-N dithiane Natural products C1CSCCS1 LOZWAPSEEHRYPG-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229940045996 isethionic acid Drugs 0.000 description 2
- LRDFRRGEGBBSRN-UHFFFAOYSA-N isobutyronitrile Chemical compound CC(C)C#N LRDFRRGEGBBSRN-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 2
- DEDZSLCZHWTGOR-UHFFFAOYSA-N propylcyclohexane Chemical compound CCCC1CCCCC1 DEDZSLCZHWTGOR-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000011002 quantification Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 235000009566 rice Nutrition 0.000 description 2
- 229960004889 salicylic acid Drugs 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000001577 simple distillation Methods 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 229940014800 succinic anhydride Drugs 0.000 description 2
- 229960003080 taurine Drugs 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- JWCVYQRPINPYQJ-UHFFFAOYSA-N thiepane Chemical compound C1CCCSCC1 JWCVYQRPINPYQJ-UHFFFAOYSA-N 0.000 description 2
- XSROQCDVUIHRSI-UHFFFAOYSA-N thietane Chemical compound C1CSC1 XSROQCDVUIHRSI-UHFFFAOYSA-N 0.000 description 2
- AMIGYDGSJCJWSD-UHFFFAOYSA-N thiocane Chemical compound C1CCCSCCC1 AMIGYDGSJCJWSD-UHFFFAOYSA-N 0.000 description 2
- IIYFAKIEWZDVMP-UHFFFAOYSA-N tridecane Chemical compound CCCCCCCCCCCCC IIYFAKIEWZDVMP-UHFFFAOYSA-N 0.000 description 2
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 2
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 2
- WYRSGXAIHNMKOL-UHFFFAOYSA-N $l^{1}-sulfanylethane Chemical compound CC[S] WYRSGXAIHNMKOL-UHFFFAOYSA-N 0.000 description 1
- OSLACAVPQKYRMC-UHFFFAOYSA-N (3-chloro-2-hydroxypropyl)-ethylsulfamic acid Chemical compound CCN(S(O)(=O)=O)CC(O)CCl OSLACAVPQKYRMC-UHFFFAOYSA-N 0.000 description 1
- QYCCIVDFILYJMF-UHFFFAOYSA-N (3-chloro-2-hydroxypropyl)-methylsulfamic acid Chemical compound OS(=O)(=O)N(C)CC(O)CCl QYCCIVDFILYJMF-UHFFFAOYSA-N 0.000 description 1
- IFKKKVMVPOPSFE-UHFFFAOYSA-N (3-methoxy-4-methylphenyl)sulfamic acid Chemical compound COC1=CC(NS(O)(=O)=O)=CC=C1C IFKKKVMVPOPSFE-UHFFFAOYSA-N 0.000 description 1
- BULNJLRCRDTBSQ-UHFFFAOYSA-N (4-bromophenyl)sulfamic acid Chemical compound OS(=O)(=O)NC1=CC=C(Br)C=C1 BULNJLRCRDTBSQ-UHFFFAOYSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- ZPFAVCIQZKRBGF-UHFFFAOYSA-N 1,3,2-dioxathiolane 2,2-dioxide Chemical compound O=S1(=O)OCCO1 ZPFAVCIQZKRBGF-UHFFFAOYSA-N 0.000 description 1
- WDXYVJKNSMILOQ-UHFFFAOYSA-N 1,3,2-dioxathiolane 2-oxide Chemical compound O=S1OCCO1 WDXYVJKNSMILOQ-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- FSSPGSAQUIYDCN-UHFFFAOYSA-N 1,3-Propane sultone Chemical compound O=S1(=O)CCCO1 FSSPGSAQUIYDCN-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- YUWZYMMMYVMIIL-UHFFFAOYSA-N 1,3-dithian-5-ylsulfamic acid Chemical compound OS(=O)(=O)NC1CSCSC1 YUWZYMMMYVMIIL-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- PIYNUZCGMLCXKJ-UHFFFAOYSA-N 1,4-dioxane-2,6-dione Chemical compound O=C1COCC(=O)O1 PIYNUZCGMLCXKJ-UHFFFAOYSA-N 0.000 description 1
- OSIGJGFTADMDOB-UHFFFAOYSA-N 1-Methoxy-3-methylbenzene Chemical compound COC1=CC=CC(C)=C1 OSIGJGFTADMDOB-UHFFFAOYSA-N 0.000 description 1
- MBDUIEKYVPVZJH-UHFFFAOYSA-N 1-ethylsulfonylethane Chemical compound CCS(=O)(=O)CC MBDUIEKYVPVZJH-UHFFFAOYSA-N 0.000 description 1
- GGYVTHJIUNGKFZ-UHFFFAOYSA-N 1-methylpiperidin-2-one Chemical compound CN1CCCCC1=O GGYVTHJIUNGKFZ-UHFFFAOYSA-N 0.000 description 1
- KYEACNNYFNZCST-UHFFFAOYSA-N 1-methylpyrrolidine-2,5-dione Chemical compound CN1C(=O)CCC1=O KYEACNNYFNZCST-UHFFFAOYSA-N 0.000 description 1
- NOFQKTWPZFUCOO-UHFFFAOYSA-N 2,2,4,4,6-pentamethylheptane Chemical compound CC(C)CC(C)(C)CC(C)(C)C NOFQKTWPZFUCOO-UHFFFAOYSA-N 0.000 description 1
- KLCIQIJSLGGVSW-UHFFFAOYSA-N 2,2-dimethylpropylsulfamic acid Chemical compound CC(C)(C)CNS(O)(=O)=O KLCIQIJSLGGVSW-UHFFFAOYSA-N 0.000 description 1
- ZTZGDBMJSMCCBE-UHFFFAOYSA-N 2,3-dihydroxypropyl(methyl)sulfamic acid Chemical compound OS(=O)(=O)N(C)CC(O)CO ZTZGDBMJSMCCBE-UHFFFAOYSA-N 0.000 description 1
- HXALBHWOJYQGNX-UHFFFAOYSA-N 2,3-dihydroxypropylsulfamic acid Chemical compound OCC(O)CNS(O)(=O)=O HXALBHWOJYQGNX-UHFFFAOYSA-N 0.000 description 1
- WKFQMDFSDQFAIC-UHFFFAOYSA-N 2,4-dimethylthiolane 1,1-dioxide Chemical compound CC1CC(C)S(=O)(=O)C1 WKFQMDFSDQFAIC-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical class OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- DILXLMRYFWFBGR-UHFFFAOYSA-N 2-formylbenzene-1,4-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(S(O)(=O)=O)C(C=O)=C1 DILXLMRYFWFBGR-UHFFFAOYSA-N 0.000 description 1
- 229940006193 2-mercaptoethanesulfonic acid Drugs 0.000 description 1
- SFPQDYSOPQHZAQ-UHFFFAOYSA-N 2-methoxypropanenitrile Chemical compound COC(C)C#N SFPQDYSOPQHZAQ-UHFFFAOYSA-N 0.000 description 1
- DTFKRVXLBCAIOZ-UHFFFAOYSA-N 2-methylanisole Chemical compound COC1=CC=CC=C1C DTFKRVXLBCAIOZ-UHFFFAOYSA-N 0.000 description 1
- NWPNXBQSRGKSJB-UHFFFAOYSA-N 2-methylbenzonitrile Chemical compound CC1=CC=CC=C1C#N NWPNXBQSRGKSJB-UHFFFAOYSA-N 0.000 description 1
- LMVHWZSUGKCFLU-UHFFFAOYSA-N 2-methylbutylsulfamic acid Chemical compound CCC(C)CNS(O)(=O)=O LMVHWZSUGKCFLU-UHFFFAOYSA-N 0.000 description 1
- FPPLREPCQJZDAQ-UHFFFAOYSA-N 2-methylpentanedinitrile Chemical compound N#CC(C)CCC#N FPPLREPCQJZDAQ-UHFFFAOYSA-N 0.000 description 1
- HHCHLHOEAKKCAB-UHFFFAOYSA-N 2-oxaspiro[3.5]nonane-1,3-dione Chemical compound O=C1OC(=O)C11CCCCC1 HHCHLHOEAKKCAB-UHFFFAOYSA-N 0.000 description 1
- BCVLYTJAAOFMHN-UHFFFAOYSA-N 2-phenylpropylsulfamic acid Chemical compound CC(CNS(O)(=O)=O)c1ccccc1 BCVLYTJAAOFMHN-UHFFFAOYSA-N 0.000 description 1
- SYIUWAVTBADRJG-UHFFFAOYSA-N 2H-pyran-2,6(3H)-dione Chemical compound O=C1CC=CC(=O)O1 SYIUWAVTBADRJG-UHFFFAOYSA-N 0.000 description 1
- BUZICZZQJDLXJN-UHFFFAOYSA-N 3-azaniumyl-4-hydroxybutanoate Chemical compound OCC(N)CC(O)=O BUZICZZQJDLXJN-UHFFFAOYSA-N 0.000 description 1
- WQPMYSHJKXVTME-UHFFFAOYSA-N 3-hydroxypropane-1-sulfonic acid Chemical compound OCCCS(O)(=O)=O WQPMYSHJKXVTME-UHFFFAOYSA-N 0.000 description 1
- MDYZYBNXGNBMGE-UHFFFAOYSA-N 3-hydroxypropylsulfamic acid Chemical compound OCCCNS(O)(=O)=O MDYZYBNXGNBMGE-UHFFFAOYSA-N 0.000 description 1
- RXXCIBALSKQCAE-UHFFFAOYSA-N 3-methylbutoxymethylbenzene Chemical compound CC(C)CCOCC1=CC=CC=C1 RXXCIBALSKQCAE-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- 229940077398 4-methyl anisole Drugs 0.000 description 1
- SBUOHGKIOVRDKY-UHFFFAOYSA-N 4-methyl-1,3-dioxolane Chemical compound CC1COCO1 SBUOHGKIOVRDKY-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- COVZYZSDYWQREU-UHFFFAOYSA-N Busulfan Chemical compound CS(=O)(=O)OCCCCOS(C)(=O)=O COVZYZSDYWQREU-UHFFFAOYSA-N 0.000 description 1
- 229910001558 CF3SO3Li Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- 229910008963 Li2PO3F Inorganic materials 0.000 description 1
- 229910010227 LiAlF4 Inorganic materials 0.000 description 1
- 229910013375 LiC Inorganic materials 0.000 description 1
- 229910013684 LiClO 4 Inorganic materials 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- 229910012265 LiPO2F2 Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- MAVWOEHJRUHAKP-REOHCLBHSA-N N[C@@H](CCl)C(=O)NS(O)(=O)=O Chemical compound N[C@@H](CCl)C(=O)NS(O)(=O)=O MAVWOEHJRUHAKP-REOHCLBHSA-N 0.000 description 1
- 229910020808 NaBF Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- CDURIORCALPJSA-NFJMKROFSA-N [(2R)-2-amino-3-chlorobutanoyl]sulfamic acid Chemical compound CC([C@@H](C(=O)NS(=O)(=O)O)N)Cl CDURIORCALPJSA-NFJMKROFSA-N 0.000 description 1
- IPAIJDAJVYZJCA-UHFFFAOYSA-L [Mg+2].[O-]S(F)(=O)=O.[O-]S(F)(=O)=O Chemical compound [Mg+2].[O-]S(F)(=O)=O.[O-]S(F)(=O)=O IPAIJDAJVYZJCA-UHFFFAOYSA-L 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- BTGRAWJCKBQKAO-UHFFFAOYSA-N adiponitrile Chemical compound N#CCCCCC#N BTGRAWJCKBQKAO-UHFFFAOYSA-N 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical group 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- CHIHQLCVLOXUJW-UHFFFAOYSA-N benzoic anhydride Chemical compound C=1C=CC=CC=1C(=O)OC(=O)C1=CC=CC=C1 CHIHQLCVLOXUJW-UHFFFAOYSA-N 0.000 description 1
- QOFBKJJGYDCVLZ-UHFFFAOYSA-N bis(2-hydroxyethyl)sulfamic acid Chemical compound OCCN(S(O)(=O)=O)CCO QOFBKJJGYDCVLZ-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229960002092 busulfan Drugs 0.000 description 1
- ZTCLFSRIWSZUHZ-UHFFFAOYSA-N but-1-yne;carbonic acid Chemical compound CCC#C.OC(O)=O ZTCLFSRIWSZUHZ-UHFFFAOYSA-N 0.000 description 1
- WPYSBIGHCUQFNK-UHFFFAOYSA-N butan-2-ylsulfamic acid Chemical compound CCC(C)NS(O)(=O)=O WPYSBIGHCUQFNK-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- SYLNJGIBLUVXCG-UHFFFAOYSA-N carbonic acid;prop-1-yne Chemical compound CC#C.OC(O)=O SYLNJGIBLUVXCG-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- ZNEWHQLOPFWXOF-UHFFFAOYSA-N coenzyme M Chemical compound OS(=O)(=O)CCS ZNEWHQLOPFWXOF-UHFFFAOYSA-N 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- HCAJEUSONLESMK-UHFFFAOYSA-N cyclohexylsulfamic acid Chemical compound OS(=O)(=O)NC1CCCCC1 HCAJEUSONLESMK-UHFFFAOYSA-N 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- 229930007927 cymene Natural products 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- CLJWYXVAGLXDQW-UHFFFAOYSA-N dicyclohexylsulfamic acid Chemical compound C1CCCCC1N(S(=O)(=O)O)C1CCCCC1 CLJWYXVAGLXDQW-UHFFFAOYSA-N 0.000 description 1
- UAEWCWCMYQAIDR-UHFFFAOYSA-N diethyl methyl phosphate Chemical compound CCOP(=O)(OC)OCC UAEWCWCMYQAIDR-UHFFFAOYSA-N 0.000 description 1
- NXFNZLHFBJYCPG-UHFFFAOYSA-N diethylsulfamic acid Chemical compound CCN(CC)S(O)(=O)=O NXFNZLHFBJYCPG-UHFFFAOYSA-N 0.000 description 1
- 125000006001 difluoroethyl group Chemical group 0.000 description 1
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 1
- SXWUDUINABFBMK-UHFFFAOYSA-L dilithium;fluoro-dioxido-oxo-$l^{5}-phosphane Chemical compound [Li+].[Li+].[O-]P([O-])(F)=O SXWUDUINABFBMK-UHFFFAOYSA-L 0.000 description 1
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N dimethylformamide Substances CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 description 1
- 239000002001 electrolyte material Substances 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- VEWCYSOHRQNJRN-UHFFFAOYSA-N ethene;ethenyl hydrogen carbonate Chemical compound C=C.OC(=O)OC=C VEWCYSOHRQNJRN-UHFFFAOYSA-N 0.000 description 1
- JQVXMIPNQMYRPE-UHFFFAOYSA-N ethyl dimethyl phosphate Chemical compound CCOP(=O)(OC)OC JQVXMIPNQMYRPE-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- DTFIPEAYVOZSEU-UHFFFAOYSA-N ethyl(phenyl)sulfamic acid Chemical compound CCN(S(O)(=O)=O)C1=CC=CC=C1 DTFIPEAYVOZSEU-UHFFFAOYSA-N 0.000 description 1
- SIVVHUQWDOGLJN-UHFFFAOYSA-N ethylsulfamic acid Chemical compound CCNS(O)(=O)=O SIVVHUQWDOGLJN-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000007701 flash-distillation Methods 0.000 description 1
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical class [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 description 1
- 125000003784 fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical class OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- ZTOMUSMDRMJOTH-UHFFFAOYSA-N glutaronitrile Chemical compound N#CCCCC#N ZTOMUSMDRMJOTH-UHFFFAOYSA-N 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- DOUHZFSGSXMPIE-UHFFFAOYSA-N hydroxidooxidosulfur(.) Chemical compound [O]SO DOUHZFSGSXMPIE-UHFFFAOYSA-N 0.000 description 1
- 150000001261 hydroxy acids Chemical class 0.000 description 1
- KMOKWDFZXUHOQJ-UHFFFAOYSA-N hydroxy-(2-hydroxynaphthalen-1-yl)sulfamic acid Chemical compound ON(c1c(O)ccc2ccccc12)S(O)(=O)=O KMOKWDFZXUHOQJ-UHFFFAOYSA-N 0.000 description 1
- IIXGBDGCPUYARL-UHFFFAOYSA-N hydroxysulfamic acid Chemical compound ONS(O)(=O)=O IIXGBDGCPUYARL-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 238000006138 lithiation reaction Methods 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- 229910003473 lithium bis(trifluoromethanesulfonyl)imide Inorganic materials 0.000 description 1
- 229910001547 lithium hexafluoroantimonate(V) Inorganic materials 0.000 description 1
- 229910001540 lithium hexafluoroarsenate(V) Inorganic materials 0.000 description 1
- 229910001496 lithium tetrafluoroborate Inorganic materials 0.000 description 1
- ACFSQHQYDZIPRL-UHFFFAOYSA-N lithium;bis(1,1,2,2,2-pentafluoroethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)C(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)C(F)(F)F ACFSQHQYDZIPRL-UHFFFAOYSA-N 0.000 description 1
- IGILRSKEFZLPKG-UHFFFAOYSA-M lithium;difluorophosphinate Chemical compound [Li+].[O-]P(F)(F)=O IGILRSKEFZLPKG-UHFFFAOYSA-M 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- CAAULPUQFIIOTL-UHFFFAOYSA-N methyl dihydrogen phosphate Chemical compound COP(O)(O)=O CAAULPUQFIIOTL-UHFFFAOYSA-N 0.000 description 1
- MBABOKRGFJTBAE-UHFFFAOYSA-N methyl methanesulfonate Chemical compound COS(C)(=O)=O MBABOKRGFJTBAE-UHFFFAOYSA-N 0.000 description 1
- XTBFPVLHGVYOQH-UHFFFAOYSA-N methyl phenyl carbonate Chemical compound COC(=O)OC1=CC=CC=C1 XTBFPVLHGVYOQH-UHFFFAOYSA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- YACKEPLHDIMKIO-UHFFFAOYSA-N methylphosphonic acid Chemical compound CP(O)(O)=O YACKEPLHDIMKIO-UHFFFAOYSA-N 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- KERBAAIBDHEFDD-UHFFFAOYSA-N n-ethylformamide Chemical compound CCNC=O KERBAAIBDHEFDD-UHFFFAOYSA-N 0.000 description 1
- XFSXWFOXECTCPD-UHFFFAOYSA-N naphthalen-1-ylsulfamic acid Chemical compound C1=CC=C2C(NS(=O)(=O)O)=CC=CC2=C1 XFSXWFOXECTCPD-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- MHYFEEDKONKGEB-UHFFFAOYSA-N oxathiane 2,2-dioxide Chemical compound O=S1(=O)CCCCO1 MHYFEEDKONKGEB-UHFFFAOYSA-N 0.000 description 1
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Chemical class 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- MBDNRNMVTZADMQ-UHFFFAOYSA-N sulfolene Chemical compound O=S1(=O)CC=CC1 MBDNRNMVTZADMQ-UHFFFAOYSA-N 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- GREIWJODZCGLLG-UHFFFAOYSA-N thian-3-ylsulfamic acid Chemical compound OS(=O)(=O)NC1CCCSC1 GREIWJODZCGLLG-UHFFFAOYSA-N 0.000 description 1
- FKQPPNANKBHSRP-UHFFFAOYSA-N thiepan-4-ylsulfamic acid Chemical compound OS(=O)(=O)NC1CCCSCC1 FKQPPNANKBHSRP-UHFFFAOYSA-N 0.000 description 1
- FQHMOLJCIIYWSB-UHFFFAOYSA-N thietan-3-ylsulfamic acid Chemical compound OS(=O)(=O)NC1CSC1 FQHMOLJCIIYWSB-UHFFFAOYSA-N 0.000 description 1
- DBBZLRGXFRZKSB-UHFFFAOYSA-N thiocan-4-ylsulfamic acid Chemical compound OS(=O)(=O)NC1CCCCSCC1 DBBZLRGXFRZKSB-UHFFFAOYSA-N 0.000 description 1
- JEYSHPXCWFSACO-UHFFFAOYSA-N thiocan-5-ylsulfamic acid Chemical compound OS(=O)(=O)NC1CCCSCCC1 JEYSHPXCWFSACO-UHFFFAOYSA-N 0.000 description 1
- ZYSXHACXWDEZSM-UHFFFAOYSA-N thiolan-3-ylsulfamic acid Chemical compound C1(CSCC1)NS(O)(=O)=O ZYSXHACXWDEZSM-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- SFEBPWPPVGRFOA-UHFFFAOYSA-N trifluoromethanesulfinic acid Chemical compound OS(=O)C(F)(F)F SFEBPWPPVGRFOA-UHFFFAOYSA-N 0.000 description 1
- XJAAVVLEUZQVNJ-UHFFFAOYSA-N trifluoromethylphosphonic acid Chemical compound OP(O)(=O)C(F)(F)F XJAAVVLEUZQVNJ-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- PHYFQTYBJUILEZ-IUPFWZBJSA-N triolein Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(OC(=O)CCCCCCC\C=C/CCCCCCCC)COC(=O)CCCCCCC\C=C/CCCCCCCC PHYFQTYBJUILEZ-IUPFWZBJSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0566—Liquid materials
- H01M10/0568—Liquid materials characterised by the solutes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
- H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0566—Liquid materials
- H01M10/0567—Liquid materials characterised by the additives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0566—Liquid materials
- H01M10/0569—Liquid materials characterised by the solvents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M2300/00—Electrolytes
- H01M2300/0017—Non-aqueous electrolytes
- H01M2300/0025—Organic electrolyte
- H01M2300/0028—Organic electrolyte characterised by the solvent
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the present disclosure relates to a composition manufacturing method and a non-aqueous electrolyte.
- Patent Literature 1 proposes a method for producing a non-aqueous electrolyte having a low water content. This method comprises combining an acid containing an anion of an alkali metal salt (e.g., bis(fluorosulfonyl)imide (HFSI)), an alkali metal base (e.g., lithium carbonate), and a non-aqueous solvent with a non-aqueous solvent, water, and an acid.
- an alkali metal salt e.g., bis(fluorosulfonyl)imide (HFSI)
- an alkali metal base e.g., lithium carbonate
- step (a) mixing under conditions sufficient to produce a solution mixture comprising the alkali metal salt produced from the reaction of the alkali metal salt with an alkali metal base; and (b) generating a liquid. Moreover, in this method, a non-aqueous solvent is added to the generated non-aqueous electrolytic solution, and step (b) is repeated.
- step (b) the thermal stability of the solution mixture obtained in step (a) is not sufficient. It is necessary to perform step (b) at Therefore, in this method, the step (b) must be repeated many times in order to sufficiently reduce the water content of the non-aqueous electrolyte, and the efficiency of dehydration and replacement with a non-aqueous solvent is insufficient. there were.
- the present disclosure has been made in view of such points, and the object thereof is to provide a method for producing a composition that is highly efficient in dehydration and substitution with a non-aqueous solvent, and a non-aqueous electrolyte solution containing the composition. to provide.
- the present applicant discloses an electrolyte composition containing a sulfonylimide compound and an amidosulfuric acid component in International Publication No. 2020/241161 (application specification of PCT/JP2020/18124).
- the applicant also discloses a composition comprising an electrolyte, a solvent and an anion component in application specification PCT/JP2021/004071.
- the electrolyte contains a sulfonylimide salt (sulfonylimide compound), and the anion component is an acid having an acid dissociation constant pKa (acid dissociation constant pKa1 of the first stage for an acid that ionizes multiple times) of 0 or more and 6.5 or less.
- the component is contained at a concentration of 50 ppm by mass or more and 10000 ppm by mass or less with respect to the electrolyte.
- the composition containing the sulfonylimide compound has excellent storage stability even at high temperatures (the property that the decomposition reaction of the sulfonylimide compound is suppressed even when stored for a long period of time).
- the disclosed technique utilizes the above-described effect produced by the addition of an anion component and adds an anion component to a solution containing a sulfonylimide compound to improve the thermal stability of the solution.
- An operation of dehydration and replacement with a non-aqueous solvent was performed.
- the present disclosure is specifically as follows.
- a method for producing a composition of the present disclosure is a method for producing a composition containing an electrolyte, a non-aqueous solvent and an anion component
- the electrolyte has the general formula (1): LiN(XSO 2 )(FSO 2 ) (X represents a fluorine atom, an alkyl group having 1 to 6 carbon atoms or a fluoroalkyl group having 1 to 6 carbon atoms.) (1) including a sulfonylimide compound represented by The anion component has an acid dissociation constant pKa of its conjugate acid (acid dissociation constant pKa1 of the first stage for an acid that ionizes multiple times) of 0 or more and 6.5 or less, and a concentration of 10000 mass ppm or less with respect to the electrolyte. is contained in A dehydration step of adding the anion component to a solution containing the electrolyte and the non-aqueous solvent, dehydrating the solution, and substituting the solvent.
- the anion component in the manufacturing method, in the dehydration step, may be contained at a concentration of 4000 ppm by mass or more relative to the electrolyte. Moreover, the dehydration step may include a step of adding the anion component to the electrolyte at a concentration of 1000 ppm by mass or more.
- the anion component may be at least one selected from the group consisting of an amidosulfuric acid component, an acetic acid (carboxylic acid) component, a carbonic acid component and a phosphoric acid component.
- the anion component is at least one selected from the group consisting of a sulfonic acid component, a sulfinic acid component, a carboxylic acid component, a carbonic acid component, a phosphoric acid component, a phosphonic acid component, derivatives thereof, and salts thereof.
- the anion component contains at least one selected from the group consisting of amidosulfuric acid and salts thereof, amidosulfuric acid derivatives and salts thereof, and the amidosulfuric acid derivatives and salts thereof have the general formula (2):
- R 1 and R 2 are H (hydrogen atom), a hydroxyl group, an optionally substituted alkyl group having 1 to 10 carbon atoms, a cyclo represents an alkyl group, an aryl group having 6 to 16 carbon atoms, an aralkyl group having 7 to 16 carbon atoms or an alkanoyl group having 2 to 16 carbon atoms, which may contain a hetero atom, and R 1 and R 2 form a ring structure;
- R 1 and R 2 are the above groups other than H, they may be the same or different (R 1 and R 2 are not the same when H (R 1 and R 2 is not H at the same time)).
- M represents H (hydrogen atom) or metal atom.) It may be a compound represented by.
- the anion component may contain at least one selected from the group consisting of amidosulfuric acid and alkali metal salts of amidosulfuric acid.
- the anion component may contain an alkali metal amide sulfate.
- the non-aqueous solvent may contain a chain carbonate solvent.
- the moisture content of the composition may be 10000 ppm by mass or less.
- the non-aqueous electrolyte of the present disclosure includes the composition obtained by the production method described above.
- the method for producing the composition according to this embodiment includes at least a preparation step and a dehydration step. Through these steps, a composition containing an electrolyte, a non-aqueous solvent and an anion component, which will be described later, is obtained.
- a preparation step is a step of preparing a solution containing an electrolyte and water and/or a non-aqueous solvent. That is, in the preparation step, an aqueous electrolyte solution containing an electrolyte and water may be prepared, an electrolyte solution containing an electrolyte and a non-aqueous solvent may be prepared, or a hydrous electrolyte containing an electrolyte, water and a non-aqueous solvent may be prepared.
- a solution may be prepared.
- the electrolyte aqueous solution, the electrolyte solution, and the water-containing electrolyte solution are collectively referred to as "water-containing sulfonylimide solution".
- the method for producing a composition according to the present embodiment is a method premised on using a hydrous sulfonylimide solution.
- the electrolyte has the general formula (1): [Chemical 2] LiN( XSO2 )( FSO2 ) (1) (hereinafter referred to as "sulfonylimide compound (1)", fluorine-containing sulfonylimide salt).
- the sulfonylimide compound (1) is an electrolyte contained in the composition obtained by the production method according to this embodiment.
- X represents a fluorine atom, an alkyl group having 1 to 6 carbon atoms or a fluoroalkyl group having 1 to 6 carbon atoms.
- alkyl groups having 1 to 6 carbon atoms include methyl group, ethyl group, propyl group, isopropyl group, butyl group, pentyl group and hexyl group.
- alkyl groups having 1 to 6 carbon atoms linear or branched alkyl groups having 1 to 6 carbon atoms are preferred, and linear alkyl groups having 1 to 6 carbon atoms are more preferred.
- fluoroalkyl group having 1 to 6 carbon atoms examples include those in which some or all of the hydrogen atoms of an alkyl group having 1 to 6 carbon atoms are substituted with fluorine atoms.
- the fluoroalkyl group having 1 to 6 carbon atoms includes fluoromethyl group, difluoromethyl group, trifluoromethyl group, fluoroethyl group, difluoroethyl group, trifluoroethyl group, pentafluoroethyl group and the like.
- the fluoroalkyl group may be a perfluoroalkyl group.
- the substituent X is preferably a fluorine atom and a perfluoroalkyl group (for example, a perfluoroalkyl group having 1 to 6 carbon atoms such as a trifluoromethyl group, a pentafluoroethyl group, a heptafluoropropyl group, etc.), a fluorine atom, A trifluoromethyl group and a pentafluoroethyl group are more preferred, a fluorine atom and a trifluoromethyl group are even more preferred, and a fluorine atom is even more preferred.
- a perfluoroalkyl group for example, a perfluoroalkyl group having 1 to 6 carbon atoms such as a trifluoromethyl group, a pentafluoroethyl group, a heptafluoropropyl group, etc.
- the sulfonylimide compound (1) include lithium bis(fluorosulfonyl)imide (LiN(FSO 2 ) 2 , LiFSI), lithium (fluorosulfonyl)(methylsulfonyl)imide, lithium (fluorosulfonyl)(ethylsulfonyl) imide, lithium(fluorosulfonyl)(trifluoromethylsulfonyl)imide, lithium(fluorosulfonyl)(pentafluoroethylsulfonyl)imide, lithium(fluorosulfonyl)(heptafluoropropylsulfonyl)imide and the like.
- the sulfonylimide compounds may be used alone or in combination of two or more.
- lithium bis(fluorosulfonyl)imide lithium bis(fluorosulfonyl)imide, lithium (fluorosulfonyl)(trifluoromethylsulfonyl)imide, and lithium (fluorosulfonyl)(pentafluoroethylsulfonyl) ) imide, more preferably lithium bis(fluorosulfonyl)imide.
- lithium bis(fluorosulfonyl)imide lithium (fluorosulfonyl)(trifluoromethylsulfonyl)imide
- lithium (fluorosulfonyl)(pentafluoroethylsulfonyl) ) imide more preferably lithium bis(fluorosulfonyl)imide.
- hydrous sulfonylimide solutions those in which the sulfonylimide compound (1) contains LiN(FSO 2 ) 2 are preferred.
- sulfonylimide compound (1) a commercially available product may be used, or one synthesized by a conventionally known method may be used.
- a method for synthesizing the sulfonylimide compound (1) is not particularly limited, and all conventionally known methods can be employed.
- a powder (solid) of the sulfonylimide compound (1) is obtained by the conventionally known method described above.
- the sulfonylimide compound (1) can be used in the production solvent used for the production of the sulfonylimide compound (1) (the sulfonylimide compound (1) obtained by the above-described conventionally known production method) within the range that does not hinder the object of the present invention. contained residual solvent).
- the residual solvent includes the solvent used in the production reaction of the sulfonylimide compound (1), the solvent used in the purification step, and the like.
- water For example, water; alcohol solvents such as methanol, ethanol, propanol and butanol; carboxylic acid solvents such as formic acid and acetic acid; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and diisobutyl ketone; Nitrile solvents such as nitrile and benzonitrile; Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate; Aliphatic ether solvents such as diethyl ether, diisopropyl ether, t-butyl methyl ether and cyclopentyl methyl ether; Halogen-based solvents; nitro group-containing solvents such as nitromethane and nitrobenzene; nitrogen-containing organic solvents such as ethylformamide and N-methylpyrrolidone; dimethyl sulfoxide; glyme-based solvents, tolu
- aromatic hydrocarbon solvents pentane, hexane, heptane, octane, decane, dodecane, undecane, tridecane, decalin, 2,2,4,6,6-pentamethylheptane, isoparaffin (e.g., "Marcazol R” (Maruzen 2,2,4,6,6-pentamethylheptane manufactured by Petrochemical Co., Ltd., a mixture of 2,2,4,4,6-pentamethylheptane), "Isopar (registered trademark) G” (manufactured by ExxonMobil C9-C11 mixed isoparaffins), “Isopar (registered trademark) E” (C8-C10 mixed isoparaffins manufactured by ExxonMobil) Chain aliphatic hydrocarbon solvents such as dichloromethane, chloroform, 1,2-dichloroethane; cyclohexane, methylcyclohexane , 1,2-di
- the content of the sulfonylimide compound (1) in the hydrous sulfonylimide solution is preferably 10% by mass or more, from the viewpoint of sufficiently reducing the water content of the composition. More preferably 20% by mass or more, still more preferably 30% by mass or more.
- the content is preferably 40% by mass or more, more preferably 45% by mass or more, still more preferably 50% by mass or more, and even more preferably 60% by mass or more.
- the upper limit of the content is preferably 80% by mass or less from the viewpoint of sufficiently reducing the moisture content of the composition.
- the dehydration efficiency means the efficiency of dehydrating the hydrous sulfonylimide solution and substituting it with a non-aqueous solvent in the dehydration step described later, specifically by the method described in the examples below. It means the dehydration efficiency based on the obtained numerical value.
- Non-aqueous solvent The non-aqueous solvent is not particularly limited as long as it can dissolve and disperse the electrolyte (hereinafter also referred to as "electrolyte solvent").
- electrolyte solvent a non-aqueous solvent having a large dielectric constant, a high solubility of the electrolyte salt, a boiling point of 60° C. or higher at normal pressure, and a wide electrochemical stability range is suitable. More preferably, it is an organic solvent with a low water content.
- organic solvents examples include ethylene glycol dimethyl ether, ethylene glycol diethyl ether, tetrahydrofuran, 2-methyltetrahydrofuran, 2,6-dimethyltetrahydrofuran, tetrahydropyran, crown ether, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, Ether solvents such as 1,4-dioxane and 1,3-dioxolane; Chain carbonates such as dimethyl carbonate (DMC), ethylmethyl carbonate (EMC), diethyl carbonate (DEC), diphenyl carbonate, and methylphenyl carbonate ) solvent; saturated cyclic carbonate solvent such as ethylene carbonate, propylene carbonate, 2,3-dimethylethylene carbonate, 1,2-butylene carbonate and erythritan carbonate; vinylene carbonate, methyl vinylene carbonate, ethyl vinylene carbonate, 2- cyclic carbonate solvents having uns
- non-aqueous solvents chain carbonate solvents, carbonate solvents such as cyclic carbonate solvents, lactone solvents, ether solvents and chain ester solvents are preferred, and dimethyl carbonate, ethylmethyl carbonate, diethyl carbonate.
- ethylene carbonate, propylene carbonate, ⁇ -butyrolactone and ⁇ -valerolactone are more preferable, and carbonate solvents such as dimethyl carbonate, ethylmethyl carbonate, diethyl carbonate, ethylene carbonate and propylene carbonate are more preferable, and dimethyl carbonate, ethylmethyl carbonate, Chain carbonate-based solvents such as diethyl carbonate are even more preferred.
- the non-aqueous solvent preferably contains a carbonate solvent, more preferably a chain carbonate solvent, and even more preferably a chain carbonate solvent alone.
- the hydrous sulfonylimide solution may or may not contain an anion component, which will be described later.
- the content of the anion component is preferably 10000 ppm by mass or less, more preferably 7500 ppm by mass or less, and even more preferably 5500 ppm by mass or less relative to the electrolyte. It is preferably 4500 mass ppm or less, more preferably 4000 mass ppm or less, and particularly preferably 4000 mass ppm or less.
- the method of preparing the hydrous sulfonylimide solution is not particularly limited, and a method of dissolving the powder (solid) of the sulfonylimide compound (1) in water and/or a non-aqueous solvent; water and/or a non-aqueous solvent, LiOH or A method of mixing and reacting a lithium salt such as Li 2 CO 3 and HFSI [bis(fluorosulfonyl)imide] may be mentioned. Examples of the lithiation reaction of HFSI include methods described in International Publication No. 2014-035464.
- ⁇ Dehydration process> In the dehydration step, a non-aqueous solvent was added to the hydrous sulfonylimide solution obtained in the preparation step, and the water contained in the hydrous sulfonylimide solution and the added non-aqueous solvent were azeotropically removed for dehydration and addition. This is the step of substituting with a non-aqueous solvent.
- the term "water contained in the water-containing sulfonylimide solution” refers to the water used in the preparation step as well as the water contained in raw materials such as the sulfonylimide compound (1) and the non-aqueous solvent.
- the method for producing the composition according to the present embodiment is characterized in that an anion component is further added to the hydrous sulfonylimide solution together with the non-aqueous solvent before the operation of dehydration and replacement with the non-aqueous solvent.
- the solution for performing the operation of dehydration and substitution with a non-aqueous solvent contains, in addition to the sulfonylimide compound (1), water and a non-aqueous solvent, an anion component contains
- an anion component contains, when the hydrous sulfonylimide solution obtained in the preparation step is an electrolyte solution containing a non-aqueous solvent or a hydrous electrolyte solution (other than an aqueous electrolyte solution), when an anion component is added to these electrolyte solutions or hydrous electrolyte solutions, the non-aqueous No solvent may be added.
- a solution obtained by adding only an anion component to an electrolyte solution or a hydrous electrolyte solution may be used as the hydrous sulfonylimide solution for dehydration.
- the hydrous sulfonylimide solution for dehydration prepared as described above contains an anion component and is therefore excellent in thermal stability. As a result, even if the hydrous sulfonylimide solution for dehydration is dehydrated at a relatively high temperature and replaced with a non-aqueous solvent, the decomposition of LiFSI is suppressed.
- the addition of the anion component also improves the efficiency (dehydration efficiency) of dehydrating the hydrous sulfonylimide solution for dehydration and substituting it with a non-aqueous solvent.
- Advantageous effects of the addition of the anionic component reduce the labor required for the dehydration step and improve the productivity of the composition.
- the content of the sulfonylimide compound (1) in the hydrous sulfonylimide solution for dehydration is preferably 10% by mass from the viewpoint of sufficiently reducing the water content of the composition. Above, more preferably 20% by mass or more, still more preferably 30% by mass or more. Moreover, the content is preferably 40% by mass or more, more preferably 45% by mass or more, and still more preferably 50% by mass or more, from the viewpoint of improving dehydration efficiency.
- the upper limit of the content is preferably 60% by mass or less from the viewpoint of sufficiently reducing the moisture content of the composition.
- Non-aqueous solvent the same solvent (electrolyte solvent) as the non-aqueous solvent used in the preparation step can be used as the non-aqueous solvent (hereinafter also referred to as "addition solvent") added to the hydrous sulfonylimide solution as necessary.
- the water-containing sulfonylimide solution is an electrolyte solution containing a non-aqueous solvent or a water-containing electrolyte solution (other than an aqueous electrolyte solution)
- the added solvent may be the same as or different from the non-aqueous solvent used in the preparation step.
- chain carbonate (chain carbonate) solvents preferably contains a chain carbonate-based solvent, and more preferably contains only a chain carbonate-based solvent.
- the hydrous sulfonylimide solution obtained in the preparation step is used as a raw material, so the additive solvent does not need to be "completely" non-aqueous, and may contain water.
- the upper limit of the water content of the solvent to be added may be the saturated water content or less, preferably 1000 mass ppm or less, more preferably 500 mass ppm or less.
- the total amount of the added solvent is not particularly limited in terms of the lower limit, and may be adjusted as appropriate according to the type and amount of the residual solvent in the sulfonylimide compound (1). For example, it is preferably 10000 g or less, more preferably 1000 g or less, even more preferably 500 g or less, and still more preferably 200 g or less per 100 g of the sulfonylimide compound (1).
- the total amount of the additive solvent (the amount used) is, for example, preferably 1 to 1000 parts by mass, more preferably 5 to 500 parts by mass, and still more preferably 100 parts by mass of the sulfonylimide compound (1). is 10 to 300 parts by mass, more preferably 30 to 200 parts by mass.
- the anion component added to the hydrous sulfonylimide solution (hereinafter also referred to as “additional anion component”) has an acid dissociation constant pKa of its conjugate acid (acid dissociation constant pKa1 of the first stage for an acid that ionizes multiple times) ( Temperature: room temperature (25° C.), solvent: water) is an acid component (hereinafter also referred to as “specific acid component”) having a temperature of 0 to 6.5.
- the hydrous sulfonylimide solution for dehydration is excellent in thermal stability, since decomposition of LiFSI is suppressed even at relatively high temperatures (for example, 50° C. or higher). Further, the composition obtained after the dehydration step contains a specific acid component, so that the thermal stability is improved.
- an anion component means a specific acid (for example, amidosulfuric acid described later) or a salt thereof (for example, lithium amidosulfate described later) that can become an anion by dissociating ions in a solution. It refers to the partial structure of the acid component (in the case of the above example, the amidosulfate ion).
- the pKa of the conjugate acid means, for example, the pKa of “HA” when the anion (A ⁇ ) has a valence of 1, and the first dissociation constant pKa1 of “H 2 A” when it has a valence of 2.
- the specific acid components may be used alone (may be included), or may be used in combination of two or more (may be included in combination).
- the specific acid component is at least one selected from the group consisting of an amidosulfuric acid component, an acetic acid (carboxylic acid) component, a carbonic acid component and a phosphoric acid component. Further, the specific acid component (anion component) is selected from the group consisting of a sulfonic acid component, a sulfinic acid component, a carboxylic acid component, a carbonic acid component, a phosphoric acid component and a phosphonic acid component; derivatives thereof; and salts thereof. At least one. When two or more types of anion components are used in combination, a plurality of the same anion components may be selected, or a plurality of different types of anion components may be combined.
- the structure of the specific acid component is not particularly limited in the solution, and it may exist (contain) in the form of ions (may not be dissolved) or may be dissolved.
- the sulfonic acid component refers to a compound having a sulfonic acid group (sulfo group, —SO 3 H). mentioned.
- Amidosulfuric acid component Amidosulfuric acid components (amidosulfuric acid compounds, amidosulfuric compounds, amidosulfuric acid compounds) include amidosulfuric acid (sulfamic acid), amidosulfuric acid derivatives, salts thereof, and the like.
- Amidosulfuric acid derivatives include N-substituted amidosulfuric acid (N-substituted sulfamic acid, etc.).
- amidosulfuric acid derivatives may be compounds represented by general formula (2) (N-substituted amidosulfuric acid and salts thereof).
- general formula (2) is represented as a neutral type (R 1 R 2 NSO 2 (OM)), it may be a zwitterionic type, or both of these may be included.
- R 1 and R 2 are ⁇ H (hydrogen atom), a hydroxyl group, or an optionally substituted alkyl group having 1 to 10 carbon atoms, cycloalkyl group having 3 to 10 carbon atoms, aryl group having 6 to 16 carbon atoms, or aralkyl group having 7 to 16 carbon atoms. or an alkanoyl group having 2 to 16 carbon atoms, may contain a heteroatom, and may form a ring structure with R 1 and R 2 .
- R 1 and R 2 are the above groups other than H, they may be the same or different (R 1 and R 2 are not the same when they are H (R 1 and R 2 are not H at the same time )).
- M represents H (hydrogen atom) or a metal atom.
- examples of the alkyl group having 1 to 10 carbon atoms include a methyl group.
- the cycloalkyl group having 3 to 10 carbon atoms includes cyclopropyl group and the like.
- examples of the aryl group having 6 to 16 carbon atoms include a phenyl group and a naphthyl group.
- Examples of the aralkyl group having 7 to 16 carbon atoms include a benzyl group and a phenethyl group.
- the alkanoyl group having 2 to 16 carbon atoms includes benzoyl group and the like.
- These may be groups containing heteroatoms (nitrogen atom, oxygen atom, sulfur atom, phosphorus atom, etc.).
- groups containing heteroatoms include groups in which some of the carbon atoms are substituted with heteroatoms, thiocycloalkyl groups (groups corresponding to thiocycloalkanes such as thiepane, thiocane, thietane, thiane, and dithiane).
- substituents for these groups include, but are not particularly limited to, hydroxyl groups, halogen atoms, amino groups, carboxyl groups, alkoxy groups, acyl groups, and the like. These may be substituted singly or in combination of two or more.
- metal atoms examples include alkali metal atoms such as lithium, sodium, and potassium; alkaline earth metal atoms such as magnesium, calcium, and barium; and aluminum.
- amidosulfuric acid derivatives and salts thereof [N-substituted amidosulfuric acid and salts thereof (or compounds represented by the formula (2))] include N-hydroxyamidosulfuric acid; N-mono- or dialkylamidosulfuric acid [N - methylamidosulfuric acid, N-ethylamidosulfuric acid, N-(1-methylpropyl)amidosulfuric acid, N-(2-methylbutyl)amidosulfuric acid, N-(2,2-dimethylpropyl)amidosulfuric acid, N,N-diethylamidosulfuric acid, N-(3-hydroxypropyl)amidosulfuric acid, N-methyl-N-(2,3-dihydroxypropyl)amidosulfuric acid, N,N-bis(2-hydroxyethyl)amidosulfuric acid, N-(2,3-dihydroxy Propyl)amidosulfuric acid, N-(3-methoxy-4-methylphenyl
- N-mono- or dialkylamidosulfuric acid [N-benzylamidosulfuric acid, N-( ⁇ -methylphenethyl)amidosulfuric acid, etc.]; N-alkyl-N-arylamidosulfuric acid (N-ethyl-N-phenylamidosulfuric acid, etc.
- N-mono- or diacylamidosulfuric acid [N-benzoylamidosulfuric acid, N-(3-chloroalanyl)amidosulfuric acid, N-(3-chloro-3-methylalanyl)amidosulfuric acid, etc.]; N-thiocycloalkylamidosulfuric acid [ N-(thiepan-4-yl)amidosulfuric acid, N-thiocan-4-ylamidosulfuric acid, thiocan-5-ylamidosulfuric acid, N-thietane-3-ylamidosulfuric acid, N-1,3-dithian-5-ylamidosulfuric acid, N-(thiane-3-yl)amidosulfuric acid, N-(thiolan-3-yl)amidosulfuric acid, etc.]; and salts thereof.
- Amidosulfuric acid derivatives and salts thereof may be used alone, respectively, or two or more of them may be used in combination.
- the salt of the amidosulfuric acid component is not particularly limited.
- it may be a salt that uses amidosulfuric acid or an amidosulfuric acid derivative as either a base or an acid. a salt of an amidosulfuric acid derivative and a base).
- Specific salts include alkali metal salts such as lithium salts, sodium salts and potassium salts; alkaline earth metal salts such as magnesium salts, calcium salts and barium salts; and metal salts such as aluminum salts.
- alkali metal salts are preferred, and lithium salts are more preferred.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined. For example, when a lithium salt is used as the electrolyte, a lithium salt (lithium amidosulfate, etc.) may be used.
- the amidosulfuric acid component preferably contains at least one selected from the group consisting of amidosulfuric acid and its salts (alkali metal salts), amidosulfuric acid derivatives and its salts (alkali metal salts), amidosulfuric acid and alkali metal amidosulfuric acid More preferably, it contains at least one selected from the group consisting of salts (for example, lithium amidosulfate, etc.), and more preferably contains an alkali metal amidosulfate.
- salts for example, lithium amidosulfate, etc.
- the heteroatom-containing alkylsulfonic acid component is not particularly limited, and may be represented by general formula (4): [Chemical 4] R 4 —SO 2 (OM) (4) Compounds represented by and the like.
- R 4 represents an alkyl group having 1 to 6 carbon atoms containing a heteroatom (nitrogen atom, oxygen atom, sulfur atom, etc.). M is the same as above.
- heteroatom-containing alkylsulfonic acid components include isethionic acid (R 4 : C 2 H 4 OH, pKa: 1.4) and 3-hydroxypropanesulfonic acid (R 4 : C 3 H 6 OH, pKa: 1.7), taurine (2-aminoethanesulfonic acid, R 4 : C 2 H 4 NH 2 , pKa: 0.5), 2-mercaptoethanesulfonic acid (R 4 : C 2 H 4 SH, pKa: 1 .5); and salts thereof.
- the heteroatom-containing alkylsulfonic acid components may be used alone or in combination of two or more.
- alkali metal salts are preferred, and lithium salts are more preferred.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined.
- a lithium salt such as lithium heteroatom-containing alkylsulfonate
- a lithium salt such as lithium heteroatom-containing alkylsulfonate
- heteroatom-containing alkylene disulfonic acid component The heteroatom-containing alkylenedisulfonic acid component is not particularly limited and may be represented by general formula (5): [Chemical 5] (MO)SO2 - R5 - SO2(OM) ( 5 ) Compounds represented by and the like.
- R 5 represents a C 1-6 alkylene group containing a heteroatom (nitrogen atom, oxygen atom, sulfur atom, etc.).
- M is the same as above.
- heteroatom-containing alkylenedisulfonic acid component examples include general formula (5a): [Chemical 6] (HO)SO2 - CH2SCH2 - SO2 ( OH) (5a) A compound represented by (pKa: 0.2), general formula (5b): [Chemical 7] (HO)SO2 - CH2OCH2 - SO2 ( OH) (5b) Compound represented by (pKa: 0.2); and salts thereof and the like.
- the heteroatom-containing alkylenedisulfonic acid components may be used alone or in combination of two or more.
- alkali metal salts are preferred, and lithium salts are more preferred.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined.
- a lithium salt such as lithium heteroatom-containing alkylenedisulfonate
- a lithium salt such as lithium heteroatom-containing alkylenedisulfonate
- a sulfinic acid component refers to a compound having a —SO 2 H group, such as general formula (6): [Chemical 8] R6-SO(OM) ( 6 ) Compounds represented by and the like.
- R 6 represents a hydroxy group, an alkyl group having 1 to 6 carbon atoms (halogenated alkyl group) optionally having a halogen atom as a substituent, or an aryl group having 6 to 16 carbon atoms.
- the aryl group having 6 to 16 carbon atoms includes phenyl group, tolyl group, xylyl group, naphthyl group and the like.
- M is the same as above.
- the sulfinic acid component examples include sulfurous acid (R 6 : OH, pKa: 1.9), p-toluenesulfinic acid (R 6 : (CH 3 )C 6 H 3 (p-tolyl group), pKa: 2 .0), trifluoromethanesulfinic acid (R 6 : CF 3 , pKa: 2.1); and salts thereof.
- the sulfinic acid components may be used singly or in combination of two or more.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined.
- a lithium salt lithium sulfinate, etc.
- a lithium salt lithium sulfinate, etc.
- Carboxylic acids and salts thereof represented by the acetic acid component may be compounds represented by the general formula (3).
- R 3 is H (hydrogen atom), optionally substituted alkyl group having 1 to 10 carbon atoms, cycloalkyl group having 3 to 10 carbon atoms, 6 to 16 carbon atoms represents an aryl group, an aralkyl group having 7 to 16 carbon atoms, or an alkanoyl group having 2 to 16 carbon atoms, which may contain a heteroatom.
- M is the same as above.
- examples of the alkyl group having 1 to 10 carbon atoms include a methyl group.
- the cycloalkyl group having 3 to 10 carbon atoms includes cyclopropyl group and the like.
- examples of the aryl group having 6 to 16 carbon atoms include a phenyl group and a naphthyl group.
- Examples of the aralkyl group having 7 to 16 carbon atoms include a benzyl group and a phenethyl group.
- the alkanoyl group having 2 to 16 carbon atoms includes benzoyl group and the like.
- These may be groups containing heteroatoms (nitrogen atom, oxygen atom, sulfur atom, phosphorus atom, etc.).
- groups containing heteroatoms include groups in which some of the carbon atoms are substituted with heteroatoms, thiocycloalkyl groups (groups corresponding to thiocycloalkanes such as thiepane, thiocane, thietane, thiane, and dithiane).
- substituents for these groups include, but are not particularly limited to, hydroxyl groups, halogen atoms, amino groups, carboxyl groups, alkoxy groups, acyl groups, and the like. These may be substituted singly or in combination of two or more.
- carboxylic acids and salts thereof include saturated fatty acids (formic acid, acetic acid, propionic acid, butyric acid, etc.), unsaturated fatty acids (linolenic acid, linoleic acid, olein acid, etc.), hydroxy acids (lactic acid, citric acid, salicylic acid, etc.), dicarboxylic acids (oxalic acid, tartaric acid, phthalic acid, itaconic acid, maleic acid, etc.), amino acids (glycine, alanine, etc.), and salts thereof. be done. More specifically, alkyl monocarboxylic acids and salts thereof include acetic acid, trifluoroacetic acid; and salts thereof.
- Alkyldicarboxylic acids and salts thereof include malonic acid, maleic acid, succinic acid; and salts thereof.
- aromatic carboxylic acids and salts thereof include benzoic acid, salicylic acid; and salts thereof.
- aromatic dicarboxylic acids and salts thereof include phthalic acid, maleic acid; and salts thereof.
- Carboxylic acid and its salt may be used independently, respectively, and may use two or more types together.
- Specific salts include alkali metal salts (lithium salts, sodium salts, potassium salts, etc.), alkaline earth metal salts (magnesium salts, calcium salts, barium salts, etc.), aluminum salts, and the like. Among these, alkali metal salts are preferred, and lithium salts are more preferred.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined. For example, when using a lithium salt as the electrolyte, a lithium salt (such as lithium acetate) may be used.
- the carbonic acid component is not particularly limited, and examples thereof include carbonates, hydrogen carbonates, and the like. Carbonic acid components may be used alone or in combination of two or more.
- Specific salts include alkali metal salts (lithium salts, sodium salts, potassium salts, rubidium salts, cesium salts, etc.), alkaline earth metal salts (beryllium salts, magnesium salts, calcium salts, strontium salts, barium salts, etc.). etc. Among these, alkali metal salts are preferred, and lithium salts are more preferred.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined. For example, when using a lithium salt as the electrolyte, a lithium salt (such as lithium carbonate) may be used.
- the phosphoric acid component is not particularly limited, and includes various phosphates such as phosphates, hydrogen phosphates and dihydrogen phosphates; phosphate ester components and the like. Each phosphoric acid component may be used alone, or two or more of them may be used in combination.
- Specific salts include alkali metal salts (lithium salts, sodium salts, potassium salts, rubidium salts, cesium salts, etc.), alkaline earth metal salts (beryllium salts, magnesium salts, calcium salts, strontium salts, barium salts, etc.). etc. Among these, alkali metal salts are preferred, and lithium salts are more preferred.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined. For example, when using a lithium salt as the electrolyte, a lithium salt (such as lithium phosphate) may be used.
- the phosphate ester component is not particularly limited, and general formula (7): [Chemical 10] R 7 O-PO(OM) 2 (7)
- Examples include a phosphate diester component represented by the above.
- R 7 is an alkyl group having 1 to 6 carbon atoms (halogenated alkyl group) optionally having a halogen atom as a substituent or an aryl group having 6 to 16 carbon atoms. show.
- the aryl group having 6 to 16 carbon atoms includes phenyl group, tolyl group, xylyl group, naphthyl group and the like.
- two R 7 may form a ring structure.
- M is the same as above.
- two Ms may be the same (both are H (hydrogen atom) or metal atom) or may be different.
- phosphoric acid monoester component examples include monomethyl phosphate (R 7 : methyl group, pKa: 1.8); and salts thereof.
- phosphate diester component examples include formula (8a): [Chemical 12] (CF 3 O) 2 -PO(OH) (8a) A compound represented by (R 7 : CF 3 , pKa: 0.6), formula (8b):
- the phosphate ester component may be used alone or in combination of two or more.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined.
- a lithium salt lithium phosphate, etc.
- a lithium salt lithium phosphate, etc.
- R 8 is an alkyl group having 1 to 6 carbon atoms (halogenated alkyl group) optionally having a halogen atom as a substituent, an aryl group having 6 to 16 carbon atoms, a halogen atom or hydrogen. represents an atom.
- the aryl group having 6 to 16 carbon atoms includes phenyl group, tolyl group, xylyl group, naphthyl group and the like.
- M is the same as above. Two M may be the same (both are H (hydrogen atom) or metal atom) or may be different.
- the phosphonic acid component examples include methylphosphonic acid (R 8 : methyl group, pKa: 2.4), trifluoromethanephosphonic acid (R 8 : CF 3 , pKa: 1.2), phosphorous acid/ phosphite, R 8 : H, pKa: 1.3); and salts thereof.
- alkali metal salts are preferred, and lithium salts are more preferred.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined.
- a lithium salt such as lithium phosphonate
- Each of the phosphonic acid components may be used alone, or two or more of them may be used in combination.
- the salt may also be a salt corresponding to the cation of the electrolyte with which it is combined.
- a lithium salt such as lithium phosphonate
- a lithium salt such as lithium phosphonate
- a sulfonic acid component, a carbonic acid component and a phosphoric acid component are preferable from the viewpoint of improving the thermal stability of the hydrous sulfonylimide solution for dehydration and improving the dehydration efficiency. More preferred.
- the sulfonic acid components amidosulfuric acid components and heteroatom-containing alkyl sulfonic acid components are preferred.
- a combination of a sulfonic acid component (an amidosulfuric acid component or a heteroatom-containing alkylsulfonic acid component) and a carbonic acid component is preferred, and a combination of an amidosulfuric acid component and a carbonic acid component is more preferred.
- the added amount of the added anion component (specific acid component) (the total added amount when two or more types are used together) is determined by the thermal stability of the hydrous sulfonylimide solution for dehydration with respect to the electrolyte (sulfonylimide compound (1)). It is preferably 1000 ppm by mass or more, more preferably 2000 ppm by mass or more, and still more preferably 4000 ppm by mass or more, from the viewpoint of improving dehydration efficiency by improving properties.
- the upper limit of the amount added is preferably 30000 mass ppm or less, more preferably 25000 mass ppm or less, and even more preferably 10000 mass ppm or less.
- the addition amount of the additional anion component refers to the addition amount of the anion component intentionally added to the hydrous sulfonylimide solution in the dehydration step. That is, the dehydration step includes a step of adding (to the hydrous sulfonylimide solution or the hydrous sulfonylimide solution for dehydration) the added anion component at the above concentration (for example, a concentration of 1000 ppm by mass or more relative to the electrolyte). good too.
- the anion component (specific acid component) concentration in the hydrated sulfonylimide solution for dehydration is preferably 4000 ppm by mass or more, more preferably 4000 ppm by mass or more, relative to the electrolyte. is 5000 mass ppm or more, more preferably 8000 mass ppm or more, still more preferably 10000 mass ppm or more, still more preferably 20000 mass ppm or more.
- the concentration of the anion component is not the amount of the anion component added in the dehydration step, but the amount of the anion component present (the content of the anion component contained in the hydrous sulfonylimide solution for dehydration).
- the above addition amount may be a ratio in terms of a non-salt form (or free form, such as acid or acid derivative).
- the salts of the acids and derivatives thereof described above may be commercially available products or manufactured products.
- the method for dehydrating the hydrous sulfonylimide solution is not particularly limited.
- a hydrous sulfonylimide solution for dehydration which is obtained by adding a non-aqueous solvent and an anion component to the hydrous sulfonylimide solution, is distilled by a distillation method such as simple distillation, flash distillation, or continuous distillation. A dehydration method and the like can be mentioned.
- the same amount of the non-aqueous solvent as the distillate to be removed is continuously added.
- the distillate may be phase separated to remove the aqueous phase while the organic phase (the phase containing the non-aqueous solvent) is allowed to reflux.
- the reflux liquid may be returned to the fractionating tube (distillation column, column, etc.) or to the distillation bottoms containing the hydrous sulfonylimide solution for dehydration.
- the reflux liquid may be subjected to a separate dehydration operation and then returned to the distillation apparatus (either the fractionating tube or the distillation bottom liquid may be used).
- the dehydration operation includes the use of dehydrating agents such as molecular sieves.
- the temperature at which the distillate is phase-separated is not particularly limited, and may be appropriately adjusted depending on the non-aqueous solvent used. °C, more preferably 10°C to 40°C.
- the positional relationship between the organic phase to be refluxed and the aqueous phase to be removed may change depending on the type of non-aqueous solvent used. For example, when butyl acetate is used as the non-aqueous solvent, the organic phase is positioned at the top, and when dimethyl carbonate is used, the organic phase is positioned at the bottom.
- the distillation apparatus may be appropriately selected.
- the waste water phase removed to the outside of the system contains not a little non-aqueous solvent.
- the production method of the present disclosure may include a recovery step of recovering the non-aqueous solvent from the discarded aqueous phase after the dehydration step.
- a method for recovering the non-aqueous solvent from the waste water phase is not particularly limited, and an example thereof includes a method of distilling the waste water phase.
- the hydrous sulfonylimide solution for dehydration is dehydrated to obtain a composition containing the added non-aqueous solvent and the anion component.
- the dehydration step can be said to be a step of replacing the water in the hydrous sulfonylimide solution with a non-aqueous solvent.
- the dehydration step can be carried out under normal pressure or under reduced pressure (the dehydration step may be carried out under a combination of normal pressure and reduced pressure), but from the viewpoint of suppressing decomposition of the sulfonylimide compound (1) due to heat. Therefore, it is preferable to carry out the reaction under reduced pressure (dehydration under reduced pressure).
- the degree of pressure reduction is not particularly limited and may be adjusted appropriately according to the concentration of the sulfonylimide compound (1), the type and amount of the non-aqueous solvent, etc. For example, it is preferably 200 kPa or less, more preferably 40 kPa or less, and still more preferably 15 kPa. Below, it is particularly preferably 10 kPa or less. Moreover, the lower limit of the degree of pressure reduction is more than 5 kPa.
- the degree of pressure reduction in the dehydration process may be constant during the dehydration process, or may be changed within the above range.
- the heating temperature in the dehydration step may be adjusted as appropriate according to the degree of pressure reduction, the type and amount of the non-aqueous solvent, and is not particularly limited, but from the viewpoint of improving the dehydration efficiency, For example, it is preferably 20 to 110°C, more preferably 30 to 100°C.
- the hydrous sulfonylimide solution for dehydration has improved thermal stability due to the addition of an anion component.
- the hydrolysis of 1) is suppressed. That is, in order to improve the dehydration efficiency, the lower limit of the heating temperature may be set to 50° C. or higher.
- the heating temperature in the dehydration process may be constant during the dehydration process, or may be changed within the above range.
- the temperature may be gradually increased within the above range.
- the heating method is not particularly limited, and for example, by raising the oil bath temperature while a container such as a flask containing the hydrous sulfonylimide solution for dehydration is immersed in the oil bath, the internal temperature of the container (heating temperature equivalent) is raised.
- the temperature difference ( ⁇ t) between the flask internal temperature and the oil bath temperature during the dehydration operation is preferably 5 to 40°C, more preferably 10 to 40°C. , more preferably from 20 to 40°C, and even more preferably from 30 to 40°C.
- the treatment time in the dehydration step is not particularly limited and may be appropriately adjusted according to the degree of pressure reduction, heating temperature, type and amount of non-aqueous solvent, etc. For example, it is preferably 1 to 40 hours, more preferably 2 to 35 hours. hours, more preferably 5 to 30 hours.
- the device for decompression and/or heating used in the dehydration process may be appropriately selected according to the amount of solution, degree of decompression, heating temperature, and the like.
- a tank reactor, a pressure-reduced tank reactor, and the like can be mentioned.
- the dehydration efficiency in the dehydration step is specified by the dehydration efficiency obtained by the method for quantifying the dehydration efficiency described later and the method described in Examples in the method for producing a composition according to the present embodiment.
- the dehydration efficiency in the dehydration step is preferably 80 or less, more preferably 60 or less, still more preferably 50 or less, and even more preferably 30 or less.
- the total amount of non-aqueous solvent required to reach the target water content of the composition for example, 50 mass ppm or less
- total weight for quantification.
- the “total amount of non-aqueous solvent” in the formula (1) refers to the total amount of non-aqueous solvent (addition solvent) added to the hydrous sulfonylimide solution in the dehydration step.
- total amount of non-aqueous solvent may be the total amount of solvent added to the system for simple distillation, and the total amount of vapor evaporated from the reactor/still can (distillation device) for continuous distillation (hereinafter referred to as “total rise (also called steam volume).
- total rise also called steam volume.
- the method for producing the composition may contain other steps as long as the object of the present invention is not impaired. Other steps include filtration, column purification, activated carbon treatment, molecular sieve treatment, etc., in addition to the recovery step described above.
- a hydrous sulfonylimide solution containing the sulfonylimide compound (1) and water and/or a non-aqueous solvent (electrolyte solvent) is prepared, and the solution is A composition containing the sulfonylimide compound (1) as an electrolyte, a non-aqueous solvent and an anion component through a step (operation) of dehydrating a hydrous sulfonylimide solution for dehydration by adding an anion component and, if necessary, a non-aqueous solvent to you get something.
- the hydrous sulfonylimide solution for dehydration has high thermal stability due to the addition of an anion component, the dehydration operation can be performed at a relatively high temperature (for example, 50° C. or higher), resulting in excellent dehydration efficiency and productivity. also improve.
- the resulting composition not only has a sufficiently low moisture content, but also has excellent thermal stability.
- composition (Electrolytes)
- the content of the sulfonylimide compound (1) in the composition (relative to the total amount of 100% by mass of the components contained in the composition) (the total content when two or more are used in combination) makes the composition suitable for a wide range of electrolytic solution compositions. From the viewpoint of application, it is preferably 30% by mass or more, more preferably 35% by mass or more.
- the upper limit of the content is preferably 60% by mass or less, more preferably 55% by mass or less, from the viewpoint of improving the storage stability of the composition even at high temperatures.
- the composition may contain the sulfonylimide compound (1), but may contain other electrolytes (electrolytes other than the sulfonylimide compound (1)).
- Other electrolytes may be mixed with the composition, or may be mixed with the hydrous sulfonylimide solution and/or the hydrous sulfonylimide solution for dehydration in the manufacturing process of the composition.
- Other electrolytes include imide salts, non-imide salts, and the like.
- Examples of the imide salt include fluorine-containing sulfonylimide salts different from the sulfonylimide compound (1) (hereinafter referred to as "another sulfonylimide compound").
- Other sulfonylimide compounds include lithium bis(trifluoromethylsulfonyl)imide (LiN(CF 3 SO 2 ) 2 , hereinafter also referred to as “LiTFSI”); lithium bis(pentafluoroethylsulfonyl)imide; lithium bis(heptafluoro propylsulfonyl)imide; non-lithium salts of fluorine-containing sulfonylimides listed as sulfonylimide compound (1) (for example, salts in which lithium (ion) is substituted with a cation other than lithium ion in sulfonylimide compound (1)), etc.
- Salts substituted with cations other than lithium ions include alkali metal salts such as sodium salts, potassium salts, rubidium salts and cesium salts; alkaline earth metal salts such as beryllium salts, magnesium salts, calcium salts, strontium salts and barium salts. aluminum salts; ammonium salts; phosphonium salts and the like.
- alkali metal salts such as sodium salts, potassium salts, rubidium salts and cesium salts
- alkaline earth metal salts such as beryllium salts, magnesium salts, calcium salts, strontium salts and barium salts.
- aluminum salts such as ammonium salts; phosphonium salts and the like.
- Other sulfonylimide compounds may be used alone, respectively, or two or more of them may be used in combination.
- other sulfonylimide compounds may be commercially available products, or may be synthesized by conventionally known methods.
- Non-imide salts include salts of non-imide anions and cations (lithium ions and cations exemplified above).
- Examples of non-imide salts include fluorophosphorus salts such as LiPF 6 , LiPF 3 (CF 3 ) 3 , LiPF 3 (C 2 F 5 ) 3 , LiPF 3 (C 3 F 7 ) 3 and LiPF 3 (C 4 F 9 ) 3 .
- Acid compounds Fluoroboric acid compounds such as LiBF4 , LiBF( CF3 ) 3 , LiBF( C2F5 ) 3 , LiBF( C3F7 ) 3 , lithium hexafluoroarsenate ( LiAsF6 ), LiSbF6 , LiClO 4 , LiSCN, LiAlF4 , CF3SO3Li , LiC[(CF3SO2)3 ] , LiN ( NO2), LiN[(CN) 2 ;
- salts include salts in which lithium (ions) are substituted with the above-exemplified cations (e.g., NaBF 4 , NaPF 6 , NaPF 3 (CF 3 ) 3 , etc.)
- Non-imide salts may be used alone. Alternatively, two or more types may be used in combination.
- the non-imide salt may be a commercially available product or one synthesized by a conventionally known method.
- electrolytes sulfonylimide compound (1), other electrolytes, etc.
- electrolytes may exist (contain) in the form of ions in the composition.
- the non-aqueous solvent preferably contains a carbonate solvent, more preferably contains a chain carbonate solvent, and particularly preferably consists of only a chain carbonate solvent.
- the ratio of the carbonate-based solvent (preferably chain carbonate-based solvent) to the total non-aqueous solvent is not particularly limited, and is 10% by volume or more, 20% by volume or more, 30% by volume or more, 40% by volume or more, 50% by volume or more. , 60% by volume or more, 70% by volume or more, 80% by volume or more, 90% by volume or more, 95% by volume or more, 99% by volume or more, or 100% by volume (substantially only carbonate solvent (preferably substantially Only a chain carbonate-based solvent)) may be used.
- the concentration of the anion component (specific acid component) is 10000 mass ppm (1 mass%) or less with respect to the electrolyte (sulfonylimide compound (1)).
- the concentration of the anion component (specific acid component) relative to the electrolyte (sulfonylimide compound (1)) is preferably 50 ppm by mass or more from the viewpoint of improving the storage stability of the composition even at high temperatures. , more preferably 60 mass ppm or more.
- the upper limit of the concentration is 10000 mass ppm or less, preferably 8000 mass ppm or less, more preferably 6000 mass ppm or less, still more preferably 4000 mass ppm or less, and even more preferably 2000 mass ppm or less.
- the concentration of the specific acid component is preferably 1000 mass ppm or less, more preferably 500 mass ppm or less, and even more preferably 400 mass ppm or less.
- the above concentration may be a ratio in terms of non-salt form (or free form, such as acid or acid derivative).
- the composition may contain additives for the purpose of improving various characteristics of the lithium ion secondary battery.
- the additive may be added to the composition, or may be added to the hydrous sulfonylimide solution and/or the hydrous sulfonylimide solution for dehydration in the production process of the composition.
- Additives include succinic anhydride, glutaric anhydride, maleic anhydride, citraconic anhydride, glutaconic anhydride, itaconic anhydride, diglycolic anhydride, cyclohexanedicarboxylic anhydride, cyclopentanetetracarboxylic dianhydride, phenyl Carboxylic anhydride such as succinic anhydride; ethylene sulfite, 1,3-propanesultone, 1,4-butanesultone, methyl methanesulfonate, busulfan, sulfolane, sulfolene, dimethylsulfone, tetramethylthiuram monosulfide, trimethylene sulfur-containing compounds such as glycol sulfate; 1-methyl-2-pyrrolidinone, 1-methyl-2-piperidone, 3-methyl-2-oxazolidinone, 1,3-dimethyl-2-imidazolidinone, N-methylsuccinimide, etc
- saturated hydrocarbon compounds such as heptane, octane, and cycloheptane
- carbonate compounds such as vinylene carbonate, fluoroethylene carbonate (FEC), trifluoropropylene carbonate, phenylethylene carbonate and erythritan carbonate; , H 3 NSO 3
- sulfamate alkali metal salts such as lithium salt, sodium salt, potassium salt; alkaline earth metal salts such as calcium salt, strontium salt, barium salt; manganese salt, copper salt, zinc salt, other metal salts such as iron salts , cobalt salts , nickel salts; ammonium salts; guanidine salts , etc.
- fluorosulfonic acid compounds such as magnesium fluorosulfonate (Mg(FSO3)2 )
- fluorophosphate compounds such as lithium monofluorophosphate ( Li2PO3F ) and lithium difluorophosphate ( LiPO2F2 ); lithium Bis
- the moisture content (water concentration, water content) of the composition is preferably 10000 ppm by mass or less, more preferably 3000 ppm by mass, 1000 ppm by mass, 900 ppm by mass, 800 mass ppm, 700 mass ppm, 600 mass ppm, 500 mass ppm, 400 mass ppm, 300 mass ppm, 200 mass ppm, 100 mass ppm and 50 mass ppm.
- the water content of the composition is preferably as low as possible, may be below the detection limit, and may be substantially free of water (0 mass ppm).
- the water concentration can be measured by the method described in Examples below, for example, using a Karl Fischer moisture analyzer.
- the composition contains water content of 0.1 mass ppm or more, 0.3 mass ppm or more, 0.5 mass ppm or more, 0.7 mass ppm or more, 0.8 mass ppm or more, 1 mass ppm or more, 1 It may be contained at a concentration of 5 mass ppm or more, 2 mass ppm or more, 3 mass ppm or more, 5 mass ppm or more, 7 mass ppm or more, or 10 mass ppm or more.
- Each concentration of anionic impurities such as fluoride ion (F ⁇ ), chloride ion (Cl ⁇ ), sulfate ion (SO 4 2 ⁇ ), FSO 3 ⁇ (fluorosulfonate ion), etc.
- F ⁇ fluoride ion
- Cl ⁇ chloride ion
- SO 4 2 ⁇ sulfate ion
- FSO 3 ⁇ fluorosulfonate ion
- it is preferably 300 mass ppm or less, more preferably 200 mass ppm or less, even more preferably 100 mass ppm or less, still more preferably 80 mass ppm or less, and even more preferably 60 mass ppm. Below, particularly preferably, it is 40 mass ppm or less.
- Each concentration of anionic impurities is preferably as low as possible, may be below the detection limit, and may be substantially free of anionic impurities (0 mass ppm).
- the concentration of anionic impurities can be measured by the methods described in Examples below, such as ion chromatography and NMR.
- the composition configured as described above is a solution (liquid) composition because it contains the electrolyte, solvent, and anion component described above.
- the liquid composition may be used as a non-aqueous electrolyte or as a raw material for a non-aqueous electrolyte (electrolyte solution, electrolyte material).
- the non-aqueous electrolytic solution according to this embodiment includes the composition (liquid composition) obtained by the manufacturing method according to this embodiment described above. That is, the non-aqueous electrolyte is prepared using the composition.
- the composition may be used as it is, or the composition may be diluted by mixing the above-described non-aqueous solvent (electrolyte solvent).
- electrolyte solvents include carbonate-based solvents and other non-aqueous solvents.
- the solvent mixed with the composition may be the same solvent as the solvent constituting the composition, or may be a different solvent.
- the non-aqueous electrolytic solution may contain only the composition (consisting of only the composition), and if necessary, the composition may contain the above-described electrolyte or solvent, and the above-described additives as long as they are not harmful. It may further contain.
- all the items described in the manufacturing method and the obtained composition described above also apply to the non-aqueous electrolyte.
- LiFSI LiFSI aqueous solution
- LiFSI/H 2 O lithium bis(fluorosulfonyl)imide
- the quantitative lower limits are, for example, F ⁇ , Cl ⁇ , SO 4 2 ⁇ : 5 mass ppm, H 2 NSO 3 Li: 10 mass ppm. These lower limits of determination are the concentration in the solution, not the standard concentration of the electrolyte.
- the LiFSI concentration in the LiFSI aqueous solution was measured by 19 F-NMR.
- 19 F-NMR measurement was performed using "Unity Plus-400" manufactured by Varian (internal standard substance: trifluorotoluene, number of integrations: 64 times).
- the hydrous LiFSI solution is diluted 100 times with ultrapure water (over 18.2 ⁇ cm) to obtain a measurement solution, and an ion chromatography system ICS-3000 (manufactured by Nippon Dionex Co., Ltd.) is used to measure the content in the hydrous LiFSI solution.
- concentrations of H 2 NSO 3 Li (anion component), anionic impurities (F ⁇ , Cl ⁇ , SO 4 2 ⁇ , FSO 3 ⁇ etc.) and other impurities (FSO 2 NH 2 etc.) were measured.
- the measurement conditions are as follows.
- Example 1 In a dry room (dew point: ⁇ 40° C.), a 2-liter three-necked flask equipped with a thermometer for measuring the internal temperature, a solvent inlet, and a distillation column (filler: Sulzer EX, manufactured by Sulzer Japan Co., Ltd.; the same shall apply hereinafter).
- LiFSI aqueous solution LiFSI/H 2 O obtained in Synthesis Example 1 (preparation step) obtained in Synthesis Example 1 (preparation step)
- 678 g of DMC and 1.2 g of lithium carbonate as an anion component (2691 mass ppm per electrolyte) and 0.8 g of lithium amide sulfate (electrolyte 1792 mass ppm per unit) was added to prepare a hydrous LiFSI/DMC solution containing 28% by mass of LiFSI (a hydrous sulfonylimide solution for dehydration).
- a cooling pipe for condensing volatilized vapor is provided at the top of the distillation column.
- a Dean-Stark apparatus is provided as a phase separation tank for oil-water separation of the condensed liquid.
- the flask is immersed in an oil bath, and the temperature inside the flask is heated to 32° C. in the oil bath to azeotropically distill water together with DMC. rice field.
- the distillate gas passed through a distillation column, was condensed in a condenser (2° C.), and was phase-separated into an aqueous phase and a DMC phase in a Dean Stark chamber as a distillate.
- the aqueous phase was removed out of the system, and the DMC phase was returned to the top of the distillation column using a reflux pump and refluxed.
- Example 2 It was dehydrated and replaced with DMC under the same conditions as in Example 1, except that ⁇ t was changed from 15 to 20°C (dehydration step). The resulting suspension was filtered through a membrane filter to obtain a colorless and transparent LiFSI/DMC solution. The results of measuring the solution composition of the LiFSI/DMC solution and the concentration of anionic impurities in the electrolyte in the same manner as described above are shown below.
- Example 3 In a dry room (dew point: ⁇ 40° C.), 699 g of the LiFSI aqueous solution (LiFSI/H 2 O) obtained in Synthesis Example 1 (preparation step), 712 g of EMC, and lithium carbonate as an anion component were placed in the same apparatus as in Example 1. 1.2 g (3368 mass ppm per electrolyte) and 0.6 g lithium amidosulfate (1757 mass ppm per electrolyte) were added to prepare an EMC solution of hydrated LiFSI containing 25% by mass of LiFSI (hydrous sulfonylimide solution for dehydration). .
- the flask is immersed in an oil bath, and the temperature inside the flask is heated to 33° C. in the oil bath to azeotropically distill water together with EMC. rice field.
- the distillate gas passed through a distillation column, was condensed in a condenser (2° C.), and was phase-separated into a water phase and an EMC phase in a Dean Stark chamber as a distillate. Among them, the water phase was removed out of the system, and the EMC phase was returned to the top of the distillation column using a reflux pump and refluxed.
- Vacuum distillation (continuous distillation) was carried out for a total of 30 hours while gradually raising the temperature of the oil bath, thereby dehydrating and replacing with EMC.
- the internal temperature of the flask varied between 33°C and 64°C, and ⁇ t varied between 15 and 30°C.
- the above dehydration operation was defined as a dehydration step.
- the resulting suspension was filtered through a membrane filter to obtain a colorless and transparent LiFSI/EMC solution.
- the results of measuring the solution composition of the LiFSI/EMC solution and the concentration of anionic impurities in the electrolyte in the same manner as described above are shown below.
- Example 4 It was dehydrated and replaced with EMC under the same conditions as in Example 3, except that ⁇ t was changed from 15 to 20°C (dehydration step). The resulting suspension was filtered through a membrane filter to obtain a colorless and transparent LiFSI/EMC solution. The results of measuring the solution composition of the LiFSI/EMC solution and the concentration of anionic impurities in the electrolyte in the same manner as described above are shown below.
- Example 5 In a dry room (dew point: ⁇ 40° C.), 812 g of the LiFSI aqueous solution (LiFSI/H 2 O) obtained in Synthesis Example 2 (preparation step), 665 g of DMC and 15 of lithium carbonate as an anion component were placed in the same apparatus as in Example 1. 0 g (23383 mass ppm per electrolyte) was added to prepare a hydrous LiFSI/DMC solution containing 44 wt % LiFSI (a hydrous sulfonylimide solution for dehydration).
- the pressure in the flask was reduced to 8.5 kPa using a vacuum pump, the flask was immersed in an oil bath, and the temperature inside the flask was heated to 52 ° C. in the oil bath. operation was performed. While gradually raising the temperature of the oil bath, vacuum distillation (continuous distillation) was carried out for a total of 25 hours to dehydrate and replace with DMC. During the dehydration, the temperature inside the flask varied between 52°C and 84°C, and ⁇ t varied between 7 and 20°C. The above dehydration operation was defined as a dehydration step. The resulting suspension was filtered through a membrane filter to obtain a colorless and transparent LiFSI/DMC solution.
- Example 6 In a dry room (dew point: ⁇ 40° C.), 1263 g of the LiFSI aqueous solution (LiFSI/H 2 O) obtained in Synthesis Example 2 (preparation step), 1994 g of EMC, and 4 lithium carbonate as an anion component were placed in the same apparatus as in Example 1. .1 g (4108 wt ppm per electrolyte) was added to prepare a hydrous LiFSI/EMC solution containing 31 wt % LiFSI (a hydrous sulfonylimide solution for dehydration).
- Example 2 the pressure in the flask was reduced to 8 kPa using a vacuum pump, the flask was immersed in an oil bath, and the same operation as in Example 1 was performed except that the temperature inside the flask was heated to 71 ° C. in the oil bath. did Vacuum distillation (continuous distillation) was performed for a total of 15 hours while gradually raising the temperature of the oil bath to dehydrate and replace with EMC. During dehydration, the internal temperature of the flask varied between 49°C and 59°C, and ⁇ t varied between 22 and 31°C. The above dehydration operation was defined as a dehydration step. The resulting suspension was filtered through a membrane filter to obtain a colorless and transparent LiFSI/EMC solution.
- Example 7 In a dry room (dew point: ⁇ 40° C.), 1477 g of the hydrous LiFSI/EMC solution obtained in Synthesis Example 4 (preparation step) and 15.0 g of lithium carbonate as an anion component (25647 g per electrolyte) were placed in the same apparatus as in Example 1. mass ppm) was added to prepare a hydrous LiFSI/EMC solution containing 40% by mass of LiFSI (a hydrous sulfonylimide solution for dehydration).
- the pressure in the flask was reduced to 5.5 kPa using a vacuum pump, the flask was immersed in an oil bath, and the temperature inside the flask was heated to 58 ° C. in the oil bath. operation was performed. While gradually raising the temperature of the oil bath, vacuum distillation (continuous distillation) was performed for a total of 7 hours to dehydrate and replace with EMC. During dehydration, the internal temperature of the flask varied between 57°C and 64°C, and ⁇ t varied between 5 and 25°C. The above dehydration operation was defined as a dehydration step. The resulting suspension was filtered through a membrane filter to obtain a colorless and transparent LiFSI/EMC solution.
- Example 8> In a dry room (dew point: -40 ° C.), 51 g of the LiFSI aqueous solution obtained in Synthesis Example 5 (FSI concentration: 70 wt%, anion component content: 5822 ppm), 212 g of EMC, and lithium phosphate as an anion component were added to a 500 mL eggplant flask. 1.1 g (manufactured by Sigma-Aldrich, amount of anion component added during process (per electrolyte): 14233 ppm) was added to prepare a hydrous LiFSI/EMC solution containing 14% by mass of LiFSI (a hydrous sulfonylimide solution for dehydration).
- Example 9 In a dry room (dew point: -40 ° C.), 50 g of the LiFSI aqueous solution obtained in Synthesis Example 5 (FSI concentration: 70 wt%, anion component content: 5822 ppm) in a 500 mL eggplant flask, EMC 230 g, and lithium carbonate 0 as an anion component .52 g (addition amount of anion component during process (per electrolyte): 14733 ppm) and 0.63 g of 70% by mass isethionic acid aqueous solution (manufactured by Fuji Film Wako Pure Chemical, amount of anion component addition during process (per electrolyte): 12495 ppm)
- a hydrous LiFSI/EMC solution a hydrous sulfonylimide solution for dehydration
- the flask was immersed in an oil bath and heated to 25° C. (oil bath temperature: 60° C.) in the oil bath. Water was azeotropically distilled with DMC. After 20 minutes, the flask was depressurized and non-aqueous DMC (water content ⁇ 30 ppm by mass) was added, followed by distillation under reduced pressure again. This operation was repeated, and a cumulative total of 606.0 g of DMC was added.
- a part of the obtained solution was filtered with a membrane filter to obtain a colorless and transparent LiFSI/DMC solution containing 56% by mass of LiFSI.
- the water content of the LiFSI/EMC solution was measured in the same manner as described above, the water content was 115 mass ppm.
- Table 1 shows the number of times DMC was added, the total amount of DMC (additional total amount) at each time, the water content of the solution at each time, and the dehydration efficiency at each time.
- the dehydration efficiency in each time was calculated
- the dehydration efficiency means that the smaller the value, the higher the efficiency of dehydration and replacement with DMC.
- Dehydration efficiency "total amount of DMC required to reach the water content at each time” / "weight of LiFSI" (2)
- the flask was immersed in an oil bath and heated to 25° C. (oil bath temperature: 50° C.) in the oil bath. azeotropically distilled water with EMC.
- the distillate gas passed through a distillation column, was condensed in a condenser (2° C.), and was phase-separated into a water phase and an EMC phase in a Dean Stark chamber as a distillate. Among them, the water phase was removed out of the system, and the EMC phase was returned to the top of the distillation column using a reflux pump and refluxed. After 4.5 hours, the flask internal temperature reached 35 ° C.
- the LiFSI/EMC solution obtained above was concentrated at a pressure of 2.5 KPa and an oil bath temperature of 50°C. The resulting solution was filtered through a membrane filter to obtain 263.3 g of a colorless and transparent LiFSI/EMC solution.
- the solution composition of the concentrated LiFSI/EMC solution and the concentration of anionic impurities in the electrolyte were measured in the same manner as described above, and the results are shown below.
- Table 2 shows the type of solvent, the type and amount of anion component added, and the dehydration efficiency of each LiFSI solution (composition) obtained through the adjustment process and the dehydration process.
- the amount of anion component added during the dehydration process per electrolyte is the weight of the anion component added to the hydrous LiFSI solution when preparing the hydrous sulfonylimide solution for dehydration before dehydration (a plurality of anion components is added, the sum of these weights).
- the anion component content during the dehydration process per electrolyte is a calculated value based on the total amount of the anion component content in the raw material of the hydrous LiFSI solution and the above anion component addition amount.
- the dehydration efficiency was determined by the following formula (3).
- the dehydration efficiency means that the smaller the value, the higher the efficiency of dehydration and replacement with a non-aqueous solvent.
- [Number 3] Dehydration efficiency "Total amount of added solvent or total amount of rising steam required for water content to reach 50 ppm by mass”/"Weight of LiFSI" (3)
- the total amount of the non-aqueous solvent in Comparative Example 1 is the amount required for the water content to reach 115 ppm by mass.
- the anion component in the production method of each example, in the dehydration step, is contained at a concentration of 4000 ppm by mass or more with respect to LiFSI (electrolyte) (the total concentration when two or more types are used together). It can be said that the dehydration efficiency is high.
- the set pressure degree of pressure reduction
- the heating temperature can be set relatively high (for example, 50 ° C. or higher), so not only the dehydration efficiency , the production efficiency (productivity) of the composition is also excellent.
- the present disclosure is suitable for non-aqueous electrolytes used in lithium-ion secondary batteries and the like, and compositions that can be used as raw materials thereof.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Secondary Cells (AREA)
Abstract
Description
前記電解質は、一般式(1):
LiN(XSO2)(FSO2) (Xはフッ素原子、炭素数1~6のアルキル基又は炭素数1~6のフルオロアルキル基を示す。) (1)で表されるスルホニルイミド化合物を含み、
前記アニオン成分は、その共役酸の酸解離定数pKa(複数電離する酸については第1段階の酸解離定数pKa1)が0以上6.5以下であり、前記電解質に対して10000質量ppm以下の濃度で含まれており、
前記電解質及び前記非水系溶媒を含有する溶液に前記アニオン成分を加えて脱水し、溶媒置換する脱水工程を含む。
で表される化合物であってもよい。前記アニオン成分は、アミド硫酸及びアミド硫酸のアルカリ金属塩からなる群より選択される少なくとも1種を含むものでもよい。前記アニオン成分は、アミド硫酸アルカリ金属塩を含むものでもよい。前記非水系溶媒は鎖状カーボネート系溶媒を含むものでもよい。組成物の含水率が10000質量ppm以下であってもよい。前記脱水工程において、以下の数式:脱水効率=「組成物の目標とする含水率に到達するまでに要した非水系溶媒の総量」/「電解質の重量」により求められる脱水効率が80以下であってもよい。
本実施形態に係る組成物の製造方法は、調製工程と、脱水工程とを少なくとも含む。これら工程を経て、後述する電解質、非水系溶媒及びアニオン成分を含有する組成物が得られる。
調製工程は、電解質と、水及び/又は非水系溶媒とを含有する溶液を調製する工程である。つまり、調製工程では、電解質及び水を含有する電解質水溶液を調製してもよく、電解質及び非水系溶媒を含有する電解質溶液を調製してもよく、電解質、水及び非水系溶媒を含有する含水電解質溶液を調製してもよい。以下、電解質水溶液、電解質溶液及び含水電解質溶液をまとめて「含水スルホニルイミド溶液」ともいう。このように、本実施形態に係る組成物の製造方法は、含水スルホニルイミド溶液を用いることを前提とする方法である。
電解質は、一般式(1):
[化2]
LiN(XSO2)(FSO2) (1)
で表されるスルホニルイミド化合物(以下「スルホニルイミド化合物(1)」という、フッ素含有スルホニルイミド塩)を含む。
非水系溶媒は、電解質を溶解、分散できる溶媒(以下「電解液溶媒」ともいう)であれば特に限定されない。非水系溶媒としては、誘電率が大きく、電解質塩の溶解性が高く、常圧における沸点が60℃以上であり、且つ、電気化学的安定範囲が広い非水系溶媒が好適である。より好ましくは、含有水分量が低い有機溶媒である。このような有機溶媒としては、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、テトラヒドロフラン、2-メチルテトラヒドロフラン、2,6-ジメチルテトラヒドロフラン、テトラヒドロピラン、クラウンエーテル、トリエチレングリコールジメチルエーテル、テトラエチレングリコールジメチルエ-テル、1,4-ジオキサン、1,3-ジオキソラン等のエーテル系溶媒;炭酸ジメチル(DMC)、炭酸エチルメチル(EMC)、炭酸ジエチル(DEC)、炭酸ジフェニル、炭酸メチルフェニル等の鎖状炭酸エステル(カーボネート)系溶媒;炭酸エチレン、炭酸プロピレン、2,3-ジメチル炭酸エチレン、炭酸1,2-ブチレン及びエリスリタンカーボネート等の飽和環状炭酸エステル系溶媒;炭酸ビニレン、メチルビニレンカーボネート、エチルビニレンカーボネート、2-ビニル炭酸エチレン及びフェニルエチレンカーボネート等の不飽和結合を有する環状炭酸エステル系溶媒;フルオロエチレンカーボネート、4,5-ジフルオロエチレンカーボネート及びトリフルオロプロピレンカーボネート等のフッ素含有環状炭酸エステル系溶媒;安息香酸メチル、安息香酸エチル等の芳香族カルボン酸エステル系溶媒;γ-ブチロラクトン、γ-バレロラクトン、δ-バレロラクトン等のラクトン系溶媒;リン酸トリメチル、リン酸エチルジメチル、リン酸ジエチルメチル、リン酸トリエチル等のリン酸エステル系溶媒;アセトニトリル、プロピオニトリル、メトキシプロピオニトリル、グルタロニトリル、アジポニトリル、2-メチルグルタロニトリル、バレロニトリル、ブチロニトリル、イソブチロニトリル等のニトリル系溶媒;ジメチルスルホン、エチルメチルスルホン、ジエチルスルホン、スルホラン、3-メチルスルホラン、2,4-ジメチルスルホラン等の硫黄化合物系溶媒;ベンゾニトリル、トルニトリル等の芳香族ニトリル系溶媒;ニトロメタン、1,3-ジメチル-2-イミダゾリジノン、1,3-ジメチル-3,4,5,6-テトラヒドロ-2(1H)-ピリミジノン、3-メチル-2-オキサゾリジノン等;酢酸エチル、酢酸ブチル、プロピオン酸プロピル等の鎖状エステル系溶媒等が挙げられる。これら溶媒は、それぞれ単独で用いてもよく、2種類以上を併用してもよい。
含水スルホニルイミド溶液を調製する方法は、特に限定されず、スルホニルイミド化合物(1)の粉体(固体)を水及び/又は非水系溶媒に溶解する方法;水及び/又は非水系溶媒、LiOHやLi2CO3等のリチウム塩及びHFSI〔ビス(フルオロスルホニル)イミド〕を混合し反応させる方法等が挙げられる。HFSIのリチウム化反応としては、例えば、国際公開第2014-035464号等に記載の方法等が挙げられる。
脱水工程は、調製工程で得られた含水スルホニルイミド溶液に非水系溶媒を加えて、含水スルホニルイミド溶液に含まれる水と、添加した非水系溶媒とを共沸により除去して脱水し、添加した非水系溶媒に置換する工程である。なお、「含水スルホニルイミド溶液に含まれる水」とは、調製工程で使用される水の他に、スルホニルイミド化合物(1)や非水系溶媒等の原料に含まれる水分をいう。ここで、本実施形態に係る組成物の製造方法では、脱水して非水系溶媒に置換する操作の前に、含水スルホニルイミド溶液に非水系溶媒と共に、アニオン成分をさらに加える点に特徴を有する。つまり、脱水して非水系溶媒に置換する操作を行うための溶液(以下「脱水用含水スルホニルイミド溶液」ともいう)は、スルホニルイミド化合物(1)、水及び非水系溶媒に加えて、アニオン成分を含有する。なお、調製工程で得られた含水スルホニルイミド溶液が非水系溶媒を含有する電解質溶液又は含水電解質溶液(電解質水溶液以外)の場合、これら電解質溶液又は含水電解質溶液にアニオン成分を加えるときに、非水系溶媒を加えなくてもよい。つまり、電解質溶液又は含水電解質溶液にアニオン成分のみを加えて得られた溶液を脱水用含水スルホニルイミド溶液として用いてもよい。以上のように調製される脱水用含水スルホニルイミド溶液は、アニオン成分を含有するため、熱安定性に優れる。その結果、脱水用含水スルホニルイミド溶液を比較的高い温度で脱水して非水系溶媒に置換しても、LiFSIの分解が抑制される。また、アニオン成分添加により、脱水用含水スルホニルイミド溶液を脱水して非水系溶媒に置換する効率(脱水効率)も向上する。アニオン成分添加による有利な効果によって、脱水工程の操作の手間が軽減し、組成物の生産性が向上する。
脱水工程において、必要に応じて、含水スルホニルイミド溶液に添加する非水系溶媒(以下「添加溶媒」ともいう)は、調製工程で用いられる非水系溶媒と同様の溶媒(電解液溶媒)を使用できる。含水スルホニルイミド溶液が非水系溶媒を含有する電解質溶液又は含水電解質溶液(電解質水溶液以外)の場合、添加溶媒は、調製工程で用いた非水系溶媒と同じあってもよく、異なっていてもよい。
脱水工程において、含水スルホニルイミド溶液に添加するアニオン成分(以下「添加アニオン成分」ともいう)は、その共役酸の酸解離定数pKa(複数電離する酸については第1段階の酸解離定数pKa1)(温度:室温(25℃)、溶媒:水)が0以上6.5以下の酸成分(以下「特定の酸成分」ともいう)である。アニオン成分添加により、脱水用含水スルホニルイミド溶液は、比較的高温(例えば50℃以上)でもLiFSIの分解が抑制され、熱安定性に優れる。そして、脱水工程後に得られる組成物は、特定の酸成分を含有するため、熱安定性が向上する。
(https://organicchemistrydata.org/hansreich/resources/pka/pka_data/pka-compilation-williams.pdf)。特定の酸成分は、それぞれ単独で用いてもよく(含んでいてもよく)、2種類以上を併用してもよい(組み合わせて含んでいてもよい)。具体的には、特定の酸成分(アニオン成分)は、アミド硫酸成分、酢酸(カルボン酸)成分、炭酸成分及びリン酸成分からなる群より選択される少なくとも1種である。また、特定の酸成分(アニオン成分)は、スルホン酸成分、スルフィン酸成分、カルボン酸成分、炭酸成分、リン酸成分及びホスホン酸成分;これらの誘導体;並びにこれらの塩からなる群より選択される少なくとも1種である。2種類以上のアニオン成分を併用する場合、同一のアニオン成分から複数選択してもよく、異なる種類のアニオン成分を複数組み合わせてもよい。なお、特定の酸成分は、溶液中において、その構造は特に限定されず、イオンの形態で存在(含有)していてもよく(溶解していなくてもよく)、溶解していてもよい。
スルホン酸成分は、スルホン酸基(スルホ基、-SO3H)を有する化合物をいい、例えば、アミド硫酸(アミドスルホン酸)成分、ヘテロ原子含有アルキルスルホン酸成分、ヘテロ原子含有アルキレンジスルホン酸等が挙げられる。
アミド硫酸成分(アミド硫酸化合物、アミド硫酸系化合物、アミド硫酸類)としては、アミド硫酸(スルファミン酸)、アミド硫酸誘導体、及びこれらの塩等が挙げられる。
・H(水素原子)、
・ヒドロキシル基、又は
・置換基を有していてもよい炭素数1~10のアルキル基、炭素数3~10のシクロアルキル基、炭素数6~16のアリール基、炭素数7~16のアラルキル基若しくは炭素数2~16のアルカノイル基を表し、ヘテロ原子を含んでいてもよく、R1とR2で環構造を形成していてもよい。R1、R2は、H以外の上記基のとき、同一でもよく、異なっていてもよい(R1、R2は、Hのとき、同一ではない(R1及びR2は同時にHではない))。Mは、H(水素原子)又は金属原子を表す。
ヘテロ原子含有アルキルスルホン酸成分としては特に限定されず、一般式(4):
[化4]
R4-SO2(OM) (4)
で表される化合物等が挙げられる。一般式(4)中、R4はヘテロ原子(窒素原子、酸素原子、硫黄原子等)を含む炭素数1~6のアルキル基を表す。Mは、前記と同じ。
ヘテロ原子含有アルキレンジスルホン酸成分としては特に限定されず、一般式(5):
[化5]
(MO)SO2-R5-SO2(OM) (5)
で表される化合物等が挙げられる。一般式(5)中、R5はヘテロ原子(窒素原子、酸素原子、硫黄原子等)を含む炭素数1~6のアルキレン基を表す。Mは、前記と同じ。
[化6]
(HO)SO2-CH2SCH2-SO2(OH) (5a)
で表される化合物(pKa:0.2)、一般式(5b):
[化7]
(HO)SO2-CH2OCH2-SO2(OH) (5b)
で表される化合物(pKa:0.2);及びこれらの塩等が挙げられる。ヘテロ原子含有アルキレンジスルホン酸成分は、それぞれ単独で用いてもよく、2種類以上を併用してもよい。
スルフィン酸成分は、-SO2H基を有する化合物をいい、例えば一般式(6):
[化8]
R6-SO(OM) (6)
で表される化合物等が挙げられる。一般式(6)中、R6はヒドロキシ基、置換基としてハロゲン原子を有していてもよい炭素数1~6のアルキル基(ハロゲン化アルキル基)又は炭素数6~16のアリール基を表す。炭素数6~16のアリール基としては、フェニル基、トリル基、キシリル基、ナフチル基等が挙げられる。Mは、前記と同じ。
酢酸成分として代表されるカルボン酸及びその塩は、一般式(3)で表される化合物でもよい。
R3COOM (3)
一般式(3)中、R3はH(水素原子)、置換基を有していてもよい、炭素数1~10のアルキル基、炭素数3~10のシクロアルキル基、炭素数6~16のアリール基、炭素数7~16のアラルキル基、炭素数2~16のアルカノイル基を表し、ヘテロ原子を含んでいてもよい。Mは、前記と同じ。
炭酸成分としては特に限定されず、炭酸塩、炭酸水素塩等が挙げられる。炭酸成分は、それぞれ単独で用いてもよく、2種類以上を併用してもよい。
リン酸成分としては特に限定されず、リン酸塩、リン酸水素塩、リン酸二水素塩等の各種リン酸塩;リン酸エステル成分等が挙げられる。リン酸成分は、それぞれ単独で用いてもよく、2種類以上を併用してもよい。
リン酸エステル成分としては特に限定されず、一般式(7):
[化10]
R7O-PO(OM)2 (7)
で表されるリン酸モノエステル成分、一般式(8):
[化11]
(R7O)2-PO(OM) (8)
で表されるリン酸ジエステル成分等が挙げられる。一般式(7)及び(8)中、R7は置換基としてハロゲン原子を有していてもよい炭素数1~6のアルキル基(ハロゲン化アルキル基)又は炭素数6~16のアリール基を表す。炭素数6~16のアリール基としては、フェニル基、トリル基、キシリル基、ナフチル基等が挙げられる。一般式(8)において、2つのR7で環構造を形成していてもよい。Mは、前記と同じ。一般式(7)において、2つのMは、同一(共に、H(水素原子)又は金属原子)でもよく、異なっていてもよい。
[化12]
(CF3O)2-PO(OH) (8a)
で表される化合物(R7:CF3、pKa:0.6)、式(8b):
ホスホン酸成分としては特に限定されず、一般式(9):
[化14]
R8-PO(OM)2 (9)
で表される化合物等が挙げられる。一般式(9)中、R8は置換基としてハロゲン原子を有していてもよい炭素数1~6のアルキル基(ハロゲン化アルキル基)、炭素数6~16のアリール基、ハロゲン原子又は水素原子を表す。炭素数6~16のアリール基としては、フェニル基、トリル基、キシリル基、ナフチル基等が挙げられる。Mは、前記と同じ。2つのMは、同一(共に、H(水素原子)又は金属原子)でもよく、異なっていてもよい。
含水スルホニルイミド溶液を脱水する方法は特に限定されず、例えば、含水スルホニルイミド溶液に非水系溶媒及びアニオン成分を加えた脱水用含水スルホニルイミド溶液を単蒸留、フラッシュ蒸留、連続蒸留等の蒸留方法によって脱水する方法等が挙げられる。
脱水工程における脱水効率として、本実施形態に係る組成物の製造方法では、後述の脱水効率を定量化する方法及び実施例で記載の方法により求めた脱水効率により特定される。脱水工程における脱水効率は、好ましくは80以下、より好ましくは60以下、さらに好ましくは50以下、さら一層好ましくは30以下である。
[数1]
・脱水効率=「組成物の目標とする含水率に到達するまでに要した非水系溶媒の総量」/「電解質の重量」 (1)
組成物の製造方法は、本発明の目的を阻害しない範囲内で、その他の工程を含んでいてもよい。その他の工程としては、前記の回収工程の他、ろ過、カラム精製、活性炭処理、モレキュラーシーブ処理等が挙げられる。
(電解質)
組成物における(組成物に含まれる成分の総量100質量%に対する)スルホニルイミド化合物(1)の含有量(2種類以上を併用する場合は含有量の合計)は、組成物を幅広い電解液組成に適用する観点から、好ましくは30質量%以上、さらに好ましくは35質量%以上である。当該含有量の上限値は、高温でも組成物の保存安定性を向上する観点から、好ましくは60質量%以下、より好ましくは55質量%以下である。
非水系溶媒は、カーボネート系溶媒を含むことが好ましく、鎖状カーボネート系溶媒を含むことがより好ましく、鎖状カーボネート系溶媒のみからなることが特に好ましい。
アニオン成分(特定の酸成分)の濃度は、電解質(スルホニルイミド化合物(1))に対して10000質量ppm(1質量%)以下である。具体的には、アニオン成分(特定の酸成分)の濃度は、電解質(スルホニルイミド化合物(1))に対して、高温でも組成物の保存安定性を向上する観点から、好ましくは50質量ppm以上、より好ましくは60質量ppm以上である。また、当該濃度の上限値は、10000質量ppm以下、好ましくは8000質量ppm以下、より好ましくは6000質量ppm以下、さらに好ましくは4000質量ppm以下、さらに一層好ましくは2000質量ppm以下である。なお、非水系溶媒に含まれるカーボネート系溶媒が鎖状カーボネート系溶媒のみからなる場合又は非水系溶媒自体が鎖状カーボネート系溶媒のみからなる場合、特定の酸成分の濃度が比較的低くても高温での組成物の保存安定性が向上する。この場合、特定の酸成分の濃度における上限値は、好ましくは1000質量ppm以下、より好ましくは500質量ppm以下、さらに好ましくは400質量ppm以下である。
組成物は、リチウムイオン二次電池の各種特性の向上を目的とする添加剤を含んでいてもよい。添加剤は、組成物に添加してもよく、組成物の製造工程において含水スルホニルイミド溶液及び/又は脱水用含水スルホニルイミド溶液に添加してもよい。添加剤としては、無水コハク酸、無水グルタル酸、無水マレイン酸、無水シトラコン酸、無水グルタコン酸、無水イタコン酸、無水ジグリコール酸、シクロヘキサンジカルボン酸無水物、シクロペンタンテトラカルボン酸二無水物、フェニルコハク酸無水物等のカルボン酸無水物;エチレンサルファイト、1,3-プロパンスルトン、1,4-ブタンスルトン、メタンスルホン酸メチル、ブサルファン、スルホラン、スルホレン、ジメチルスルホン、テトラメチルチウラムモノスルフィド、トリメチレングリコール硫酸エステル等の含硫黄化合物;1-メチル-2-ピロリジノン、1-メチル-2-ピペリドン、3-メチル-2-オキサゾリジノン、1,3-ジメチル-2-イミダゾリジノン、N-メチルスクシンイミド等の含窒素化合物;ヘプタン、オクタン、シクロヘプタン等の飽和炭化水素化合物;ビニレンカーボネート、フルオロエチレンカーボネート(FEC)、トリフルオロプロピレンカーボネート、フェニルエチレンカーボネート及びエリスリタンカーボネート等のカーボネート化合物;スルファミン酸(アミド硫酸、H3NSO3);スルファミン酸塩(リチウム塩、ナトリウム塩、カリウム塩等のアルカリ金属塩;カルシウム塩、ストロンチウム塩、バリウム塩等のアルカリ土類金属塩;マンガン塩、銅塩、亜鉛塩、鉄塩、コバルト塩、ニッケル塩等の他の金属塩;アンモニウム塩;グアニジン塩等);フルオロスルホン酸リチウム(LiFSO3)、フルオロスルホン酸ナトリウム(NaFSO3)、フルオロスルホン酸カリウム(KFSO3)、フルオロスルホン酸マグネシウム(Mg(FSO3)2)等のフルオロスルホン酸化合物;モノフルオロリン酸リチウム(Li2PO3F)、ジフルオロリン酸リチウム(LiPO2F2)等のフルオロリン酸化合物;リチウムビス(オキサラト)ボレート(LiBOB)、リチウムジフルオロオキサラトボレート(LiDFOB)、リチウムジフルオロオキサラトホスファナイト(LIDFOP)、リチウムテトラフルオロオキサラトホスフェート(LITFOP)、リチウムジフルオロビス(オキサラト)ホスフェート(LiDFOP)、リチウムトリス(オキサラト)ホスフェート等のシュウ酸骨格を有するリチウム塩等のフルオロオキサラト化合物等が挙げられる。これら添加剤は、それぞれ単独で用いてもよく、2種類以上を併用してもよい。
組成物の含水率(水分濃度、含水量)は、組成物の保存安定性を向上させる観点から、好ましくは10000質量ppm以下であり、より好ましくは3000質量ppm、1000質量ppm、900質量ppm、800質量ppm、700質量ppm、600質量ppm、500質量ppm、400質量ppm、300質量ppm、200質量ppm、100質量ppm、50質量ppmでもよい。組成物の含水率は、低いほど好ましく、検出限界以下でもよく、水を実質的に含んでいなくてもよい(0質量ppm)。水分濃度は、後述の実施例で記載の方法、例えばカールフィッシャー水分測定装置等を用いて測定できる。
組成物におけるフッ化物イオン(F-)、塩化物イオン(Cl-)、硫酸イオン(SO4 2-)、FSO3 -(フルオロスルホン酸イオン)等のアニオン性不純物の各濃度は、スルホニルイミド化合物(1)の分解を抑制する観点から、好ましくは300質量ppm以下、より好ましくは200質量ppm以下、より一層好ましくは100質量ppm以下、さらに好ましくは80質量ppm以下、さらに一層好ましくは60質量ppm以下、特に好ましくは40質量ppm以下である。アニオン性不純物の各濃度は、低いほど好ましく、検出限界以下でもよく、アニオン性不純物を実質的に含んでいなくてもよい(0質量ppm)。アニオン性不純物濃度は、後述の実施例で記載の方法、例えばイオンクロマトグラフィーやNMR等により測定できる。
本実施形態に係る非水電解液は、上述した本実施形態に係る製造方法で得られた組成物(液体組成物)を含む。つまり、非水電解液は、組成物を用いて調製される。非水電解液は、組成物をそのまま用いてもよく、組成物に前記した非水系溶媒(電解液溶媒)を混合して希釈してもよい。電解液溶媒としては、カーボネート系溶媒や他の非水系溶媒等が挙げられる。組成物に混合する溶媒は、組成物を構成する溶媒と同一の溶媒でもよく、異なる溶媒でもよい。このように、非水電解液は、組成物のみを含む(組成物のみからなる)ものでもよく、必要に応じて組成物に前記した電解質又は溶媒、実害のない範囲で前記した添加剤等をさらに含むものでもよい。なお、前記した製造方法及び得られる組成物で説明したすべての事項は、非水電解液にも適用される。
炭酸リチウム(Li2CO3)120gと水476gとを混合した後、氷浴で冷却したスラリーに対し、ビス(フルオロスルホニル)イミド(HFSI)(株式会社日本触媒製、HFSI純度:99.5質量%、不純物:FSO3H 0.03質量%、FSO2NH20.50質量%)484gを45分間かけて滴下した。そのままの温度で1時間撹拌を行った後、No.5Cの桐山ろ紙でろ過を行い、リチウムビス(フルオロスルホニル)イミド(以下「LiFSI」という)を含有するLiFSI水溶液(LiFSI/H2O)を1000g得た。LiFSI水溶液の溶液組成(各成分濃度)、電解質に対するアニオン性不純物濃度を後述する方法に基づいて測定した結果を以下に示す。
・溶液組成 LiFSI:50.1質量%、H2O:49.9質量%
・アニオン性不純物濃度 F-:12質量ppm、Cl-:定量下限以下、SO4 2-:54質量ppm、FSO3 -:146質量ppm
・アニオン成分 H2NSO3Li(H2LiNO3S、アミド硫酸リチウム):3671質量ppm。
LiFSI水溶液におけるLiFSI濃度は、19F-NMRにより測定した。19F-NMRの測定は、Varian社製の「Unity Plus-400」を使用して行った(内部標準物質:トリフルオロトルエン、積算回数:64回)。
カールフィッシャー水分測定装置AQ-2000(平沼産業株式会社製)を用い、発生液としてアクアライトRS-A(平沼産業株式会社製)、対極液としてアクアライトCN(平沼産業株式会社製)を用いて、含水LiFSI溶液における水分量(水分濃度)を測定した。
含水LiFSI溶液を超純水(18.2Ω・cm超)で100倍に希釈して測定溶液とし、イオンクロマトグラフィーシステムICS-3000(日本ダイオネクス株式会社製)を用いて、含水LiFSI溶液中に含まれるH2NSO3Li(アニオン成分)、アニオン性不純物(F-、Cl-、SO4 2-、FSO3 -等)、その他の不純物(FSO2NH2等)の濃度を測定した。測定条件は以下のとおりである。
(イオンクロマトグラフィー測定の測定条件)
・分離モード:イオン交換
・溶離液:7~18mM KOH水溶液
・検出器:電気伝導度検出器
・カラム:アニオン分析用カラムIon PAC AS-17C(日本ダイオネクス株式会社製。
炭酸リチウム18.5gと水16.4gとを混合した後、氷浴で冷却したスラリーに対し、HFSI(株式会社日本触媒製、HFSI純度:99.5質量%、不純物:FSO3H0.03質量%、FSO2NH20.50質量%)70.1gを48分間かけて滴下した。そのままの温度で5時間撹拌を行った後、No.5Cの桐山ろ紙でろ過を行い、LiFSI水溶液(LiFSI/H2O)を83.3g得た。LiFSI水溶液の溶液組成、電解質に対するアニオン性不純物濃度を前記と同様にして測定した結果を以下に示す。
・溶液組成 LiFSI:79.1質量%、H2O:20.9質量%
・アニオン性不純物濃度 F-:17質量ppm、Cl-及びSO4 2-:定量下限以下、FSO3 -:56質量ppm
・アニオン成分 H2NSO3Li:6109質量ppm。
炭酸リチウム12.8gとジメチルカーボネート(DMC)60.7gとを混合した後、10℃に冷却したスラリーに対し、HFSI(株式会社日本触媒製、HFSI純度:99.5質量%、不純物:FSO3H 0.01質量%、FSO2NH20.45質量%)60.1gを45分間かけて滴下した。そのままの温度で2時間撹拌を行った。反応を完結させるために、室温まで昇温後さらに1時間攪拌を行った後、No.5Cの桐山ろ紙でろ過を行い、含水LiFSI/DMC溶液を123.9g得た。含水LiFSI/DMC溶液の溶液組成、電解質に対するアニオン性不純物濃度、電解質に対するその他不純物濃度を前記と同様にして測定した結果を以下に示す。
・溶液組成 LiFSI:50.1質量%、H2O:2.5質量%、DMC濃度:46.9質量%
・アニオン性不純物濃度 F-:944質量ppm、Cl-及びSO4 2-:定量下限以下
・アニオン成分 H2NSO3Li:798質量ppm
・その他不純物濃度 FSO2NH2:0.40質量%。
炭酸リチウム6.5gとエチルメチルカーボネート(EMC)44.9gとを混合した後、10℃に冷却したスラリーに対し、HFSI(株式会社日本触媒製、HFSI純度:99.5質量%、不純物:FSO3H 0.01質量%、FSO2NH20.45質量%)29.9gを26分間かけて滴下した。そのままの温度で4時間撹拌を行った。反応を完結させるために、室温まで昇温後さらに2時間攪拌を行った後、No.5Cの桐山ろ紙でろ過を行い、含水LiFSI/EMC溶液75.1g得た。含水LiFSI/EMC溶液の溶液組成、電解質に対するアニオン性不純物濃度を前記と同様にして測定した結果を以下に示す。
・溶液組成 LiFSI:39.6質量%、H2O:2.0質量%、EMC濃度:58.4質量%
・アニオン性不純物濃度 F-:874質量ppm、Cl-及びSO4 2-:定量下限以下
・アニオン成分 H2NSO3Li:292質量ppm
・その他不純物濃度 FSO2NH2:0.46質量%。
炭酸リチウム31.9gと水54.8gとを混合した後、氷浴で冷却したスラリーに対し、HFSI(株式会社日本触媒製、HFSI純度:99.5質量%、不純物:FSO3H 0.03質量%、FSO2NH20.50質量%)140gを30分間かけて滴下した。そのままの温度で2時間撹拌を行った後、No.5Cの桐山ろ紙でろ過を行い、LiFSI水溶液(LiFSI/H2O)を200g得た。LiFSI水溶液の溶液組成、電解質に対するアニオン性不純物濃度を前記と同様にして測定した結果を以下に示す。
・溶液組成 LiFSI:70.2質量%、H2O:29.8質量%
・アニオン性不純物濃度 F-:10質量ppm、Cl-:21質量ppm、SO4 2-:定量下限以下、FSO3 -:定量下限以下
・アニオン成分 H2NSO3Li:5822質量ppm。
ドライルーム(露点:-40℃)にて、内温を測定する温度計、溶媒投入口、蒸留塔(充填材:スルザーEX、スルザージャパン株式会社製、以下同じ。)を備えた2Lの三口フラスコに合成例1(調製工程)で得られたLiFSI水溶液(LiFSI/H2O)898g、DMC678g、並びにアニオン成分として炭酸リチウム1.2g(電解質あたり2691質量ppm)及びアミド硫酸リチウム0.8g(電解質あたり1792質量ppm)を加えて、LiFSIを28質量%含む含水LiFSI/DMC溶液(脱水用含水スルホニルイミド溶液)を調製した。なお、蒸留塔の塔頂には、揮発した蒸気を凝集するための冷却管が備えられている。さらに冷却管の先には、凝集した液を油水分離するための相分離槽としてディーンスターク装置が備えられている。
・溶液組成 LiFSI:47質量%、H2O(含水率):46質量ppm
・アニオン性不純物濃度 F-:22質量ppm、Cl-及びSO4 2-:定量下限以下
・アニオン成分残存量 H2NSO3Li:345質量ppm。
Δtを15~20℃で推移させた以外は実施例1と同様の条件で脱水しDMCに置換した(脱水工程)。得られた懸濁液をメンブレンフィルターでろ過し、無色透明なLiFSI/DMC溶液を得た。LiFSI/DMC溶液の溶液組成、電解質に対するアニオン性不純物濃度を前記と同様にして測定した結果を以下に示す。
・溶液組成 LiFSI:44質量%、H2O(含水率):48質量ppm
・アニオン性不純物濃度 F-、Cl-及びSO4 2-:定量下限以下
・アニオン成分残存量 H2NSO3Li:295質量ppm。
ドライルーム(露点:-40℃)にて、実施例1と同様の装置に合成例1(調製工程)で得られたLiFSI水溶液(LiFSI/H2O)699g、EMC712g、並びにアニオン成分として炭酸リチウム1.2g(電解質あたり3368質量ppm)及びアミド硫酸リチウム0.6g(電解質あたり1757質量ppm)を加えて、LiFSIを25質量%含む含水LiFSIのEMC溶液(脱水用含水スルホニルイミド溶液)を調製した。
・溶液組成 LiFSI:37質量%、H2O(含水率):32質量ppm
・アニオン性不純物濃度 F-、Cl-及びSO4 2-:定量下限以下
・アニオン成分残存量 H2NSO3Li:189質量ppm。
Δtを15~20℃で推移させた以外は実施例3と同様の条件で脱水しEMCに置換した(脱水工程)。得られた懸濁液をメンブレンフィルターでろ過し、無色透明なLiFSI/EMC溶液を得た。LiFSI/EMC溶液の溶液組成、電解質に対するアニオン性不純物濃度を前記と同様にして測定した結果を以下に示す。
・溶液組成 LiFSI:36質量%、H2O(含水率):31質量ppm
・アニオン性不純物濃度 F-、Cl-及びSO4 2-:定量下限以下
・アニオン成分残存量 H2NSO3Li:186質量ppm。
ドライルーム(露点:-40℃)にて、実施例1と同様の装置に合成例2(調製工程)で得られたLiFSI水溶液(LiFSI/H2O)812g、DMC665g及びアニオン成分として炭酸リチウム15.0g(電解質あたり23383質量ppm)を加えて、LiFSIを44質量%含む含水LiFSI/DMC溶液(脱水用含水スルホニルイミド溶液)を調製した。
・溶液組成 LiFSI:53質量%、H2O(含水率):50質量ppm
・アニオン性不純物濃度 F-:20質量ppm、Cl-及びSO4 2-:定量下限以下
・アニオン成分残存量 H2NSO3Li:68質量ppm。
ドライルーム(露点:-40℃)にて、実施例1と同様の装置に合成例2(調製工程)で得られたLiFSI水溶液(LiFSI/H2O)1263g、EMC1994g及びアニオン成分として炭酸リチウム4.1g(電解質あたり4108質量ppm)を加えて、LiFSIを31質量%含む含水LiFSI/EMC溶液(脱水用含水スルホニルイミド溶液)を調製した。
・溶液組成 LiFSI:34質量%、H2O(含水率):8質量ppm
・アニオン性不純物濃度 F-及びCl-及びSO4 2-:定量下限以下
・アニオン成分残存量 H2NSO3Li:206質量ppm。
ドライルーム(露点:-40℃)にて、実施例1と同様の装置に合成例4(調製工程)で得られた含水LiFSI/EMC溶液1477g及びアニオン成分として炭酸リチウム15.0g(電解質あたり25647質量ppm)を加えて、LiFSIを40質量%含む含水LiFSI/EMC溶液(脱水用含水スルホニルイミド溶液)を調製した。
・溶液組成 LiFSI:42質量%、H2O(含水率):26質量ppm
・アニオン性不純物濃度 F-:25質量ppm、Cl-:定量下限以下、SO4 2-:12質量ppm
・アニオン成分残存量 H2NSO3Li:92質量ppm。
ドライルーム(露点:-40℃)にて、500mLナスフラスコに合成例5で得られたLiFSI水溶液51g(FSI濃度:70wt%、アニオン成分含有量:5822ppm)、EMC212g、及びアニオン成分としてリン酸リチウム1.1g(Sigma-Aldrich製、工程中のアニオン成分添加量(電解質あたり):14233ppm)を加え、LiFSIを14質量%含む含水LiFSI/EMC溶液(脱水用含水スルホニルイミド溶液)を調製した。
・溶液組成 LiFSI:41質量%、H2O(含水率):9.5質量ppm
・アニオン性不純物 F-:18.0質量ppm、Cl-:定量下限以下、SO4 2-:126質量ppm
・アニオン成分残存量 H2NSO3Li:1717質量ppm、Li3PO4:7.8質量ppm。
ドライルーム(露点:-40℃)にて、500mLナスフラスコに合成例5で得られたLiFSI水溶液50g(FSI濃度:70wt%、アニオン成分含有量:5822ppm)、EMC230g、並びにアニオン成分として炭酸リチウム0.52g(工程中のアニオン成分添加量(電解質あたり):14733ppm)及び70質量%イセチオン酸水溶液0.63g(富士フィルム和光純薬製、工程中のアニオン成分添加量(電解質あたり):12495ppm)を加え、LiFSIを13質量%含む含水LiFSI/EMC溶液(脱水用含水スルホニルイミド溶液)を調製した。
・溶液組成 LiFSI:44質量%、H2O(含水率):18.3質量ppm
・アニオン性不純物 F-:15.4質量ppm、Cl-、SO4 2-:いずれも定量下限以下
・アニオン成分残存量 イセチオン酸Li(HO(CH2)2SO3Li):5356質量ppm。
ドライルーム(露点:-40℃)にて、内温を測定する温度計、溶媒投入口、リービッヒ冷却器を備えた2Lの三口フラスコに合成例1で得られたLiFSI水溶液(LiFSI/H2O)19g、DMC63gを加えて、LiFSIを12質量%含む含水LiFSI/DMC溶液を調製した。
・溶液組成 LiFSI:56質量%、H2O:115質量ppm
・アニオン性不純物 F-:10質量ppm、Cl-及びSO4 2-:定量下限以下
・アニオン成分残存量 H2NSO3Li:411質量ppm。
[数2]
脱水効率=「各回における含水率に到達するまでに要したDMCの総量」/「LiFSIの重量」 (2)
ドライルーム(露点:-40℃)にて、実施例1と同様の装置に合成例1で得られたLiFSI水溶液(LiFSI/H2O)242g及びEMC920gを加えて、LiFSIを25質量%含む含水LiFSIのEMC溶液を調製した。
・溶液組成 LiFSI:41質量%、H2O:29質量ppm
・アニオン性不純物 F-:28質量ppm、Cl-及びSO4 2-: 定量下限以下
・アニオン成分残存量 H2NSO3Li:68質量ppm。
調整工程及び脱水工程を経て得られた各LiFSI溶液(組成物)の溶媒の種類、アニオン成分の種類及びその添加量、脱水効率を以下の表2に示す。なお、表2中、電解質あたりの脱水工程中のアニオン成分添加量とは、脱水前の脱水用含水スルホニルイミド溶液を調製する際に、含水LiFSI溶液に添加したアニオン成分の重量(複数のアニオン成分を添加した場合、これら重量の合計)に基づく計算値をいう。電解質あたりの脱水工程中のアニオン成分含有量とは、含水LiFSI溶液の原料中のアニオン成分含有量と上記アニオン成分添加量との合計量に基づく計算値をいう。脱水効率は、以下の数式(3)により求めた。脱水効率は、その値が小さいほど脱水し非水系溶媒に置換する効率が高いことを意味する。
[数3]
脱水効率=「含水率が50質量ppmに到達するまでに要した添加溶媒の総量又は総上昇蒸気量」/「LiFSIの重量」 (3)
但し、比較例1の非水系溶媒の総量は、含水率が115質量ppmに到達するまでに要した量とする。
表2の結果から、脱水工程において、各実施例の製造方法は、調製工程で得られたスルホニルイミド溶液に非水系溶媒と共に、アニオン成分(酸成分)をさらに加えて脱水し非水系溶媒に置換するという操作が採用されているため、アニオン成分を加えずに脱水し非水系溶媒に置換する各比較例の製造方法と比較して、脱水効率に優れることが分かった。
Claims (12)
- 電解質、非水系溶媒及びアニオン成分を含有する組成物を製造する方法であって、
前記電解質は、一般式(1)で表されるスルホニルイミド化合物を含み、
前記アニオン成分は、その共役酸の酸解離定数pKa(複数電離する酸については第1段階の酸解離定数pKa1)が0以上6.5以下であり、前記電解質に対して10000質量ppm以下の濃度で含まれており、
前記電解質及び前記非水系溶媒を含有する溶液に前記アニオン成分を加えて脱水し、溶媒置換する脱水工程を含む、組成物の製造方法。
LiN(XSO2)(FSO2) (Xはフッ素原子、炭素数1~6のアルキル基又は炭素数1~6のフルオロアルキル基を示す。) (1) - 前記脱水工程において、前記アニオン成分を前記電解質に対して4000質量ppm以上の濃度で含む、請求項1に記載の組成物の製造方法。
- 前記脱水工程は、前記アニオン成分を前記電解質に対して1000質量ppm以上の濃度で追加する工程を含む、請求項1に記載の組成物の製造方法。
- 前記アニオン成分は、アミド硫酸成分、カルボン酸成分、炭酸成分及びリン酸成分からなる群より選択される少なくとも1種である、請求項1~3のいずれか一項に記載の組成物の製造方法。
- 前記アニオン成分は、スルホン酸成分、スルフィン酸成分、カルボン酸成分、炭酸成分、リン酸成分及びホスホン酸成分、これらの誘導体、並びにこれらの塩からなる群より選択される少なくとも1種である、請求項1~3のいずれか一項に記載の組成物の製造方法。
- 前記アニオン成分は、アミド硫酸及びその塩、アミド硫酸誘導体及びその塩からなる群より選択される少なくとも1種を含み、
前記アミド硫酸誘導体及びその塩は一般式(2)で表される化合物である、請求項1~5のいずれか一項に記載の組成物の製造方法。
- 前記アニオン成分は、アミド硫酸及びアミド硫酸のアルカリ金属塩からなる群より選択される少なくとも1種を含む、請求項1~5のいずれか一項に記載の組成物の製造方法。
- 前記アニオン成分は、アミド硫酸アルカリ金属塩を含む、請求項1~5のいずれか一項に記載の組成物の製造方法。
- 前記非水系溶媒は鎖状カーボネート系溶媒を含む、請求項1~8のいずれか一項に記載の組成物の製造方法。
- 含水率が10000質量ppm以下である、請求項1~9のいずれか一項に記載の組成物の製造方法。
- 前記脱水工程において、以下の数式:
脱水効率=「組成物の目標とする含水率に到達するまでに要した非水系溶媒の総量」/「電解質の重量」
により求められる脱水効率が80以下である、請求項1~10のいずれか一項に記載の組成物の製造方法。 - 請求項1~11のいずれか一項に記載の製造方法で得られた組成物を含む、非水電解液。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023531857A JPWO2023276812A1 (ja) | 2021-06-30 | 2022-06-22 | |
EP22832960.3A EP4343915A1 (en) | 2021-06-30 | 2022-06-22 | Composition production method and non-aqueous electrolyte solution |
KR1020247002946A KR20240025009A (ko) | 2021-06-30 | 2022-06-22 | 조성물의 제조방법 및 비수전해액 |
CN202280041810.4A CN117480659A (zh) | 2021-06-30 | 2022-06-22 | 组合物的制造方法及非水电解液 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021109047 | 2021-06-30 | ||
JP2021-109047 | 2021-06-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2023276812A1 true WO2023276812A1 (ja) | 2023-01-05 |
Family
ID=84691777
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2022/024862 WO2023276812A1 (ja) | 2021-06-30 | 2022-06-22 | 組成物の製造方法及び非水電解液 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP4343915A1 (ja) |
JP (1) | JPWO2023276812A1 (ja) |
KR (1) | KR20240025009A (ja) |
CN (1) | CN117480659A (ja) |
WO (1) | WO2023276812A1 (ja) |
Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08511274A (ja) | 1994-03-21 | 1996-11-26 | サントル・ナショナル・ドゥ・ラ・ルシェルシュ・シャンティフィク | 良好な耐食性を示すイオン性伝導材料 |
JP2007182410A (ja) | 2006-01-10 | 2007-07-19 | Dai Ichi Kogyo Seiyaku Co Ltd | フッ素化合物の製造方法及びそれにより得られるフッ素化合物 |
WO2010010613A1 (ja) | 2008-07-23 | 2010-01-28 | 第一工業製薬株式会社 | ビス(フルオロスルホニル)イミドアニオン化合物の製造方法およびイオン対化合物 |
JP2010168249A (ja) | 2009-01-22 | 2010-08-05 | Nippon Shokubai Co Ltd | フルオロスルホニルイミド類およびその製造方法 |
JP2010168308A (ja) | 2009-01-22 | 2010-08-05 | Nippon Shokubai Co Ltd | フルオロスルホニルイミド類およびその製造方法 |
JP2010189372A (ja) | 2008-03-31 | 2010-09-02 | Nippon Shokubai Co Ltd | フルオロスルホニルイミド類およびその製造方法 |
JP2010254543A (ja) | 2009-03-31 | 2010-11-11 | Mitsubishi Materials Corp | ビス(フルオロスルホニル)イミド塩の製造方法及びフルオロ硫酸塩の製造方法、並びにビス(フルオロスルホニル)イミド・オニウム塩の製造方法 |
JP2010280586A (ja) | 2009-06-03 | 2010-12-16 | Central Glass Co Ltd | イミド酸塩の製造方法 |
WO2011065502A1 (ja) | 2009-11-27 | 2011-06-03 | 株式会社日本触媒 | フルオロスルホニルイミド塩およびフルオロスルホニルイミド塩の製造方法 |
WO2011149095A1 (ja) | 2010-05-28 | 2011-12-01 | 株式会社日本触媒 | フルオロスルホニルイミドのアルカリ金属塩およびその製造方法 |
WO2012108284A1 (ja) | 2011-02-10 | 2012-08-16 | 日本曹達株式会社 | フルオロスルホニルイミドアンモニウム塩の製造方法 |
WO2012117961A1 (ja) | 2011-03-03 | 2012-09-07 | 日本曹達株式会社 | フルオロスルホニルイミドアンモニウム塩の製造方法 |
WO2012118063A1 (ja) | 2011-03-03 | 2012-09-07 | 日本曹達株式会社 | フッ素含有スルホニルイミド塩の製造方法 |
WO2014035464A1 (en) | 2012-08-29 | 2014-03-06 | Boulder Ionics Corporation | Synthesis of bis(fluorosulfonyl)imide |
JP2014201453A (ja) | 2013-04-01 | 2014-10-27 | 株式会社日本触媒 | フルオロスルホニルイミドのアルカリ金属塩の製造方法 |
JP2018055882A (ja) * | 2016-09-27 | 2018-04-05 | 株式会社日本触媒 | ビス(フルオロスルホニル)イミドのアルカリ金属塩と有機溶媒とを含む電解液材料の製造方法、及びビス(フルオロスルホニル)イミドのアルカリ金属塩と有機溶媒とを含む電解液材料 |
WO2018144480A1 (en) | 2017-01-31 | 2018-08-09 | Synthio Chemicals, LLC | Method for producing a hygroscopic alkali metal salt electrolyte solution |
WO2020241161A1 (ja) | 2019-05-31 | 2020-12-03 | 株式会社日本触媒 | 電解質組成物、溶媒組成物、非水電解液及びその用途 |
-
2022
- 2022-06-22 CN CN202280041810.4A patent/CN117480659A/zh active Pending
- 2022-06-22 KR KR1020247002946A patent/KR20240025009A/ko unknown
- 2022-06-22 JP JP2023531857A patent/JPWO2023276812A1/ja active Pending
- 2022-06-22 EP EP22832960.3A patent/EP4343915A1/en active Pending
- 2022-06-22 WO PCT/JP2022/024862 patent/WO2023276812A1/ja active Application Filing
Patent Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08511274A (ja) | 1994-03-21 | 1996-11-26 | サントル・ナショナル・ドゥ・ラ・ルシェルシュ・シャンティフィク | 良好な耐食性を示すイオン性伝導材料 |
JP2007182410A (ja) | 2006-01-10 | 2007-07-19 | Dai Ichi Kogyo Seiyaku Co Ltd | フッ素化合物の製造方法及びそれにより得られるフッ素化合物 |
JP2010189372A (ja) | 2008-03-31 | 2010-09-02 | Nippon Shokubai Co Ltd | フルオロスルホニルイミド類およびその製造方法 |
WO2010010613A1 (ja) | 2008-07-23 | 2010-01-28 | 第一工業製薬株式会社 | ビス(フルオロスルホニル)イミドアニオン化合物の製造方法およびイオン対化合物 |
JP2010168249A (ja) | 2009-01-22 | 2010-08-05 | Nippon Shokubai Co Ltd | フルオロスルホニルイミド類およびその製造方法 |
JP2010168308A (ja) | 2009-01-22 | 2010-08-05 | Nippon Shokubai Co Ltd | フルオロスルホニルイミド類およびその製造方法 |
JP2010254543A (ja) | 2009-03-31 | 2010-11-11 | Mitsubishi Materials Corp | ビス(フルオロスルホニル)イミド塩の製造方法及びフルオロ硫酸塩の製造方法、並びにビス(フルオロスルホニル)イミド・オニウム塩の製造方法 |
JP2010280586A (ja) | 2009-06-03 | 2010-12-16 | Central Glass Co Ltd | イミド酸塩の製造方法 |
WO2011065502A1 (ja) | 2009-11-27 | 2011-06-03 | 株式会社日本触媒 | フルオロスルホニルイミド塩およびフルオロスルホニルイミド塩の製造方法 |
WO2011149095A1 (ja) | 2010-05-28 | 2011-12-01 | 株式会社日本触媒 | フルオロスルホニルイミドのアルカリ金属塩およびその製造方法 |
WO2012108284A1 (ja) | 2011-02-10 | 2012-08-16 | 日本曹達株式会社 | フルオロスルホニルイミドアンモニウム塩の製造方法 |
WO2012117961A1 (ja) | 2011-03-03 | 2012-09-07 | 日本曹達株式会社 | フルオロスルホニルイミドアンモニウム塩の製造方法 |
WO2012118063A1 (ja) | 2011-03-03 | 2012-09-07 | 日本曹達株式会社 | フッ素含有スルホニルイミド塩の製造方法 |
WO2014035464A1 (en) | 2012-08-29 | 2014-03-06 | Boulder Ionics Corporation | Synthesis of bis(fluorosulfonyl)imide |
JP2014201453A (ja) | 2013-04-01 | 2014-10-27 | 株式会社日本触媒 | フルオロスルホニルイミドのアルカリ金属塩の製造方法 |
JP2018055882A (ja) * | 2016-09-27 | 2018-04-05 | 株式会社日本触媒 | ビス(フルオロスルホニル)イミドのアルカリ金属塩と有機溶媒とを含む電解液材料の製造方法、及びビス(フルオロスルホニル)イミドのアルカリ金属塩と有機溶媒とを含む電解液材料 |
WO2018144480A1 (en) | 2017-01-31 | 2018-08-09 | Synthio Chemicals, LLC | Method for producing a hygroscopic alkali metal salt electrolyte solution |
WO2020241161A1 (ja) | 2019-05-31 | 2020-12-03 | 株式会社日本触媒 | 電解質組成物、溶媒組成物、非水電解液及びその用途 |
Also Published As
Publication number | Publication date |
---|---|
CN117480659A (zh) | 2024-01-30 |
EP4343915A1 (en) | 2024-03-27 |
JPWO2023276812A1 (ja) | 2023-01-05 |
KR20240025009A (ko) | 2024-02-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9985317B2 (en) | Alkali metal salt of fluorosulfonyl imide, and production method therefor | |
KR102428546B1 (ko) | 헤테로고리형 이온성 액체 | |
JP2023153387A (ja) | 組成物、電解液材料及び電解液 | |
WO2023276812A1 (ja) | 組成物の製造方法及び非水電解液 | |
WO2023276568A1 (ja) | スルホニルイミド水溶液の精製方法、非水電解液の製造方法及び電解質組成物の製造方法 | |
WO2023276561A1 (ja) | 非水電解液の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 22832960 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2023531857 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 202280041810.4 Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2022832960 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: 2022832960 Country of ref document: EP Effective date: 20231218 |
|
ENP | Entry into the national phase |
Ref document number: 20247002946 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020247002946 Country of ref document: KR |
|
NENP | Non-entry into the national phase |
Ref country code: DE |