JPWO2023063027A5 - - Google Patents

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Publication number
JPWO2023063027A5
JPWO2023063027A5 JP2023555053A JP2023555053A JPWO2023063027A5 JP WO2023063027 A5 JPWO2023063027 A5 JP WO2023063027A5 JP 2023555053 A JP2023555053 A JP 2023555053A JP 2023555053 A JP2023555053 A JP 2023555053A JP WO2023063027 A5 JPWO2023063027 A5 JP WO2023063027A5
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JP
Japan
Prior art keywords
polishing composition
composition according
water
inorganic acid
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023555053A
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English (en)
Japanese (ja)
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JPWO2023063027A1 (https=
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Publication date
Application filed filed Critical
Priority claimed from PCT/JP2022/034908 external-priority patent/WO2023063027A1/ja
Publication of JPWO2023063027A1 publication Critical patent/JPWO2023063027A1/ja
Publication of JPWO2023063027A5 publication Critical patent/JPWO2023063027A5/ja
Pending legal-status Critical Current

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JP2023555053A 2021-10-12 2022-09-20 Pending JPWO2023063027A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021167127 2021-10-12
PCT/JP2022/034908 WO2023063027A1 (ja) 2021-10-12 2022-09-20 研磨用組成物

Publications (2)

Publication Number Publication Date
JPWO2023063027A1 JPWO2023063027A1 (https=) 2023-04-20
JPWO2023063027A5 true JPWO2023063027A5 (https=) 2024-07-24

Family

ID=85987670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023555053A Pending JPWO2023063027A1 (https=) 2021-10-12 2022-09-20

Country Status (6)

Country Link
EP (1) EP4418306A4 (https=)
JP (1) JPWO2023063027A1 (https=)
KR (1) KR20240074866A (https=)
CN (1) CN118103955A (https=)
TW (1) TW202334339A (https=)
WO (1) WO2023063027A1 (https=)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6050125U (ja) 1983-09-14 1985-04-09 小島 義彦 箱のコ−ナ−補強金具
JP4608196B2 (ja) * 2003-09-30 2011-01-05 株式会社フジミインコーポレーテッド 研磨用組成物
JP2005244123A (ja) * 2004-02-27 2005-09-08 Fujimi Inc 研磨用組成物
US20130302984A1 (en) 2011-01-26 2013-11-14 Fujimi Incorporated Polishing composition, polishing method using same, and substrate production method
US10730755B2 (en) * 2015-03-31 2020-08-04 Jgc Catalysts And Chemicals Ltd. Silica-based composite fine-particle dispersion, method for producing same, and polishing slurry including silica-based composite fine-particle dispersion
JP7250530B2 (ja) * 2018-03-15 2023-04-03 株式会社フジミインコーポレーテッド 研磨用組成物、研磨用組成物の製造方法、研磨方法、および半導体基板の製造方法
JP7234536B2 (ja) * 2018-03-26 2023-03-08 三菱ケミカル株式会社 シリカゾルの製造方法
WO2020196370A1 (ja) * 2019-03-26 2020-10-01 株式会社フジミインコーポレーテッド 研磨用組成物
JP7272990B2 (ja) 2020-04-09 2023-05-12 トヨタ自動車株式会社 コラムカバーユニット

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